公开(公告)号：US20080030731A1

公开(公告)日：2008-02-07

申请号：US11891657

申请日：2007-08-09

申请人： Ju Jin ,  Satish Sadam ,  Vishal Verma ,  Zhiyan Huang ,  Siming Lin ,  Michael Robbins ,  Paul Forderhase

发明人： Ju Jin ,  Satish Sadam ,  Vishal Verma ,  Zhiyan Huang ,  Siming Lin ,  Michael Robbins ,  Paul Forderhase

IPC分类号： G01J4/00 ,  G01N21/25 ,  G01N21/47

CPC分类号： G01N21/4738 ,  G01N21/9503

摘要： A substrate illumination and inspection system provides for illuminating and inspecting a substrate particularly the substrate edge. The system uses a light diffuser with a plurality of lights disposed at its exterior or interior for providing uniform diffuse illumination of a substrate. An optic and imaging system exterior of the light diffuser are used to inspect the plurality of surfaces of the substrate including specular surfaces. The optic can be rotated radially relative to a center point of the substrate edge to allow for focused inspection of all surfaces of the substrate edge.

摘要翻译： 衬底照明和检查系统提供用于照明和检查衬底，特别是衬底边缘。 该系统使用具有设置在其外部或内部的多个光的光漫射器，用于提供衬底的均匀漫射照明。 光扩散器的光学和成像系统外部用于检查包括镜面的基板的多个表面。 光学元件可以相对于基板边缘的中心点径向旋转，以允许对基板边缘的所有表面进行聚焦检查。

公开(公告)号：US20080011332A1

公开(公告)日：2008-01-17

申请号：US11825676

申请日：2007-07-06

申请人： Joel Bailey ,  Jean-Michel Huret ,  Paul Forderhase ,  Satish Sadam ,  Scott Stratton ,  Michael Robbins

发明人： Joel Bailey ,  Jean-Michel Huret ,  Paul Forderhase ,  Satish Sadam ,  Scott Stratton ,  Michael Robbins

IPC分类号： B08B3/02

CPC分类号： H01L21/6708 ,  G01C25/00 ,  H01J37/32366 ,  H01L21/31116 ,  H01L21/31612 ,  H01L21/67069 ,  H01L21/681

摘要： An edge area of the substrate processing device is disclosed. The edge area being processed is isolated from the remainder of the substrate by directing a flow of an inert gas through a plenum near the area to be processed thus forming a barrier while directing a flow of reactive species at an angle relative to the top surface of the substrate towards the substrate edge area thus processing the substrate edge area. A flow of oxygen containing gas into the processing chamber together with a negative exhaust pressure may contribute to the biasing of reactive species and other gases away from the non-processing areas of the substrate.

摘要翻译： 公开了一种基板处理装置的边缘区域。 正在处理的边缘区域与基板的其余部分分离，通过使惰性气体流通过待处理区域附近的增压室，从而形成屏障，同时将反应物流的流动相对于顶部表面成一定角度 基板朝向基板边缘区域，从而处理基板边缘区域。 含氧气体流入处理室和负排气压力可能有助于使反应物质和其他气体偏离基板的非处理区域。

公开(公告)号：US20080011421A1

公开(公告)日：2008-01-17

申请号：US11825669

申请日：2007-07-06

申请人： Joel Bailey ,  Jean-Michel Huret ,  Paul Forderhase ,  Satish Sadam ,  Scott Stratton ,  Michael Robbins

发明人： Joel Bailey ,  Jean-Michel Huret ,  Paul Forderhase ,  Satish Sadam ,  Scott Stratton ,  Michael Robbins

IPC分类号： C23F1/00

CPC分类号： G01C25/00 ,  H01L21/67069 ,  H01L21/681

摘要： An edge area of the substrate processing device is disclosed. The edge area being processed is isolated from the remainder of the substrate by directing a flow of an inert gas through a plenum near the area to be processed thus forming a barrier while directing a flow of reactive species at an angle relative to the top surface of the substrate towards the substrate edge area thus processing the substrate edge area. A flow of oxygen containing gas into the processing chamber together with a negative exhaust pressure may contribute to the biasing of reactive species and other gases away from the non-processing areas of the substrate. A seal arrangement is provided for the processing chamber.

摘要翻译： 公开了一种基板处理装置的边缘区域。 正在处理的边缘区域与基板的其余部分分离，通过使惰性气体流通过待处理区域附近的增压室，从而形成屏障，同时将反应物流的流动相对于顶部表面成一定角度 基板朝向基板边缘区域，从而处理基板边缘区域。 含氧气体流入处理室和负排气压力可能有助于使反应物质和其他气体偏离基板的非处理区域。 为处理室提供密封装置。

公开(公告)号：US20080017316A1

公开(公告)日：2008-01-24

申请号：US11825671

申请日：2007-07-06

申请人： Joel Bailey ,  Jean-Michel Huret ,  Paul Forderhase ,  Satish Sadam ,  Scott Stratton ,  Michael Robbins

发明人： Joel Bailey ,  Jean-Michel Huret ,  Paul Forderhase ,  Satish Sadam ,  Scott Stratton ,  Michael Robbins

IPC分类号： C23F1/00 ,  F23Q7/22

CPC分类号： H01L21/67069 ,  G01C25/00 ,  H01J37/32366 ,  H01L21/31116 ,  H01L21/31612 ,  H01L21/6708 ,  H01L21/681

摘要： An edge area of the substrate processing device is disclosed. The edge area being processed is isolated from the remainder of the substrate by directing a flow of an inert gas through a plenum near the area to be processed thus forming a barrier while directing a flow of reactive species at an angle relative to the top surface of the substrate towards the substrate edge area thus processing the substrate edge area. A flow of oxygen containing gas into the processing chamber together with a negative exhaust pressure may contribute to the biasing of reactive species and other gases away from the non-processing areas of the substrate. A clean ignition system is used to ignite the combustion flame.

摘要翻译： 公开了一种基板处理装置的边缘区域。 正在处理的边缘区域与基板的其余部分分离，通过使惰性气体流通过待处理区域附近的增压室，从而形成屏障，同时将反应物流的流动相对于顶部表面成一定角度 基板朝向基板边缘区域，从而处理基板边缘区域。 含氧气体流入处理室和负排气压力可能有助于使反应物质和其他气体偏离基板的非处理区域。 使用干净的点火系统点燃燃烧火焰。

公开(公告)号：US20080010845A1

公开(公告)日：2008-01-17

申请号：US11825670

申请日：2007-07-06

申请人： Joel Bailey ,  Jean-Michel Huret ,  Paul Forderhase ,  Satish Sadam ,  Scott Stratton ,  Michael Robbins

发明人： Joel Bailey ,  Jean-Michel Huret ,  Paul Forderhase ,  Satish Sadam ,  Scott Stratton ,  Michael Robbins

IPC分类号： G01C25/00 ,  G01D21/00 ,  G06F17/17 ,  H01L21/68

CPC分类号： G01C25/00 ,  H01J37/32366 ,  H01L21/31116 ,  H01L21/31612 ,  H01L21/67069 ,  H01L21/6708 ,  H01L21/681

摘要： A method and apparatus for dry chemical processing a wafer at atmospheric pressure is disclosed. The edge area of a substrate is placed in isolation from the remainder of the substrate. According to the present teachings, a method for centering a wafer on a rotatable chuck is provided. The method includes the steps of positioning a wafer adjacent to a micrometer. The wafer is then rotated and a plurality of wafer edge locations and rotational increments are measured. A center offset value for the value of the wafer center with respect to a chuck is calculated. The wafer is then moved with respect to a center position of the chuck.

摘要翻译： 公开了一种用于在大气压下干燥化学处理晶片的方法和装置。 将衬底的边缘区域与衬底的其余部分隔离放置。 根据本教导，提供了一种用于将晶片定心在可旋转卡盘上的方法。 该方法包括将晶片定位在与千分尺相邻的步骤。 然后旋转晶片，并且测量多个晶片边缘位置和旋转增量。 计算晶片中心相对于卡盘的值的中心偏移值。 然后晶片相对于卡盘的中心位置移动。

公开(公告)号：US20070062647A1

公开(公告)日：2007-03-22

申请号：US11230263

申请日：2005-09-19

申请人： Joel Bailey ,  Jonathan Doan ,  Paul Forderhase ,  Johnny Ortiz ,  Michael Robbins

发明人： Joel Bailey ,  Jonathan Doan ,  Paul Forderhase ,  Johnny Ortiz ,  Michael Robbins

IPC分类号： H01L21/306 ,  C23F1/00

CPC分类号： H01L21/67063 ,  G03F7/168 ,  H01L21/02087 ,  H01L21/6708

摘要： An isolative substrate edge area processing method and apparatus is described. The apparatus has an isolator for isolating and processing by dry chemical technique a portion of a substrate including a substrate edge region. The isolator has nozzles for directing a flow of reactive species towards the edge area of the substrate and a purge plenum for biasing flow of reactive species towards an exhaust plenum while the substrate rotates on a chuck. Tuned flow control prevents migration of reactive species and reaction byproducts out of the processing area. A method for processing a substrate with the isolator involves directing a flow of reactive species at an angle towards an edge area of the substrate while forming a boundary around the processing area with flow control provided by the purge plenum, and exhaust plenum.

摘要翻译： 描述了隔离衬底边缘区域处理方法和装置。 该装置具有用于通过干化学技术隔离和处理包括衬底边缘区域的衬底的一部分的隔离器。 隔离器具有用于将反应物质流引导到基底的边缘区域的喷嘴和用于在衬底在卡盘上旋转的同时将反应物质的流动偏向排气室的吹扫气室。 调节流量控制可防止反应物质和反应副产物迁离加工区域。 用隔离器处理衬底的方法包括以一定角度朝向衬底的边缘区域引导反应物种的流动，同时通过由净化气室和排气室提供的流动控制在处理区域周围形成边界。

公开(公告)号：US20070258085A1

公开(公告)日：2007-11-08

申请号：US11417297

申请日：2006-05-02

申请人： Michael Robbins ,  Paul Forderhase ,  Joel Bailey ,  Kevin Nguyen

发明人： Michael Robbins ,  Paul Forderhase ,  Joel Bailey ,  Kevin Nguyen

IPC分类号： G01N21/00

CPC分类号： G01N21/9503 ,  G01N21/4738

摘要： A substrate illumination and inspection system provides for illuminating and inspecting a substrate particularly the substrate edge. The system uses a light diffuser with a plurality of lights disposed at its exterior or interior for providing uniform diffuse illumination of a substrate. An optic and imaging system exterior of the light diffuser are used to inspect the plurality of surfaces of the substrate including specular surfaces. The optic is held at an angle from a surface normal to avoid reflective artifacts from the specular surface of the substrate. The optic can be rotated radially relative to a center point of the substrate edge to allow for focused inspection of all surfaces of the substrate edge. The plurality of lights can modulate color and intensity of light to enhance inspection of the substrate for defects.

摘要翻译： 衬底照明和检查系统提供用于照明和检查衬底，特别是衬底边缘。 该系统使用具有设置在其外部或内部的多个光的光漫射器，用于提供衬底的均匀漫射照明。 光扩散器的光学和成像系统外部用于检查包括镜面的基板的多个表面。 光学元件保持与表面法线成一定角度，以避免来自基板的镜面的反射伪影。 光学元件可以相对于基板边缘的中心点径向旋转，以允许对基板边缘的所有表面进行聚焦检查。 多个光可以调制光的颜色和强度，以增强基板对缺陷的检查。

公开(公告)号：US20130209198A1

公开(公告)日：2013-08-15

申请号：US13397441

申请日：2012-02-15

申请人： Paul Forderhase ,  Julian Blake ,  William Weaver

发明人： Paul Forderhase ,  Julian Blake ,  William Weaver

IPC分类号： H01L21/683 ,  F16M13/00 ,  F28F7/00 ,  C23C16/48 ,  B05C13/00 ,  B44C1/22 ,  H01L21/68 ,  A47B81/00

CPC分类号： H01L21/67046 ,  H01L21/67333 ,  H01L21/67706 ,  H01L21/67712 ,  H01L21/67748 ,  H01L21/67754 ,  H01L21/67781

摘要： Techniques for handling media arrays are disclosed. The techniques may be realized as a system for handling a plurality of substrates. The system may comprise a plurality of row elements for supporting the plurality of substrates, wherein the plurality of row elements may be operable to change configuration of the substrates from open configuration to a high-density configuration, where a distance between adjacent substrates in the open configuration may be greater than a distance between the adjacent substrates in the high-density configuration.

摘要翻译： 公开了处理介质阵列的技术。 这些技术可以被实现为用于处理多个基板的系统。 所述系统可以包括用于支撑多个基板的多个行元件，其中所述多个行元件可操作以将所述基板的构型从开放构型改变为高密度配置，其中所述相邻基板之间的距离为开放 配置可以大于高密度配置中的相邻基板之间的距离。

公开(公告)号：US08814239B2

公开(公告)日：2014-08-26

申请号：US13397441

申请日：2012-02-15

申请人： Paul Forderhase ,  Julian Blake ,  William Weaver

发明人： Paul Forderhase ,  Julian Blake ,  William Weaver

IPC分类号： H01L21/683 ,  A47B81/00

CPC分类号： H01L21/67046 ,  H01L21/67333 ,  H01L21/67706 ,  H01L21/67712 ,  H01L21/67748 ,  H01L21/67754 ,  H01L21/67781

摘要： Techniques for handling media arrays are disclosed. The techniques may be realized as a system for handling a plurality of substrates. The system may comprise a plurality of row elements for supporting the plurality of substrates, wherein the plurality of row elements may be operable to change configuration of the substrates from open configuration to a high-density configuration, where a distance between adjacent substrates in the open configuration may be greater than a distance between the adjacent substrates in the high-density configuration.

摘要翻译： 公开了处理介质阵列的技术。 这些技术可以被实现为用于处理多个基板的系统。 所述系统可以包括用于支撑多个基板的多个行元件，其中所述多个行元件可操作以将基板的构型从开放构型改变为高密度构造，其中相邻基底之间在开口 配置可以大于高密度配置中的相邻基板之间的距离。

公开(公告)号：US20050039963A1

公开(公告)日：2005-02-24

申请号：US10847526

申请日：2004-05-17

申请人： Paul Forderhase

发明人： Paul Forderhase

IPC分类号： B62M6/55 ,  B62M1/36 ,  B62K11/00

CPC分类号： B62M6/55 ,  B62M1/36

摘要： An auxiliary power system for a bicycle having a motor (10) attached to the bicycle flame (22) by thin clamps (30), which can be arranged in a variety of positions to avoid disturbing the control cables. Power is delivered on demand via a sprocket driving a single freewheel (180) attached to a modified left crank (200). The gearbox (20) may be attached to the frame by means of a quick-release system. A bushing (600), (700), (820) may be used instead of a modified as a means of mounting the freewheel to the crank axle. (720), (610), (850b). To prevent accidental simultaneous braking and triggering, triggering the system is accomplished by placing the trigger switch (430) so that the rider's fingers must disengage the brake in order to engage the motor. Accidental triggering may be prevented by placing a trigger switch on each handle and wiring them in series so that both switches must be engaged to obtain power.

摘要翻译： 一种用于自行车的辅助动力系统，其具有通过薄夹具（30）附接到自行车火焰（22）的电动机（10），其可以布置在各种位置以避免干扰控制电缆。 根据需要通过链轮驱动功率，该链轮驱动附接到改进的左曲柄（200）的单个自由轮（180）。 齿轮箱（20）可以通过快速释放系统附接到框架。 可以使用衬套（600），（700），（820）代替修改为将自由轮安装到曲轴上的装置。 （720），（610），（850b）。 为了防止意外的同时制动和触发，通过放置触发开关（430）来实现触发系统，使得骑车人的手指必须脱离制动器以接合电动机。 可以通过在每个手柄上放置触发开关并串联连接来防止意外触发，从而两个开关必须接合才能获得电力。