Abstract:
A method for forming a battery element includes etching trenches into a substrate and crystal orientation dependent etching of the trenches. Further, the method includes forming solid state battery structures within the trenches.
Abstract:
A semiconductor device comprises a transistor formed in a semiconductor body having a first main surface. The transistor comprises a source region, a drain region, a channel region, a drift zone, a source contact electrically connected to the source region, a drain contact electrically connected to the drain region, and a gate electrode at the channel region. The channel region and the drift zone are disposed along a first direction between the source region and the drain region, the first direction being parallel to the first main surface. The channel region has a shape of a first ridge extending along the first direction. One of the source contact and the drain contact is adjacent to the first main surface, the other one of the source contact and the drain contact is adjacent to a second main surface that is opposite to the first main surface.
Abstract:
A method for forming a battery element includes etching trenches into a substrate and crystal orientation dependent etching of the trenches. Further, the method includes forming solid state battery structures within the trenches.
Abstract:
A battery element includes a substrate with a plurality of trenches extending into the substrate. At least a part of each trench of the plurality of trenches is filled with a solid state battery structure. Further, the battery element includes a front side battery element electrode arranged at a front side of the substrate and electrically connected to a first electrode layer of the solid state battery structures within the plurality of trenches. Additionally, the battery element includes a backside battery element electrode arranged at a backside of the substrate and electrically connected to a second electrode layer of the solid state battery structures within the plurality of trenches.
Abstract:
A semiconductor device comprises a transistor formed in a semiconductor body having a first main surface. The transistor comprises a source region, a drain region, a channel region, a drift zone, a source contact electrically connected to the source region, a drain contact electrically connected to the drain region, and a gate electrode at the channel region. The channel region and the drift zone are disposed along a first direction between the source region and the drain region, the first direction being parallel to the first main surface. The channel region has a shape of a first ridge extending along the first direction. One of the source contact and the drain contact is adjacent to the first main surface, the other one of the source contact and the drain contact is adjacent to a second main surface that is opposite to the first main surface.
Abstract:
A semiconductor device includes a transistor in a semiconductor body having a first main surface. The transistor includes: a source contact electrically connected to a source region; a drain contact electrically connected to a drain region; a gate electrode at the channel region, the channel region and a drift zone disposed along a first direction between the source and drain regions, the first direction being parallel to the first main surface, the channel region patterned into a ridge by adjacent gate trenches formed in the first main surface, the adjacent gate trenches spaced apart in a second direction perpendicular to the first direction, a longitudinal axis of the ridge extending in the first direction and a longitudinal axis of the gate trenches extending in the first direction; and at least one of the source and drain contacts being adjacent to a second main surface opposite the first main surface.
Abstract:
A battery element includes a substrate with a plurality of trenches extending into the substrate. At least a part of each trench of the plurality of trenches is filled with a solid state battery structure. Further, the battery element includes a front side battery element electrode arranged at a front side of the substrate and electrically connected to a first electrode layer of the solid state battery structures within the plurality of trenches. Additionally, the battery element includes a backside battery element electrode arranged at a backside of the substrate and electrically connected to a second electrode layer of the solid state battery structures within the plurality of trenches.
Abstract:
A semiconductor device includes a transistor in a semiconductor body having a first main surface. The transistor includes: a source contact electrically connected to a source region; a drain contact electrically connected to a drain region; a gate electrode at the channel region, the channel region and a drift zone disposed along a first direction between the source and drain regions, the first direction being parallel to the first main surface, the channel region patterned into a ridge by adjacent gate trenches formed in the first main surface, the adjacent gate trenches spaced apart in a second direction perpendicular to the first direction, a longitudinal axis of the ridge extending in the first direction and a longitudinal axis of the gate trenches extending in the first direction; and at least one of the source and drain contacts being adjacent to a second main surface opposite the first main surface.
Abstract:
A semiconductor device is described that includes a transistor chain which is configured as a stacked switch device that switches on and off in response to a drive voltage. The transistor chain includes a first transistor connected in series to a plurality of second transistors. Each transistor in the transistor chain is located at a particular position in the transistor chain according to at least one of a respective capacitance of the transistor and a respective threshold voltage of the transistor.