公开(公告)号：US11003079B2

公开(公告)日：2021-05-11

申请号：US16205502

申请日：2018-11-30

Applicant: JSR CORPORATION

Inventor： Naoya Nosaka ,  Gouji Wakamatsu ,  Tsubasa Abe ,  Yuushi Matsumura ,  Masayuki Miyake ,  Yoshio Takimoto

IPC: G03F7/00 ,  G03F7/11 ,  G03F7/26 ,  G03F7/09 ,  C08F34/02 ,  C09D161/12 ,  C08G8/20 ,  C07D311/74 ,  C07D311/92 ,  C07D405/14 ,  C08G61/10 ,  C09D165/00 ,  H01L21/027 ,  C08J5/18

Abstract: The composition for film formation includes a compound including a group of the formula (1) and a solvent. In the formula (1), R1 to R4 each independently represent a hydrogen atom, a monovalent organic group having 1 to 20 carbon atoms, or R1 to R4 taken together represent a cyclic structure having 3 to 20 ring atoms together with the carbon atom or a carbon chain to which R1 to R4 bond. Ar1 represents a group obtained by removing (n+3) hydrogen atoms from an aromatic ring of an arene having 6 to 20 carbon atoms. n is an integer of 0 to 9. R5 represents a hydroxy group, a halogen atom, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms.

公开(公告)号：US20230041656A1

公开(公告)日：2023-02-09

申请号：US17942332

申请日：2022-09-12

Applicant: JSR CORPORATION

Inventor： Yugaku TAKAGI ,  Tsubasa Abe ,  Takashi Katagiri ,  Satoshi Dei ,  Kazunori Takanashi ,  Yuya Hayashi

IPC: C08G8/12 ,  C08F220/22 ,  C08F216/02 ,  C08G8/24 ,  G03F7/11 ,  H01L21/027

Abstract: A composition includes: a compound including an aromatic ring; and a first polymer including a first structural unit represented by formula (1) and a second structural unit represented by formula (2). A content of the first polymer with respect to 100 parts by mass of the compound is no less than 0.1 parts by mass and no greater than 200 parts by mass. R1 represents a hydrogen atom or a substituted or unsubstituted monovalent hydrocarbon group; and R2 represents a substituted or unsubstituted monovalent hydrocarbon group. R3 represents a hydrogen atom or a substituted or unsubstituted monovalent hydrocarbon group; L represents a single bond or a divalent linking group; Ar represents a group obtained by removing (n+1) hydrogen atoms from a substituted or unsubstituted aromatic ring; R4 represents a hydroxy group or a monovalent hydroxyalkyl group; and n is an integer of 1 to 8.

公开(公告)号：US10053539B2

公开(公告)日：2018-08-21

申请号：US14955473

申请日：2015-12-01

Applicant: JSR Corporation

Inventor： Shin-ya Nakafuji ,  Goji Wakamatsu ,  Tsubasa Abe ,  Kazunori Sakai

IPC: H01L21/308 ,  H01L21/027 ,  H01L21/306 ,  C08G65/40

CPC classification number: C08G65/4043 ,  C08G65/40 ,  C08G65/4031 ,  G03F7/094 ,  H01L21/0271 ,  H01L21/0274 ,  H01L21/30604 ,  H01L21/3081

Abstract: A composition comprises a compound comprising a partial structure represented by formula (1) and comprising an intermolecular bond-forming group; and a solvent. X1 and X2 each independently represent a substituted or unsubstituted ring structure having 4 to 10 ring atoms constituted taken together with a spiro carbon atom and carbon atoms of an aromatic ring. R1 and R2 each independently represent a halogen atom, a hydroxy group, a nitro group or a monovalent organic group. a1 and a2 are each independently an integer of 0 to 8. n1 and n2 are each independently an integer of 0 to 2; k1 and k2 are each independently an integer of 0 to 8. A sum of k1 and k2 is no less than 1, and a sum of a1 and k1. A sum of a2 and k2 are no greater than 8.

公开(公告)号：US09620378B1

公开(公告)日：2017-04-11

申请号：US14757551

申请日：2015-12-24

Applicant: JSR Corporation

Inventor： Shin-ya Nakafuji ,  Goji Wakamatsu ,  Tsubasa Abe ,  Kazunori Sakai

IPC: G03F7/11 ,  H01L21/308 ,  H01L21/027 ,  C09D7/12 ,  C09D201/00 ,  C09D171/08 ,  C07C255/54 ,  C09D171/12

CPC classification number: C09D201/00 ,  C07C255/54 ,  C09D171/12 ,  G03F7/094

Abstract: A composition comprises: a compound having one partial structure represented by formula (1), and a solvent. n1 and n2 are each independently an integer of 0 to 2; and k1 and k2 are each independently an integer of 0 to 9. The compound preferably has an intermolecular bond-forming group. The compound is preferably represented by formula (2). Z represents the partial structure represented by the formula (1); Ar1 and Ar2 represent a substituted or unsubstituted arenediyl group having 6 to 20 carbon atoms; Ar3 and Ar4 represent a substituted or unsubstituted aryl group having 6 to 20 carbon atoms; and p1 and p2 are each independently an integer of 0 to 3.

公开(公告)号：US11243468B2

公开(公告)日：2022-02-08

申请号：US16564499

申请日：2019-09-09

Applicant: JSR CORPORATION

Inventor： Naoya Nosaka ,  Goji Wakamatsu ,  Tsubasa Abe ,  Ichihiro Miura ,  Kengo Ehara ,  Hiroki Nakatsu ,  Hiroki Nakagawa

IPC: G03F7/20 ,  G03F7/038 ,  G03F7/09 ,  C08G61/12 ,  G03F7/039 ,  C08G61/04

Abstract: A composition for resist underlayer film formation contains: a compound having a partial structure represented by the following formula (1); and a solvent. In the formula (1): X represents a group represented by formula (i), (ii), (iii) or (iv). In the formula (i): R1 and R2 each independently represent a hydrogen atom, a substituted or unsubstituted monovalent aliphatic hydrocarbon group having 1 to 20 carbon atoms, or a substituted or unsubstituted aralkyl group having 7 to 20 carbon atoms provided that at least one of R1 and R2 represents the substituted or unsubstituted monovalent aliphatic hydrocarbon group having 1 to 20 carbon atoms or the substituted or unsubstituted aralkyl group having 7 to 20 carbon atoms; or R1 and R2 taken together represent a part of a ring structure having 3 to 20 ring atoms together with the carbon atom to which R1 and R2 bond.

公开(公告)号：US20180348633A1

公开(公告)日：2018-12-06

申请号：US16100501

申请日：2018-08-10

Applicant: JSR CORPORATION

Inventor： Goji Wakamatsu ,  Naoya Nosaka ,  Tsubasa Abe ,  Kazunori Sakai ,  Yuushi Matsumura ,  Hayato Namai

IPC: G03F7/039 ,  G03F7/11 ,  G03F7/26

CPC classification number: G03F7/11 ,  G03F7/26 ,  H01L21/027

Abstract: A composition for resist underlayer film formation, includes a first compound and a solvent. The first compound includes a first group represented by formula (1) and a partial structure comprising an aromatic ring. In the formula (1), R1 represents a single bond or an oxygen atom, R2 represents a divalent chain or alicyclic hydrocarbon group having 1 to 30 carbon atoms, and * denotes a bonding site to a moiety other than the first group of the first compound. *—R1-R2—CN  (1)

公开(公告)号：US20160314984A1

公开(公告)日：2016-10-27

申请号：US15134508

申请日：2016-04-21

Applicant: JSR CORPORATION

Inventor： Yuushi MATSUMURA ,  Goji Wakamatsu ,  Naoya Nosaka ,  Tsubasa Abe ,  Yoshio Takimoto

IPC: H01L21/308 ,  G03F7/11 ,  H01L21/3065

CPC classification number: G03F7/11 ,  C08G8/22 ,  C08G8/30 ,  C09D161/14 ,  G03F7/0041 ,  G03F7/094 ,  H01L21/0271

Abstract: A method comprises applying a composition on a substrate to form a coating film on the substrate. The coating film is heated in an atmosphere in which an oxygen concentration is less than 1% by volume and a temperature is higher than 450° C. and 800° C. or lower, to form a film on the substrate. The composition comprises a compound comprising an aromatic ring. The oxygen concentration in the atmosphere during the heating of the coating film is preferably no greater than 0.1% by volume. The temperature in the atmosphere during the heating of the coating film is preferably 500° C. or higher and 600° C. or lower.

Abstract translation: 一种方法包括在基底上施加组合物以在基底上形成涂膜。 在氧气浓度小于1体积％且温度高于450℃和800℃以下的气氛中加热涂膜，以在基材上形成膜。 该组合物包含包含芳环的化合物。 涂膜加热时的气氛中的氧浓度优选为0.1体积％以下。 涂膜加热时的气氛温度优选为500℃以上，600℃以下。

公开(公告)号：US11320739B2

公开(公告)日：2022-05-03

申请号：US16100501

申请日：2018-08-10

Applicant: JSR CORPORATION

Inventor： Goji Wakamatsu ,  Naoya Nosaka ,  Tsubasa Abe ,  Kazunori Sakai ,  Yuushi Matsumura ,  Hayato Namai

IPC: G03F7/40 ,  G03F7/30 ,  G03F7/09 ,  G03F7/11 ,  H01L21/027 ,  G03F7/26 ,  G03F7/039

Abstract: A composition for resist underlayer film formation, includes a first compound and a solvent. The first compound includes a first group represented by formula (1) and a partial structure comprising an aromatic ring. In the formula (1), R1 represents a single bond or an oxygen atom, R2 represents a divalent chain or alicyclic hydrocarbon group having 1 to 30 carbon atoms, and * denotes a bonding site to a moiety other than the first group of the first compound. *—R1—R2—CN  (1)

公开(公告)号：US20210286267A1

公开(公告)日：2021-09-16

申请号：US17331757

申请日：2021-05-27

Applicant: JSR CORPORATION

Inventor： Tsubasa Abe ,  Gouji Wakamatsu

IPC: G03F7/11 ,  C08G8/24 ,  C09D161/06 ,  C08G8/20 ,  C09D161/12 ,  C08F212/32 ,  C09D125/02 ,  C08F220/22 ,  C09D133/16

Abstract: A composition contains: an aromatic ring-containing compound; a fluorine atom-containing polymer; and an organic solvent. The fluorine atom-containing polymer has: a first structural unit represented by formula (1); and a second structural unit represented by formula (2). In the formula (1), R1 represents a fluorine atom-containing monovalent organic group having 1 to 20 carbon atoms; and R2 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms. In the formula (2), R3 represents a monovalent hydrocarbon group having 1 to 20 carbon atoms; and R4 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms.

公开(公告)号：US20200012193A1

公开(公告)日：2020-01-09

申请号：US16564499

申请日：2019-09-09

Applicant: JSR CORPORATION

Inventor： Naoya NOSAKA ,  Goji Wakamatsu ,  Tsubasa Abe ,  Ichihiro Miura ,  Kengo Ehara ,  Hiroki Nakatsu ,  Hiroki Nakagawa

IPC: G03F7/039 ,  G03F7/09 ,  G03F7/20 ,  C08G61/12 ,  C08G61/04

Abstract: A composition for resist underlayer film formation contains: a compound having a partial structure represented by the following formula (1); and a solvent. In the formula (1): X represents a group represented by formula (i), (ii), (iii) or (iv). In the formula (i): R1 and R2 each independently represent a hydrogen atom, a substituted or unsubstituted monovalent aliphatic hydrocarbon group having 1 to 20 carbon atoms, or a substituted or unsubstituted aralkyl group having 7 to 20 carbon atoms provided that at least one of R1 and R2 represents the substituted or unsubstituted monovalent aliphatic hydrocarbon group having 1 to 20 carbon atoms or the substituted or unsubstituted aralkyl group having 7 to 20 carbon atoms; or R1 and R2 taken together represent a part of a ring structure having 3 to 20 ring atoms together with the carbon atom to which R1 and R2 bond.