公开(公告)号：US20110070667A1

公开(公告)日：2011-03-24

申请号：US12885257

申请日：2010-09-17

申请人： Hiroyuki Morimoto ,  Masahiko Kubota

发明人： Hiroyuki Morimoto ,  Masahiko Kubota

IPC分类号： H01L21/66

CPC分类号： B41J2/1603 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1634 ,  B41J2/1639 ,  B41J2/1645 ,  Y10S438/94

摘要： A substrate processing method includes preparing a substrate, a first mask adjacent to a first surface of the substrate and including a first light transmitting portion allowing light to be transmitted therethrough, a condenser adjacent to the first surface, a second mask including a second light transmitting portion, and a photo detecting member including a photo detecting portion detecting light having passed through the second light transmitting portion, the condenser condensing light having passed through the first light transmitting portion toward the second light transmitting portion, the second light transmitting portion allowing the light condensed by the condenser to be transmitted therethrough, and forming a recess in the substrate by laser beam irradiation from a direction opposite to the first surface. When an intensity of the laser beam detected by the photo detecting portion is at or above a specific intensity, the irradiation of the laser beam is stopped.

摘要翻译： 衬底处理方法包括：准备衬底，与衬底的第一表面相邻的第一掩模，并且包括允许光透射的第一透光部分，与第一表面相邻的电容器;第二掩模，包括第二透光 以及光检测部件，其包括检测通过第二透光部的光的光检测部，通过第一透光部朝向第二透光部的聚光灯，第二透光部，允许光 通过冷凝器冷凝以透过其中，并且通过从与第一表面相反的方向的激光束照射在基板中形成凹部。 当由光电检测部分检测的激光束的强度处于或高于特定强度时，停止激光束的照射。

公开(公告)号：US08211719B2

公开(公告)日：2012-07-03

申请号：US12885257

申请日：2010-09-17

申请人： Hiroyuki Morimoto ,  Masahiko Kubota

发明人： Hiroyuki Morimoto ,  Masahiko Kubota

IPC分类号： H01L21/66

CPC分类号： B41J2/1603 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1634 ,  B41J2/1639 ,  B41J2/1645 ,  Y10S438/94

摘要： A substrate processing method includes preparing a substrate, a first mask adjacent to a first surface of the substrate and including a first light transmitting portion allowing light to be transmitted therethrough, a condenser adjacent to the first surface, a second mask including a second light transmitting portion, and a photo detecting member including a photo detecting portion detecting light having passed through the second light transmitting portion, the condenser condensing light having passed through the first light transmitting portion toward the second light transmitting portion, the second light transmitting portion allowing the light condensed by the condenser to be transmitted therethrough, and forming a recess in the substrate by laser beam irradiation from a direction opposite to the first surface. When an intensity of the laser beam detected by the photo detecting portion is at or above a specific intensity, the irradiation of the laser beam is stopped.

摘要翻译： 衬底处理方法包括：准备衬底，与衬底的第一表面相邻的第一掩模，并且包括允许光透射的第一透光部分，与第一表面相邻的电容器;第二掩模，包括第二透光 以及光检测部件，其包括检测通过第二透光部的光的光检测部，通过第一透光部朝向第二透光部的聚光灯，第二透光部，允许光 通过冷凝器冷凝以透过其中，并且通过从与第一表面相反的方向的激光束照射在基板中形成凹部。 当由光电检测部分检测的激光束的强度处于或高于特定强度时，停止激光束的照射。

公开(公告)号：US20090314742A1

公开(公告)日：2009-12-24

申请号：US12484937

申请日：2009-06-15

申请人： Keisuke Kishimoto ,  Satoshi Ibe ,  Takuya Hatsui ,  Shimpei Otaka ,  Hiroto Komiyama ,  Hiroyuki Morimoto ,  Masahiko Kubota ,  Toshiyasu Sakai

发明人： Keisuke Kishimoto ,  Satoshi Ibe ,  Takuya Hatsui ,  Shimpei Otaka ,  Hiroto Komiyama ,  Hiroyuki Morimoto ,  Masahiko Kubota ,  Toshiyasu Sakai

IPC分类号： G01D15/18

CPC分类号： B41J2/1603 ,  B41J2/1629 ,  B41J2/1634 ,  B41J2/1635 ,  B41J2/1639

摘要： A method for processing a substrate includes preparing a substrate having a first layer on a first surface side thereof, the first layer having a material capable of suppressing transmission of laser light, processing the substrate with laser light from a second surface that is opposite the first surface of the substrate toward the first surface of the substrate, and allowing the laser light to reach the first layer to form a hole in the substrate, and performing etching of the substrate from the second surface through the hole.

摘要翻译： 一种处理衬底的方法包括制备在其第一表面侧上具有第一层的衬底，所述第一层具有能够抑制激光透射的材料，用来自与第一层相反的第二表面的激光来处理衬底 基板的表面朝向基板的第一表面，并且允许激光到达第一层以在基板中形成孔，并且通过该孔从第二表面进行基板的蚀刻。

公开(公告)号：US08597529B2

公开(公告)日：2013-12-03

申请号：US12484937

申请日：2009-06-15

申请人： Keisuke Kishimoto ,  Satoshi Ibe ,  Takuya Hatsui ,  Shimpei Otaka ,  Hiroto Komiyama ,  Hiroyuki Morimoto ,  Masahiko Kubota ,  Toshiyasu Sakai

发明人： Keisuke Kishimoto ,  Satoshi Ibe ,  Takuya Hatsui ,  Shimpei Otaka ,  Hiroto Komiyama ,  Hiroyuki Morimoto ,  Masahiko Kubota ,  Toshiyasu Sakai

IPC分类号： G01D15/00

CPC分类号： B41J2/1603 ,  B41J2/1629 ,  B41J2/1634 ,  B41J2/1635 ,  B41J2/1639

摘要： A method for processing a substrate includes preparing a substrate having a first layer on a first surface side thereof, the first layer having a material capable of suppressing transmission of laser light, processing the substrate with laser light from a second surface that is opposite the first surface of the substrate toward the first surface of the substrate, and allowing the laser light to reach the first layer to form a hole in the substrate, and performing etching of the substrate from the second surface through the hole.

摘要翻译： 一种处理衬底的方法包括制备在其第一表面侧上具有第一层的衬底，所述第一层具有能够抑制激光透射的材料，用来自与第一层相反的第二表面的激光来处理衬底 基板的表面朝向基板的第一表面，并且允许激光到达第一层以在基板中形成孔，并且通过该孔从第二表面进行基板的蚀刻。

公开(公告)号：US08613141B2

公开(公告)日：2013-12-24

申请号：US12268760

申请日：2008-11-11

申请人： Akihiko Okano ,  Maki Kato ,  Masaki Ohsumi ,  Yoshinori Tagawa ,  Kazuhiro Asai ,  Masahiko Kubota ,  Tamaki Sato

发明人： Akihiko Okano ,  Maki Kato ,  Masaki Ohsumi ,  Yoshinori Tagawa ,  Kazuhiro Asai ,  Masahiko Kubota ,  Tamaki Sato

IPC分类号： B41J2/16 ,  B21D53/76

CPC分类号： B41J2/1603 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1639 ,  B41J2/164 ,  B41J2002/14475

摘要： A manufacturing method of a liquid ejection head provided with a flow passage communicating with an ejection outlet for ejecting liquid includes steps of preparing a substrate on which a flow passage wall forming member for forming a part of a wall of the flow passage and a solid layer having a shape of a part of the flow passage contact each other, wherein the flow passage wall forming member has a height, from a surface of the substrate, substantially equal to that of the solid layer; providing on the solid layer a pattern having a shape of another part of the flow passage; providing a coating layer, for forming another part of the wall of the flow passage, so as to coat the pattern; providing the ejection outlet to the coating layer; and forming the flow passage by removing the solid layer and the pattern.

摘要翻译： 具有与用于喷射液体的喷射口连通的流路的液体喷射头的制造方法包括准备基板的步骤，在基板上形成用于形成流路的壁的一部分的流路壁形成部件和固体层 具有所述流路的一部分的形状彼此接触，其中，所述流路壁形成部件具有与所述基板的表面大致相等的所述固体层的高度; 在所述固体层上提供具有所述流路的另一部分的形状的图案; 提供用于形成流路的壁的另一部分以涂覆图案的涂层; 向喷涂层提供喷射出口; 并通过去除固体层和图案形成流动通道。

公开(公告)号：US08518725B2

公开(公告)日：2013-08-27

申请号：US13521694

申请日：2011-01-13

申请人： Atsunori Terasaki ,  Masahiko Kubota ,  Ryoji Kanri ,  Yoshiyuki Fukumoto

发明人： Atsunori Terasaki ,  Masahiko Kubota ,  Ryoji Kanri ,  Yoshiyuki Fukumoto

IPC分类号： H01L21/00 ,  H01L21/30 ,  H01L21/46 ,  B21D53/76 ,  B23P17/00 ,  G01D15/00 ,  G11B5/127 ,  B44C1/22 ,  C03C15/00 ,  C03C25/68 ,  C23F1/00

CPC分类号： B41J2/1603 ,  B41J2/1623 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1634 ,  B41J2/1639 ,  B41J2/1642

摘要： A method for processing a silicon substrate includes providing a combination of a first silicon substrate, a second silicon substrate, and an intermediate layer including a plurality of recessed portions, which is provided between the first silicon substrate and the second silicon substrate, forming a first through hole that goes through the first silicon substrate by executing etching of the first silicon substrate on a surface of the first silicon substrate opposite to a bonding surface with the intermediate layer by using a first mask, and exposing a portion of the intermediate layer corresponding to the plurality of recessed portions of the intermediate layer, forming a plurality of openings on the intermediate layer by removing a portion constituting a bottom of the plurality of recessed portions, and forming a second through hole that goes through the second silicon substrate by executing second etching of the second silicon substrate by using the intermediate layer on which the plurality of openings are formed as a mask.

摘要翻译： 一种处理硅衬底的方法，包括提供第一硅衬底，第二硅衬底和包括多个凹陷部分的中间层的组合，其设置在第一硅衬底和第二硅衬底之间，形成第一衬底 通过使用第一掩模在所述第一硅衬底的与所述中间层的接合表面相对的表面上执行所述第一硅衬底的表面的蚀刻来穿过所述第一硅衬底的通孔，以及将与所述第一硅衬底相对应的所述中间层的一部分 中间层的多个凹部，通过除去构成多个凹部的底部的部分，在中间层上形成多个开口，并且通过执行第二蚀刻形成穿过第二硅衬底的第二通孔 的第二硅衬底通过使用其上的中间层 形成多个开口作为掩模。

公开(公告)号：US08398212B2

公开(公告)日：2013-03-19

申请号：US12635948

申请日：2009-12-11

申请人： Akihiko Okano ,  Masahiko Kubota ,  Ryoji Kanri ,  Atsushi Hiramoto

发明人： Akihiko Okano ,  Masahiko Kubota ,  Ryoji Kanri ,  Atsushi Hiramoto

IPC分类号： B41J2/05

CPC分类号： B41J2/1404 ,  B41J2/14145 ,  B41J2/1603 ,  B41J2/1628 ,  B41J2/1634

摘要： An ink jet head includes a Si substrate with a surface having a {100} orientation; a passage holding ink on the Si substrate; an ink discharge port which is communicatively connected to the passage and through which ink is ejected; and a supply port which extends through the Si substrate, which is communicatively connected to the passage, and which supplies ink to the passage. The supply port has walls having two {111} planes facing each other.

摘要翻译： 喷墨头包括具有{100}取向的表面的Si衬底; 在Si衬底上保持油墨的通道; 墨水排出口，其连通地连接到通道并通过其喷射墨水; 以及供应端口，其延伸穿过Si衬底，其通信地连接到通道，并且向通道供应墨水。 供应端口具有彼此面对的两个{111}平面的壁。

公开(公告)号：US08017307B2

公开(公告)日：2011-09-13

申请号：US10568341

申请日：2005-06-27

申请人： Masahiko Kubota ,  Takumi Suzuki ,  Tamaki Sato ,  Ryoji Kanri ,  Maki Hatta ,  Kazuhiro Asai ,  Shoji Shiba ,  Hiroe Ishikura ,  Akihiko Okano

发明人： Masahiko Kubota ,  Takumi Suzuki ,  Tamaki Sato ,  Ryoji Kanri ,  Maki Hatta ,  Kazuhiro Asai ,  Shoji Shiba ,  Hiroe Ishikura ,  Akihiko Okano

IPC分类号： G03F7/20

CPC分类号： B41J2/1603 ,  B41J2/1404 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2/1634 ,  B41J2/1639 ,  B41J2/1645 ,  B41J2202/11 ,  G03F7/095 ,  Y10T29/49401

摘要： A method for manufacturing a minute structure comprises a step of forming an ionizing radiation decomposing type positive type resist layer including a methyl isopropenyl ketone as a first positive type photosensitive material layer, a step of forming an ionizing radiation decomposing type positive type resist layer including a photosensitive material of a copolymer as a second positive type photosensitive material layer to be sensitized by an ionizing radiation of a second wavelength range on the first positive type photosensitive material layer, a step of forming a desired pattern in the above-mentioned second positive type photosensitive material layer, and development using a developing solution, and then, a step of forming a desired pattern in the above-mentioned first positive type photosensitive material layer to form a convex shape pattern.

摘要翻译： 微细结构体的制造方法包括形成电离辐射分解型正型抗蚀剂层的步骤，该电离辐射分解型正型抗蚀剂层包括甲基异丙烯基酮作为第一正型感光材料层，形成电离辐射分解型正型抗蚀剂层的步骤包括 作为通过第一正型感光材料层上的第二波长范围的电离辐射致敏的作为第二正型感光材料层的共聚物的感光材料，在上述第二正型感光材料层中形成所需图案的步骤 材料层和使用显影溶液的显影，然后，在上述第一正型感光材料层中形成所需图案以形成凸形图案的步骤。

公开(公告)号：US20090095708A1

公开(公告)日：2009-04-16

申请号：US12251229

申请日：2008-10-14

申请人： Masahiko Kubota ,  Akihiko Okano

发明人： Masahiko Kubota ,  Akihiko Okano

IPC分类号： G11B5/127

CPC分类号： B81C1/00523 ,  B41J2/1603 ,  B41J2/1628 ,  B41J2/1631 ,  B41J2002/14403 ,  B41J2002/14467

摘要： A method for manufacturing a liquid discharge head including a substrate on which supply ports for supplying a liquid are provided, includes forming a first supply port among the supply ports by performing crystal anisotropic etching on the substrate from one surface of the substrate, and forming a plurality of second supply ports among the supply ports by performing dry etching on the substrate using a crystal anisotropic etching method from a surface exposed toward the one surface of the substrate to a rear surface so that the independent second supply ports are respectively opened on the rear surface.

摘要翻译： 一种液体排出头的制造方法，其特征在于，具备：基板，其上设置有用于供给液体的供给口的基板，包括：在所述基板的一个表面上对所述基板进行结晶各向异性蚀刻，形成供给口中的第一供给口， 通过使用晶体各向异性蚀刻方法从从衬底的一个表面暴露的表面到后表面在基板上对基板进行干蚀刻，使得独立的第二供给端口分别在后部分别地开放，从而在供给端口中的多个第二供给口 表面。

公开(公告)号：US20080252689A1

公开(公告)日：2008-10-16

申请号：US11941431

申请日：2007-11-16

申请人： Shoji Shiba ,  Akihiko Okano ,  Yoshikazu Saito ,  Kazuhiro Asai ,  Tamaki Sato ,  Takumi Suzuki ,  Masahiko Kubota ,  Maki Kato ,  Hiroe Ishikura ,  Shinsuke Tsuji

发明人： Shoji Shiba ,  Akihiko Okano ,  Yoshikazu Saito ,  Kazuhiro Asai ,  Tamaki Sato ,  Takumi Suzuki ,  Masahiko Kubota ,  Maki Kato ,  Hiroe Ishikura ,  Shinsuke Tsuji

IPC分类号： B41J2/135 ,  G03F7/20

CPC分类号： B41J2/162 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1645 ,  B41J2002/14475 ,  B41J2202/11 ,  G03F1/00 ,  G03F1/50 ,  G03F1/70

摘要： A method for manufacturing a liquid discharge head including an energy generating element, which generates energy utilized for discharging a liquid, and a discharge portion provided at a position facing the energy generating element and having a discharge port for discharging the liquid is provided. This method includes the steps of forming a negative photosensitive resin layer used for a member that forms the discharge port on the substrate, and exposing the layer to an i-line to form the discharge portion that is tapered in a direction from the substrate to the discharge port, wherein the layer has an absorbance per 1 μm thickness of about 0.02 to about 0.07 for light used for the exposure.

摘要翻译： 本发明提供一种液体排出头的制造方法，该液体排出头包括产生用于排出液体的能量的能量产生元件，以及设置在面向能量产生元件的位置并具有用于排出液体的排出口的排出部分。 该方法包括以下步骤：形成用于在基板上形成排出口的部件的负型感光性树脂层，并且将该层暴露于i线以形成沿着从基板到 排出口，其中该层对于曝光用的光，每1μm厚度的吸光度为约0.02至约0.07。