摘要:
A catadioptric objective comprises a plurality of lenses and at least two deflecting mirrors that have reflecting surfaces that are at a specific angle, in particular of 90°, to one another. The two deflecting mirrors are arranged with their reflecting surfaces on a common base member whose position in the objective can be set.
摘要:
The invention relates to a device for holding a beam splitter element having an optically active beam splitter layer in an optical imaging device, the beam splitter element being connected to at least one support element that is fastened in the housing of the imaging device. The connection between the beam splitter element and said at least one support element is designed in such a way that the position of the beam splitter layer of the beam splitter element remains nearly constant relative to the housing independently of temperatures and of thermal stresses acting upon the beam splitter element.
摘要:
The invention relates to a device for holding a beam splitter element having an optically active beam splitter layer in an optical imaging device, the beam splitter element being connected to at least one support element that is fastened in the housing of the imaging device. The connection between the beam splitter element and said at least one support element is designed in such a way that the position of the beam splitter layer of the beam splitter element remains nearly constant relative to the housing independently of temperatures and of thermal stresses acting upon the beam splitter element.
摘要:
The invention relates to a device for manipulation of the angular position of an object relative to a fixed structure, into which the object, in particular an optical element of a lens group for microlithography, is introduced, about three rotational axes, intersecting at a point. The object can also be held in a support frame. The support frame, with the object is connected to the fixed structure by means of three connection limbs each with three rotational degrees of freedom and one translational degree of freedom. The angular position of the support frame is adjustable about each one of the three rotational axes by means of one of the connection limbs.
摘要:
A mount for an optical element in an optical imaging device, in particular in a lens system (4) for semiconductor lithography, has at least one mounting ring (2) which bears the optical element (6). The mounting ring (2) is of at least partially hollow design in cross section.
摘要:
An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.
摘要:
An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.
摘要:
An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.
摘要:
An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.
摘要:
The invention relates to an apparatus for tilting a carrier for optical elements with two optical faces which are arranged together on a carrier and are fixed at a fixed angle to one another, the carrier being fastened on a base plate via articulated connections. The carrier can be pivoted about three tilting axes, a first tilting axis preferably being located in the plane of the first optical face and extending normal to the plane of the second optical face, the second tilting axis preferably being located in the plane of the second optical face and extending normal to the plane of the first optical face, and the third tilting axis being located parallel to the line of intersection between the two planes of the optical element.