Adjustment Arrangement of an Optical Element
    2.
    发明申请
    Adjustment Arrangement of an Optical Element 有权
    光学元件的调整布置

    公开(公告)号:US20090009892A1

    公开(公告)日:2009-01-08

    申请号:US12211978

    申请日:2008-09-17

    IPC分类号: G02B7/04

    摘要: A arrangement serves for the adjustment of an optical element (1), in particular of a lens in an optical system, in particular in a projection lens system for semiconductor lithography. The optical element (1) is mounted in a mount (3) by means of a number of bearing feet (2) distributed over the circumference of the optical element (1) and is selectively deformable by actuators (5). At least some of the bearing feet (2) are engaged by the actuators (5) in a region of the respective bearing foot (2) in such a way that the respective bearing foot (2) can be displaced in the direction of the optical axis (7).

    摘要翻译: 一种布置用于调整光学元件(1),特别是光学系统中的透镜的调整,特别是用于半导体光刻的投影透镜系统中。 光学元件(1)通过分布在光学元件(1)的圆周上的多个轴承脚(2)安装在安装件(3)中,并且可由致动器(5)选择性地变形。 至少一些轴承脚(2)在相应的轴承座(2)的区域中被致动器(5)接合,使得相应的轴承座(2)可以沿着光学方向 轴(7)。

    Adjustment arrangement of an optical element
    4.
    发明授权
    Adjustment arrangement of an optical element 有权
    光学元件的调整布置

    公开(公告)号:US07656595B2

    公开(公告)日:2010-02-02

    申请号:US12211978

    申请日:2008-09-17

    IPC分类号: G02B7/02

    摘要: A arrangement serves for the adjustment of an optical element (1), in particular of a lens in an optical system, in particular in a projection lens system for semiconductor lithography. The optical element (1) is mounted in a mount (3) by means of a number of bearing feet (2) distributed over the circumference of the optical element (1) and is selectively deformable by actuators (5). At least some of the bearing feet (2) are engaged by the actuators (5) in a region of the respective bearing foot (2) in such a way that the respective bearing foot (2) can be displaced in the direction of the optical axis (7).

    摘要翻译: 一种布置用于调整光学元件(1),特别是调整光学系统中的透镜,特别是在用于半导体光刻的投影透镜系统中。 光学元件(1)通过分布在光学元件(1)的圆周上的多个轴承脚(2)安装在安装件(3)中,并且可由致动器(5)选择性地变形。 至少一些轴承脚(2)在相应的轴承座(2)的区域中被致动器(5)接合,使得相应的轴承座(2)可以沿着光学方向 轴(7)。

    Adjustment arrangement of an optical element
    5.
    发明授权
    Adjustment arrangement of an optical element 有权
    光学元件的调整布置

    公开(公告)号:US07193794B2

    公开(公告)日:2007-03-20

    申请号:US10779392

    申请日:2004-02-13

    IPC分类号: G02B7/02

    摘要: An arrangement serves for the adjustment of an optical element (1), in particular of a lens in an optical system, in particular in a projection lens system for semiconductor lithography. The optical element (1) is mounted in a mount (3) by means of a number of bearing feet (2) distributed over the circumference of the optical element (1) and is selectively deformable by actuators (5). At least some of the bearing feet (2) are engaged by the actuators (5) in a region of the respective bearing foot (2) in such a way that the respective bearing foot (2) can be displaced in the direction of the optical axis (7).

    摘要翻译: 一种布置用于调整光学元件(1),特别是调整光学系统中的透镜,特别是在用于半导体光刻的投影透镜系统中。 光学元件(1)通过分布在光学元件(1)的圆周上的多个轴承脚(2)安装在安装件(3)中,并且可由致动器(5)选择性地变形。 至少一些轴承脚(2)在相应的轴承座(2)的区域中被致动器(5)接合,使得相应的轴承座(2)可以沿着光学方向 轴(7)。

    ADJUSTMENT ARRANGEMENT OF AN OPTICAL ELEMENT
    6.
    发明申请
    ADJUSTMENT ARRANGEMENT OF AN OPTICAL ELEMENT 失效
    光学元件的调整安排

    公开(公告)号:US20070014038A1

    公开(公告)日:2007-01-18

    申请号:US11533660

    申请日:2006-09-20

    IPC分类号: G02B7/02

    摘要: A arrangement serves for the adjustment of an optical element (1), in particular of a lens in an optical system, in particular in a projection lens system for semiconductor lithography. The optical element (1) is mounted in a mount (3) by means of a number of bearing feet (2) distributed over the circumference of the optical element (1) and is selectively deformable by actuators (5). At least some of the bearing feet (2) are engaged by the actuators (5) in a region of the respective bearing foot (2) in such a way that the respective bearing foot (2) can be displaced in the direction of the optical axis (7).

    摘要翻译: 一种布置用于调整光学元件(1),特别是光学系统中的透镜的调整,特别是用于半导体光刻的投影透镜系统中。 光学元件(1)通过分布在光学元件(1)的圆周上的多个轴承脚(2)安装在安装件(3)中,并且可由致动器(5)选择性地变形。 至少一些轴承脚(2)在相应的轴承座(2)的区域中被致动器(5)接合,使得相应的轴承座(2)可以沿着光学方向 轴(7)。

    Adjustment arrangement of an optical element
    7.
    发明授权
    Adjustment arrangement of an optical element 失效
    光学元件的调整布置

    公开(公告)号:US07457059B2

    公开(公告)日:2008-11-25

    申请号:US11533660

    申请日:2006-09-20

    IPC分类号: G02B7/02

    摘要: A arrangement serves for the adjustment of an optical element (1), in particular of a lens in an optical system, in particular in a projection lens system for semiconductor lithography. The optical element (1) is mounted in a mount (3) by means of a number of bearing feet (2) distributed over the circumference of the optical element (1) and is selectively deformable by actuators (5). At least some of the bearing feet (2) are engaged by the actuators (5) in a region of the respective bearing foot (2) in such a way that the respective bearing foot (2) can be displaced in the direction of the optical axis (7).

    摘要翻译: 一种布置用于调整光学元件(1),特别是光学系统中的透镜的调整,特别是用于半导体光刻的投影透镜系统中。 光学元件(1)通过分布在光学元件(1)的圆周上的多个轴承脚(2)安装在安装件(3)中,并且可由致动器(5)选择性地变形。 至少一些轴承脚(2)在相应的轴承座(2)的区域中被致动器(5)接合,使得相应的轴承座(2)可以沿着光学方向 轴(7)。

    Optical element with an optical axis
    9.
    发明授权
    Optical element with an optical axis 失效
    具有光轴的光学元件

    公开(公告)号:US07295331B2

    公开(公告)日:2007-11-13

    申请号:US10489030

    申请日:2002-10-18

    IPC分类号: G02B5/08

    摘要: The invention concerns an optical element (1) with an optical axis (3), designed in particular for an exposure lens used in semiconductor lithography. Said optical element comprises at least an extension (2, 2′) in the direction of the optical axis (3). A device (11) enables to induce a two-wave or multiple wave deformation in said optical element (1). At least a system (12) mounted in the extension zone (2, 2′) is designed to apply a force in said extension (2, 2′).

    摘要翻译: 本发明涉及具有光轴(3)的光学元件(1),其特别设计用于半导体光刻中使用的曝光透镜。 所述光学元件在光轴(3)的方向上至少包括延伸部(2,2')。 装置(11)能够在所述光学元件(1)中引起双波或多波变形。 安装在延伸区域(2,2')中的至少一个系统(12)被设计成在所述延伸部(2,2')中施加力。