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    NEGATIVE-TONE RADIATION-SENSITIVE COMPOSITION, CURED PATTERN FORMING METHOD, AND CURED PATTERN
    1.
    发明申请
    NEGATIVE-TONE RADIATION-SENSITIVE COMPOSITION, CURED PATTERN FORMING METHOD, AND CURED PATTERN 审中-公开
    负离子辐射敏感组合物，固化图案形成方法和固化图案

    公开(公告)号：US20100167024A1

    公开(公告)日：2010-07-01

    申请号：US12647375

    申请日：2009-12-24

    申请人： Norihiro Natsume ,  Takanori Kishida ,  Hayato Namai ,  Kyoyu Yasuda ,  Satoshi Dei ,  Koichi Hasegawa

    发明人： Norihiro Natsume ,  Takanori Kishida ,  Hayato Namai ,  Kyoyu Yasuda ,  Satoshi Dei ,  Koichi Hasegawa

    IPC分类号： B32B3/10 ,  G03F7/004 ,  G03F7/20

    CPC分类号： G03F7/0757 ,  Y10T428/24802

    摘要： A negative-tone radiation-sensitive composition includes a polymer, a photoacid generator, and a solvent. The polymer has a polystyrene-reduced weight average molecular weight of 4000 to 200,000, and is obtained by hydrolysis and condensation of at least one hydrolyzable silane compound among compounds shown by RaSi(OR1)4-a, Si(OR2)4 and R3x(R4O)3-xSi—(R7)z—Si(OR5)3-yR6y. “R” represents a fluorine atom, an alkylcarbonyloxy group, or a linear or branched alkyl group having 1 to 5 carbon atoms. “R1” represents a monovalent organic group. “R2” represents a monovalent organic group. “R3” and “R6” individually represent a fluorine atom, an alkylcarbonyloxy group, or a linear or branched alkyl group having 1 to 5 carbon atoms “R4” and “R5” individually represent a monovalent organic group. “R7” represents an oxygen atom, a phenylene group, or a group —(CH2)m—. The content of units derived from the compound RaSi(OR1)4-a is 50 to 100 mol % of the total units forming the polymer.

    摘要翻译： 负色辐射敏感组合物包括聚合物，光致酸产生剂和溶剂。 聚苯乙烯换算的重均分子量为4000〜200,000，通过RaSi（OR1）4-a，Si（OR2）4和R3x（OR1）4-a表示的化合物中至少一种可水解硅烷化合物的水解和缩合得到， R4O）3-xSi-（R7）z-Si（OR5）3-yR6y。 “R”表示氟原子，烷基羰基氧基或碳原子数1〜5的直链或支链烷基。 “R1”表示一价有机基团。 “R2”表示一价有机基团。 “R3”和“R6”分别表示氟原子，烷基羰基氧基或碳原子数为1〜5的直链或支链烷基，“R4”和“R5”分别表示一价有机基团。 “R7”表示氧原子，亚苯基或基团 - （CH2）m-。 衍生自化合物RaSi（OR1）4-a的单元的含量为形成聚合物的总单元的50〜100摩尔％。