公开(公告)号：US4563227A

公开(公告)日：1986-01-07

申请号：US660255

申请日：1984-10-12

申请人： Hiroyuki Sakai ,  Kenji Kawakita ,  Tsutomu Fujita ,  Toyoki Takemoto

发明人： Hiroyuki Sakai ,  Kenji Kawakita ,  Tsutomu Fujita ,  Toyoki Takemoto

IPC分类号： H01L21/762 ,  H01L21/38 ,  H01L21/467

CPC分类号： H01L21/76232 ,  H01L21/762

摘要： The invention provides a method for manufacturing a semiconductor device, wherein a semiconductor substrate is vertically etched to form a groove, antioxidant insulating films are formed on the side walls of the groove, and local oxidation is performed. Lateral extrusion of an oxide film which is a so-called bird's beak and a projection of the oxide film which is a so-called bird's head are substantially eliminated. As a result, the active region of the transistor, that is, the element formation region may not be narrowed, providing high packing density and high precision. Furthermore, the surface of the semiconductor substrate is flattened to prevent short-circuiting and disconnections of wiring layers. Stable manufacturing process provides a high yield of the semiconductor device. Electrical characteristics of the semiconductor device are greatly improved.

摘要翻译： 本发明提供一种制造半导体器件的方法，其中半导体衬底被垂直蚀刻以形成沟槽，在沟槽的侧壁上形成抗氧化绝缘膜，并进行局部氧化。 基本上消除了所谓的鸟喙的氧化膜的侧向挤出和所谓的鸟头的氧化膜的突起。 结果，晶体管的有源区，即元件形成区域可能不会变窄，提供高的堆积密度和高精度。 此外，半导体衬底的表面被平坦化以防止布线层的短路和断开。 稳定的制造工艺提供了高产量的半导体器件。 半导体器件的电气特性大大提高。

公开(公告)号：US4563807A

公开(公告)日：1986-01-14

申请号：US596592

申请日：1984-04-04

申请人： Hiroyuki Sakai ,  Toyoki Takemoto ,  Kenji Kawakita ,  Tsutomu Fujita ,  Atsuko Akiyama

发明人： Hiroyuki Sakai ,  Toyoki Takemoto ,  Kenji Kawakita ,  Tsutomu Fujita ,  Atsuko Akiyama

IPC分类号： H01L21/20 ,  H01L21/203 ,  H01L21/285 ,  H01L21/331 ,  H01L29/73 ,  H01L29/732 ,  H01L21/225

CPC分类号： H01L29/7325 ,  H01L21/02532 ,  H01L21/02576 ,  H01L21/02631 ,  H01L21/28525 ,  Y10S148/123 ,  Y10S148/124 ,  Y10S148/169

摘要： Semiconductor device, such as bipolar transistor, is made by molecular beam epitaxy, wherein a emitter layer (27) and overriding contact regions (28) of polycrystalline silicon are grown continuously on a silicon substrate (23+26) without breaking high vacuum, thus eliminating the adverse interface of natural oxide film under the polycrystalline silicon layer (28) and the adverse donor-acceptor compensation while attaining a well controlled h.sub.FE and enabling a shallow emitter junction.

摘要翻译： 诸如双极晶体管的半导体器件通过分子束外延制造，其中发射极层（27）和多晶硅的覆盖接触区域（28）在硅衬底（23 + 26）上连续生长而不破坏高真空，因此 消除多晶硅层（28）下的自然氧化膜的不利界面和不利的供体 - 受体补偿，同时实现良好控制的hFE并实现浅发射极结。

公开(公告)号：US4484211A

公开(公告)日：1984-11-20

申请号：US542555

申请日：1983-10-17

申请人： Toyoki Takemoto ,  Tsutomu Fujita ,  Hiroyuki Sakai ,  Haruyasu Yamada

发明人： Toyoki Takemoto ,  Tsutomu Fujita ,  Hiroyuki Sakai ,  Haruyasu Yamada

IPC分类号： H01L29/06 ,  H01L29/732 ,  H01L27/04 ,  H01L29/04 ,  H01L29/72

CPC分类号： H01L29/7325 ,  H01L29/0649

摘要： A semiconductor integrated circuit device in which the side surfaces of an emitter of an oxide isolated bipolar transistor are surrounded with insulating compounds or regions so that the capacitance between the emitter and base is lowered and a base is formed by the self-alignment so that the influence of an active base between an external base and the emitter can be made negligible. Thus the base resistance and parasitic capacitance are lowered.

摘要翻译： 一种半导体集成电路器件，其中氧化物隔离双极晶体管的发射极的侧表面被绝缘化合物或区域包围，使得发射极和基极之间的电容降低，并且通过自对准形成基极， 活性碱在外部碱基和发光体之间的影响可以忽略不计。 因此，基极电阻和寄生电容降低。

公开(公告)号：US4459496A

公开(公告)日：1984-07-10

申请号：US251966

申请日：1981-04-03

申请人： Haruyasu Yamada ,  Toyoki Takemoto ,  Tadao Komeda ,  Tsutomu Fujita ,  Yuichi Hirofuji ,  Hiroyuki Sakai

发明人： Haruyasu Yamada ,  Toyoki Takemoto ,  Tadao Komeda ,  Tsutomu Fujita ,  Yuichi Hirofuji ,  Hiroyuki Sakai

IPC分类号： H03K19/091 ,  H03K19/092

CPC分类号： H03K19/091

摘要： In a stacked, multilayer IIL (integrated injection logic) circuit, with which power consumption can be significantly reduced, a discharging circuit constructed of an IIL constant-current circuit or of a resistor is provided for one of transistors which are used for shifting the level of a signal from an IIL circuit of a top layer to an IIL circuit of a bottom layer, so that signal transmission therebetween is prevented from deterioration. A charging circuit may be added to another transistor, while a diode may be interposed between these transistors. Additional diodes may be interposed between adjacent layers for speeding up the signal transmission from one layer to another upper layer.

摘要翻译： 在堆叠的多层IIL（集成注入逻辑）电路中，功率消耗可以显着降低，由用于移位电平的晶体管之一提供由IIL恒流电路或电阻构成的放电电路 从顶层的IIL电路到底层的IIL电路的信号，从而防止它们之间的信号传输劣化。 充电电路可以被添加到另一个晶体管，而二极管可以插在这些晶体管之间。 可以在相邻层之间插入附加的二极管，以加速从一个层到另一个上层的信号传输。

公开(公告)号：US5661066A

公开(公告)日：1997-08-26

申请号：US965967

申请日：1991-04-02

申请人： Toyoki Takemoto ,  Haruyasu Yamada ,  Tsutomu Fujita ,  Tadao Komeda

发明人： Toyoki Takemoto ,  Haruyasu Yamada ,  Tsutomu Fujita ,  Tadao Komeda

IPC分类号： H01L21/8222 ,  H01L27/02 ,  H01L27/06 ,  H01L29/8605 ,  H01L29/93 ,  H01L21/265 ,  H01L21/70 ,  H01L27/00

CPC分类号： H01L27/0233 ,  H01L21/8222 ,  H01L27/0244 ,  H01L27/0647 ,  H01L29/8605 ,  H01L29/93

摘要： In an integrated circuit comprising an IIL and a high frequency npn bipolar transistor which has a deep p.sup.- -type base region 45 for its inverted npn output transistors, circuit elements such as a resistor part R, a capacitor part C, a diode part D and an isolated crossing connection part Cr are provided with deep p.sup.- -type regions 54, 54', 65', 71 and 82 which are formed at the same time with the p.sup.- -type region 45 in the IIL, and thereby, reliability of the circuit elements as well as characteristic thereof are improved, thereby further improving manufacturing yields.

摘要翻译： 在包括IIL和高频npn双极晶体管的集成电路中，其具有用于其反相npn输出晶体管的深p型基极区45，电路元件如电阻器部分R，电容器部分C，二极管部分D 并且隔离交叉连接部分Cr设置有与IIL中的p型区域45同时形成的深P型区域54,54'，65'，71和82，从而可靠性 的电路元件及其特性得到改善，从而进一步提高了制造成品率。

公开(公告)号：US5066602A

公开(公告)日：1991-11-19

申请号：US295380

申请日：1989-01-10

申请人： Toyoki Takemoto ,  Tadao Komeda ,  Haruyasu Yamada ,  Tsutomu Fujita

发明人： Toyoki Takemoto ,  Tadao Komeda ,  Haruyasu Yamada ,  Tsutomu Fujita

IPC分类号： H01L21/74 ,  H01L21/761 ,  H01L21/8228 ,  H01L27/02 ,  H01L27/06 ,  H01L27/082 ,  H01L27/092

CPC分类号： H01L27/0244 ,  H01L21/74 ,  H01L21/761 ,  H01L21/82285 ,  H01L27/0623 ,  H01L27/0826 ,  H01L27/0922 ,  Y10S148/009 ,  Y10S148/151

摘要： In a semiconductor IC, a vertical pnp or npn transistor of a uniform characteristic and a high breakdown voltage is made by forming, for example, a p.sup.- -collector region (39) in an n-type epitaxial region, an n-well base region (41) formed in the p.sup.- -collector region (39) and a p-emitter region (42) formed in the n-well base region (41); and furthermore, for example as shown in FIG. 9, p.sup.- -regions (40) and (49) are formed simultaneously with the p.sup.- -collector region (39) and an n-region (53) is formed simultaneously with the n-well base region (41), thereby constituting IIL of superior characteristics and a high resistance device at the same time as forming of the vertical transistor without substantial increase of manufacturing steps; and in the similar way, by combining the p.sup.- -region and n-region formed in the above-mentioned simultaneous steps with other region formed simultaneously with the forming of the vertical transistor, high h.sub.FE transistor, high speed vertical npn transistor, cross-over devices, p-channel and/or n-channel MOS transistors can be formed within limited manufacturing steps.

公开(公告)号：US4826780A

公开(公告)日：1989-05-02

申请号：US124423

申请日：1987-11-23

申请人： Toyoki Takemoto ,  Tadao Komeda ,  Haruyasu Yamada ,  Tsutomu Fujita

发明人： Toyoki Takemoto ,  Tadao Komeda ,  Haruyasu Yamada ,  Tsutomu Fujita

IPC分类号： H01L21/74 ,  H01L21/761 ,  H01L21/8228 ,  H01L27/02 ,  H01L27/06 ,  H01L27/082 ,  H01L27/092 ,  H01L21/38

CPC分类号： H01L27/0244 ,  H01L21/74 ,  H01L21/761 ,  H01L21/82285 ,  H01L27/0623 ,  H01L27/0826 ,  H01L27/0922 ,  Y10S148/009 ,  Y10S148/151

摘要： In a semiconductor IC, a vertical pnp or npn transistor of a uniform characteristic and a high breakdown voltage is made by forming, for example, a p.sup.- -collector region (39) in an n-type epitaxial region, an n-well base region (41) formed in the p.sup.- -collector region (39) and a p-emitter region (42) formed in the n-well base region (41); and furthermore, for example as shown in FIG. 9, p.sup.- -regions (40) and (49) are formed simultaneously with the p.sup.- -collector region (39) and an n-region (53) is formed simultaneously with the n-well base region (41), thereby constituting IIL of superior characteristics and a high resistance device at the same time as forming of the vertical transistor without substantial increase of manufacturing steps; and in the similar way, by combining the p.sup.- -region and n-region formed in the above-mentioned simultaneous steps with other region formed simultaneously with the forming of the vertical transistor, high h.sub.FE transistor, high speed vertical npn transistor, cross-over devices, p-channel and/or n-channel MOS transistors can be formed within limited manufacturing steps.

摘要翻译： 在半导体IC中，通过在n型外延区域中形成例如p型集电极区域（39），形成具有均匀特性和高击穿电压的垂直pnp或npn晶体管，n阱基极 形成在p型集电极区域（39）中的区域（41）和形成在n阱基极区域（41）中的p型发射极区域（42）。 此外，例如如图1所示。 如图9所示，p-区域（40）和（49）与p-集电极区域（39）同时形成，并且与n-阱基区域（41）同时形成n区域（53），从而构成 IIL具有优越的特性和高电阻器件，同时形成垂直晶体管而不大幅度增加制造步骤; 并且以类似的方式，通过将在上述同步步骤中形成的p区域和n区域与形成垂直晶体管，高hFE晶体管，高速垂直npn晶体管， 可以在有限的制造步骤中形成器件，p沟道和/或n沟道MOS晶体管。

公开(公告)号：US5555527A

公开(公告)日：1996-09-10

申请号：US358606

申请日：1994-12-14

申请人： Hisakazu Kotani ,  Hironori Akamatsu ,  Tsutomu Fujita

发明人： Hisakazu Kotani ,  Hironori Akamatsu ,  Tsutomu Fujita

IPC分类号： G09G5/39 ,  G11C11/406 ,  G11C13/00

CPC分类号： G09G5/39 ,  G11C11/406 ,  G09G2360/123 ,  G09G5/001

摘要： A memory array divided into a plurality of sub-memory-arrays is disposed on a chip so that, if a specified sub-memory-array is selected by a sub-memory-array selecting circuit, a normal read/write operation is performed with respect to the sub-memory-array based on an address indicated by a group of external address signals. At the same time, a clock generator for self-refresh mounted on a chip generates a word-line basic clock for self-refresh and a word-line basic clock for refresh, thereby selecting the word lines in the sub-memory-arrays which have not been selected. Prior to a predetermined time at which the sub-memory-array subjected to a refresh operation is subsequently selected, a refresh halt signal is outputted so as to forcibly halt the refresh operation, thereby preventing insufficient recharging of a memory cell. Each of the plurality of sub-memory-arrays stores, of sequential sets of image data, data on one frame or one field.

公开(公告)号：US5077784A

公开(公告)日：1991-12-31

申请号：US598758

申请日：1990-10-09

申请人： Tsutomu Fujita ,  Takeshi Ban ,  Yoshinobu Ido ,  Masaaki Sugihara ,  Tsuneyoshi Yamada ,  Takashi Sugiyama ,  Yoshihito Higashitutumi

发明人： Tsutomu Fujita ,  Takeshi Ban ,  Yoshinobu Ido ,  Masaaki Sugihara ,  Tsuneyoshi Yamada ,  Takashi Sugiyama ,  Yoshihito Higashitutumi

IPC分类号： H04N7/18

CPC分类号： H04N7/186

摘要： A visible telephone includes a housing in which a video camera is accommodated in a manner that an aperture thereof is directed to the front. The camera is fixed to a rotatable holder which is rotated by an operation of a knob outside the housing, responsively, an angle of declination or elevation of the aperture of the camera is changed. The camera includes a lens system and a solid-state image sensor which converts a light image from the lens system into an electrical signal (video signal), which is mounted on a circuit board. The solid-state image sensor is responsive to at least an infrared light. On the same or the other circuit board, an infrared LED is mounted. The infrared LED is lightened at necessary timing to expose a person or subject in the front of the aperture of the camera.

摘要翻译： 可视电话包括其中摄像机以其孔径指向前方的方式容纳的壳体。 照相机被固定到可旋转的保持器，其通过旋钮外壳外部的操作而旋转，响应地改变照相机的光圈的偏角或仰角。 相机包括透镜系统和将来自透镜系统的光图像转换成安装在电路板上的电信号（视频信号）的固态图像传感器。 固态图像传感器至少响应于红外光。 在相同或另一个电路板上安装了一个红外LED。 红外LED在必要的时间被点亮，以使照相机孔径前方的人或物体曝光。

公开(公告)号：US4819311A

公开(公告)日：1989-04-11

申请号：US062506

申请日：1987-06-15

申请人： Hitoshi Hashimoto ,  Tsutomu Fujita ,  Eiji Ryukawa ,  Hideo Kodachi

发明人： Hitoshi Hashimoto ,  Tsutomu Fujita ,  Eiji Ryukawa ,  Hideo Kodachi

IPC分类号： B23B39/20 ,  B23B29/32 ,  B23B31/26 ,  B23Q1/01 ,  B23Q1/28 ,  B23Q3/157 ,  B23Q5/20 ,  B23Q39/02

CPC分类号： B23B31/263 ,  B23Q1/017 ,  B23Q1/28 ,  B23Q39/02 ,  B23Q5/20 ,  B23Q2039/004 ,  Y10T29/5155 ,  Y10T29/5167 ,  Y10T408/37 ,  Y10T409/307672 ,  Y10T409/308232 ,  Y10T409/309352

摘要： A machine tool comprises an upstanding column, a tool-driving unit vertically movable on the column, and a pair of guide rails on a front surface of the column to extend vertically thereon and horizontally spaced apart from each other for guiding the upward and downward movement of the tool-driving unit. The tool-driving unit includes a lift frame on the guide rails and a tilting-type turret head which is supported on a front surface of the lift frame and is rotatable about an axis inclined relative to the longitudinal direction of the frame in a horizontal plane. One of the pair of guide rails is relatively disposed forwardly of the other guide rail, so that the individual guide rails both assume positions close to the turret head thereby to minimize the amount of overhang of the tool-driving unit.

摘要翻译： 一种机床包括直立柱，可在柱上垂直移动的工具驱动单元和在柱的前表面上的一对导轨，其在其上垂直延伸并且彼此水平间隔开以引导向上和向下运动 的工具驱动单元。 工具驱动单元包括在导轨上的提升框架和倾斜式转塔头，该倾斜式转台头部被支撑在提升框架的前表面上，并且能够绕水平面相对于框架的纵向方向倾斜的轴线旋转 。 一对导轨中的一个相对地设置在另一个导轨的前方，使得各个导轨都采取靠近转台头的位置，从而最小化工具驱动单元的悬伸量。