Abstract:
A non recursive analog integrator providing M integrations of a sampled analog signal Vn,m. The integrator comprises a series parallel demultiplexer with N outputs, N capacitors each with an electrode connected to a floating potential with respect to a reference potential, and a parallel series multiplexer with N inputs, the respective capacitors being connected in parallel between the outputs of the demultiplexer and the inputs of the multiplexer. Each capacitor performs, at each integration, the summation in form of charges of the sample of corresponding rank of the sampled analog signal Vn,m. So, at the end of the M integrations, an analog signal- ##EQU1## is obtained at the output of the multiplexer. Charge transfer devices serve as the series parallel demultiplexer and as the parallel series multiplexer.
Abstract:
This device comprises a MOS transistor of the tetrode type operating under triode conditions. The storage of charges corresponding to each input voltage sample is realised beneath the MOS capacitor, whose plate is the longer insulating gate of the MOS transistor. The various gates of the transistor are half-rings with an increasing surface area. The diode connected to the input voltage of the device is placed in the center of circles defining the rings. The diode connected to the voltage follower stage supplying the output voltage of the device is positioned on the periphery of the longer insulating gate.
Abstract:
This device incorporates a photosensitive (1) constituted by a matrix of photosensitive points. Each photosensitive point has a charge reading diode D.sub.1. Metallic connections (C.sub.1 to C.sub.4) connect the reading diodes of the same column to a single diode (D.sub.2), followed by a grid G.sub.2 raised to a constant potential (V.sub.2). The operation of the device involves the repetition of two stages, i.e. stage T.sub.1 and stage T.sub.2. During stage T.sub.1 parasitic charges, due for example to too intense illumination, are transferred from diodes D.sub.1 to diodes D.sub.2 and are removed by a diode (D.sub.5). During stage T.sub.2 the signal charges stored by the points of one line of the matrix are transferred into a memory and then into a charge transfer read register (R.sub.2). The register reads these charges during the following stages T.sub.1 and T.sub.2 until the time when the register receives the charges corresponding to the reading of the following line.
Abstract:
A multilinear charge transfer array is provided formed by N lines of P photosensitie detectors. Each photosensitive detector is connected directly by a connection to a demultiplexing and reading system, the signals obtained at the output of the array being fed to a processing device external to the array.The demultiplexing system comprises a charge transfer shift register with N.times.P stages, the connections between each detector and the corresponding input of the register being provided so that the detectors of the same rank are connected to contiguous inputs.
Abstract:
An analog accumulator used in association with a solid state image analyzer for averaging and storing the fixed pattern noise (FPN) includes an N-stage transfer shift register with an input receiving a signal corresponding to the fixed pattern noise and with N outputs, N floating storage diodes each connected to an output of the transfer shift register, N reading parts each connected to a floating storage diode and each comprising a floating input diode connected to the floating storage diode through an injection gate, an injection device and a charge removal drain, and an N-stage transfer shift register with N inputs each connected to a reading part and with an output. The accumulator provides M integrations of N samples of an analog signal and delivers, at the end of the M integrations, the N accumulated samples several times.
Abstract:
A new method of manufacturing a two-phase charge-transfer device operating by the charge-coupled technique, in which the asymmetry means associated with each group of electrodes are constituted by impurity barriers implanted in the semiconductor substrate and are automatically positioned in relation to the electrodes, in particular by carrying out implantation operations through masks constituted by films of silicon nitride and by the electrodes themselves, the films of silicon nitride subsequently being completely removed.This method makes it possible to create linear charge-transfer registers and photo-sensitive matrices.