Metallic oxide with boron and process for manufacturing the same
    5.
    发明授权
    Metallic oxide with boron and process for manufacturing the same 失效
    具有硼的金属氧化物及其制造方法

    公开(公告)号:US5512542A

    公开(公告)日:1996-04-30

    申请号:US297767

    申请日:1994-08-30

    摘要: A novel metallic oxide of a Ln-Ca-Sr-Ba-Cu-B-O type and a process for manufacturing such a metallic oxide. The above metallic oxide has a composition expressed by the following formula (I):(Ln.sub.1-a Ca.sub.a)(Sr.sub.2-b Ba.sub.b)(Cu.sub.3-c B.sub.c)O.sub.d(I)wherein Ln is one or more kinds of elements selected from the group consisting of Y and lanthanoid elements except for Ce and Tb and wherein the following conditions are met: 0.1.ltoreq.a.ltoreq.0.5, 0.7.ltoreq.b.ltoreq.1.7, 0.1.ltoreq.c.ltoreq.0.5, and 6.5.ltoreq.d.ltoreq.7.5. A process for manufacturing the metallic oxide has the following steps. A mixture of materials including H.sub.3 BO.sub.3 used as a starting material of B is prepared. The resultant mixture is heated at a rate of 5.degree. C. or lower per minute up to 900.degree. C. or lower. Then, it is heated in an oxygen atmosphere at a range from 900.degree.-1050.degree. C.

    摘要翻译: Ln-Ca-Sr-Ba-Cu-B-O型的新型金属氧化物及其制造方法。 上述金属氧化物具有由下式(I)表示的组成:(Ln1-aCaa)(Sr2-bBab)(Cu3-cBc)Od(I)其中Ln是选自以下的一种或多种元素: Y和除了Ce和Tb之外的镧系元素,其中满足以下条件:0.1

    Process for producing nanostructure of mixed film of Al, Si, and/or Ge
    6.
    发明授权
    Process for producing nanostructure of mixed film of Al, Si, and/or Ge 失效
    制备Al,Si和/或Ge混合膜的纳米结构的方法

    公开(公告)号:US07517554B2

    公开(公告)日:2009-04-14

    申请号:US11339627

    申请日:2006-01-26

    IPC分类号: C23C8/00

    摘要: A process for producing a nano-structure is provided which enables control of the pore diameters and the pore intervals by film formation conditions. The process produces a nano-structure of an aluminum-silicon-germanium mixed film containing silicon and germanium at a content of 20 to 70 atom % relative to aluminum, the mixed film being constituted of a matrix composed mainly of silicon and germanium in a composition ratio of SixGe1-x (0≦X≦1), and cylindrical portions mainly composed of aluminum having a diameter of not larger 30 nm in the matrix. In the process, the mixed film is formed at a film-forming rate of not higher than 150 nm/min.

    摘要翻译: 提供一种制造纳米结构的方法,其能够通过成膜条件控制孔径和孔间隔。 该方法产生相对于铝含有20〜70原子%含有硅和锗的铝 - 硅 - 锗混合膜的纳米结构,该混合膜由组成为主要由硅和锗组成的基体构成 SixGe1-x(0 <= X <= 1)的比例,以及主要由直径不大于30nm的铝构成的圆筒部。 在该过程中,以不高于150nm / min的成膜速度形成混合膜。

    Magnetic device
    10.
    发明授权
    Magnetic device 失效
    磁性装置

    公开(公告)号:US07349242B2

    公开(公告)日:2008-03-25

    申请号:US10968902

    申请日:2004-10-21

    申请人: Tohru Den

    发明人: Tohru Den

    IPC分类号: G11C11/00 G11C11/14 G11C11/15

    摘要: A magnetic device has a layer containing fine pores and having wirings on both faces of the layer formed on a substrate, wherein at least a part of the pores are filled with a layered column formed by stacking magnetic layers and nonmagnetic layers alternately, and at least a part of the pores filled with a conductive column as writing wires for writing into the magnetic layers in the adjacent pores. The fine pores may be nano-holes of alumina formed by anodic oxidation. A part of the pores may serve to intercept a magnetic field. The magnetic layer may contain Co, and the nonmagnetic layer and/or the writing wire may contain Cu. The pores may be arranged in a honeycomb arrangement or a rectangular array. The ratio of the sectional area S (cm2) of the pore and the length (cm) of the pore satisfy the relation: 105 105.

    摘要翻译: 磁性器件具有含有细孔的层,并且在形成在衬底上的层的两个表面上具有布线,其中至少部分孔填充有通过交替层叠磁性层和非磁性层而形成的层状结构,并且至少 填充有导电柱的孔的一部分作为用于写入相邻孔中的磁性层的书写线。 细孔可以是通过阳极氧化形成的氧化铝的纳米孔。 一部分孔可用于截取磁场。 磁性层可以含有Co,非磁性层和/或书写线可以含有Cu。 孔可以布置成蜂窝布置或矩形阵列。 孔的截面积S(cm 2)与孔的长度(cm)的比例满足关系式:10 10 < SUP> 5