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公开(公告)号：US09362088B2
公开(公告)日：2016-06-07
申请号：US14434687
申请日：2013-10-09
发明人： Takahiro Sato , Akinari Morikawa , Isamu Sekihara
IPC分类号： H01J37/317 , G01N1/28 , H01J37/28 , H01J37/30 , H01J37/31
CPC分类号： H01J37/3178 , G01N1/28 , G01N1/286 , G01N2001/2873 , H01J37/28 , H01J37/3005 , H01J37/3007 , H01J37/31 , H01J2237/063 , H01J2237/08 , H01J2237/208 , H01J2237/24564 , H01J2237/2813 , H01J2237/2817 , H01J2237/304 , H01J2237/31745 , H01J2237/31749
摘要： Provided is a charged particle beam device provided with: a charged particle source; an objective lens for focusing a charged particle beam emitted from the charged particle source onto a sample; a detector for detecting a secondary charged particle emitted from the sample; a probe capable of coming into contact with the sample; a gas nozzle for emitting conductive gas to the sample; and a control unit for controlling the drive of the probe and gas emission from the gas nozzle, wherein before bringing the probe into contact with the sample after applying the charged particle beam to the sample to machine the sample, the control unit emits gas toward a machining position from the gas nozzle and applies the charged particle beam to form a conductive film on a machining portion of the sample, and the charged particle beam device is provided with a contact detection unit for determining that the conductive film formed on the machining portion and the probe have come into contact with each other.
摘要翻译： 提供一种带电粒子束装置，具有：带电粒子源; 用于将从带电粒子源发射的带电粒子束聚焦到样品上的物镜; 用于检测从样品发射的二次带电粒子的检测器; 能够与样品接触的探针; 用于向样品发射导电气体的气体喷嘴; 以及控制单元，用于控制探头的驱动和来自气体喷嘴的气体发射，其中在将带电粒子束施加到样品以加样样品之前，在使探针与样品接触之前，控制单元朝向 从气体喷嘴加工位置并施加带电粒子束以在样品的加工部分上形成导电膜，并且带电粒子束装置设置有接触检测单元，用于确定形成在加工部分上的导电膜和 探针相互接触。
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公开(公告)号：US20150255250A1
公开(公告)日：2015-09-10
申请号：US14434687
申请日：2013-10-09
发明人： Takahiro Sato , Akinari Morikawa , Isamu Sekihara
IPC分类号： H01J37/317 , G01N1/28 , H01J37/28 , H01J37/31 , H01J37/30
CPC分类号： H01J37/3178 , G01N1/28 , G01N1/286 , G01N2001/2873 , H01J37/28 , H01J37/3005 , H01J37/3007 , H01J37/31 , H01J2237/063 , H01J2237/08 , H01J2237/208 , H01J2237/24564 , H01J2237/2813 , H01J2237/2817 , H01J2237/304 , H01J2237/31745 , H01J2237/31749
摘要： Provided is a charged particle beam device provided with: a charged particle source; an objective lens for focusing a charged particle beam emitted from the charged particle source onto a sample; a detector for detecting a secondary charged particle emitted from the sample; a probe capable of coming into contact with the sample; a gas nozzle for emitting conductive gas to the sample; and a control unit for controlling the drive of the probe and gas emission from the gas nozzle, wherein before bringing the probe into contact with the sample after applying the charged particle beam to the sample to machine the sample, the control unit emits gas toward a machining position from the gas nozzle and applies the charged particle beam to form a conductive film on a machining portion of the sample, and the charged particle beam device is provided with a contact detection unit for determining that the conductive film formed on the machining portion and the probe have come into contact with each other.
摘要翻译： 提供一种带电粒子束装置，具有：带电粒子源; 用于将从带电粒子源发射的带电粒子束聚焦到样品上的物镜; 用于检测从样品发射的二次带电粒子的检测器; 能够与样品接触的探针; 用于向样品发射导电气体的气体喷嘴; 以及控制单元，用于控制探头的驱动和来自气体喷嘴的气体发射，其中在将带电粒子束施加到样品以加样样品之前，在使探针与样品接触之前，控制单元朝向 从气体喷嘴加工位置并施加带电粒子束以在样品的加工部分上形成导电膜，并且带电粒子束装置设置有接触检测单元，用于确定形成在加工部分上的导电膜和 探针相互接触。
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公开(公告)号：US11458513B2
公开(公告)日：2022-10-04
申请号：US16616165
申请日：2017-06-21
发明人： Akinari Morikawa , Kotaro Hosoya
摘要： To provide a charged particle beam apparatus. The charged particle beam apparatus includes: a stage on which a sample is placed; a cleaner configured to remove a contaminant on the sample; and a stage control unit configured to adjust a relative positional relationship between the cleaner and the sample by moving the stage during use of the cleaner.
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