公开(公告)号：US09449786B2

公开(公告)日：2016-09-20

申请号：US14786446

申请日：2014-04-11

Applicant: Hitachi High-Technologies Corporation

Inventor： Miki Tsuchiya ,  Yasuhira Nagakubo ,  Satoshi Tomimatsu

IPC: H01J37/20 ,  H01J37/305 ,  G01N1/42 ,  H01J37/302 ,  H01J37/304 ,  B25J7/00 ,  H01J37/28 ,  H01J37/30 ,  G01N1/28

CPC classification number: H01J37/20 ,  B25J7/00 ,  G01N1/42 ,  G01N2001/2873 ,  H01J37/28 ,  H01J37/30 ,  H01J37/302 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/002 ,  H01J2237/2001 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/208 ,  H01J2237/2801 ,  H01J2237/30461 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: The present invention enables a sample to be observed in a clean state directly after preparation of a final observation surface when preparing a sample for observing a material that is sensitive to heat. The present invention is a method of preparing a sample using a charged particle beam device including a microprobe having a cooling mechanism, a first sample holder having a mechanism for retaining a sample in a cooled state, and a stage into which the microprobe and the first sample holder can be introduced, the method including cutting a bulk-shaped sample piece from the sample on the first sample holder retained in a cooled state; adhering the sample piece to a distal end of the microprobe that is cooled to a fixed temperature and transferring the sample piece to a second sample holder for thin film observation retained in a cooled state, which is different from the first sample holder, within a vacuum chamber of the charged particle beam device; separating the sample piece that has been transferred to the second sample holder from the microprobe and thin film processing the sample piece to a thickness that is less than the thickness during cutting; and observing the sample piece after the thin film processing.

Abstract translation: 本发明使得在制备用于观察对热敏感的材料的样品时，在制备最终观察表面之后，可以直接在清洁状态下观察样品。 本发明是一种使用带电粒子束装置制备样品的方法，所述带电粒子束装置包括具有冷却机构的微探针，具有用于将样品保持在冷却状态的机构的第一样品保持器和所述微探针和第一 可以引入样品保持器，该方法包括从保持在冷却状态的第一样品保持器上的样品切割块状样品; 将样品块粘附到被冷却到固定温度的微探针的远端，并将样品片转移到第二样品保持器以进行薄膜观察，在与真空中的第一样品保持器不同的冷却状态下保持 带电粒子束装置的腔室; 将从所述微探针转移到所述第二样品保持器的样品片和将所述样品片处理的薄膜分离成小于切割时的厚度的厚度; 并在薄膜处理后观察样品。

公开(公告)号：US20150014529A1

公开(公告)日：2015-01-15

申请号：US14382165

申请日：2013-02-20

Applicant: HITACHI HIGH - TECHNOLOGIES CORPORATION

Inventor： Terutaka Nanri ,  Satoshi Tomimatsu ,  Isamu Sekihara

IPC: H01J37/244

CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J37/3056 ,  H01J37/3178 ,  H01J2237/244 ,  H01J2237/24495 ,  H01J2237/24571

Abstract: Provided is a charged particle beam device with high sensitivity, capable of detecting charged particles emitted from a sample at high resolution. An absorption current detector arranged to contact with the sample makes an absorption current generated in the sample by an irradiated charged particle beam flow through the detector, thereby to detect the current. The charged particle beam scans the sample and the charged particle beam device acquires an absorption current image. In case the absorption current detector is arranged separated from the sample, the absorption current detector detects the incident charged particle beam as a signal current dependent on an angle θ formed in a direction from the irradiation position on the sample toward the absorption current detector relative to at least one of the normal line direction of the front surface of the sample and the incident direction of the charged particle beam.

Abstract translation: 提供了一种具有高灵敏度的带电粒子束装置，能够以高分辨率检测从样品发射的带电粒子。 布置成与样品接触的吸收电流检测器使得通过照射的带电粒子束流过样品中产生的吸收电流流过检测器，从而检测电流。 带电粒子束扫描样品，带电粒子束装置获取吸收电流图像。 在吸收电流检测器与样品分离的情况下，吸收电流检测器检测入射的带电粒子束作为取决于角度的信号电流; 形成在从样品的照射位置朝向吸收电流检测器的方向上，相对于样品前表面的法线方向和带电粒子束的入射方向中的至少一个。

公开(公告)号：US08779400B2

公开(公告)日：2014-07-15

申请号：US13926352

申请日：2013-06-25

Applicant: Hitachi High-Technologies Corporation

Inventor： Hiroyasu Shichi ,  Satoshi Tomimatsu ,  Kaoru Umemura ,  Noriyuki Kaneoka ,  Koji Ishiguro

IPC: G21G5/00

CPC classification number: C23C14/3442 ,  H01J27/10 ,  H01J37/08 ,  H01J37/28 ,  H01J37/3023 ,  H01J37/3056 ,  H01J2237/006 ,  H01J2237/057 ,  H01J2237/0807 ,  H01J2237/0825 ,  H01J2237/0827 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: An ion beam machining and observation method relevant to a technique of cross sectional observation of an electronic component, through which a sample is machined by using an ion beam and a charged particle beam processor capable of reducing the time it takes to fill up a processed hole with a high degree of flatness at the filled area. The observation device is capable of switching the kind of gas ion beam used for machining a sample with the kind of a gas ion beam used for observing the sample. To implement the switch between the kind of a gas ion beam used for sample machining and the kind of a gas ion beam used for sample observation, at least two gas introduction systems are used, each system having a gas cylinder, a gas tube, a gas volume control valve, and a stop valve.

Abstract translation: 一种与电子部件的横截面观察技术有关的离子束加工和观察方法，通过使用离子束加工样品的电子部件和能够减少填充加工孔的时间的带电粒子束处理器 在填充区域具有高度的平整度。 观察装置能够切换用于用于观察样品的气体离子束的种类来加工样品的气体离子束的种类。 为了实现用于样品加工的气体离子束的种类和用于样品观察的气体离子束的种类之间的切换，使用至少两个气体引入系统，每个系统具有气瓶，气体管， 气体量控制阀和截止阀。

公开(公告)号：US09330883B2

公开(公告)日：2016-05-03

申请号：US14382165

申请日：2013-02-20

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Terutaka Nanri ,  Satoshi Tomimatsu ,  Isamu Sekihara

IPC: H01J37/00 ,  H01J37/244 ,  H01J37/28 ,  H01J37/317 ,  H01J37/305

CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J37/3056 ,  H01J37/3178 ,  H01J2237/244 ,  H01J2237/24495 ,  H01J2237/24571

Abstract: Provided is a charged particle beam device with high sensitivity, capable of detecting charged particles emitted from a sample at high resolution. An absorption current detector arranged to contact with the sample makes an absorption current generated in the sample by an irradiated charged particle beam flow through the detector, thereby to detect the current. The charged particle beam scans the sample and the charged particle beam device acquires an absorption current image. In case the absorption current detector is arranged separated from the sample, the absorption current detector detects the incident charged particle beam as a signal current dependent on an angle θ formed in a direction from the irradiation position on the sample toward the absorption current detector relative to at least one of the normal line direction of the front surface of the sample and the incident direction of the charged particle beam.

Abstract translation: 提供了一种具有高灵敏度的带电粒子束装置，能够以高分辨率检测从样品发射的带电粒子。 布置成与样品接触的吸收电流检测器使得通过照射的带电粒子束流过样品中产生的吸收电流流过检测器，从而检测电流。 带电粒子束扫描样品，带电粒子束装置获取吸收电流图像。 在吸收电流检测器与样品分离的情况下，吸收电流检测器检测入射的带电粒子束作为取决于角度的信号电流; 形成在从样品的照射位置朝向吸收电流检测器的方向上，相对于样品前表面的法线方向和带电粒子束的入射方向中的至少一个。