Automatic wafer edge inspection and review system
    1.
    发明申请
    Automatic wafer edge inspection and review system 失效
    自动晶圆边缘检查和审查系统

    公开(公告)号:US20080030731A1

    公开(公告)日:2008-02-07

    申请号:US11891657

    申请日:2007-08-09

    IPC分类号: G01J4/00 G01N21/25 G01N21/47

    CPC分类号: G01N21/4738 G01N21/9503

    摘要: A substrate illumination and inspection system provides for illuminating and inspecting a substrate particularly the substrate edge. The system uses a light diffuser with a plurality of lights disposed at its exterior or interior for providing uniform diffuse illumination of a substrate. An optic and imaging system exterior of the light diffuser are used to inspect the plurality of surfaces of the substrate including specular surfaces. The optic can be rotated radially relative to a center point of the substrate edge to allow for focused inspection of all surfaces of the substrate edge.

    摘要翻译: 衬底照明和检查系统提供用于照明和检查衬底,特别是衬底边缘。 该系统使用具有设置在其外部或内部的多个光的光漫射器,用于提供衬底的均匀漫射照明。 光扩散器的光学和成像系统外部用于检查包括镜面的基板的多个表面。 光学元件可以相对于基板边缘的中心点径向旋转,以允许对基板边缘的所有表面进行聚焦检查。

    Automatic wafer edge inspection and review system
    4.
    发明授权
    Automatic wafer edge inspection and review system 失效
    自动晶圆边缘检查和审查系统

    公开(公告)号:US07508504B2

    公开(公告)日:2009-03-24

    申请号:US11891657

    申请日:2007-08-09

    IPC分类号: G01N21/00

    CPC分类号: G01N21/4738 G01N21/9503

    摘要: A substrate illumination and inspection system provides for illuminating and inspecting a substrate particularly the substrate edge. The system uses a light diffuser with a plurality of lights disposed at its exterior or interior for providing uniform diffuse illumination of a substrate. An optic and imaging system exterior of the light diffuser are used to inspect the plurality of surfaces of the substrate including specular surfaces. The optic can be rotated radially relative to a center point of the substrate edge to allow for focused inspection of all surfaces of the substrate edge.

    摘要翻译: 衬底照明和检查系统提供用于照明和检查衬底,特别是衬底边缘。 该系统使用具有设置在其外部或内部的多个光的光漫射器,用于提供衬底的均匀漫射照明。 光扩散器的光学和成像系统外部用于检查包括镜面的基板的多个表面。 光学元件可以相对于基板边缘的中心点径向旋转,以允许对基板边缘的所有表面进行聚焦检查。

    Laundry treating appliance with balancing system

    公开(公告)号:US08701451B2

    公开(公告)日:2014-04-22

    申请号:US12963190

    申请日:2010-12-08

    IPC分类号: D06F29/00

    CPC分类号: D06F37/225

    摘要: A laundry treating appliance having a drum, defining a treating chamber, with a lifter and a balancing system having at least one balancing ring and a reservoir located in the lifter and a liquid supply system fluidly coupled to the reservoir. Liquid may be supplied to the ring and to the reservoir through the ring to offset an imbalance in a laundry load located within the drum.

    Laundry treating appliance with balancing system
    6.
    发明授权
    Laundry treating appliance with balancing system 有权
    洗衣处理设备与平衡系统

    公开(公告)号:US08695383B2

    公开(公告)日:2014-04-15

    申请号:US12963145

    申请日:2010-12-08

    IPC分类号: D06F29/00

    CPC分类号: D06F37/225

    摘要: A laundry treating appliance having a drum, defining a treating chamber, with a lifter and a balancing system having at least one balancing ring and a reservoir located in the lifter and a liquid supply system fluidly coupled to the reservoir. Liquid may be supplied to the ring and to the reservoir through the ring to offset an imbalance in a laundry load located within the drum.

    摘要翻译: 一种具有滚筒的洗衣处理设备,其具有提升器和具有至少一个平衡环的平衡系统和位于升降机内的储存器的液体供应系统,液体供应系统与流体耦合到储存器的液体供应系统一起形成处理室。 可以通过环将液体供应到环和储存器,以抵消位于滚筒内的衣物负载中的不平衡。

    Laundry treating appliance with balancing system

    公开(公告)号:US08713977B2

    公开(公告)日:2014-05-06

    申请号:US12963079

    申请日:2010-12-08

    申请人: Vishal Verma

    发明人: Vishal Verma

    IPC分类号: D06F29/00

    CPC分类号: D06F37/225

    摘要: A laundry treating appliance having a drum, defining a treating chamber, with a lifter and a balancing system having at least one balancing ring and a reservoir located in the lifter and a liquid supply system fluidly coupled to the reservoir. Liquid may be supplied to the ring and to the reservoir through the ring to offset an imbalance in a laundry load located within the drum.

    Laundry treating appliance with balancing system
    9.
    发明授权
    Laundry treating appliance with balancing system 有权
    洗衣处理设备与平衡系统

    公开(公告)号:US08991223B2

    公开(公告)日:2015-03-31

    申请号:US12963052

    申请日:2010-12-08

    IPC分类号: D06F37/22

    CPC分类号: D06F37/225

    摘要: A laundry treating appliance having a drum, defining a treating chamber, with a lifter and a balancing system having at least one balancing ring and a reservoir located in the lifter and a liquid supply system fluidly coupled to the reservoir. Liquid may be supplied to the ring and to the reservoir through the ring to offset an imbalance in a laundry load located within the drum.

    摘要翻译: 一种具有滚筒的洗衣处理设备,其具有提升器和具有至少一个平衡环的平衡系统和位于升降机内的储存器的液体供应系统,液体供应系统与流体耦合到储存器的液体供应系统一起形成处理室。 可以通过环将液体供应到环和储存器,以抵消位于滚筒内的衣物负载中的不平衡。