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27 条记录 (耗时 0.015 秒)

    Magnetically-levitated rotor system for an RTP chamber
    2.
    发明授权
    Magnetically-levitated rotor system for an RTP chamber 失效
    用于RTP室的磁悬浮转子系统

    公开(公告)号：US6157106A

    公开(公告)日：2000-12-05

    申请号：US879497

    申请日：1997-05-16

    申请人： James V. Tietz ,  Benjamin Bierman

    发明人： James V. Tietz ,  Benjamin Bierman

    IPC分类号： H01L21/205 ,  H01L21/00 ,  H01L21/26 ,  H01L21/687 ,  H02K7/09

    CPC分类号： H01L21/68785 ,  F16C32/047 ,  H01L21/68792

    摘要： Accomodations for a magnetically levitated rotating system in an RTP chamber are provided. The system includes a magnetically permeable rotor; a cylindrical thin wall concentric with and surrounding the rotor; and a magnetic stator assembly adjacent the cylindrical thin wall. The radial distance between the rotor and the magnetic stator assembly is small enough that a magnetic field created by the stator assembly magnetically levitates the rotor but is great enough that the rotor does not physically contact the thin wall upon thermal expansion. The system is such that the relative positions of a plurality of sensors which determine the position of a rotating frame is maintained upon dismantling. Thermal isolation of the area including the rotor is accomplished from the reactive gases in a processing area of the RTP chamber. The rotor may be cooled by a number of cooling chambers formed within the chamber.

    摘要翻译： 提供了一个用于RTP室中的磁悬浮旋转系统的住宿。 该系统包括导磁转子; 与转子同心并围绕转子的圆柱形薄壁; 以及邻近圆柱形薄壁的磁性定子组件。 转子和磁性定子组件之间的径向距离足够小，使得由定子组件产生的磁场使转子磁悬浮，但足够大，使得转子在热膨胀时不与薄壁物理接触。 该系统使得在拆卸时保持确定旋转框架的位置的多个传感器的相对位置。 包括转子在内的区域的热隔离由RTP室的处理区域内的反应性气体完成。 转子可以由在室内形成的多个冷却室冷却。

    Method for gaseous substrate support
    4.
    发明授权
    Method for gaseous substrate support 失效
    气体底物支撑方法

    公开(公告)号：US5920797A

    公开(公告)日：1999-07-06

    申请号：US758699

    申请日：1996-12-03

    申请人： David S. Ballance ,  Benjamin Bierman ,  James V. Tietz ,  Brian Haas

    发明人： David S. Ballance ,  Benjamin Bierman ,  James V. Tietz ,  Brian Haas

    IPC分类号： H01L21/22 ,  H01L21/00 ,  H01L21/205 ,  H01L21/26 ,  H01L21/31 ,  H01L21/683

    CPC分类号： H01L21/67115 ,  H01L21/6838 ,  Y10S438/909

    摘要： A method of reducing stress on a substrate in a thermal processing chamber. The method includes the steps of supporting a first portion of a substrate by means of contacting the same such that a second portion of the substrate is not contacted, part of the second portion forming one wall of a cavity, and flowing a gas into the cavity such that the pressure of the gas exerts a force on the second portion to at least partially support the second portion.

    摘要翻译： 一种降低热处理室中的衬底上的应力的方法。 该方法包括以下步骤：通过使基板的第一部分接触而支撑基板的第一部分，使得基板的第二部分不接触，形成空腔的一个壁的第二部分的一部分并将气体流入腔 使得气体的压力在第二部分上施加力以至少部分地支撑第二部分。

    Method and apparatus for purging the back side of a substrate during chemical vapor processing
    5.
    发明授权
    Method and apparatus for purging the back side of a substrate during chemical vapor processing 失效
    用于在化学气相处理期间净化衬底的背面的方法和装置

    公开(公告)号：US5884412A

    公开(公告)日：1999-03-23

    申请号：US687166

    申请日：1996-07-24

    申请人： James V. Tietz ,  Benjamin Bierman ,  David S. Ballance

    发明人： James V. Tietz ,  Benjamin Bierman ,  David S. Ballance

    IPC分类号： C23C16/44 ,  C23C16/455 ,  F26B11/18

    CPC分类号： C23C16/45521 ,  C23C16/455

    摘要： A method of processing a disk-shaped substrate, or wafer, during a chemical vapor process includes a backside purge of the substrate with a purge gas. The backside purge is obtained by spinning the substrate about a central axis, directing a flow of the purge gas over the backside of the spinning substrate, and causing the purge gas to flow in an outward radial direction with the spinning substrate. An apparatus in a vapor processing system structured for conducting the backside purge includes a support mechanism structured and arranged to support the substrate and spin the substrate about a central axis, and a conduit coupled to a source of purge gas, structured and arranged to direct a flow of the purge gas over a backside of the substrate while the substrate is spinning such that the spinning substrate causes the purge gas to flow radially outward.

    摘要翻译： 在化学蒸汽处理过程中处理盘形基板或晶片的方法包括用吹扫气体对基板进行背面吹扫。 背面吹扫是通过围绕中心轴线旋转衬底而获得的，该吹扫气体引导吹扫气体流过纺丝衬底的背面，并使吹扫气体与旋转衬底沿向外径向流动。 构造用于进行背面清洗的蒸气处理系统中的装置包括构造和布置成支撑基板并围绕中心轴线旋转基板的支撑机构，以及耦合到吹扫气体源的导管，其被构造和布置成引导 当衬底旋转时，吹扫气体在衬底的背面上流动，使得纺丝衬底使吹扫气体径向向外流动。

    Lift pin and support pin apparatus for a processing chamber
    7.
    发明授权
    Lift pin and support pin apparatus for a processing chamber 失效
    用于处理室的提升销和支撑销装置

    公开(公告)号：US5879128A

    公开(公告)日：1999-03-09

    申请号：US687165

    申请日：1996-07-24

    申请人： James V. Tietz ,  Benjamin Bierman

    发明人： James V. Tietz ,  Benjamin Bierman

    IPC分类号： H01L21/683 ,  H01L21/26 ,  H01L21/687 ,  B05C13/00

    CPC分类号： H01L21/68742 ,  Y10S414/135 ,  Y10S414/139

    摘要： A substrate support mechanism including a housing made of a magnetically permeable material; a pin located substantially within the housing and having an upper end extending up into a passage which extends up through the bottom of the chamber and into the cavity which contains a substrate during processing; a first magnet assembly on the inside of the housing and mounted on the pin; a carriage structure located outside of the housing; and a second magnet assembly mounted on the carriage structure, wherein the first and second magnet assemblies are positioned relative to each other so that the second magnet assembly causes the pin and the first magnet assembly to magnetically levitate within the housing.

    摘要翻译： 一种衬底支撑机构，包括由导磁材料制成的壳体; 销基本上位于壳体内，并且具有向上延伸到通道的上端的上端，该通道在处理期间向上延伸穿过腔室的底部并进入包含衬底的空腔中; 位于壳体内部并安装在销上的第一磁体组件; 位于壳体外部的托架结构; 以及安装在所述滑架结构上的第二磁体组件，其中所述第一和第二磁体组件相对于彼此定位，使得所述第二磁体组件引起所述销和所述第一磁体组件在所述壳体内磁悬浮。