公开(公告)号：US07504696B2

公开(公告)日：2009-03-17

申请号：US11306748

申请日：2006-01-10

申请人： Huilong Zhu ,  Zhijiong Luo ,  Dae-Gyu Park

发明人： Huilong Zhu ,  Zhijiong Luo ,  Dae-Gyu Park

IPC分类号： H01L29/76 ,  H01L29/94 ,  H01L31/062 ,  H01L31/113 ,  H01L31/119

CPC分类号： H01L21/823842 ,  H01L21/823807 ,  H01L21/823857 ,  H01L21/823878

摘要： Embodiments herein present a structure and method to make a CMOS with dual metal gates. Specifically, the CMOS comprises a first gate comprising a first metal and a second gate comprising a second metal. The first gate comprises a portion of a first transistor that is complementary to a second transistor that includes the second gate, wherein the first gate and the second gate are situated on the same substrate. Furthermore, the first metal produces a first threshold voltage characteristic, wherein the first metal comprises tantalum. The second metal produces a second threshold voltage characteristic that differs from the first threshold voltage characteristic, wherein the second metal comprises tungsten.

摘要翻译： 本文的实施例提供了制造具有双金属栅极的CMOS的结构和方法。 具体地，CMOS包括包括第一金属的第一栅极和包括第二金属的第二栅极。 第一栅极包括与包括第二栅极的第二晶体管互补的第一晶体管的一部分，其中第一栅极和第二栅极位于相同的衬底上。 此外，第一金属产生第一阈值电压特性，其中第一金属包括钽。 第二金属产生与第一阈值电压特性不同的第二阈值电压特性，其中第二金属包括钨。

公开(公告)号：US20070278590A1

公开(公告)日：2007-12-06

申请号：US11306748

申请日：2006-01-10

申请人： Huilong Zhu ,  Zhijiong Luo ,  Dae-Gyu Park

发明人： Huilong Zhu ,  Zhijiong Luo ,  Dae-Gyu Park

IPC分类号： H01L29/76 ,  H01L21/8238

CPC分类号： H01L21/823842 ,  H01L21/823807 ,  H01L21/823857 ,  H01L21/823878

摘要： Embodiments herein present a structure and method to make a CMOS with dual metal gates. Specifically, the CMOS comprises a first gate comprising a first metal and a second gate comprising a second metal. The first gate comprises a portion of a first transistor that is complementary to a second transistor that includes the second gate, wherein the first gate and the second gate are situated on the same substrate. Furthermore, the first metal produces a first threshold voltage characteristic, wherein the first metal comprises tantalum. The second metal produces a second threshold voltage characteristic that differs from the first threshold voltage characteristic, wherein the second metal comprises tungsten.

摘要翻译： 本文的实施例提供了制造具有双金属栅极的CMOS的结构和方法。 具体地，CMOS包括包括第一金属的第一栅极和包括第二金属的第二栅极。 第一栅极包括与包括第二栅极的第二晶体管互补的第一晶体管的一部分，其中第一栅极和第二栅极位于相同的衬底上。 此外，第一金属产生第一阈值电压特性，其中第一金属包括钽。 第二金属产生与第一阈值电压特性不同的第二阈值电压特性，其中第二金属包括钨。

公开(公告)号：US07666774B2

公开(公告)日：2010-02-23

申请号：US11625984

申请日：2007-01-23

申请人： Huilong Zhu ,  Dae-Gyu Park ,  Zhijiong Luo ,  Ying Zhang

发明人： Huilong Zhu ,  Dae-Gyu Park ,  Zhijiong Luo ,  Ying Zhang

IPC分类号： H01L21/8238

CPC分类号： H01L21/823842 ,  H01L21/28088 ,  H01L27/092 ,  H01L29/4966 ,  H01L29/517 ,  H01L29/665

摘要： A CMOS structure and a method for fabricating the CMOS structure include a first transistor located within a first semiconductor substrate region having a first polarity. The first transistor includes a first gate electrode that includes a first metal containing material layer and a first silicon containing material layer located upon the first metal containing material layer. The CMOS structure also includes a second transistor located within a laterally separated second semiconductor substrate region having a second polarity that is different than the first polarity. The second transistor includes a second gate electrode comprising a second metal containing material layer of a composition that is different than the first metal containing material layer, and a second silicon containing material layer located upon the second metal containing material layer. The first silicon containing material layer and the first semiconductor substrate region comprise different materials. The second silicon containing material layer and the second semiconductor substrate region also comprise different materials.

摘要翻译： CMOS结构和制造CMOS结构的方法包括位于具有第一极性的第一半导体衬底区域内的第一晶体管。 第一晶体管包括第一栅电极，其包括第一含金属材料层和位于第一含金属材料层上的第一含硅材料层。 CMOS结构还包括位于横向分离的第二半导体衬底区域内的第二晶体管，其具有不同于第一极性的第二极性。 第二晶体管包括第二栅极电极，其包括与第一含金属材料层不同的组成的第二金属含有材料层和位于第二含金属材料层上的第二含硅材料层。 第一含硅材料层和第一半导体衬底区域包括不同的材料。 第二含硅材料层和第二半导体衬底区域也包括不同的材料。

公开(公告)号：US20080173946A1

公开(公告)日：2008-07-24

申请号：US11625984

申请日：2007-01-23

申请人： Huilong Zhu ,  Dae-Gyu Park ,  Zhijiong Luo ,  Ying Zhang

发明人： Huilong Zhu ,  Dae-Gyu Park ,  Zhijiong Luo ,  Ying Zhang

IPC分类号： H01L27/00 ,  H01L21/8238

CPC分类号： H01L21/823842 ,  H01L21/28088 ,  H01L27/092 ,  H01L29/4966 ,  H01L29/517 ,  H01L29/665

摘要： A CMOS structure and a method for fabricating the CMOS structure include a first transistor located within a first semiconductor substrate region having a first polarity. The first transistor includes a first gate electrode that includes a first metal containing material layer and a first silicon containing material layer located upon the first metal containing material layer. The CMOS structure also includes a second transistor located within a laterally separated second semiconductor substrate region having a second polarity that is different than the first polarity The second transistor includes a second gate electrode comprising a second metal containing material layer of a composition that is different than the first metal containing material layer, and a second silicon containing material layer located upon the second metal containing material layer. The first silicon containing material layer and the first semiconductor substrate region comprise different materials. The second silicon containing material layer and the second semiconductor substrate region also comprise different materials.

摘要翻译： CMOS结构和制造CMOS结构的方法包括位于具有第一极性的第一半导体衬底区域内的第一晶体管。 第一晶体管包括第一栅电极，其包括第一含金属材料层和位于第一含金属材料层上的第一含硅材料层。 CMOS结构还包括位于横向分离的第二半导体衬底区域内的第二晶体管，其具有与第一极性不同的第二极性。第二晶体管包括第二栅电极，第二栅电极包括不同于 第一含金属材料层和位于第二含金属材料层上的第二含硅材料层。 第一含硅材料层和第一半导体衬底区域包括不同的材料。 第二含硅材料层和第二半导体衬底区域也包括不同的材料。

公开(公告)号：US09356025B2

公开(公告)日：2016-05-31

申请号：US14348579

申请日：2012-03-29

申请人： Huilong Zhu ,  Zhijiong Luo ,  Haizhou Yin

发明人： Huilong Zhu ,  Zhijiong Luo ,  Haizhou Yin

IPC分类号： H01L27/092 ,  H01L29/78 ,  H01L21/8238 ,  H01L21/762 ,  H01L29/66

CPC分类号： H01L27/092 ,  H01L21/76224 ,  H01L21/823807 ,  H01L21/823878 ,  H01L29/66575 ,  H01L29/7846

摘要： The present invention relates to enhancing MOSFET performance with the corner stresses of STI. A method of manufacturing a MOS device comprises the steps of: providing a semiconductor substrate; forming trenches on the semiconductor substrate and at least a pMOS region and at least an nMOS region surrounded by the trenches; filling the trenches with a dielectric material having a stress; removing at least the dielectric material having a stress in the trenches which is adjacent to a position where a channel is to be formed on each of the pMOS and nMOS regions so as to form exposed regions; filling the exposed regions with a insulating material; and forming pMOS and nMOS devices on the pMOS region and the nMOS region, respectively, wherein each of the pMOS and nMOS devices comprises a channel, a gate formed above the channel, and a source and a drain formed at both sides of the channel; wherein in a channel length direction, the boundary of each exposed region is substantially aligned with the boundary of the position of the channel, or the boundary of each exposed region extends along the channel length direction to be aligned with the boundary of corresponding pMOS or nMOS region.

摘要翻译： 本发明涉及利用STI的拐角应力来增强MOSFET的性能。 一种制造MOS器件的方法包括以下步骤：提供半导体衬底; 在所述半导体衬底和至少一个pMOS区域和由所述沟槽包围的至少nMOS区域中形成沟槽; 用具有应力的介电材料填充沟槽; 至少去除在沟道中具有应力的介电材料，所述沟槽邻近要在pMOS和nMOS区域中的每一个上形成沟道的位置，以形成暴露区域; 用绝缘材料填充暴露的区域; 以及分别在pMOS区域和nMOS区域上形成pMOS和nMOS器件，其中pMOS和nMOS器件中的每一个包括沟道，形成在沟道上方的栅极以及形成在沟道两侧的源极和漏极; 其中在通道长度方向上，每个曝光区域的边界基本上与通道位置的边界对齐，或者每个曝光​​区域的边界沿着沟道长度方向延伸以与对应的pMOS或nMOS的边界对准 地区。

公开(公告)号：US09054221B2

公开(公告)日：2015-06-09

申请号：US13510807

申请日：2011-11-18

申请人： Huilong Zhu ,  Qingqing Liang ,  Zhijiong Luo ,  Haizhou Yin

发明人： Huilong Zhu ,  Qingqing Liang ,  Zhijiong Luo ,  Haizhou Yin

IPC分类号： H01L27/088 ,  H01L21/336 ,  H01L21/84 ,  H01L27/12

CPC分类号： H01L21/84 ,  H01L27/1203

摘要： The present disclosure provides a semiconductor device and a method for manufacturing the same. The semiconductor device comprises: an SOI wafer comprising a semiconductor substrate, a buried insulation layer, and a semiconductor layer, wherein the buried insulation layer is disposed on the semiconductor substrate, and the semiconductor layer is disposed on the buried insulation layer; a plurality of MOSFETs being formed adjacently to each other in the SOI wafer, wherein each of the MOSFETs comprises a respective backgate being formed in the semiconductor substrate; and a plurality of shallow trench isolations, each of which being formed between respective adjacent MOSFETs to isolate the respective adjacent MOSFETs from each other, wherein the respective adjacent MOSFETs share a common backgate isolation region under and in direct contact with the respective backgate in the semiconductor substrate, and a PNP junction or an NPN junction is formed by the common backgate isolation region and the respective backgate of the respective adjacent MOSFETs. According to the present disclosure, respective backgates of two adjacent MOSFETs are isolated from each other by the shallow trench isolation. Furthermore, the two adjacent MOSFETs are also isolated from each other by the PNP or NPN junction formed by the respective backgates of the two adjacent MOSFETs and the common backgate isolation. As a result, this device structure has a better insulation effect over the prior art MOSFET and it greatly reduces the possibility of breakthrough.

摘要翻译： 本发明提供一种半导体器件及其制造方法。 半导体器件包括：SOI晶片，其包括半导体衬底，掩埋绝缘层和半导体层，其中所述掩埋绝缘层设置在所述半导体衬底上，并且所述半导体层设置在所述掩埋绝缘层上; 在SOI晶片中彼此相邻形成的多个MOSFET，其中每个MOSFET包括形成在半导体衬底中的相应后栅; 以及多个浅沟槽隔离，其中每一个均形成在各个相邻的MOSFET之间，以将各个相邻的MOSFET彼此隔离，其中相应的相邻MOSFET在半导体内部和相应的后栅极直接接触并与之直接接触。 衬底，并且PNP结或NPN结由公共背栅隔离区和相应的相邻MOSFET的相应背栅形成。 根据本公开，两个相邻MOSFET的相应背板通过浅沟槽隔离彼此隔离。 此外，两个相邻的MOSFET也通过由两个相邻MOSFET的相应后沿和公共背栅隔离形成的PNP或NPN结彼此隔离。 结果，该器件结构具有比现有技术的MOSFET更好的绝缘效果，并且大大降低了突破的可能性。

公开(公告)号：US08981454B2

公开(公告)日：2015-03-17

申请号：US13061461

申请日：2010-09-25

申请人： Huilong Zhu ,  Haizhou Yin ,  Zhijiong Luo

发明人： Huilong Zhu ,  Haizhou Yin ,  Zhijiong Luo

IPC分类号： H01L29/788 ,  H01L29/66 ,  H01L29/78

CPC分类号： H01L29/66825 ,  H01L21/28273 ,  H01L21/845 ,  H01L29/42324 ,  H01L29/785 ,  H01L29/7881

摘要： The present application discloses a non-volatile memory device, comprising a semiconductor fin on an insulating layer; a channel region at a central portion of the semiconductor fin; source/drain regions on both sides of the semiconductor fin; a floating gate arranged at a first side of the semiconductor fin and extending in a direction further away from the semiconductor fin; and a first control gate arranged on top of the floating gate or covering top and sidewall portions of the floating gate. The non-volatile memory device reduces a short channel effect, has an increased memory density, and is cost effective.

摘要翻译： 本申请公开了一种非易失性存储器件，其包括绝缘层上的半导体鳍片; 在半导体鳍片的中心部分处的沟道区域; 半导体鳍片两侧的源极/漏极区域; 布置在半导体鳍片的第一侧并沿远离半导体鳍片的方向延伸的浮动栅极; 以及布置在所述浮动栅极的顶部上或覆盖所述浮动栅极的顶部和侧壁部分的第一控制栅极。 非易失性存储器件减少短通道效应，具有增加的存储器密度，并且是成本有效的。

公开(公告)号：US08952453B2

公开(公告)日：2015-02-10

申请号：US13580053

申请日：2011-11-18

申请人： Huilong Zhu ,  Qingqing Liang ,  Haizhou Yin ,  Zhijiong Luo

发明人： Huilong Zhu ,  Qingqing Liang ,  Haizhou Yin ,  Zhijiong Luo

IPC分类号： H01L27/12 ,  H01L21/84 ,  H01L29/66 ,  H01L29/786

CPC分类号： H01L21/84 ,  H01L27/1203 ,  H01L29/66545 ,  H01L29/78648

摘要： The present application discloses a MOSFET and a method for manufacturing the same. The MOSFET is formed on an SOI wafer, comprising: a shallow trench isolation for defining an active region in the semiconductor layer; a gate stack on the semiconductor layer; a source region and a drain region in the semiconductor layer on both sides of the gate stack; a channel region in the semiconductor layer and sandwiched by the source region and the drain region; a back gate in the semiconductor substrate; a first dummy gate stack overlapping with a boundary between the semiconductor layer and the shallow trench isolation; and a second dummy gate stack on the shallow trench isolation, wherein the MOSFET further comprises a plurality of conductive vias which are disposed between the gate stack and the first dummy gate stack and electrically connected to the source region and the drain region respectively, and between the first dummy gate stack and the second dummy gate stack and electrically connected to the back gate. The MOSFET avoids short circuit between the back gate and the source/drain regions by the dummy gate stacks.

摘要翻译： 本申请公开了一种MOSFET及其制造方法。 MOSFET形成在SOI晶片上，包括：用于限定半导体层中的有源区的浅沟槽隔离; 半导体层上的栅极堆叠; 栅极堆叠的两侧的半导体层中的源极区域和漏极区域; 半导体层中的沟道区，被源极区和漏极区夹持; 半导体衬底中的背栅; 与半导体层和浅沟槽隔离之间的边界重叠的第一虚拟栅极堆叠; 以及在浅沟槽隔离上的第二虚拟栅极堆叠，其中所述MOSFET还包括多个导电通孔，所述多个导电通孔设置在所述栅极堆叠和所述第一伪栅极堆叠之间，并分别电连接到所述源极区域和所述漏极区域之间，以及 第一虚拟栅极堆叠和第二虚拟栅极堆叠并且电连接到背栅极。 MOSFET通过虚拟栅极堆叠避免了背栅极和源极/漏极区域之间的短路。

公开(公告)号：US08928089B2

公开(公告)日：2015-01-06

申请号：US13201827

申请日：2011-02-24

申请人： Huilong Zhu ,  Zhijiong Luo ,  Haizhou Yin

发明人： Huilong Zhu ,  Zhijiong Luo ,  Haizhou Yin

IPC分类号： H01L21/70 ,  H01L21/8238 ,  H01L29/78

CPC分类号： H01L21/823807 ,  H01L21/823864 ,  H01L29/7843

摘要： A semiconductor structure and a method for forming the same are provided. The structure comprises a semiconductor substrate (100) with an nMOSFET region (102) and a pMOSFET region (104) on it. An nMOSFET structure and a pMOSFET structure are formed in the nMOSFET region (102) and the pMOSFET region (104), respectively. The nMOSFET structure comprises a first channel region (182) formed in the nMOSFET region (102) and a first gate stack formed in the first channel region (182). The nMOSFET structure is covered with a compressive-stressed material layer (130) to apply a tensile stress to the first channel region (182). The pMOSFET structure comprises a second channel region (184) formed in the pMOSFET region (104) and a second gate stack formed in the second channel region (184). The pMOSFET structure is covered with a tensile-stressed material layer (140) to apply a compressive stress to the second channel region (184).

摘要翻译： 提供半导体结构及其形成方法。 该结构包括其上具有nMOSFET区域（102）和pMOSFET区域（104）的半导体衬底（100）。 nMOSFET结构和pMOSFET结构分别形成在nMOSFET区域（102）和pMOSFET区域（104）中。 nMOSFET结构包括形成在nMOSFET区域（102）中的第一沟道区（182）和形成在第一沟道区（182）中的第一栅叠层。 nMOSFET结构用压应力材料层（130）覆盖，以向第一沟道区域（182）施加拉伸应力。 pMOSFET结构包括形成在pMOSFET区域（104）中的第二沟道区（184）和形成在第二沟道区（184）中的第二栅叠层。 pMOSFET结构被拉伸应力材料层（140）覆盖，以向第二通道区域（184）施加压缩应力。

公开(公告)号：US08841777B2

公开(公告)日：2014-09-23

申请号：US12685954

申请日：2010-01-12

申请人： Mukta G. Farooq ,  Zhengwen Li ,  Zhijiong Luo ,  Huilong Zhu

发明人： Mukta G. Farooq ,  Zhengwen Li ,  Zhijiong Luo ,  Huilong Zhu

IPC分类号： H01L21/48 ,  H01L21/52 ,  H01L21/40 ,  H01L21/20 ,  H01L27/06 ,  H01L21/768

CPC分类号： H01L21/76841 ,  H01L21/2007 ,  H01L27/0688 ,  H01L2224/80357 ,  H01L2224/80895 ,  H01L2224/80896

摘要： Vertical stacks of a metal portion and a semiconductor portion formed on a first substrate are brought into physical contact with vertical stacks of a metal portion and a semiconductor portion formed on a second substrate. Alternately, vertical stacks of a metal portion and a semiconductor portion formed on a first substrate are brought into physical contact with metal portions formed on a second substrate. The assembly of the first and second substrates is subjected to an anneal at a temperature that induces formation of a metal semiconductor alloy derived from the semiconductor portions and the metal portions. The first substrate and the second substrate are bonded through metal semiconductor alloy portions that adhere to the first and second substrates.

摘要翻译： 形成在第一基板上的金属部分和半导体部分的垂直叠层与形成在第二基板上的金属部分和半导体部分的垂直叠层物理接触。 或者，形成在第一基板上的金属部分和半导体部分的垂直堆叠与形成在第二基板上的金属部分物理接触。 在引起由半导体部分和金属部分衍生的金属半导体合金的形成的温度下对第一和第二基板的组装进行退火。 第一基板和第二基板通过粘附到第一和第二基板的金属半导体合金部分接合。