STRUCTURE AND PROCESS FOR WARPAGE REDUCTION
    3.
    发明公开

    公开(公告)号:US20240186263A1

    公开(公告)日:2024-06-06

    申请号:US18060574

    申请日:2022-12-01

    CPC classification number: H01L23/562 H01L24/13 H01L2224/32225 H01L2924/3511

    Abstract: The present disclosure is directed to a semiconductor carrier platform having a support panel with a top surface and a bottom surface, with the top surface providing a working surface for assembling IC packages using panel-level packaging technology. In an aspect, a backside molding layer may be positioned on the bottom surface of the support panel to prevent or correct any panel warpage. In another aspect, a removable film may be positioned between the bottom surface of the support panel and the backside molding layer to allow the support panel to be readily cleaned and reused.

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