公开(公告)号：US09704722B2

公开(公告)日：2017-07-11

申请号：US14958072

申请日：2015-12-03

申请人： Jeong-ju Park ,  Seung-chul Kwon ,  Eun-sung Kim ,  Jae-woo Nam ,  Shi-yong Yi ,  Hyun-woo Kim

发明人： Jeong-ju Park ,  Seung-chul Kwon ,  Eun-sung Kim ,  Jae-woo Nam ,  Shi-yong Yi ,  Hyun-woo Kim

IPC分类号： G03F7/40 ,  H01L21/311 ,  G03F7/00 ,  C08L53/00 ,  B82Y10/00 ,  G03F7/16 ,  G03F7/20 ,  B82Y40/00 ,  H01L21/02 ,  H01L21/027 ,  H01L21/3065 ,  H01L21/033 ,  H01L21/308 ,  H01L21/3213 ,  H01L27/108

CPC分类号： H01L21/31144 ,  B82Y10/00 ,  B82Y40/00 ,  C08L53/00 ,  G03F7/002 ,  G03F7/0035 ,  G03F7/165 ,  G03F7/2022 ,  G03F7/2059 ,  G03F7/40 ,  H01L21/02112 ,  H01L21/0274 ,  H01L21/0332 ,  H01L21/0337 ,  H01L21/3065 ,  H01L21/3086 ,  H01L21/32139 ,  H01L27/10855

摘要： A method of forming a fine pattern includes forming pillar-shaped guides regularly arranged on a feature layer, forming a block copolymer layer on the feature layer around the pillar-shaped guides, phase separating the block copolymer layer, forming first domains regularly arranged on the feature layer with the pillar-shaped guides, forming a second domain on the feature layer surrounding the pillar-shaped guides and the first domains, removing the first domains, and forming holes corresponding with the first domains in the feature layer by etching the feature layer using the pillar-shaped guides and the second domain as etch masks. The block copolymer layer includes a polymer blend having first and second polymer blocks having first and second repeat units, respectively, a first homopolymer and a second homopolymer. The first domains include the first polymer block and the first homopolymer, and the second domain includes the second polymer block and the second homopolymer.

公开(公告)号：US20160163547A1

公开(公告)日：2016-06-09

申请号：US14957777

申请日：2015-12-03

申请人： Eun-sung Kim ,  Dae-yong Kang ,  Seung-chul Kwon ,  Shi-yong Yi

发明人： Eun-sung Kim ,  Dae-yong Kang ,  Seung-chul Kwon ,  Shi-yong Yi

IPC分类号： H01L21/033

CPC分类号： H01L21/0337 ,  H01L21/0332 ,  H01L21/3086 ,  H01L21/31144 ,  H01L21/32139 ,  H01L27/10855

摘要： The present inventive concept provides a method of forming a fine pattern including forming a plurality of pillar-shaped guides that are regularly arranged on a feature layer.

摘要翻译： 本发明构思提供了一种形成精细图案的方法，包括形成规则地布置在特征层上的多个柱状引导件。