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公开(公告)号:US20240088087A1
公开(公告)日:2024-03-14
申请号:US18509357
申请日:2023-11-15
Applicant: Infineon Technologies AG
Inventor: Alexander HEINRICH , Michael JUERSS , Konrad ROESL , Oliver EICHINGER , Kok Chai GOH , Tobias SCHMIDT
IPC: H01L23/00 , H01L23/482 , H01L23/495 , H01L29/43 , H01L29/45
CPC classification number: H01L24/32 , H01L23/4827 , H01L23/49513 , H01L23/49541 , H01L23/49582 , H01L24/03 , H01L24/05 , H01L24/08 , H01L24/27 , H01L24/29 , H01L24/83 , H01L29/43 , H01L29/45 , H01L2224/03438 , H01L2224/0345 , H01L2224/04026 , H01L2224/05083 , H01L2224/05124 , H01L2224/05139 , H01L2224/05166 , H01L2224/05171 , H01L2224/05184 , H01L2224/05639 , H01L2224/05644 , H01L2224/05647 , H01L2224/05655 , H01L2224/05669 , H01L2224/08503 , H01L2224/2745 , H01L2224/29082 , H01L2224/29084 , H01L2224/291 , H01L2224/29101 , H01L2224/29105 , H01L2224/29109 , H01L2224/29111 , H01L2224/29113 , H01L2224/29118 , H01L2224/29124 , H01L2224/29139 , H01L2224/29144 , H01L2224/29147 , H01L2224/29155 , H01L2224/29166 , H01L2224/29169 , H01L2224/29171 , H01L2224/29184 , H01L2224/32225 , H01L2224/32245 , H01L2224/32503 , H01L2224/32507 , H01L2224/83191 , H01L2224/83439 , H01L2224/83444 , H01L2224/83447 , H01L2224/83455 , H01L2224/8346 , H01L2224/83464 , H01L2224/83469 , H01L2224/83815 , H01L2924/01028 , H01L2924/01029 , H01L2924/01046 , H01L2924/01047 , H01L2924/01048 , H01L2924/01074 , H01L2924/01078 , H01L2924/01079 , H01L2924/0132 , H01L2924/01327 , H01L2924/014 , H01L2924/10253 , H01L2924/1305 , H01L2924/13055 , H01L2924/13091 , H01L2924/1461 , H01L2924/17738 , H01L2924/17747 , H01L2924/1776
Abstract: An electronic device with a multi-layer contact and a system is disclosed. In an embodiment, a semiconductor device includes a semiconductor substrate having a first electrode terminal located on a first surface and a second surface electrode terminal located on a second surface, the first surface being opposite to the second surface, an electrical contact layer disposed directly on the first electrode terminal, a functional layer directly disposed on the electrical contact layer, an adhesion layer directly disposed on the functional layer, a solder layer directly disposed on the adhesion layer; and a protection layer directly disposed on the solder layer, wherein the semiconductor device is a power semiconductor device configured to provide a vertical current flow.