公开(公告)号：US20090200484A1

公开(公告)日：2009-08-13

申请号：US12366390

申请日：2009-02-05

申请人： Juergen FROSIEN

发明人： Juergen FROSIEN

IPC分类号： H01J3/14

CPC分类号： H01J37/08 ,  H01J27/26 ,  H01J37/241 ,  H01J37/243 ,  H01J2237/002 ,  H01J2237/006 ,  H01J2237/061 ,  H01J2237/0807 ,  H01J2237/0827 ,  H01J2237/28 ,  H01J2237/317

摘要： A focused ion beam device is described. The focused ion beam device includes an ion beam column including an enclosure for housing a gas field ion source emitter with an emitter area for generating ions, an electrode for extracting ions from the gas field ion source emitter, one or more gas inlets adapted to introduce a first gas and a second gas to the emitter area, an objective lens for focusing the ion beam generated from the first gas or the second gas, a voltage supply for providing a voltage between the electrode and the gas field ion source emitter, and a controller for switching between a first voltage and a second voltage of the voltage supply for generating an ion beam of ions of the first gas or an ion beam of ions of the second gas.

摘要翻译： 描述了聚焦离子束装置。 聚焦离子束装置包括离子束柱，其包括用于容纳具有用于产生离子的发射极区域的气体场离子源发射器的外壳，用于从气体离子源发射器提取离子的电极，适于引入离子源的一个或多个气体入口 将第一气体和第二气体输送到发射器区域，用于聚焦由第一气体或第二气体产生的离子束的物镜，用于在电极和气体离子源发射器之间提供电压的电压源，以及 控制器，用于在电压源的第一电压和第二电压之间切换，用于产生第一气体的离子离子束或第二气体的离子离子束。

公开(公告)号：US20090289185A1

公开(公告)日：2009-11-26

申请号：US12133298

申请日：2008-06-04

申请人： Juergen FROSIEN ,  Dieter WINKLER ,  Udo WEIGEL ,  Stefan GRIMM

发明人： Juergen FROSIEN ,  Dieter WINKLER ,  Udo WEIGEL ,  Stefan GRIMM

IPC分类号： G01N23/00

CPC分类号： H01J37/08 ,  H01J27/26 ,  H01J37/28 ,  H01J2237/004 ,  H01J2237/061 ,  H01J2237/0807 ,  H01J2237/244 ,  H01J2237/24514 ,  H01J2237/24535 ,  H01J2237/24564 ,  H01J2237/24578 ,  H01J2237/2594 ,  H01J2237/2623 ,  H01J2237/2816 ,  H01J2237/2817

摘要： A focused ion beam device is described comprising a gas field ion source with an analyzer for analyzing and classifying the structure of a specimen, a controller for controlling and/or modifying the structure of the specimen according to the analysis of the analyzer, an emitter tip, the emitter tip has a base tip comprising a first material and a supertip comprising a material different from the first material, wherein the supertip is a single atom tip and the base tip is a single crystal base tip. Furthermore, the focused ion beam device has a probe current control and a sample charge control. A method of operating a focused ion beam device is provided comprising applying a voltage between a single emission centre of the supertip and an electrode, supplying gas to the emitter tip, analyzing and classifying the structure of a specimen, and controlling the structure of the specimen.

摘要翻译： 描述了一种聚焦离子束装置，其包括气体离子源，其具有用于分析和分类样品结构的分析器，用于根据分析仪的分析来控制和/或改变样品的结构的控制器，发射器尖端 发射极尖端具有包括第一材料和超高压头的基座尖端，所述第一材料和第一材料包括不同于所述第一材料的材料，其中所述超高压是单个原子尖端，并且所述基座尖端是单晶基底尖端。 此外，聚焦离子束装置具有探针电流控制和样品充电控制。 提供了一种操作聚焦离子束装置的方法，包括在超高压的单个发射中心和电极之间施加电压，向发射极尖端供应气体，分析和分类样品的结构，以及控制样品的结构 。

公开(公告)号：US20100084553A1

公开(公告)日：2010-04-08

申请号：US12247849

申请日：2008-10-08

申请人： Juergen FROSIEN

发明人： Juergen FROSIEN

IPC分类号： G01N23/00

CPC分类号： G01T1/00

摘要： A detection apparatus for use in a charged particle beam device is provided. The detection apparatus includes a separation field generating portion adapted to generate a separation field separating positively and negatively charged secondary particles, at least one first detector for detecting positively charged particles, at least one second detector for detecting negatively charged particles, wherein the detection apparatus is adapted to simultaneously detect the positively charged secondary particles in the at least one first detector and the negatively charged secondary particles in the at least one second detector. Further, a method of simultaneously detecting negatively and positively charged particles is provided. The method includes providing a separation field, providing at least one first detector and at least one second detector, separating the negatively charged particles from the positively charged particles in the separation field, simultaneously detecting positively charged particles with the at least one first detector and negatively charged particles with the at least one second detector.

摘要翻译： 提供一种用于带电粒子束装置的检测装置。 检测装置包括：分离场产生部分，适于产生分离带正电荷和带负电荷的二次粒子的分离场;至少一个检测带正电荷的粒子的第一检测器;用于检测带负电荷的粒子的至少一个第二检测器，其中检测装置 适于同时检测所述至少一个第一检测器中的带正电荷的次级颗粒和所述至少一个第二检测器中的带负电荷的次级颗粒。 此外，提供同时检测带正电的带电粒子的方法。 该方法包括提供分离场，提供至少一个第一检测器和至少一个第二检测器，从分离场中带正电的粒子分离带负电的粒子，同时用至少一个第一检测器检测带正电的粒子， 带电粒子与至少一个第二检测器。

公开(公告)号：US20090289191A1

公开(公告)日：2009-11-26

申请号：US12133147

申请日：2008-06-04

申请人： Juergen FROSIEN

发明人： Juergen FROSIEN

IPC分类号： H01J3/14 ,  H01J27/00

CPC分类号： H01J37/265 ,  H01J37/28 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/0805 ,  H01J2237/0807 ,  H01J2237/244 ,  H01J2237/24507 ,  H01J2237/24535

摘要： A focused ion beam device is described comprising a gas field ion source with an emitter emitting an ion beam including ions of gas, an ion beam column and a beam current control loop comprising a beam current measurement device. Furthermore, the focused ion beam device may have a sample charge control comprising measuring the sample charge. A method of operating a focused ion beam device is provided comprising applying a voltage between an emitter an electrode, applying gas to the emitter, emitting ions of a gas from the emitter and controlling a beam current by measuring the beam current with a beam current measurement device.

摘要翻译： 描述了一种聚焦离子束装置，其包括具有发射包括气体离子的离子束的发射体的气体场离子源，离子束列和包括束电流测量装置的束流控制回路。 此外，聚焦离子束装置可以具有包括测量样品电荷的样品电荷控制。 提供了一种操作聚焦离子束装置的方法，包括在发射极与电极之间施加电压，向发射体施加气体，从发射极发射气体的离子，并通过用束电流测量来测量束电流来控制束电流 设备。

公开(公告)号：US20090146074A1

公开(公告)日：2009-06-11

申请号：US12277818

申请日：2008-11-25

申请人： Helmut BANZHOF ,  Juergen FROSIEN ,  Dieter WINKLER

发明人： Helmut BANZHOF ,  Juergen FROSIEN ,  Dieter WINKLER

IPC分类号： H01J3/14

CPC分类号： H01J37/04 ,  H01J37/28 ,  H01J2237/0473 ,  H01J2237/0475 ,  H01J2237/0492 ,  H01J2237/08 ,  H01J2237/0807

摘要： A method of operating a focused ion beam device having a gas field ion source is described. According to some embodiments, the method includes emitting an ion beam from a gas field ion source, providing an ion beam column ion beam energy in the ion beam column which is higher than the final beam energy, decelerating the ion beam for providing a final beam energy on impingement of the ion beam on the specimen of 1 keV to 4 keV, and imaging the specimen.

摘要翻译： 描述了具有气体场离子源的聚焦离子束装置的操作方法。 根据一些实施例，该方法包括从气体场离子源发射离子束，在离子束列中提供高于最终光束能量的离子束柱离子束能量，使离子束减速以提供最终光束 将离子束撞击在1keV至4keV的样品上的能量，并对样品进行成像。