公开(公告)号：US20130107235A1

公开(公告)日：2013-05-02

申请号：US13283582

申请日：2011-10-28

申请人： Hayato NAMAI ,  Hiroki Nakagawa ,  Kentaro Harada ,  Takehiko Naruoka

发明人： Hayato NAMAI ,  Hiroki Nakagawa ,  Kentaro Harada ,  Takehiko Naruoka

IPC分类号： G03B27/52

CPC分类号： G03F7/40 ,  G03F7/0397 ,  G03F7/325 ,  G03F7/405 ,  H01L21/0337

摘要： A pattern-forming method includes applying a photoresist composition to a substrate to form a resist film. The photoresist composition includes an acid generator and a first polymer that includes an acid-dissociable group. The resist film is exposed. The resist film is developed using a developer having an organic solvent content of 80 mass % or more to form a prepattern of the resist film. A polymer film having a phase separation structure in a space defined by the prepattern is formed using a composition that includes a plurality of second polymers. A part of the phase separation structure of the polymer film is removed.

摘要翻译： 图案形成方法包括将光致抗蚀剂组合物施加到基底以形成抗蚀剂膜。 光致抗蚀剂组合物包括酸产生剂和包含酸解离基团的第一聚合物。 抗蚀剂膜被曝光。 使用有机溶剂含量为80质量％以上的显影剂显影抗蚀剂膜，以形成抗蚀剂膜的前体图案。 使用包含多个第二聚合物的组合物形成在由预制图案限定的空间中具有相分离结构的聚合物膜。 除去聚合物膜的相分离结构的一部分。

公开(公告)号：US08703395B2

公开(公告)日：2014-04-22

申请号：US13283582

申请日：2011-10-28

申请人： Hayato Namai ,  Hiroki Nakagawa ,  Kentaro Harada ,  Takehiko Naruoka

发明人： Hayato Namai ,  Hiroki Nakagawa ,  Kentaro Harada ,  Takehiko Naruoka

IPC分类号： G03F7/26

CPC分类号： G03F7/40 ,  G03F7/0397 ,  G03F7/325 ,  G03F7/405 ,  H01L21/0337

摘要： A pattern-forming method includes applying a photoresist composition to a substrate to form a resist film. The photoresist composition includes an acid generator and a first polymer that includes an acid-dissociable group. The resist film is exposed. The resist film is developed using a developer having an organic solvent content of 80 mass % or more to form a prepattern of the resist film. A polymer film having a phase separation structure in a space defined by the prepattern is formed using a composition that includes a plurality of second polymers. A part of the phase separation structure of the polymer film is removed.

摘要翻译： 图案形成方法包括将光致抗蚀剂组合物施加到基底以形成抗蚀剂膜。 光致抗蚀剂组合物包括酸产生剂和包含酸解离基团的第一聚合物。 抗蚀剂膜被曝光。 使用有机溶剂含量为80质量％以上的显影剂显影抗蚀剂膜，以形成抗蚀剂膜的前体图案。 使用包含多个第二聚合物的组合物形成在由预制图案限定的空间中具有相分离结构的聚合物膜。 除去聚合物膜的相分离结构的一部分。

公开(公告)号：US20120183902A1

公开(公告)日：2012-07-19

申请号：US13338260

申请日：2011-12-28

申请人： Hiroki Nakagawa ,  Takehiko Naruoka ,  Shinichi Nakamura ,  Kazuki Kasahara

发明人： Hiroki Nakagawa ,  Takehiko Naruoka ,  Shinichi Nakamura ,  Kazuki Kasahara

IPC分类号： G03F7/027

CPC分类号： G03F7/0397 ,  G03F7/0045

摘要： A radiation-sensitive resin composition includes an acid-labile group-containing resin, a radiation-sensitive acid generating agent, and an acid diffusion controller including a first compound shown by a following general formula (1-1) and a second compound shown by a following general formula (1-2) or (1-3). In the formula (1-1), each of R1 and R2 individually represents a hydrogen atom or the like, and Rp represents an acid-labile group. In the formula (1-2), R3 represents a hydrogen atom or the like, and each of R4 to R6 individually represents a hydrogen atom or the like. In the formula (1-3), R3 represents a hydrogen atom or the like, Rq represents a single bond or the like, and each of R5 and R6 individually represents a hydrogen atom or the like.

摘要翻译： 辐射敏感性树脂组合物包括含酸不稳定基团的树脂，辐射敏感性酸产生剂和包含由以下通式（1-1）表示的第一化合物的酸扩散控制剂和由 以下通式（1-2）或（1-3）。 式（1-1）中，R 1和R 2分别表示氢原子等，R p表示酸不稳定基。 式（1-2）中，R3表示氢原子等，R4〜R6各自表示氢原子等。 在式（1-3）中，R 3表示氢原子等，R q表示单键等，R 5和R 6各自表示氢原子等。

公开(公告)号：US08580482B2

公开(公告)日：2013-11-12

申请号：US13338569

申请日：2011-12-28

申请人： Takashi Chiba ,  Toru Kimura ,  Tomohiro Utaka ,  Hiroki Nakagawa ,  Hirokazu Sakakibara ,  Hiroshi Dougauchi

发明人： Takashi Chiba ,  Toru Kimura ,  Tomohiro Utaka ,  Hiroki Nakagawa ,  Hirokazu Sakakibara ,  Hiroshi Dougauchi

IPC分类号： G03F7/11 ,  C08F18/20 ,  C08F18/22 ,  C08F26/02 ,  C08F28/02

CPC分类号： G03F7/11 ,  C08F220/18 ,  C08F220/26 ,  C08F220/38 ,  C08F228/00 ,  G03F7/2041

摘要： A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which includes at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000.

摘要翻译： 用于形成表面涂层的树脂组合物可以形成在光致抗蚀剂膜上而不与光致抗蚀剂膜混合，可以保持在浸没光刻期间不溶于介质的稳定的膜涂层，在干燥曝光期间不损害图案轮廓（ 这不是浸没式光刻法），并且可以容易地溶解在碱性显影剂中。 树脂是包含至少一种选自由下式（1）表示的基团的重复单元，由下式（2）表示的基团的重复单元）的重复单元（I）的共聚物， 和具有羧基的重复单元和具有磺基的重复单元（II），所述共聚物的重均分子量通过凝胶渗透色谱法测定为2,000〜100,000。

公开(公告)号：US08435718B2

公开(公告)日：2013-05-07

申请号：US13272501

申请日：2011-10-13

申请人： Atsushi Nakamura ,  Hiroki Nakagawa ,  Hiromitsu Nakashima ,  Takayuki Tsuji ,  Hiroshi Dougauchi ,  Daita Kouno ,  Yukio Nishimura

发明人： Atsushi Nakamura ,  Hiroki Nakagawa ,  Hiromitsu Nakashima ,  Takayuki Tsuji ,  Hiroshi Dougauchi ,  Daita Kouno ,  Yukio Nishimura

IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/11 ,  G03F7/40

CPC分类号： G03F7/11 ,  C08F220/18 ,  C08F220/30 ,  G03F7/0046 ,  G03F7/2041

摘要： An upper layer-forming composition includes a resin, and a solvent. The resin is dissolvable in a developer for a photoresist film which is to be covered by the upper layer-forming composition to form a pattern by exposure to radiation. The solvent dissolves the resin in the solvent. The solvent includes a compound shown by a formula (1). Each of R1 and R2 independently represents a hydrocarbon group having 1 to 8 carbon atoms or a halogenated hydrocarbon group. R1—O—R2  (1)

摘要翻译： 上层形成组合物包括树脂和溶剂。 该树脂可溶于用于由上层形成组合物覆盖以形成通过辐射照射的图案的光致抗蚀剂膜的显影剂。 溶剂溶解在溶剂中的树脂。 溶剂包括由式（1）表示的化合物。 R 1和R 2各自独立地表示碳原子数1〜8的烃基或卤代烃基。 R1-O-R2（1）

公开(公告)号：US08247165B2

公开(公告)日：2012-08-21

申请号：US10586187

申请日：2005-01-14

申请人： Toru Kimura ,  Yukio Nishimura ,  Tomohiro Utaka ,  Hiroaki Nemoto ,  Atsushi Nakamura ,  Takashi Chiba ,  Hiroki Nakagawa

发明人： Toru Kimura ,  Yukio Nishimura ,  Tomohiro Utaka ,  Hiroaki Nemoto ,  Atsushi Nakamura ,  Takashi Chiba ,  Hiroki Nakagawa

IPC分类号： G03C1/00 ,  G03F7/00 ,  C08F18/20

CPC分类号： G03F7/2041 ,  C08F214/182 ,  C08F214/186 ,  C08F216/10 ,  C08F220/18 ,  C08F220/24 ,  G03F7/11 ,  C08F220/06 ,  C08F2222/1013

摘要： An immersion upper layer film composition is provided which exhibits sufficient transparency for the exposure wavelength 248 nm(KrF) and 193 nm(ArF), can form a protective film on the photoresist film without being intermixed with the photoresist film, is not eluted into water used during immersion exposure to maintain a stable film, and can be easily dissolved in an alkaline developer. The composition applied to coat on the photoresist film when using an immersion exposure device which is irradiated through water provided between a lens and the photoresist film, the composition comprises a resin forming a water-stable film during irradiation and being dissolved in a subsequent developer, and a solvent containing a monovalent alcohol having 6 or less carbon atoms, and the resin contains a resin component having an alcoholic hydroxyl group on the side chain containing a fluoroalkyl group on at least the carbon atom of α-position.

摘要翻译： 提供了对于曝光波长248nm（KrF）和193nm（ArF）显示足够的透明度的浸没上层膜组合物，可以在光致抗蚀剂膜上形成保护膜而不与光致抗蚀剂膜混合，不会被洗脱到水中 在浸渍曝光期间使用以保持稳定的膜，并且可以容易地溶解在碱性显影剂中。 当使用通过设置在透镜和光致抗蚀剂膜之间的水照射的浸没曝光装置时，该组合物涂覆在光致抗蚀剂膜上，该组合物包含在照射期间形成水稳定膜并溶解在随后的显影剂中的树脂， 和含有6个以下碳原子的一元醇的溶剂，该树脂含有至少在α-位的碳原子上的侧链上含有氟烷基的具有醇羟基的树脂成分。

公开(公告)号：US20110236227A1

公开(公告)日：2011-09-29

申请号：US13065695

申请日：2011-03-28

申请人： Gouta Ogata ,  Kazunori Mizutori ,  Masahiko Ikawa ,  Yasuhiro Tamatsu ,  Hiroki Nakagawa ,  Haruyuki Nishijima ,  Mika Gocho

发明人： Gouta Ogata ,  Kazunori Mizutori ,  Masahiko Ikawa ,  Yasuhiro Tamatsu ,  Hiroki Nakagawa ,  Haruyuki Nishijima ,  Mika Gocho

IPC分类号： F04F5/00

CPC分类号： F04F5/20 ,  F04F5/46

摘要： A nozzle of an ejector depressurizes and injects fluid, which is supplied to the nozzle. The nozzle is received in a receiving space of a body. The nozzle and the body are formed by press working. The nozzle includes nozzle-side ribs, which extend in an axial direction and project radially outward. The body includes body-side ribs, which extend in the axial direction and project radially outward. In a predetermined cross section of each of the nozzle and the body, which is perpendicular to the axial direction and includes the corresponding ribs, the nozzle or the body is formed seamlessly as a continuous single piece member.

摘要翻译： 喷射器的喷嘴减压并喷射供给喷嘴的流体。 喷嘴被容纳在身体的容纳空间中。 喷嘴和主体通过冲压加工形成。 喷嘴包括沿轴向延伸并径向向外突出的喷嘴侧肋。 主体包括沿轴向延伸并径向向外突出的主体侧肋。 在每个喷嘴和主体的垂直于轴向方向并且包括相应的肋的预定横截面中，喷嘴或主体无缝地形成为连续的单件构件。

公开(公告)号：US20090251642A1

公开(公告)日：2009-10-08

申请号：US12374113

申请日：2007-07-17

申请人： Runa Nakamura ,  Hiroki Nakagawa ,  Takashi Kuroda ,  Yuya Inomata ,  Masanori Fukuda

发明人： Runa Nakamura ,  Hiroki Nakagawa ,  Takashi Kuroda ,  Yuya Inomata ,  Masanori Fukuda

IPC分类号： G02F1/1347 ,  G02F1/13 ,  B29D7/01 ,  G02B1/08

CPC分类号： G02B5/3016 ,  B32B23/04 ,  B32B23/08 ,  B32B23/14 ,  B32B23/20 ,  B32B27/18 ,  B32B27/281 ,  B32B27/308 ,  B32B27/325 ,  B32B27/40 ,  B32B2307/40 ,  B32B2307/412 ,  B32B2307/418 ,  B32B2307/42 ,  B32B2307/54 ,  B32B2307/706 ,  B32B2307/724 ,  B32B2307/7242 ,  B32B2457/202 ,  G02F1/133634 ,  G02F2201/50 ,  G02F2413/02 ,  G02F2413/11 ,  G02F2413/12

摘要： A retardation film that is used as a polarizing plate protective film, thereby making it possible to yield a polarizing plate which is very good in durability and has a viewing angle compensation function. The retardation film has: an optical anisotropic film, in which a relation of nx>ny is realized between a refractive index “nx” in a slow axis direction of an in-plane direction and a refractive index “ny” in a fast axis direction of the in-plane direction; and a retardation layer formed on the optical anisotropic film and containing a liquid crystalline material, in which a relation of nx≦ny

摘要翻译： 作为偏光板保护膜使用的延迟膜，能够得到耐久性良好且具有视角补偿功能的偏光板。 相位差膜具有：光学各向异性膜，其中在面内方向的慢轴方向上的折射率“nx”与快轴方向的折射率“ny”之间实现nx> ny的关系 的平面方向; 以及形成在光学各向异性膜上并含有液晶材料的延迟层，其中在任意方向“x”和“y”之间实现折射率“nx”和“ny”之间的nx <= ny

公开(公告)号：US20090202945A1

公开(公告)日：2009-08-13

申请号：US12294386

申请日：2007-03-23

申请人： Hiroki Nakagawa ,  Hiromitsu Nakashima ,  Gouji Wakamatsu ,  Kentarou Harada ,  Yukio Nishimura ,  Takeo Shioya

发明人： Hiroki Nakagawa ,  Hiromitsu Nakashima ,  Gouji Wakamatsu ,  Kentarou Harada ,  Yukio Nishimura ,  Takeo Shioya

IPC分类号： G03F7/039 ,  C08F20/22

CPC分类号： G03F7/0046 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40

摘要： An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

摘要翻译： 本发明的目的是提供一种含氟聚合物，其含有含氟聚合物的液浸光刻用的辐射敏感性树脂组合物，其导致具有优异形状和优异的焦深的图案，其中 在液浸光刻中曝光期间与抗蚀剂接触的液体浸液式液晶等液体中的洗脱组分的量很少，并且在抗蚀剂膜和用于液浸的液体之间提供较大的后退接触角 光刻法如水，以及纯化含氟聚合物的方法。 本发明的树脂组合物包含含有由通式（1）和（2）表示的重复单元并具有1,000-50,000的Mw的新的含氟聚合物（A），具有酸不稳定基团的树脂（B）， 辐射敏感性酸产生剂（C），含氮化合物（D）和溶剂（E）。

公开(公告)号：US20080080939A1

公开(公告)日：2008-04-03

申请号：US11906548

申请日：2007-10-02

申请人： Toshiki Hirukawa ,  Hideki Hayashi ,  Hiroki Nakagawa

发明人： Toshiki Hirukawa ,  Hideki Hayashi ,  Hiroki Nakagawa

IPC分类号： B23B51/00

CPC分类号： B23B51/02 ,  B23B2251/241 ,  B23B2251/248 ,  B23B2251/62 ,  B23B2270/12 ,  Y10T408/03 ,  Y10T408/52 ,  Y10T408/567

摘要： A cutting tool is provided to process a processed member having an opening portion with a curved inner surface, so that a through hole is formed and a part of the inner surface of the opening portion corresponding to the through hole is processed. The through hole extends from a surface of the processed member to reach the opening portion. The cutting tool includes a shank member, and a processing member having a smaller diameter than the shank member. A groove portion of the processing member has a cutting edge, and a chip evacuation groove through which chip is expelled outward. A self guide portion of the processing member is arranged between the groove portion and the shank member and provided with a substantially cylindrical shape, to guide the cutting edge toward the part of the inner surface of the opening portion corresponding to the through hole in the processing.

摘要翻译： 提供了一种切割工具来处理具有弯曲内表面的开口部分的加工构件，从而形成通孔，并且处理与通孔相对应的开口部分的内表面的一部分。 通孔从被处理构件的表面延伸到达开口部分。 切割工具包括柄部件和直径小于柄部件的加工部件。 处理部件的槽部具有切削刃，芯片排出槽通过芯片向外侧排出。 处理部件的自引导部分设置在槽部和柄部件之间并且设置有大致圆筒形状，以在加工中将切削刃朝向对应于通孔的开口部的内表面的一部分引导 。