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公开(公告)号:US20230299123A1
公开(公告)日:2023-09-21
申请号:US17698939
申请日:2022-03-18
申请人: Intel Corporation
发明人: Qiang Yu , Gwang-Soo Kim , Said Rami
IPC分类号: H01L49/02 , H01L23/00 , H01L23/522 , H01L25/065
CPC分类号: H01L28/10 , H01L24/08 , H01L23/5227 , H01L24/06 , H01L25/0657 , H01L2224/08145 , H01L2224/08121 , H01L2224/06051 , H01L2224/0603 , H01L2224/0615 , H01L2224/0613 , H01L25/0652
摘要: In one embodiment, an apparatus includes a first integrated circuit die with metal bonding pads that are co-planar with an external surface of the die and a second integrated circuit die with metal bonding pads that are co-planar with an external surface of the die. The first and second integrated circuit dies are coupled together such that their external surfaces are in contact and the metal pads of the first integrated circuit die are in direct contact with respective metal pads of the second integrated circuit die. The apparatus also includes an inductor formed at least partially by the metal pads of the first integrated circuit die and the metal pads of the second integrated circuit die.
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公开(公告)号:US20230207525A1
公开(公告)日:2023-06-29
申请号:US17561845
申请日:2021-12-24
申请人: Intel Corporation
发明人: Debendra Mallik , Sriram Srinivasan , Christopher Pelto , Gwang-Soo Kim , Nitin Deshpande , Omkar Karhade
IPC分类号: H01L25/065 , H01L23/00 , H01L23/31
CPC分类号: H01L25/0657 , H01L23/3185 , H01L24/08 , H01L24/16 , H01L24/73 , H01L2224/08145 , H01L2224/16145 , H01L2224/73253 , H01L2225/06568
摘要: A packaged device comprises first die stack and a third die. The first die stack includes a first die comprising first conductive contacts each at a first side of the first die, and a second die comprising second conductive contacts each at a second side of the second die. First solder bonds which each extend to a respective one of the first conductive contacts. The third die comprises third conductive contacts each at a third side of the third die. The third die is coupled to the first die stack via second solder bonds which each extend to a respective one of the second conductive contacts, and to a respective one of the third conductive contacts. Each die of the first die stack is coupled to each of a respective one or more other dies of the first die stack via respective hybrid bonds.
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公开(公告)号:US20230197637A1
公开(公告)日:2023-06-22
申请号:US17554471
申请日:2021-12-17
申请人: Intel Corporation
发明人: Debendra Mallik , Mohammad Enamul Kabir , Nitin Deshpande , Omkar Karhade , Arnab Sarkar , Sairam Agraharam , Christopher Pelto , Gwang-Soo Kim , Ravindranath Mahajan
IPC分类号: H01L23/00 , H01L25/065
CPC分类号: H01L23/564 , H01L25/0655 , H01L21/447
摘要: Stacked die assemblies having a moisture sealant layer according to embodiments are described herein. A microelectronic package structure having a first die with a second and an adjacent third die on the first die. Each of the second and third die comprise hybrid bonding interfaces with the first die. A first layer is on a region of the first die adjacent sidewalls of the second and the third dies, and adjacent an edge portion of the first die. The first layer comprises a diffusion barrier material A second layer is over the first layer, the second layer, wherein a top surface of the second layer is substantially coplanar with the top surfaces of the second and third dies. The first layer provides a hermetic moisture sealant layer for stacked die package structures.
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公开(公告)号:US11444148B2
公开(公告)日:2022-09-13
申请号:US16222253
申请日:2018-12-17
申请人: Intel Corporation
发明人: Gwang-Soo Kim , Aaron D. Lilak , Kumhyo Byon , Doug Ingerly
摘要: An inductor is disclosed. The inductor includes a vertically coiled conductor, a metal contact coupled to a first end of the vertically coiled conductor, and a dielectric material coupled to the metal contact. A tunable high permittivity component is coupled to a second end of the vertically coiled conductor.
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公开(公告)号:US20230207486A1
公开(公告)日:2023-06-29
申请号:US17561833
申请日:2021-12-24
申请人: Intel Corporation
IPC分类号: H01L23/00 , H01L23/522 , H01L23/532 , H01L21/768
CPC分类号: H01L23/562 , H01L23/5226 , H01L23/53295 , H01L21/76802 , H01L21/76877
摘要: An integrated circuit (IC) die comprises a first metallization layer comprising first interconnect structures which each extend through the first metallization layer, a second metallization layer comprising second interconnect structures which each extend through the second metallization layer, an interlayer dielectric (ILD) stack between the first metallization layer and the second metallization layer. The ILD stack comprises a stress modulation layer on the first metallization layer and a capping layer on the stress modulation layer. A first intrinsic stress in a first material of the stress modulation layer is to mitigate a second intrinsic stress in the first metallization layer.
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公开(公告)号:US10811354B2
公开(公告)日:2020-10-20
申请号:US16306538
申请日:2016-06-30
申请人: Intel Corporation
发明人: Gwang-Soo Kim , Doug B. Ingerly
IPC分类号: H01L23/525 , H01L21/768 , H01L23/62
摘要: Embodiments of the present disclosure describe apparatuses, methods, and systems associated with a fuse array of an integrated circuit. An integrated circuit may include a first metallization layer including a plurality of trenches separated by an interlayer dielectric (ILD), wherein the ILD forms a protrusion that extends above a top surface of the trenches. An etch stop layer may be disposed on the first metallization layer. The integrated circuit may further include a fuse disposed on the etch stop layer, wherein the fuse includes a fuse channel coupled between an anode and a cathode, wherein the fuse channel is disposed directly above the protrusion and is in contact with the etch stop layer. The integrated circuit may additionally or alternatively include one or more dummy regions adjacent to the fuse channel and separated from the fuse channel by a dielectric material. Other embodiments may be described and/or claimed.
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