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公开(公告)号：US11932900B2
公开(公告)日：2024-03-19
申请号：US17973327
申请日：2022-10-25
Applicant: ILLUMINA, INC. , ILLUMINA CAMBRIDGE LIMITED
Inventor： Wayne N. George , Alexandre Richez , M. Shane Bowen , Andrew A. Brown , Dajun Yuan , Audrey Rose Zak , Sean M. Ramirez , Raymond Campos
IPC: C08J7/04 , C09D133/26 , C09D183/06 , C12Q1/68 , C08G77/14
CPC classification number: C12Q1/68 , C09D133/26 , C09D183/06 , C08G77/14
Abstract: An example of an array includes a support, a cross-linked epoxy polyhedral oligomeric silsesquioxane (POSS) resin film on a surface of the support, and a patterned hydrophobic polymer layer on the cross-linked epoxy POSS resin film. The patterned hydrophobic polymer layer defines exposed discrete areas of the cross-linked epoxy POSS resin film, and a polymer coating is attached to the exposed discrete areas. Another example of an array includes a support, a modified epoxy POSS resin film on a surface of the support, and a patterned hydrophobic polymer layer on the modified epoxy POSS resin film. The modified epoxy POSS resin film includes a polymer growth initiation site, and the patterned hydrophobic polymer layer defines exposed discrete areas of the modified epoxy POSS resin film. A polymer brush is attached to the polymer growth initiation site in the exposed discrete areas.
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公开(公告)号：US20180178416A1
公开(公告)日：2018-06-28
申请号：US15847150
申请日：2017-12-19
Applicant: Illumina, Inc. , Illumina Cambridge Limited
Inventor： Alexandre Richez , Andrew A. Brown , Julia Morrison , Wayne N. George , Timothy J. Merkel , Audrey Rose Zak
Abstract: An imprinting apparatus includes a silicon master having a plurality of nanofeatures defined therein. An anti-stick layer coats the silicon master, the anti-stick layer including a molecule having a cyclosiloxane with at least one silane functional group. A method includes forming a master template by: depositing a formulation on a silicon master including a plurality of nanofeatures defined therein, the formulation including a solvent and a molecule having a cyclosiloxane with at least one silane functional group; and curing the formulation, thereby forming an anti-stick layer on the silicon master, the anti-stick layer including the molecule. The method further includes depositing a silicon-based working stamp material on the anti-stick layer of the master template; curing the silicon-based working stamp material to form a working stamp including a negative replica of the plurality of nanofeatures; and releasing the working stamp from the master template.
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公开(公告)号：US20250114980A1
公开(公告)日：2025-04-10
申请号：US18964377
申请日：2024-11-30
Applicant: ILLUMINA, INC. , ILLUMINA CAMBRIDGE LIMITED
Inventor： Alexandre Richez , Andrew A. Brown , Julia Morrison , Wayne N. George , Timothy J. Merkel , Audrey Rose Zak
Abstract: An imprinting apparatus includes a silicon master having a plurality of nanofeatures defined therein. An anti-stick layer coats the silicon master, the anti-stick layer including a molecule having a cyclosiloxane with at least one silane functional group. A method includes forming a master template by: depositing a formulation on a silicon master including a plurality of nanofeatures defined therein, the formulation including a solvent and a molecule having a cyclosiloxane with at least one silane functional group; and curing the formulation, thereby forming an anti-stick layer on the silicon master, the anti-stick layer including the molecule. The method further includes depositing a silicon-based working stamp material on the anti-stick layer of the master template; curing the silicon-based working stamp material to form a working stamp including a negative replica of the plurality of nanofeatures; and releasing the working stamp from the master template.
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公开(公告)号：US12157252B2
公开(公告)日：2024-12-03
申请号：US17541089
申请日：2021-12-02
Applicant: Illumina, Inc. , Illumina Cambridge Limited
Inventor： Alexandre Richez , Andrew A. Brown , Julia Morrison , Wayne N. George , Timothy J. Merkel , Audrey Rose Zak
Abstract: An imprinting apparatus includes a silicon master having a plurality of nanofeatures defined therein. An anti-stick layer coats the silicon master, the anti-stick layer including a molecule having a cyclosiloxane with at least one silane functional group. A method includes forming a master template by: depositing a formulation on a silicon master including a plurality of nanofeatures defined therein, the formulation including a solvent and a molecule having a cyclosiloxane with at least one silane functional group; and curing the formulation, thereby forming an anti-stick layer on the silicon master, the anti-stick layer including the molecule. The method further includes depositing a silicon-based working stamp material on the anti-stick layer of the master template; curing the silicon-based working stamp material to form a working stamp including a negative replica of the plurality of nanofeatures; and releasing the working stamp from the master template.
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Patent Agency Ranking
公开(公告)号：US20220088834A1
公开(公告)日：2022-03-24
申请号：US17541089
申请日：2021-12-02
Applicant: Illumina, Inc. , Illumina Cambridge Limited
Inventor： Alexandre Richez , Andrew A. Brown , Julia Morrison , Wayne N. George , Timothy J. Merkel , Audrey Rose Zak
IPC: B29C33/38 , C09D133/26 , B29C59/02 , G03F7/00 , B29C33/40
Abstract: An imprinting apparatus includes a silicon master having a plurality of nanofeatures defined therein. An anti-stick layer coats the silicon master, the anti-stick layer including a molecule having a cyclosiloxane with at least one silane functional group. A method includes forming a master template by: depositing a formulation on a silicon master including a plurality of nanofeatures defined therein, the formulation including a solvent and a molecule having a cyclosiloxane with at least one silane functional group; and curing the formulation, thereby forming an anti-stick layer on the silicon master, the anti-stick layer including the molecule. The method further includes depositing a silicon-based working stamp material on the anti-stick layer of the master template; curing the silicon-based working stamp material to form a working stamp including a negative replica of the plurality of nanofeatures; and releasing the working stamp from the master template.
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公开(公告)号：US20180179575A1
公开(公告)日：2018-06-28
申请号：US15848640
申请日：2017-12-20
Applicant: ILLUMINA, INC. , ILLUMINA CAMBRIDGE LIMITED
Inventor： Wayne N. George , Alexandre Richez , M. Shane Bowen , Andrew A. Brown , Dajun M. Yuan , Audrey Rose Zak , Sean M. Ramirez , Raymond Campos
IPC: C12Q1/68 , C09D183/06 , C09D133/26
Abstract: An example of an array includes a support, a cross-linked epoxy polyhedral oligomeric silsesquioxane (POSS) resin film on a surface of the support, and a patterned hydrophobic polymer layer on the cross-linked epoxy POSS resin film. The patterned hydrophobic polymer layer defines exposed discrete areas of the cross-linked epoxy POSS resin film, and a polymer coating is attached to the exposed discrete areas. Another example of an array includes a support, a modified epoxy POSS resin film on a surface of the support, and a patterned hydrophobic polymer layer on the modified epoxy POSS resin film. The modified epoxy POSS resin film includes a polymer growth initiation site, and the patterned hydrophobic polymer layer defines exposed discrete areas of the modified epoxy POSS resin film. A polymer brush is attached to the polymer growth initiation site in the exposed discrete areas.
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公开(公告)号：US20240209412A1
公开(公告)日：2024-06-27
申请号：US18590738
申请日：2024-02-28
Applicant: ILLUMINA, INC.
Inventor： Wayne N. George , Alexandre Richez , M. Shane Bowen , Andrew A. Brown , Dajun Yuan , Audrey Rose Zak , Sean M. Ramirez , Raymond Campos
IPC: C12Q1/68 , C08G77/14 , C09D133/26 , C09D183/06
CPC classification number: C12Q1/68 , C09D133/26 , C09D183/06 , C08G77/14
Abstract: An example of an array includes a support, a cross-linked epoxy polyhedral oligomeric silsesquioxane (POSS) resin film on a surface of the support, and a patterned hydrophobic polymer layer on the cross-linked epoxy POSS resin film. The patterned hydrophobic polymer layer defines exposed discrete areas of the cross-linked epoxy POSS resin film, and a polymer coating is attached to the exposed discrete areas. Another example of an array includes a support, a modified epoxy POSS resin film on a surface of the support, and a patterned hydrophobic polymer layer on the modified epoxy POSS resin film. The modified epoxy POSS resin film includes a polymer growth initiation site, and the patterned hydrophobic polymer layer defines exposed discrete areas of the modified epoxy POSS resin film. A polymer brush is attached to the polymer growth initiation site in the exposed discrete areas.
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公开(公告)号：US11512339B2
公开(公告)日：2022-11-29
申请号：US15848640
申请日：2017-12-20
Applicant: ILLUMINA, INC. , ILLUMINA CAMBRIDGE LIMITED
Inventor： Wayne N. George , Alexandre Richez , M. Shane Bowen , Andrew A. Brown , Dajun Yuan , Audrey Rose Zak , Sean M. Ramirez , Raymond Campos
IPC: C09D183/06 , C12Q1/68 , C09D133/26 , C08G77/14
Abstract: An example of an array includes a support, a cross-linked epoxy polyhedral oligomeric silsesquioxane (POSS) resin film on a surface of the support, and a patterned hydrophobic polymer layer on the cross-linked epoxy POSS resin film. The patterned hydrophobic polymer layer defines exposed discrete areas of the cross-linked epoxy POSS resin film, and a polymer coating is attached to the exposed discrete areas. Another example of an array includes a support, a modified epoxy POSS resin film on a surface of the support, and a patterned hydrophobic polymer layer on the modified epoxy POSS resin film. The modified epoxy POSS resin film includes a polymer growth initiation site, and the patterned hydrophobic polymer layer defines exposed discrete areas of the modified epoxy POSS resin film. A polymer brush is attached to the polymer growth initiation site in the exposed discrete areas.
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公开(公告)号：US11213976B2
公开(公告)日：2022-01-04
申请号：US15847150
申请日：2017-12-19
Applicant: Illumina, Inc. , Illumina Cambridge Limited
Inventor： Alexandre Richez , Andrew A. Brown , Julia Morrison , Wayne N. George , Timothy J. Merkel , Audrey Rose Zak
Abstract: An imprinting apparatus includes a silicon master having a plurality of nanofeatures defined therein. An anti-stick layer coats the silicon master, the anti-stick layer including a molecule having a cyclosiloxane with at least one silane functional group. A method includes forming a master template by: depositing a formulation on a silicon master including a plurality of nanofeatures defined therein, the formulation including a solvent and a molecule having a cyclosiloxane with at least one silane functional group; and curing the formulation, thereby forming an anti-stick layer on the silicon master, the anti-stick layer including the molecule. The method further includes depositing a silicon-based working stamp material on the anti-stick layer of the master template; curing the silicon-based working stamp material to form a working stamp including a negative replica of the plurality of nanofeatures; and releasing the working stamp from the master template.
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