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公开(公告)号:US20230295455A1
公开(公告)日:2023-09-21
申请号:US18013188
申请日:2021-10-19
Applicant: ILLUMINA, INC.
Inventor: Raymond Campos , Brian D. Mather , Sean M. Ramirez
IPC: C09D133/24
CPC classification number: C09D133/24
Abstract: A flow cell includes a substrate and a copolymer coating. The copolymer coating includes copolymer chains, each having recurring units of formula (I): and formula (II):. In formula (I), R1 is —H, a halogen, an alkyl, an alkoxy, an alkenyl, an alkynyl, a cycloalkyl, an aryl, a heteroaryl, a heterocycle, or optionally substituted variants thereof; R2 is an azido; each (CH2)p can be optionally substituted; and p is an integer from 1 to 50. In formula (II), each of R3, R3′, R4, R4′ is —H, R5, —OR5, —C(O)OR5, —C(O)R5, —OC(O)R5, —C(O)NR6R7, or —NR6R7; R5 is —H, —OH, an alkyl, a cycloalkyl, a hydroxyalkyl, an aryl, a heteroaryl, a heterocycle, or optionally substituted variants thereof; and each of R6 and R7 is —H or an alkyl. Some copolymer chains include at least one alkoxyamine end group.
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公开(公告)号:US11932900B2
公开(公告)日:2024-03-19
申请号:US17973327
申请日:2022-10-25
Applicant: ILLUMINA, INC. , ILLUMINA CAMBRIDGE LIMITED
Inventor: Wayne N. George , Alexandre Richez , M. Shane Bowen , Andrew A. Brown , Dajun Yuan , Audrey Rose Zak , Sean M. Ramirez , Raymond Campos
IPC: C08J7/04 , C09D133/26 , C09D183/06 , C12Q1/68 , C08G77/14
CPC classification number: C12Q1/68 , C09D133/26 , C09D183/06 , C08G77/14
Abstract: An example of an array includes a support, a cross-linked epoxy polyhedral oligomeric silsesquioxane (POSS) resin film on a surface of the support, and a patterned hydrophobic polymer layer on the cross-linked epoxy POSS resin film. The patterned hydrophobic polymer layer defines exposed discrete areas of the cross-linked epoxy POSS resin film, and a polymer coating is attached to the exposed discrete areas. Another example of an array includes a support, a modified epoxy POSS resin film on a surface of the support, and a patterned hydrophobic polymer layer on the modified epoxy POSS resin film. The modified epoxy POSS resin film includes a polymer growth initiation site, and the patterned hydrophobic polymer layer defines exposed discrete areas of the modified epoxy POSS resin film. A polymer brush is attached to the polymer growth initiation site in the exposed discrete areas.
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公开(公告)号:US20240209412A1
公开(公告)日:2024-06-27
申请号:US18590738
申请日:2024-02-28
Applicant: ILLUMINA, INC.
Inventor: Wayne N. George , Alexandre Richez , M. Shane Bowen , Andrew A. Brown , Dajun Yuan , Audrey Rose Zak , Sean M. Ramirez , Raymond Campos
IPC: C12Q1/68 , C08G77/14 , C09D133/26 , C09D183/06
CPC classification number: C12Q1/68 , C09D133/26 , C09D183/06 , C08G77/14
Abstract: An example of an array includes a support, a cross-linked epoxy polyhedral oligomeric silsesquioxane (POSS) resin film on a surface of the support, and a patterned hydrophobic polymer layer on the cross-linked epoxy POSS resin film. The patterned hydrophobic polymer layer defines exposed discrete areas of the cross-linked epoxy POSS resin film, and a polymer coating is attached to the exposed discrete areas. Another example of an array includes a support, a modified epoxy POSS resin film on a surface of the support, and a patterned hydrophobic polymer layer on the modified epoxy POSS resin film. The modified epoxy POSS resin film includes a polymer growth initiation site, and the patterned hydrophobic polymer layer defines exposed discrete areas of the modified epoxy POSS resin film. A polymer brush is attached to the polymer growth initiation site in the exposed discrete areas.
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公开(公告)号:US11512339B2
公开(公告)日:2022-11-29
申请号:US15848640
申请日:2017-12-20
Applicant: ILLUMINA, INC. , ILLUMINA CAMBRIDGE LIMITED
Inventor: Wayne N. George , Alexandre Richez , M. Shane Bowen , Andrew A. Brown , Dajun Yuan , Audrey Rose Zak , Sean M. Ramirez , Raymond Campos
IPC: C09D183/06 , C12Q1/68 , C09D133/26 , C08G77/14
Abstract: An example of an array includes a support, a cross-linked epoxy polyhedral oligomeric silsesquioxane (POSS) resin film on a surface of the support, and a patterned hydrophobic polymer layer on the cross-linked epoxy POSS resin film. The patterned hydrophobic polymer layer defines exposed discrete areas of the cross-linked epoxy POSS resin film, and a polymer coating is attached to the exposed discrete areas. Another example of an array includes a support, a modified epoxy POSS resin film on a surface of the support, and a patterned hydrophobic polymer layer on the modified epoxy POSS resin film. The modified epoxy POSS resin film includes a polymer growth initiation site, and the patterned hydrophobic polymer layer defines exposed discrete areas of the modified epoxy POSS resin film. A polymer brush is attached to the polymer growth initiation site in the exposed discrete areas.
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公开(公告)号:US20180179575A1
公开(公告)日:2018-06-28
申请号:US15848640
申请日:2017-12-20
Applicant: ILLUMINA, INC. , ILLUMINA CAMBRIDGE LIMITED
Inventor: Wayne N. George , Alexandre Richez , M. Shane Bowen , Andrew A. Brown , Dajun M. Yuan , Audrey Rose Zak , Sean M. Ramirez , Raymond Campos
IPC: C12Q1/68 , C09D183/06 , C09D133/26
Abstract: An example of an array includes a support, a cross-linked epoxy polyhedral oligomeric silsesquioxane (POSS) resin film on a surface of the support, and a patterned hydrophobic polymer layer on the cross-linked epoxy POSS resin film. The patterned hydrophobic polymer layer defines exposed discrete areas of the cross-linked epoxy POSS resin film, and a polymer coating is attached to the exposed discrete areas. Another example of an array includes a support, a modified epoxy POSS resin film on a surface of the support, and a patterned hydrophobic polymer layer on the modified epoxy POSS resin film. The modified epoxy POSS resin film includes a polymer growth initiation site, and the patterned hydrophobic polymer layer defines exposed discrete areas of the modified epoxy POSS resin film. A polymer brush is attached to the polymer growth initiation site in the exposed discrete areas.
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