Resin composition for mold used in forming micropattern, and method for fabricating organic mold therefrom
    6.
    发明申请
    Resin composition for mold used in forming micropattern, and method for fabricating organic mold therefrom 有权
    用于形成微图案的模具用树脂组合物及其制造方法

    公开(公告)号:US20060214326A1

    公开(公告)日:2006-09-28

    申请号:US10553647

    申请日:2004-04-14

    申请人: Tae Kim Pil Jin Yoo

    发明人: Tae Kim Pil Jin Yoo

    IPC分类号: B29C35/08 B29C33/40

    摘要: A resin composition for a mold used in forming micropatterns comprises (A) 40 to 90 parts by weight of an active energy curable urethane-based oligomer having a reactive group; (B) 10 to 60 parts by weight of a monomer reactive with the urethane-based oligomer, (C) 0.01 to 200 parts by weight of a silicone or fluorine containing compound, based on 100 parts of the sum of the components (A) and (B); and (D) 0.1 to 10 parts by weight of a photoinitiator, based on 100 parts of the sum of the components (A), (B) and (C). The inventive resin composition can be easily cured by the action of an active energy ray, and the organic mold fabricated therefrom is easily lifted off from a master without irreversible adhesion or generation of defects and have excellent dimensional and chemical stabilities.

    摘要翻译: 用于形成微图案的模具用树脂组合物包含(A)40〜90重量份的具有反应性基团的活性能固化性氨基甲酸酯类低聚物; (B)10〜60重量份与氨基甲酸酯类低聚物反应的单体,(C)0.01〜200重量份的含硅或氟化合物,基于100份(A)成分的总和, 和(B); 和(D)基于100份(A),(B)和(C)组分的总和,0.1至10重量份的光引发剂。 本发明的树脂组合物可以通过活性能量射线的作用而容易地固化,并且由其制造的有机模具容易地从母料中脱离而不会产生不可逆的粘附或产生缺陷,并具有优异的尺寸和化学稳定性。

    Resin composition for mold used in forming micropattern, and method for fabricating organic mold therefrom
    7.
    发明授权
    Resin composition for mold used in forming micropattern, and method for fabricating organic mold therefrom 有权
    用于形成微图案的模具用树脂组合物及其制造方法

    公开(公告)号:US07655307B2

    公开(公告)日:2010-02-02

    申请号:US10553647

    申请日:2004-04-14

    IPC分类号: B32B27/40 B29C39/00

    摘要: A resin composition for a mold used in forming micropatterns comprises (A) 40 to 90 parts by weight of an active energy curable urethane-based oligomer having a reactive group; (B) 10 to 60 parts by weight of a monomer reactive with the urethane-based oligomer, (C) 0.01 to 200 parts by weight of a silicone or fluorine containing compound, based on 100 parts of the sum of the components (A) and (B); and (D) 0.1 to 10 parts by weight of a photoinitiator, based on 100 parts of the sum of the components (A), (B) and (C). The inventive resin composition can be easily cured by the action of an active energy ray, and the organic mold fabricated therefrom is easily lifted off from a master without irreversible adhesion or generation of defects and have excellent dimensional and chemical stabilities.

    摘要翻译: 用于形成微图案的模具用树脂组合物包含(A)40〜90重量份的具有反应性基团的活性能固化性氨基甲酸酯类低聚物; (B)10〜60重量份与氨基甲酸酯类低聚物反应的单体,(C)0.01〜200重量份的含硅或氟化合物,基于100份(A)成分的总和, 和(B); 和(D)基于100份(A),(B)和(C)组分的总和,0.1至10重量份的光引发剂。 本发明的树脂组合物可以通过活性能量射线的作用而容易地固化,并且由其制造的有机模具容易地从母料中脱离而不会产生不可逆的粘附或产生缺陷,并具有优异的尺寸和化学稳定性。

    Method for forming a mask pattern

    公开(公告)号:US06750073B2

    公开(公告)日:2004-06-15

    申请号:US10261708

    申请日:2002-09-30

    IPC分类号: H01L2100

    摘要: A mask pattern is formed on a substrate by using a solvent absorbent mold having a pattern structure with a relief and an intaglio portion. A mask layer dissolved in a solvent to obtain fluidity is prepared on the substrate. The mold is pressed onto the mask layer with a predetermined pressure, and a portion of the mask layer that contacts with the relief portion of the mold is introduced into the intaglio portion thereof. Then, the mold absorbs the solvent contained in the mask layer to thereby solidify the mask layer. Next, the mold is separated from the substrate and the portion of the mask layer that contacts with the relief portion of the mold is removed, thus finally obtaining the desired minute mask pattern.