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    Oxime derivatives and the use thereof as latent acids
    1.
    发明申请
    Oxime derivatives and the use thereof as latent acids 有权
    肟衍生物及其作为潜伏酸的用途

    公开(公告)号：US20060068325A1

    公开(公告)日：2006-03-30

    申请号：US11262104

    申请日：2005-10-27

    申请人： Hitoshi Yamato ,  Toshikage Asakura ,  Akira Matsumoto ,  Masaki Ohwa

    发明人： Hitoshi Yamato ,  Toshikage Asakura ,  Akira Matsumoto ,  Masaki Ohwa

    IPC分类号： G03C1/76

    CPC分类号： G03F7/0392 ,  B33Y70/00 ,  G03F7/0045 ,  G03F7/0382

    摘要： New oxime sulfonate compounds of the formula I, II, III, IV, V, VI and VII R1 is for example C1-C18alkylsulfonyl, R2 is halogen or C1-C10haloalkyl; R3 is for example unsubstitude or substituted phenylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl; Ar1 is for example a direct bond, C1-C12alkylene; —O—C-bond or a —O—Si—bond which cleaves upon the action of an acid; A1, A2, A3, A4, A5, A6, A7, A8, A9, A10, A11 and A12 are for example a direct bond, —O—, or —S—, or are C1-C12alkylene or phenylene unsubstituted or substituted; Y0 is C1-C12alkylene which is for example substituted by OR4, or SR7; Y2 is e.g. a trivalent radical of C1-C12alkylene; Y3 is e.g. a tetravalent radical of C1-C12alkylene; X is halogen; Ar′1 is for example C1-C12alkyl which is unsubstituted or substituted; Ar″1 is for example phenylene; provided that at least one of the radicals Ar′1, Ar″11 is substituted by 1 to 3 groups of example halogen; R15, R16, R17 and R18 e.g. hydrogen or phenyl; R19, R20, R21, R22 and R23 are e.g. phenyl; are especially suitable for the preparation of photoresists.

    摘要翻译： 式I，II，III，IV，V，VI和VII的新的肟磺酸酯化合物

    Photoinitiators and their applications
    3.
    发明授权
    Photoinitiators and their applications 失效
    光引发剂及其应用

    公开(公告)号：US06673850B1

    公开(公告)日：2004-01-06

    申请号：US09959174

    申请日：2001-10-18

    申请人： Hitoshi Yamato ,  Masaki Ohwa ,  Toshikage Asakura ,  Akira Matsumoto

    发明人： Hitoshi Yamato ,  Masaki Ohwa ,  Toshikage Asakura ,  Akira Matsumoto

    IPC分类号： C08F246

    CPC分类号： C07D295/108 ,  B33Y70/00 ,  C07C323/54 ,  C08F2/50 ,  C08F293/005 ,  C08F295/00 ,  C08L53/00 ,  C08L53/02 ,  C09D153/00 ,  C09D153/02 ,  C09J153/00 ,  C09J153/02 ,  G03F7/031 ,  Y10S522/904

    摘要： Photoinitiators of formula (Ia) or (Ib) having chain transfer groups, wherein n is 1 or 2; PI is for example a group of formula (IIa); PI′ inter alia is a group of formula (IIIa); Ar is for example phenyl; Ar2 is inter alia phenylene; R1 and R2 are for example C1-C8alkyl, or R1 and R2 together C2-C9alkylene; M1 inter alia is —NR3R4 or —OH; M1′ is for example a group (c); R3′ is a direct bond, C1-C12alkylene, or phenylene; R3 is for example hydrogen, or C1-C12alkyl; R4 is e.g. C1-C12alkyl; A1 and A2 are for example a direct bond; CT is a chain transfer group; are useful for the preparation of macrophotoinitiators which can be employed for preparing block copolymers.

    摘要翻译： 具有链转移基团的式（Ia）或（Ib）的光引发剂，其中n为1或2; PI是例如式（IIa）的一组; PI“特别是一组式（IIIa）; Ar是例如苯基; Ar2尤其是亚苯基; R 1和R 2例如是C 1 -C 8烷基，或者R 1和R 2一起是C 2 -C 9亚烷基; M1特别是-NR 3 R 4或-OH; M1'例如是一组（c）; R3'是直接键，C1-C12亚烷基或亚苯基; R3是例如氢或C1-C12烷基; R4是例如 C 1 -C 12烷基; A1和A2例如是直接键; CT是链转移组; 可用于制备可用于制备嵌段共聚物的大分子引发剂。

    Oxime derivatives and the use thereof as latent acids
    4.
    发明授权
    Oxime derivatives and the use thereof as latent acids 有权

    公开(公告)号：US07244544B2

    公开(公告)日：2007-07-17

    申请号：US11262104

    申请日：2005-10-27

    申请人： Hitoshi Yamato ,  Toshikage Asakura ,  Akira Matsumoto ,  Masaki Ohwa

    发明人： Hitoshi Yamato ,  Toshikage Asakura ,  Akira Matsumoto ,  Masaki Ohwa

    IPC分类号： G03F7/031 ,  C07C249/00

    CPC分类号： G03F7/0392 ,  B33Y70/00 ,  G03F7/0045 ,  G03F7/0382

    摘要： New oxime sulfonate compounds of the formula I, II, III, IV, V, VI and VII R1 is for example C1–C18alkylsulfonyl, R2 is halogen or C1–C10haloalkyl; R3 is for example unsubstitude or substituted phenylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl; Ar1 is for example a direct bond, C1–C12alkylene; —O—C-bond or a —O—Si-bond which cleaves upon the action of an acid; A1, A2, A3, A4, A5, A6, A7, A8, A9, A10, A11 and A12 are for example a direct bond, —O—, or —S—, or are C1–C12alkylene or phenylene unsubstituted or substituted; Y1 is C1–C12alkylene which is for example substituted by OR4, or SR7; Y2 is e.g. a trivalent radical of C1–C12alkylene; Y3 is e.g. a tetravalent radical of C1–C12alkylene; X is halogen; Ar′1 is for example C1–C12alkyl which is unsubstituted or substituted; Ar″1 is for example phenylene; provided that at least one of the radicals Ar′1, Ar″1, is substituted by 1 to 3 groups of example halogen; R15, R16, R17 and R18 e.g. hydrogen or phenyl; R19, R20, R21, R22 R23 are e.g. phenyl; are especially suitable for the preparation of photoresists.

    Photoinitiators having chain transfer groups polymerized to obtain macrophotoinitiators useful to give block copolymers
    6.
    发明授权
    Photoinitiators having chain transfer groups polymerized to obtain macrophotoinitiators useful to give block copolymers 失效
    具有链转移基团的光引发剂被聚合以获得可用于产生嵌段共聚物的大分子引发剂

    公开(公告)号：US06458864B1

    公开(公告)日：2002-10-01

    申请号：US09701457

    申请日：2000-11-27

    申请人： Toshikage Asakura ,  Masaki Ohwa ,  Hitoshi Yamato ,  Asako Ito

    发明人： Toshikage Asakura ,  Masaki Ohwa ,  Hitoshi Yamato ,  Asako Ito

    IPC分类号： C08F250

    CPC分类号： A61K6/083 ,  B33Y70/00 ,  C08F2/38 ,  C08F2/50 ,  C08K5/0025 ,  C09D7/45 ,  C09D7/65 ,  G03F7/031 ,  C08L53/00 ,  C08L33/00

    摘要： Compounds with chain transfer groups of the formula I, II, III and IV wherein a is 1 or 2; Ar and Ar1 inter alia are phenyl; Ar2 inter alia is phenylene, these groups being unsubstituted or substituted; X is a direct bond, —O—, —S— or —N(R6)—; Y inter alia is hydrogen or C1-C12alkyl; M1 is —NR3R4 or —OH, or M1 is Ar when R1 and R2 are alkoxy, or aryloxy; R1 and R2 independently of one another e.g. are C1-C8alkyl; R3 and R4 for example are C1-C12alkyl, or together are C3-C7alkylene; R5 inter alia is C1-C6alkylene or a direct bond; R6 is for example hydrogen; and Z is a divalent radical, provided that at least one of the radicals Ar, Ar1, Ar2, R1, R2, R3, R4, R5 or Y is substituted by SH groups; are suitable for the thermal preparation of macrophotoinitiators which are polymerized photochemically to give block-copolymers.

    摘要翻译： 具有式I，II，III和IV的链转移基团的化合物是1或2; Ar和Ar1特别是苯基; Ar2特别是亚苯基，这些基团是未取代的或取代的; X是直接键，-O - ， - S-或-N（R6） - ; Y尤其是氢或C 1 -C 12烷基; 当R1和R2为烷氧基时，M1为-NR3R4或-OH，或M1为Ar，或为芳氧基; R1和R2彼此独立地例如。 是C 1 -C 8烷基; R 3和R 4例如是C 1 -C 12烷基，或一起是C 3 -C 7亚烷基; R5尤其是C1-C6亚烷基或直接键; R6是例如氢; 并且Z是二价基团，条件是基团Ar，Ar 1，Ar 2，R 1，R 2，R 3，R 4，R 5或Y中的至少一个被SH基取代;适用于光化学聚合的高分子引发剂的热制备 得到嵌段共聚物。

    Oxime derivatives and the use thereof as latent acids
    7.
    发明授权
    Oxime derivatives and the use thereof as latent acids 有权
    肟衍生物及其作为潜伏酸的用途

    公开(公告)号：US06261738B1

    公开(公告)日：2001-07-17

    申请号：US09533952

    申请日：2000-03-23

    申请人： Toshikage Asakura ,  Hitoshi Yamato ,  Masaki Ohwa ,  Jean-Luc Birbaum ,  Kurt Dietliker ,  Junichi Tanabe

    发明人： Toshikage Asakura ,  Hitoshi Yamato ,  Masaki Ohwa ,  Jean-Luc Birbaum ,  Kurt Dietliker ,  Junichi Tanabe

    IPC分类号： G03G7004

    CPC分类号： G03F7/039 ,  C07C251/62 ,  C07C309/00 ,  C07C309/65 ,  C07C317/32 ,  C07C323/47 ,  C07C381/00 ,  C07C2602/42 ,  C07D319/18 ,  C07D333/22 ,  G03F7/0045 ,  Y10S430/12

    摘要： Compounds of formula I, II and III, wherein wherein R1 is for example hydrogen, C1-C12alkyl, C3-C30cycloalkyl, C2-C12alkenyl, C4-C8cycloalkenyl, phenyl, which is unsubstituted or substituted, naphthyl, anthracyl or phenanthryl, unsubstituted or substituted, heteroaryl radical which is unsubstituted or substituted; wherein all radicals R1 with the exception of hydrogen can additionally be substituted by a group having a —O—C-bond or a —O—Si-bond which cleaves upon the action of an acid; R′1 is for example phenylene, naphthylene, diphenylene or oxydiphenylene, wherein these radicals are unsubstituted or substituted; R2 is halogen or C1-C10haloalkyl; R3 is for example C1-C18alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, wherein the groups are unsubstituted or substituted, or R3 is e.g. C2-C6haloalkanoyl, or halobenzoyl, R′3 is for example phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl, wherein these radicals are unsubstituted or substituted, X is halogen; are especially suitable as phototsensitive acid-donors in chemically amplified resist formulations.

    摘要翻译： 式I，II和III的化合物，其中R1是例如氢，C1-C12烷基，C3-C30环烷基，C2-C12链烯基，C4-C8环烯基，苯基，未取代或取代的萘基，蒽基或菲基，未取代或取代的， 未取代或取代的杂芳基; 其中除氢之外的所有基团R1可以另外被具有在酸作用下切割的-O-C键或-O-Si键的基团取代; R'1是例如亚苯基，亚萘基，亚二苯基或氧联二苯基，其中这些基团是未取代的或被取代的; R2是卤素或C1-C10卤代烷基; R3是例如C1-C18烷基磺酰基，苯基磺酰基，萘基磺酰基，蒽磺酰基或菲基磺酰基，其中基团是未取代的或被取代的，或者R3是例如。 C 2 -C 6卤代烷酰基或卤代苯甲酰基，R'3是例如亚苯基二磺酰基，萘基二磺酰基，二苯基二磺酰基或氧基二苯基二磺酰基，其中这些基团是未取代的或被取代的，X是卤素; 在化学放大抗蚀剂配方中特别适合作为光敏酸供体。

    Oxime derivatives and the use thereof as latent acids
    8.
    发明授权
    Oxime derivatives and the use thereof as latent acids 有权
    肟衍生物及其作为潜伏酸的用途

    公开(公告)号：US06512020B1

    公开(公告)日：2003-01-28

    申请号：US09820115

    申请日：2001-03-28

    申请人： Toshikage Asakura ,  Hitoshi Yamato ,  Masaki Ohwa ,  Jean-Luc Birbaum ,  Kurt Dietliker ,  Junichi Tanabe

    发明人： Toshikage Asakura ,  Hitoshi Yamato ,  Masaki Ohwa ,  Jean-Luc Birbaum ,  Kurt Dietliker ,  Junichi Tanabe

    IPC分类号： C08J328

    CPC分类号： G03F7/0045 ,  B33Y70/00 ,  C07C251/62 ,  C07C309/00 ,  C07C309/65 ,  C07C317/32 ,  C07C323/47 ,  C07C381/00 ,  C07C2602/42 ,  C07D319/18 ,  C07D333/22

    摘要： Compounds of formula I, II and III, wherein wherein R1 is for example hydrogen, C1-C12alkyl, C3-C30cycloalkyl, C2-C12alkenyl, C4-C8cycloalkenyl, phenyl, which is unsubstituted or substituted, naphthyl, anthracyl or phenanthryl, unsubstituted or substituted, heteroaryl radical which is unsubstituted or substituted; wherein all radicals R1 with the exception of hydrogen can additionally be substituted by a group having a —O—C-bond or a —O—Si-bond which cleaves upon the action of an acid; R′1 is for example phenylene, naphthylene, diphenylene or oxydiphenylene, wherein these radicals are unsubstituted or substituted; R2 is halogen or C1-C10haloalkyl; R3 is for example C1-C18alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, wherein the groups are unsubstituted or substituted, or R3 is e.g. C2-C6haloalkanoyl, or halobenzoyl, R′3 is for example phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl, wherein these radicals are unsubstituted or substituted, X is halogen; are especially suitable as photosensitive acid-donors in chemically amplified resist formulations.

    摘要翻译： 式I，II和III的化合物，其中R1是例如氢，C1-C12烷基，C3-C30环烷基，C2-C12链烯基，C4-C8环烯基，苯基，未取代或取代的萘基，蒽基或菲基，未取代或取代的， 未取代或取代的杂芳基; 其中除氢之外的所有基团R1可以另外被具有在酸作用下切割的-O-C键或-O-Si键的基团取代; R'1是例如亚苯基，亚萘基，亚二苯基或氧联二苯基，其中这些基团是未取代的或被取代的; R2是卤素或C1-C10卤代烷基; R3是例如C1-C18烷基磺酰基，苯基磺酰基，萘基磺酰基，蒽磺酰基或菲基磺酰基，其中基团是未取代的或被取代的，或者R3是例如。 C 2 -C 6卤代烷酰基或卤代苯甲酰基，R'3是例如亚苯基二磺酰基，萘基二磺酰基，二苯基二磺酰基或氧基二苯基二磺酰基，其中这些基团是未取代的或被取代的，X是卤素; 在化学放大抗蚀剂配方中特别适合用作光敏酸供体。

    Halogenated oxime derivatives and the use therof as latent acids
    9.
    发明申请
    Halogenated oxime derivatives and the use therof as latent acids 有权
    卤代肟衍生物和作为潜伏酸使用

    公开(公告)号：US20090042114A1

    公开(公告)日：2009-02-12

    申请号：US12154333

    申请日：2008-05-22

    申请人： Hitoshi Yamato ,  Toshikage Asakura ,  Akira Matsumoto ,  Peter Murer ,  Tobias Hintermann

    发明人： Hitoshi Yamato ,  Toshikage Asakura ,  Akira Matsumoto ,  Peter Murer ,  Tobias Hintermann

    IPC分类号： C07D209/82 ,  C07C317/12 ,  G03F7/004 ,  C07D335/04

    CPC分类号： C07C251/48 ,  B33Y70/00 ,  C07C381/00 ,  C07C2603/18 ,  C07C2603/20 ,  C07C2603/40 ,  C07D209/86 ,  C07D307/91 ,  C07D333/76 ,  G03F7/0007 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392

    摘要： Compounds of the formula I or II wherein R1 is C1-C10haloalkylsulfonyl, halobenzenesulfonyl, C2-C10haloalkanoyl, halobenzoyl; R2 is halogen or C1-C10haloalkyl; Ar1 is phenyl, biphenylyl, fluorenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl, all of which are optionally substituted; Ar′1 is for example phenylene, naphthylene, diphenylene, heteroarylene, oxydiphenylene, phenylene-D-D1-D-phenylene or —Ar″1-A1-Y1-A1-Ar″1—; wherein these radicals optionally are substituted; Ar″1 is phenylene, naphthylene, anthracylene, phenanthrylene, or heteroarylene, all optionally substituted; A1 is for example a direct bond, —O—, —S—, or —NR6—; Y1 inter alia is C1-C18alkylene; X is halogen; D is for example —O—, —S— or —NR6—; D1 inter alia is C1-C18alkylene; are particularly suitable as photolatent acids in ArF resist technology.

    摘要翻译： 式I或II的化合物，其中R 1是C 1 -C 10卤代烷基磺酰基，卤代苯磺酰基，C 2 -C 10卤代烷酰基，卤代苯甲酰基; R2是卤素或C1-C10卤代烷基; Ar1是苯基，联苯基，芴基，萘基，蒽基，菲基或杂芳基，它们都是任选被取代的; Ar'1例如为亚苯基，亚萘基，亚二苯基，亚杂芳基，氧联二苯基，亚苯基-D-D1-D-phenylene或-Ar''1-A1-Y1-A1-Ar'1,1- 其中这些基团任选被取代; Ar 1是亚苯基，亚萘基，亚蒽基，亚菲基或亚杂芳基，全部被取代; A1是例如直接键，-O - ， - S - 或-NR 6 - ; Y1特别是C 1 -C 18亚烷基; X是卤素; D是例如-O - ， - S-或-NR 6 - ; D1特别是C 1 -C 18亚烷基; 在ArF抗蚀剂技术中特​​别适合作为光潜酸。