-
公开(公告)号：US5600880A
公开(公告)日：1997-02-11
申请号：US440513
申请日：1995-05-12
CPC分类号： G11B5/3163 , G11B5/3183 , G11B5/232 , Y10T29/49044 , Y10T29/49046
摘要： In the manufacture of a thin-film magnetic head having a vertical gap, auxiliary support is provided at the ends of a gap wall prior to formation of the magnetic poles. In a preferred embodiment, a pit is defined in a substrate and a release layer is deposited on the substrate followed by a layer of alumina. A recess is then etched through the alumina layer to the release layer in the pit. A partial layer of polymer or metal is deposited with a vertical edge across the median of the pit and recess. A layer of nonmagnetic wall material such as silicon oxide is deposited which after etching leaves a wall against the vertical edge of the partial layer. After removal of the partial layer, a vertical wall extends transversely across the recess and pit with the ends of the wall anchored and supported at the recess sidewalls. Alternatively, a pedestal may be provided in the recess to support each end of the wall. The magnetic poles are then formed simultaneously on either side of the wall. Other thin film layers are then deposited in an appropriate sequence of steps to complete the desired vertical gap, horizontal head structure. The substrate is separated from the completed thin film structure by dissolving the release layers.
摘要翻译： 在具有垂直间隙的薄膜磁头的制造中，在形成磁极之前，在间隙壁的端部设置辅助支撑。 在一个优选实施例中，凹坑被限定在基底中，并且释放层沉积在基底上，随后是一层氧化铝。 然后将凹槽通过氧化铝层蚀刻到凹坑中的释放层。 聚合物或金属的一部分层沉积有跨越凹坑和凹槽中间的垂直边缘。 沉积一层非磁性壁材料，例如氧化硅，其在蚀刻之后离开部分层的垂直边缘的壁。 在去除部分层之后，垂直壁横向延伸穿过凹部和凹坑，壁的端部锚固并支撑在凹陷侧壁处。 或者，可以在凹部中设置基座以支撑壁的每个端部。 然后在壁的任一侧同时形成磁极。 然后以适当的步骤顺序沉积其它薄膜层，以完成所需的垂直间隙，水平头部结构。 通过溶解剥离层将基底与完成的薄膜结构分离。
-
2.发明授权公开(公告)号：US06985330B2
公开(公告)日：2006-01-10
申请号：US10628861
申请日：2003-07-28
申请人： Hugo A. E. Santini
发明人： Hugo A. E. Santini
IPC分类号： G11B5/147
CPC分类号： G11B5/3932 , G11B5/1278
摘要： The present invention is a side-by-side inductive head structure having a considerably reduced separation between the read and write elements of the head structure. The present invention also provides a thin film inductive head design to minimize rework during a fabrication process.
摘要翻译： 本发明是一种并排的电感头结构，其具有在头部结构的读取和写入元件之间显着减小的间隔。 本发明还提供一种薄膜感应头设计，以在制造过程中使返工最小化。
-
3.发明授权
公开(公告)号：US5568335A
公开(公告)日：1996-10-22
申请号：US366277
申请日：1994-12-29
CPC分类号： G11B5/3929 , G11B5/23 , G11B5/3967
摘要： A method of constructing a narrow gap magnetoresistive (MR) read head is provided which prevents shorting between lead layers and shield layers. This is accomplished by a two-step process of depositing first gap layers before an MR sensor is deposited and a two-step process of depositing second gap layers after the MR sensor is formed. A very thin first gap layer is deposited on a first shield layer. A first MR region is then masked and a first gap pre-fill layer is deposited. The mask is lifted off leaving the first gap pre-fill layer everywhere except in the first MR region. An MR sensor and first and second leads are formed by various novel arrangements resulting in contiguous junctions or continuous spacer junctions therebetween. After completion of the MR sensor and leads, a very thin second gap layer is deposited. A second MR region, which encompasses the MR sensor, is masked and a second gap pre-fill layer is deposited. The mask is then lifted off leaving the second gap pre-fill layer located everywhere except in the second MR region. The result is that very thin first and second gap layers are located in the MR regions below and above the MR sensor to provide the MR head with high linear resolution, and the first gap layer and the first gap pre-fill layer are located between the leads and the first shield layer, and the second gap layer and the second gap pre-fill layer are located between the leads and the second shield layer to prevent shorting between the lead layers and the shield layers.
摘要翻译： 提供了构造窄间隙磁阻（MR）读头的方法，其防止引线层和屏蔽层之间的短路。 这是通过在MR传感器沉积之前沉积第一间隙层的两步过程和在形成MR传感器之后沉积第二间隙层的两步过程来实现的。 非常薄的第一间隙层沉积在第一屏蔽层上。 然后掩蔽第一MR区域并沉积第一间隙预填充层。 除了在第一MR区域之外，面罩被提起离开第一间隙预填充层。 MR传感器和第一和第二引线由各种新颖的布置形成，导致它们之间的连续接合或连续的间隔物接合。 在MR传感器和引线完成之后，沉积非常薄的第二间隙层。 包围MR传感器的第二MR区域被掩蔽，并且沉积第二间隙预填充层。 然后将掩模提起，留下第二间隙预填充层，除了在第二MR区域之外。 结果是，非常薄的第一和第二间隙层位于MR传感器下方和上方的MR区域中，以提供具有高线性分辨率的MR头，并且第一间隙层和第一间隙预填充层位于 引线和第一屏蔽层，并且第二间隙层和第二间隙预填充层位于引线和第二屏蔽层之间，以防止引线层和屏蔽层之间的短路。
-
公开(公告)号：US4304641A
公开(公告)日：1981-12-08
申请号：US209779
申请日：1980-11-24
CPC分类号： C25D5/08 , C25D17/007 , Y10S204/07
摘要： An apparatus and a method for rotary electroplating a thin metallic film having a uniform thickness and composition throughout. The apparatus includes a flow-through jet plate having nozzles of increasing size and uniformly spaced radially therethrough, or the same sized nozzles with varying radial spacing therethrough so as to provide a differential flow distribution of the plating solution that impinges on the wafer-cathode where the film is deposited. The spacing and size of the nozzles are critical to obtaining a uniform thickness. The electrical currents to the wafer and to the thieving ring are controlled by variable resistors so as to keep the electrical current to the cathode constant throughout the plating process. In a preferred embodiment the flow-through jet plate has an anode associated therewith in which the exposed area of the anode is maintained at a constant amount during the deposition. This method can simultaneously deposit with a uniform thickness and composition elements having a minimum gap or part size of 1 micrometer or less.
摘要翻译： 一种用于旋转电镀具有均匀厚度和组成的薄金属膜的设备和方法。 该装置包括具有增大尺寸和径向均匀间隔的喷嘴的流通喷射板，或具有通过其的径向间隔变化的相同尺寸的喷嘴，以提供冲击晶片阴极的电镀溶液的差分流动分布， 电影被存放。 喷嘴的间距和尺寸对获得均匀的厚度至关重要。 通过可变电阻器控制到晶圆和盗窃环的电流，以便在整个电镀过程中保持对阴极的电流恒定。 在优选实施例中，流通喷射板具有与之相关联的阳极，其中阳极的暴露区域在沉积期间保持恒定的量。 该方法可以同时沉积具有1微米或更小的最小间隙或部分尺寸的均匀厚度和组成元素。
-
5.发明授权Method and apparatus for providing a truncated profile probe for perpendicular recording 有权用于提供用于垂直记录的截头轮廓探头的方法和装置公开(公告)号：US07768742B2
公开(公告)日：2010-08-03
申请号：US10430949
申请日：2003-05-07
CPC分类号： G11B5/1278 , Y10T29/49032
摘要： The present invention is a truncated probe for a perpendicular recording write head. The truncated probe is formed in a resist using a pullback process. In the pullback process, a trench is formed in the resist. The resist is then heated to a required temperature for a predetermined duration of time. By controlling the temperature and time, the amount of pullback of the resist is controlled to form a specified angle for the truncated probe. Further, the present invention increases the efficiency of the write head by reducing the distance between the air-bearing surface (ABS) and a magnetic back gap of the perpendicular recording write head yokes. This reduction reduces the length of the write head and permits a faster rise time of a recorded signal.
摘要翻译： 本发明是用于垂直记录写头的截头探头。 截断的探针使用回拉工艺形成在抗蚀剂中。 在拉回过程中，在抗蚀剂中形成沟槽。 然后将抗蚀剂加热至所需温度一段预定的时间。 通过控制温度和时间，控制抗蚀剂的回拉量以形成截头探头的指定角度。 此外，本发明通过减小垂直记录写磁头磁轭的空气轴承表面（ABS）和磁背隙之间的距离来提高写入头的效率。 该减小减小了写入头的长度，并允许记录信号的更快的上升时间。
-
6.发明授权Method of coil fabrication for thin-film magnetic recording heads using phase-shifting masks 失效使用相移掩模的薄膜磁记录头的线圈制造方法
公开(公告)号：US5512394A
公开(公告)日：1996-04-30
申请号：US337808
申请日：1994-11-14
CPC分类号： G11B5/3163 , G03F7/00 , G03F7/2002 , H01F41/046
摘要： A method for fabricating a thin-film magnetic read/write head that eliminates contrast effects producing notching in a thin-film magnetic head coil caused by subsurface reflectivity at a reflective layer step during a photolithography step in the fabrication of the coil is provided. The method comprises the steps of forming a first permalloy yoke on a substrate, wherein the edges of the first yoke create steps from the top of the first yoke down to the substrate, forming a partial conformal layer of an electric insulation material over the first permalloy yoke and the substrate, forming a conformal copper seed layer over the electric insulation layer, forming a conductive coil on the electric insulation layer, wherein the copper coil is fabricated using a lithography process including placing a phase-shifting mask, formed in the image of the coil and containing non-printable openings covered by transparent material of a thickness that creates a 180.degree. phase-shift in illumination, over a photoresist layer, the phase-shifting mask creating illumination destructive interference in regions of the photoresist that are covered by the mask layer and immediately adjacent to regions of the photoresist not covered by the mask, forming a second electric insulation layer over the conductive coil, wherein the second electric insulation layer planarizes the coil topography, and forming a second permalloy yoke over the second electric insulation layer, wherein the second yoke is joined to the first yoke at a back gap but separated from the first yoke by a thin insulating layer at a recording gap.
摘要翻译： 提供一种制造薄膜磁读/写头的方法，该方法消除了在制造线圈的光刻步骤期间在反射层步骤中由表面反射率引起的在薄膜磁头线圈中产生切口的对比度效应。 该方法包括以下步骤：在衬底上形成第一坡莫合金磁轭，其中第一磁轭的边缘从第一磁轭的顶部下降到衬底，在第一坡莫合金上形成电绝缘材料的部分共形层 轭和衬底，在电绝缘层上形成共形铜籽晶层，在电绝缘层上形成导电线圈，其中铜线圈使用光刻工艺制造，包括放置形成在图像中的相移掩模 该线圈并且包含由透明材料覆盖的不可打印的开口，其厚度在光致抗蚀剂层上在照明中产生180°的相移，所述相移掩模在由所述光致抗蚀剂覆盖的区域中产生光照的相消干涉 掩模层，并且紧邻未被掩模覆盖的光致抗蚀剂的区域，形成第二电绝缘层 r所述导电线圈，其中所述第二电绝缘层平坦化所述线圈形貌，并且在所述第二电绝缘层上形成第二坡莫合金磁轭，其中所述第二磁轭在后间隙处与所述第一磁轭接合，但是与所述第一磁轭分离， 在记录间隙处的薄绝缘层。
-
公开(公告)号：US4350116A
公开(公告)日：1982-09-21
申请号：US219075
申请日：1980-12-22
CPC分类号： C30B19/068 , Y10S269/903
摘要： A holder for liquid phase epitaxial (LPE) growth which eliminates mesas on the surface of the film is described. The holder has two legs to which a ring is connected. The ring has holding means so that it can hold one wafer or two wafers back-to-back. One of the two legs extends vertically below the first ring. In a preferred embodiment a second ring having holding means for a pair of wafers back-to-back is attached to the elongated leg. This holder structure prevents a film from the liquid melt from forming when the holder is withdrawn from the liquid growth solution, thereby eliminating the formation of mesas which occur when the film ruptures.
摘要翻译： 描述了用于消除膜表面上的台面的液相外延（LPE）生长的保持器。 支架具有两个连接环的支脚。 环具有保持装置，使得其可以背对背地保持一个晶片或两个晶片。 两条腿中的一条垂直于第一环的下方延伸。 在优选实施例中，具有用于一对背板背对的保持装置的第二环连接到细长的腿上。 当保持器从液体生长溶液中取出时，该保持器结构防止了液体熔融物的形成，从而消除了当膜破裂时出现的台面的形成。
-
公开(公告)号：US5621596A
公开(公告)日：1997-04-15
申请号：US560062
申请日：1995-11-17
申请人： Hugo A. E. Santini
发明人： Hugo A. E. Santini
CPC分类号： G11B5/313 , G11B5/3133 , G11B5/3163 , G11B5/3116 , Y10T29/49032
摘要： A thin film low profile write head is provided which has first and second pole pieces which are magnetically connected in a pole tip region and at a back gap. The pole tip region is located between the head surface and a zero throat height and the head has a body region which is located between the zero throat height and the back gap. A plurality of insulation layers are located above the first pole piece in the body region. Each of the insulation layers has an apex where the insulation layer commences and each insulation layer extends from its apex toward the back gap. The plurality of insulation layers typically includes first, second and third insulation layers. In the preferred embodiment the apex of the second insulation layer is located at and defines the zero throat height of the head. This enables a very narrow track width second pole tip to be constructed simultaneously with the second pole piece using ordinary photolithography processes. Further it enables the insulation layers, the coil layer and the second pole piece to be thinner than prior art layers.
摘要翻译： 提供一种薄膜低调写头，其具有磁极连接在极尖区域和后间隙处的第一和第二极靴。 极尖区域位于头部表面和零喉部高度之间，并且头部具有位于零喉部高度和后间隙之间的身体区域。 多个绝缘层位于身体区域中的第一极靴的上方。 每个绝缘层具有绝缘层开始的顶点，并且每个绝缘层从其顶点向后间隙延伸。 多个绝缘层通常包括第一，第二和第三绝缘层。 在优选实施例中，第二绝缘层的顶点位于并限定头部的零喉部高度。 这使得能够使用普通光刻工艺与第二极靴同时构造非常窄的轨道宽度的第二极尖。 此外，其使得绝缘层，线圈层和第二极靴能够比现有技术的层更薄。
-
9.发明授权Magnetic storage system using thin film magnetic recording heads using phase-shifting mask 失效使用移相掩模的薄膜磁记录头的磁存储系统
公开(公告)号：US5414580A
公开(公告)日：1995-05-09
申请号：US242810
申请日：1994-05-13
CPC分类号： G11B5/3163 , G03F7/00 , G03F7/2002 , H01F41/046
摘要： A method for fabricating a thin-film magnetic read/write head that eliminates contrast effects producing notching in a thin-film magnetic head coil caused by subsurface reflectivity at a reflective layer step during a photolithography step in the fabrication of the coil is provided. The method comprises the steps of forming a first permalloy yoke on a substrate, wherein the edges of the first yoke create steps from the top of the first yoke down to the substrate, forming a partial conformal layer of an electric insulation material over the first permalloy yoke and the substrate, forming a conformal copper seed layer over the electric insulation layer, forming a conductive coil on the electric insulation layer, wherein the copper coil is fabricated using a lithography process including placing a phase-shifting mask, formed in the image of the coil and containing non-printable openings covered by transparent material of a thickness that creates a 180.degree. phase-shift in illumination, over a photoresist layer, the phase-shifting mask creating illumination destructive interference in regions of the photoresist that are covered by the mask layer and immediately adjacent to regions of the photoresist not covered by the mask, forming a second electric insulation layer over the conductive coil, wherein the second electric insulation layer planarizes the coil topography, and forming a second permalloy yoke over the second electric insulation layer, wherein the second yoke is joined to the first yoke at a back gap but separated from the first yoke by a thin insulating layer at a recording gap.
摘要翻译： 提供一种制造薄膜磁读/写头的方法，该方法消除了在制造线圈的光刻步骤期间在反射层步骤中由表面反射率引起的在薄膜磁头线圈中产生切口的对比度效应。 该方法包括以下步骤：在衬底上形成第一坡莫合金磁轭，其中第一磁轭的边缘从第一磁轭的顶部下降到衬底，在第一坡莫合金上形成电绝缘材料的部分共形层 轭和衬底，在电绝缘层上形成共形铜籽晶层，在电绝缘层上形成导电线圈，其中铜线圈使用光刻工艺制造，包括放置形成在图像中的相移掩模 该线圈并且包含由透明材料覆盖的不可打印的开口，其厚度在光致抗蚀剂层上在照明中产生180°的相移，所述相移掩模在由所述光致抗蚀剂覆盖的区域中产生光照的相消干涉 掩模层，并且紧邻未被掩模覆盖的光致抗蚀剂的区域，形成第二电绝缘层 r所述导电线圈，其中所述第二电绝缘层平坦化所述线圈形貌，并且在所述第二电绝缘层上形成第二坡莫合金磁轭，其中所述第二磁轭在后间隙处与所述第一磁轭接合，但是与所述第一磁轭分离， 在记录间隙处的薄绝缘层。
-
公开(公告)号：US4242038A
公开(公告)日：1980-12-30
申请号：US53166
申请日：1979-06-29
申请人： Hugo A. E. Santini , David P. Wick
发明人： Hugo A. E. Santini , David P. Wick
CPC分类号： H01L21/67787
摘要： An apparatus and method for orienting a substantially flat wafer are described. The wafer preferably has two flat registration edges of unequal length. Upon contact of any edge portion of the wafer with a sensor projecting forwardly from one registration surface, air jets are activated to rapidly rotate the wafer one way until the longer of its two registration edges contacts a sensor projecting forwardly from another registration surface. Then air jets are activated to slowly rotate the wafer the opposite way until said longer registration edge contacts another sensor associated with said other registration surface to effect precise registration of the wafer without overshoot as all three sensor are concurrently contacted and activated. Wafer movement by the jets thereupon terminates and vacuum is applied continuously to hold the wafer in place while the work operation is performed thereon. Since the wafer is registered solely by contact with the various sensor (and not by contact with the respective registration surfaces), contamination of the wafer by physical contact is minimized.
摘要翻译： 描述了用于定向基本上平坦的晶片的装置和方法。 晶片优选地具有不等长度的两个平坦配准边缘。 当晶片的任何边缘部分与从一个配准表面向前突出的传感器接触时，激活空气射流以使晶片快速旋转，直到其两个配准边缘的较长时间接触从另一个配准表面向前突出的传感器。 然后激活空气喷嘴以相反的方式缓慢地旋转晶片，直到所述较长的配准边缘接触与所述另一个配准表面相关联的另一个传感器，以在所有三个传感器同时接触和激活时实现晶片的精确配准而没有过冲。 通过喷射器的晶片移动终止，并且在其上执行工作操作时连续施加真空以将晶片保持在适当位置。 由于晶片仅通过与各种传感器接触（而不是与相应的配准表面接触）来注册，所以通过物理接触对晶片的污染被最小化。
-
-
-
-
-
-
-
-
-
搜索结果
10 条记录 (耗时 0.02 秒)
