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1.发明授权Positive electron beam resists of ortho chloro substituted phenol or cresol condensed with formaldehyde 失效邻氯取代苯酚或与甲醛缩合的甲酚的正电子束抵抗
公开(公告)号：US4379826A
公开(公告)日：1983-04-12
申请号：US298138
申请日：1981-08-31
申请人： James Economy , Roy J. Gritter , Hiroyuki Hiraoka
发明人： James Economy , Roy J. Gritter , Hiroyuki Hiraoka
CPC分类号： G03F7/039
摘要： The sensitivity of a positive working electron beam resist is increased by using as the resist material a resin which is a condensation product of formaldehyde with a phenol or a cresol having a chloro substituent ortho to the hydroxyl group on its aromatic ring.
摘要翻译： 通过使用作为抗氧化剂材料的树脂作为抗氧化剂材料，通过使用甲醛与苯酚或其芳环上具有羟基的氯取代基的甲酚的缩合产物来提高正电加工电子束抗蚀剂的灵敏度。
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公开(公告)号：US4452665A
公开(公告)日：1984-06-05
申请号：US541221
申请日：1983-10-12
申请人： Hiroyuki Hiraoka
发明人： Hiroyuki Hiraoka
IPC分类号： C23C14/12 , C23F1/00 , C23F1/02 , G03F1/20 , G03F7/09 , H01L21/027 , H01L21/302 , H01L21/3065 , H01L21/311 , B44C1/22 , B29C17/08 , C03C15/00 , C03C25/06
CPC分类号： G03F1/20 , G03F7/094 , H01L21/31138
摘要： A polymeric halocarbon is used as an etch barrier for plasma etching in a process to make high resolution, high aspect ratio polymer patterns.
摘要翻译： 在制造高分辨率，高纵横比聚合物图案的方法中，聚合卤化碳被用作等离子体蚀刻的蚀刻阻挡层。
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3.发明授权Liquid crystal alignment layer, production method for the same, and liquid crystal display device comprising the same 失效液晶取向膜及其制造方法以及包含该液晶取向膜的液晶显示装置公开(公告)号：US06312769B1
公开(公告)日：2001-11-06
申请号：US09069169
申请日：1998-04-29
申请人： Hiroyuki Hiraoka , Yasumasa Takeuchi , Shin-ichi Kimura , Yasuo Matsuki , Toshihiro Ogawa , Masayuki Kimura
发明人： Hiroyuki Hiraoka , Yasumasa Takeuchi , Shin-ichi Kimura , Yasuo Matsuki , Toshihiro Ogawa , Masayuki Kimura
IPC分类号： C09K1900
CPC分类号： G02F1/133723 , G02F1/133788 , Y10T428/10
摘要： A method of producing a liquid crystal alignment layer comprising exposing an organic film to polarized pulse laser beam to align molecules in a surface portion of the organic film. There is provided a liquid crystal alignment layer composed of a polyamide film having aligned molecules in a surface portion.
摘要翻译： 一种制造液晶取向层的方法，包括将有机膜暴露于偏振脉冲激光束以使分子在有机膜的表面部分中排列。 提供了由表面部分中具有排列分子的聚酰胺膜构成的液晶取向层。
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公开(公告)号：US5368681A
公开(公告)日：1994-11-29
申请号：US073506
申请日：1993-06-09
申请人： Hiroyuki Hiraoka , Stefan A. Latsch , Rong-Fu Xiao
发明人： Hiroyuki Hiraoka , Stefan A. Latsch , Rong-Fu Xiao
CPC分类号： C23C14/28 , C23C14/0611 , C30B23/02 , C30B29/04
摘要： A method is disclosed for the deposition of crystalline diamond on a substrate such as a silicon wafer. A polymer (for example poly(methylmethacrylate)) is provided as a target for laser ablation using for example an ArF excimer laser or an Nd-Yag laser. The laser ablation is performed in the presence of a reactive gas such as oxygen or hydrogen. The substrate is heated to a temperature of between 450 and 700 degrees celsius.
摘要翻译： 公开了一种用于在诸如硅晶片的衬底上沉积结晶金刚石的方法。 使用例如ArF准分子激光器或Nd-Yag激光器提供聚合物（例如聚（甲基丙烯酸甲酯））作为用于激光烧蚀的靶。 在诸如氧气或氢气的反应气体的存在下进行激光烧蚀。 将基底加热至450-700℃的温度。
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公开(公告)号：US5270151A
公开(公告)日：1993-12-14
申请号：US852865
申请日：1992-03-17
CPC分类号： G03F7/094 , G03F7/0757
摘要： Reaction products of organosilane compounds or polydiphenylsilazane compounds and a novolac resin having phenolic groups can be used as O.sub.2 RIE barrier materials in semiconductor etching processes. These materials have low O.sub.2 etch rates and can be spun on to form crack-free thick layers. Particular RIE barrier materials contemplated have the general formula: ##STR1## wherein A is a methyl or phenyl group.
摘要翻译： 有机硅烷化合物或聚二苯基硅氮烷化合物和具有酚基的酚醛清漆树脂的反应产物可用作半导体蚀刻工艺中的O 2 RIE阻挡材料。 这些材料具有低的氧化蚀刻速率，并且可以旋转以形成无裂纹的厚层。 考虑的特定RIE阻隔材料具有以下通式：其中A是甲基或苯基。
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公开(公告)号：US4507331A
公开(公告)日：1985-03-26
申请号：US560638
申请日：1983-12-12
申请人： Hiroyuki Hiraoka
发明人： Hiroyuki Hiraoka
IPC分类号： H01L21/027 , G03F7/075 , G03F7/09 , G03F7/20 , G03F7/26 , G03F7/30 , H01L21/30 , H01L21/311 , B05D3/06
CPC分类号： H01L21/31138 , G03F7/094 , H01L21/31144
摘要： A dry process for forming a positive tone micro pattern by coating a substrate with an organic polymer film then with a film of an oxygen etch barrier, selected from the group consisting of films of organometallic, including organosilicon compounds and metals, exposing the etch barrier film to a low energy proton beam in a patternwise manner, and developing the pattern by means of oxygen reactive ion etching.
摘要翻译： 一种用于通过用有机聚合物膜涂覆基底然后用氧蚀刻屏障的膜选择由有机金属的膜（包括有机硅化合物和金属）暴露蚀刻阻挡膜而形成正色调微图案的干法 以图案方式连接到低能量质子束，并通过氧反应离子蚀刻显影图案。
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公开(公告)号：US4482427A
公开(公告)日：1984-11-13
申请号：US612189
申请日：1984-05-21
申请人： Hiroyuki Hiraoka
发明人： Hiroyuki Hiraoka
IPC分类号： H01L21/302 , H01L21/3065 , H01L21/311 , H05K3/00 , B44C1/22 , B29C17/08 , C03C15/00 , C03C25/06
CPC分类号： H01L21/31138 , H05K3/0017
摘要： A dry process for forming via holes with sloped walls by oxygen reactive ion etching through a perforated mask.
摘要翻译： 用于通过穿孔掩模通过氧反应离子蚀刻形成具有倾斜壁的通孔的干法。
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公开(公告)号：US4004043A
公开(公告)日：1977-01-18
申请号：US616980
申请日：1975-09-26
申请人： Hiroyuki Hiraoka
发明人： Hiroyuki Hiraoka
IPC分类号： C08F8/00 , C08F8/30 , G03F7/039 , H01L21/027 , B05D3/06
CPC分类号： G03F7/039 , Y10S430/143
摘要： Positive resists are made using polymers and copolymers of methacrylic acid, methacrylic anhydride, methyl methacrylate, methacrylimide, and N-alkyl-methacrylimides which have been nitrated in up to about 10% of the monomer units on the methyl groups branching off the polymer chain. Inclusion of the nitro groups results in an increase of over an order of magnitude in the speed of development of images when the polymers are used as positive resists.
摘要翻译： 使用甲基丙烯酸，甲基丙烯酸酐，甲基丙烯酸甲酯，甲基丙烯酰亚胺和N-烷基 - 甲基丙烯酰亚胺的聚合物和共聚物制备正性抗蚀剂，其在高达聚合物链分支的甲基上高达约10％的单体单元被硝化。 当聚合物用作正性抗蚀剂时，纳入硝基导致图像显影速度超过一个数量级。
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9.发明授权Carbon nanotubes and method of manufacturing same, electron emission source, and display 失效碳纳米管及其制造方法，电子发射源和显示器公开(公告)号：US07511206B2
公开(公告)日：2009-03-31
申请号：US11267314
申请日：2005-11-07
IPC分类号： D01F9/127
CPC分类号： B82Y30/00 , B82Y10/00 , B82Y40/00 , C01B32/162 , C23C16/26 , C23C16/509 , D01F9/127 , H01J2201/30469 , Y10S977/742 , Y10S977/844 , Y10S977/952
摘要： The present invention provides carbon nanotubes perpendicularly and densely deposited over a wide area of a substrate. The carbon nanotubes are manufactured by supplying alternating-current power at a specific frequency between an anode and a cathode disposed in a reactor, and causing plasma to be generated between the anode and the cathode by introducing mixed gas containing an aliphatic hydrocarbon having 1-5 carbon atoms and hydrogen or mixed gas containing an aromatic hydrocarbon and hydrogen. The substrate is disposed between the anode and the cathode and held at a distance two times or less of the mean free path of a hydrocarbon cation from the anode.
摘要翻译： 本发明提供了在基底的广泛区域上垂直且密集地沉积的碳纳米管。 通过在设置在反应器中的阳极和阴极之间以特定频率提供交流电力，并通过引入含有1-5个脂肪族烃的混合气体在阳极和阴极之间产生等离子体来制造碳纳米管 碳原子和氢或含有芳烃和氢的混合气体。 基板设置在阳极和阴极之间并保持与阳离子从阳极平均自由程的两倍或更小的距离。
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10.发明申请公开(公告)号：US20060054491A1
公开(公告)日：2006-03-16
申请号：US11267314
申请日：2005-11-07
CPC分类号： B82Y30/00 , B82Y10/00 , B82Y40/00 , C01B32/162 , C23C16/26 , C23C16/509 , D01F9/127 , H01J2201/30469 , Y10S977/742 , Y10S977/844 , Y10S977/952
摘要： The present invention provides carbon nanotubes perpendicularly and densely deposited over a wide area of a substrate. The carbon nanotubes are manufactured by supplying alternating-current power at a specific frequency between an anode and a cathode disposed in a reactor, and causing plasma to be generated between the anode and the cathode by introducing mixed gas containing an aliphatic hydrocarbon having 1-5 carbon atoms and hydrogen or mixed gas containing an aromatic hydrocarbon and hydrogen. The substrate is disposed between the anode and the cathode and held at a distance two times or less of the mean free path of a hydrocarbon cation from the anode.
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