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13 条记录 (耗时 0.019 秒)

    PICVD process and device for the coating of curved substrates
    3.
    发明授权
    PICVD process and device for the coating of curved substrates 失效
    PICVD工艺和用于涂覆弯曲基板的装置

    公开(公告)号：US6025013A

    公开(公告)日：2000-02-15

    申请号：US716453

    申请日：1997-01-22

    申请人： Martin Heming ,  Ulrich Lange ,  Roland Langfeld ,  Wolfgang Mohl ,  Jurgen Otto ,  Volker Paquet ,  Johannes Segner ,  Martin Walther

    发明人： Martin Heming ,  Ulrich Lange ,  Roland Langfeld ,  Wolfgang Mohl ,  Jurgen Otto ,  Volker Paquet ,  Johannes Segner ,  Martin Walther

    IPC分类号： G02B1/11 ,  C23C16/44 ,  C23C16/455 ,  C23C16/50 ,  C23C16/511 ,  C23C16/515 ,  C23C16/52 ,  H05H1/00

    CPC分类号： C23C16/45565 ,  C23C16/455 ,  C23C16/45561 ,  C23C16/511 ,  C23C16/515 ,  C23C16/52

    摘要： A PCVD process for producing coating layers of uniform thickness of domed substrates. The substrate surface to be coated is arranged in relation to the gas passage surface of a gas showerhead. In order to determine the appropriate processing parameters, in a first series of tests for one type of substrate to be coated, the size of the gas passage surfaces and the gas mass flows through the gas passage surfaces are kept constant, while the intervals between plasma impulses are gradually modified, from an initial value t.sub.A until an optimum value t.sub.eff is determined, and until the uniformity of the thickness profile of the layers generated on the substrate may no longer be improved. If required, during a second series of tests, the value t.sub.eff may be kept constant, while the thickness profile of the layers is further modified by further optimizing the local parameters and/or the gas mass flows until layer uniformity may no longer be improved. The device includes a gas showerhead subdivided into zones and having gas passage surfaces arranged depending on the substrate being coated. The zones are connected by supply lines to a source of non film-forming gas and to a gas source that supplies fresh gas.

    摘要翻译： PCT No.PCT / EP95 / 01168 371日期1997年1月22日 102（e）日期1997年1月22日PCT 1995年3月29日PCT PCT。 公开号WO95 / 26427 日期1995年10月5日一种用于生产均匀厚度的圆顶基底的涂层的PCVD工艺。 待涂覆的基板表面相对于气体喷头的气体通道表面布置。 为了确定合适的加工参数，在要涂覆的一种类型的基材的第一系列试验中，气体通道表面的尺寸和通过气体通道表面的气体质量保持恒定，而等离子体 脉冲从初始值tA逐渐改变到确定最佳值teff，直到在衬底上产生的层的厚度分布的均匀性可能不再提高。 如果需要，在第二系列试验期间，值teff可以保持恒定，同时通过进一步优化局部参数和/或气体质量流量来进一步修改层的厚度分布，直到不能再改善层的均匀性。 该装置包括细分为区域的气体喷头，并且具有根据被涂覆的基底排列的气体通道表面。 这些区域通过供应管线连接到非成膜气体源和供应新鲜气体的气体源。

    Method of making a hollow, interiorly coated glass body and a glass tube as a semi-finished product for forming the glass body
    6.
    发明授权
    Method of making a hollow, interiorly coated glass body and a glass tube as a semi-finished product for forming the glass body 有权
    制造中空的内部涂覆的玻璃体和玻璃管作为用于形成玻璃体的半成品的方法

    公开(公告)号：US06200658B1

    公开(公告)日：2001-03-13

    申请号：US09234168

    申请日：1999-01-19

    申请人： Marten Walther ,  Michael Spallek ,  Burkhardt Danielzik ,  Martin Heming ,  Johannes Segner

    发明人： Marten Walther ,  Michael Spallek ,  Burkhardt Danielzik ,  Martin Heming ,  Johannes Segner

    IPC分类号： B27N2200

    CPC分类号： C03C17/256 ,  C03C17/004 ,  C03C17/245 ,  C03C17/2456 ,  C03C17/25 ,  C23C18/1254 ,  Y10T428/131 ,  Y10T428/1314 ,  Y10T428/1317

    摘要： Numerous applications for hollow glass bodies made from low melting glass material require an increase in the chemical resistance of the interior surface of the glass body. In order to avoid a disadvantageous de-alkalizing process the hollow glass body must be provided with an interior coating in a comparatively expensive prior art process. In an improved process according to the invention a glass tube acting as a semifinished product from which the hollow glass body is made is provided with an interior coating of oxide material, preferably SiO2, Al2O3, TiO2 or mixtures thereof, having a predetermined coating thickness according to the required chemical resistance or working conditions for forming the glass body and then the hollow glass body is made from the glass tube. The coating is advantageously provided by means of a PICVD process.

    摘要翻译： 由低熔点玻璃材料制成的中空玻璃体的许多应用需要增加玻璃体的内表面的耐化学性。 为了避免不利的去碱化过程，中空玻璃体必须在比较昂贵的现有技术方法中提供内部涂层。 在根据本发明的改进方法中，用作中空玻璃体制成的半成品的玻璃管设置有氧化物材料（优选SiO 2，Al 2 O 3，TiO 2或其混合物）的内部涂层，其具有预定的涂层厚度，根据 达到用于形成玻璃体的所需的耐化学性或工作条件，然后中空玻璃体由玻璃管制成。 该涂层有利地通过PICVD工艺提供。

    Process for detecting evanescently excited luminescence
    7.
    发明授权
    Process for detecting evanescently excited luminescence 失效
    检测ev逝激发光的方法

    公开(公告)号：US5822472A

    公开(公告)日：1998-10-13

    申请号：US737846

    申请日：1997-03-04

    申请人： Burkhard Danielzik ,  Gert Ludwig Duveneck ,  Martin Heming ,  Dieter Neuschafer ,  Johannes Segner

    发明人： Burkhard Danielzik ,  Gert Ludwig Duveneck ,  Martin Heming ,  Dieter Neuschafer ,  Johannes Segner

    IPC分类号： G01N21/64 ,  G01N21/77 ,  G01N21/78 ,  G01N33/483 ,  G01N33/543 ,  G02B6/10

    CPC分类号： G01N21/648 ,  G01N21/7703 ,  G01N21/7743

    摘要： The invention relates to a process for determing lumnescence with a planar dielectric optical sensor platform which consists of a transparent substrate to which a thin transparent waveguiding layer is applied, which sensor platform is provided with a coupling grating for the input-coupling of the excitation light and the refractive index of the substrate is lower than the refractive index of the waveguiding layer, by briging a liquid sample as superstrate into contact with the layer, and measuring the luminescence produced by substances having luminescence properties in the sample, or by substances having luminescence properties immobilized on the layer, optoelectronically. The invention also relates to the use of the process in quantitative affinity sensing and to the use thereof for the quantitative determination of luminescent constituents in optically turbid solutions, and to sensor platform for carrying out the process.

    摘要翻译： PCT No.PCT / IB95 / 00368 Sec。 371日期1997年3月4日 102（e）1997年3月4日PCT PCT 1995年5月17日PCT公布。 公开号WO95 / 33198 日期1995年12月7日本发明涉及一种用平面介质光学传感器平台确定梯度的方法，该平面介质光学传感器平台由透明基板构成，薄透明波导层被应用于透明基板，该传感器平台设置有用于输入 - 激发光与基板的折射率的耦合低于波导层的折射率，通过将液体样品作为覆层与该层接触，并测量样品中具有发光特性的物质产生的发光， 或通过固定在层上的具有发光特性的物质进行光电。 本发明还涉及该方法在定量亲和力感测中的用途及其用于定量测定光学混浊溶液中发光成分的用途以及用于实施该方法的传感器平台。

    Selective removal and contacting of thin film solar cells
    8.
    发明授权
    Selective removal and contacting of thin film solar cells 有权
    选择性去除和接触薄膜太阳能电池

    公开(公告)号：US08569094B2

    公开(公告)日：2013-10-29

    申请号：US12997041

    申请日：2009-06-12

    申请人： Lars Stolt ,  Olle Lundberg ,  Peter Neretnieks ,  Johannes Segner

    发明人： Lars Stolt ,  Olle Lundberg ,  Peter Neretnieks ,  Johannes Segner

    IPC分类号： H01L31/0224 ,  H01L31/18

    CPC分类号： H01L31/02008 ,  B24C1/04 ,  B24C3/322 ,  H01L31/046 ,  H01L31/0463 ,  Y02E10/50

    摘要： A method for manufacturing a thin film solar cell device including a CIGS based thin film solar cell module (17). Edge deletion by selective removal of a multilayer structure (13) that includes at least a front contact (15) and a CIGS layer (7) to expose the back contact (5) in at least a peripheral area (22) in the circumferential region (21) of the module (17) adjacent to a first longitudinal thin film solar cell segment (18) allows for contacting of the module (17) by attaching at least a first contacting element (27) to the back contact (5). Preferably a blasting operation using simultaneous supply of blasting agents and gathering of debris in a blasting chamber (32) arranged on the thin film solar cell module (17) is used for the selective removal.

    摘要翻译： 一种用于制造包括基于CIGS的薄膜太阳能电池模块（17）的薄膜太阳能电池装置的方法。 通过选择性去除包括至少前触点（15）和CIGS层（7）的多层结构（13）以在至少周边区域（22）中露出背接触（5）的边缘缺失， 与第一纵向薄膜太阳能电池段（18）相邻的模块（17）的第二端（21）允许通过将至少第一接触元件（27）附接到背接触件（5）而与模块（17）接触。 优选地，使用同时供应爆破剂并将布置在薄膜太阳能电池模块（17）上的喷射室（32）中的碎屑聚集）的喷砂操作用于选择性去除。

    Display screen for a cathode ray tube of glass having an adjustable spectral transmission curve and a method for producing the same
    9.
    发明授权
    Display screen for a cathode ray tube of glass having an adjustable spectral transmission curve and a method for producing the same 失效
    具有可调光谱透射曲线的玻璃阴极射线管的显示屏及其制造方法

    公开(公告)号：US5973448A

    公开(公告)日：1999-10-26

    申请号：US589716

    申请日：1996-01-22

    申请人： Johannes Segner ,  Martin Heming ,  Manfred Freundel

    发明人： Johannes Segner ,  Martin Heming ,  Manfred Freundel

    IPC分类号： C03C17/06 ,  C03C3/087 ,  C03C17/00 ,  C03C17/02 ,  C03C17/22 ,  C03C17/23 ,  C03C17/36 ,  H01J9/20 ,  H01J9/22 ,  H01J29/18 ,  H01J29/28 ,  H01J29/86 ,  H01J29/88 ,  H01J29/10 ,  H01J31/00

    CPC分类号： C03C17/3649 ,  C03C17/008 ,  C03C17/009 ,  C03C17/02 ,  C03C17/22 ,  C03C17/23 ,  C03C17/36 ,  C03C3/087 ,  H01J29/86 ,  C03C2217/212 ,  C03C2217/282

    摘要： A display screen for a cathode ray tube has an adjustable transmission curve in the visible spectral range of (.lambda.) between 380 to 780 nm. The display screen includes: a glass containing an oxide compound and being recyclable by melting under oxidizing conditions and without changing its characteristics and its color; the display screen having a transmission between 70% and 90% and at least one coating applied to the glass; the coating including the oxide compound; and/or, the coating including a component which forms an oxide compound in a melt of coated display screens which oxide component is likewise contained in the glass; and/or, the coating further including TiQ.sub.2 ; and/or, the coating further including titanium or compounds of titanium from which TiO.sub.2 is formed when the display screen is melted; and/or, the coating forming volatile compounds in the melt which escape from the melt in gaseous form when compounds forming in the melt contain components other than titanium oxide or the glass of the display screen.

    摘要翻译： 用于阴极射线管的显示屏具有在380至780nm之间（λ）的可见光谱范围内的可调透射曲线。 显示屏包括：含有氧化物的玻璃，并且在氧化条件下熔融并且不改变其特性和颜色可再循环; 所述显示屏具有70％至90％的透射率和至少一种施加到所述玻璃的涂层; 所述涂层包括所述氧化物化合物; 和/或，所述涂层包括在涂覆的显示屏的熔体中形成氧化物化合物的组分，所述氧化物组分同样包含在所述玻璃中; 和/或，所述涂层还包括TiQ 2; 和/或，所述涂层还包括当所述显示屏熔化时形成TiO 2的钛或钛的化合物; 和/或当在熔体中形成的化合物中的化合物中含有除了氧化钛或显示屏的玻璃之外的成分时，在熔融物中形成挥发性化合物在熔体中以气态形式逸出。

    Process and device for coating the inner surface of greatly arched, essentially dome-shaped substrate by CVD
    10.
    发明授权
    Process and device for coating the inner surface of greatly arched, essentially dome-shaped substrate by CVD 失效
    通过CVD涂覆大拱形基本圆顶形基底的内表面的方法和装置

    公开(公告)号：US5496586A

    公开(公告)日：1996-03-05

    申请号：US141656

    申请日：1993-10-26

    申请人： Ewald Mo/ rsen ,  Helge Vogt ,  Johannes Segner

    发明人： Ewald Mo/ rsen ,  Helge Vogt ,  Johannes Segner

    IPC分类号： C23C16/44 ,  C03C17/00 ,  C23C16/04 ,  C23C16/455 ,  C23C16/50 ,  C23C16/511 ,  C23C16/515 ,  B05D3/06

    CPC分类号： C23C16/455 ,  C03C17/004 ,  C23C16/045

    摘要： A process for coating the inner surface of a greatly arched, essentially dome-shaped substrate by CVD is described wherein reaction gases, which contain layer-former molecules, are conveyed into a reaction chamber containing the substrate(s) to be coated. The reaction gases are conveyed through at least one gas inlet, placed facing the vertex of the dome at a distance from the surface to be coated. Deposition of the layer material on the substrate is brought about by producing a reaction zone on the inner surface of the substrate to be coated. The reaction gases do not, as is usual for known processes, flow slowly into the reaction chamber. Instead, for production of a uniform coating, the reaction gases are introduced at a high speed such that the product of Reynolds number, R, of the gas jet in or in the immediate vicinity of the gas inlet and the distance, h, between the gas inlet and the dome vertex is 400

    摘要翻译： 描述了通过CVD涂覆大拱形基本圆顶形基底的内表面的方法，其中含有成层分子的反应气体被输送到含有待涂覆的基底的反应室中。 反应气体通过至少一个气体入口输送，该气体入口面向与待涂覆表面相距一定距离的圆顶顶点。 通过在待涂布的基材的内表面上产生反应区而使层材料沉积在基材上。 如已知方法通常，反应气体不会缓慢流入反应室。 相反，为了生产均匀的涂层，反应气体以高速引入，使得气体射流的雷诺数R的乘积在气体入口处或紧邻气体入口处的距离h和 气体入口和圆顶顶点为400