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公开(公告)号：US20150265740A1
公开(公告)日：2015-09-24
申请号：US14633745
申请日：2015-02-27
发明人： Akio UI , Yosuke Sato , Masato Akita , Yasushi Sanada
IPC分类号： A61L9/16
CPC分类号： A61L9/16 , A61L9/22 , A61L2209/212 , B01D53/323 , B01D53/8631 , B01D53/869 , B01D2251/104 , B01D2255/802 , B01D2257/406 , B01D2257/702 , B01D2257/708 , B01D2257/90
摘要： A gas processing apparatus of an embodiment includes: first and second dielectric substrates facing with each other; first and second discharge electrodes respectively disposed on a pair of facing principal surfaces of the dielectric substrates; first and second ground electrodes respectively disposed on a pair of principle surfaces at opposite sides of the principle surfaces of the dielectric substrates; a gas flow path to supply gas to be processed between the discharge electrodes; an AC power source to generate first and second plasma-induced flows by applying an AC voltage between the discharge electrodes and the ground electrodes; and a region disposed between the dielectric substrates at downstream of the plasma-induced flows from the discharge electrodes, and a gap between the dielectric substrates being 1.3 times or less of a sum of thicknesses of the plasma-induced flows.
摘要翻译： 实施例的气体处理装置包括：彼此面对的第一和第二电介质基板; 第一和第二放电电极分别设置在电介质基板的一对相对的主表面上; 第一和第二接地电极分别设置在电介质基板的主表面的相对侧上的一对主表面上; 用于在所述放电电极之间提供待处理气体的气体流路; AC电源，通过在放电电极和接地电极之间施加AC电压来产生第一和第二等离子体感应流; 以及设置在电介质基板之间的等离子体引起的来自放电电极的下游的区域，并且电介质基板之间的间隙是等离子体引起的流的厚度之和的1.3倍以下。
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公开(公告)号：US11975298B2
公开(公告)日：2024-05-07
申请号：US17249358
申请日：2021-02-26
发明人： Mitsuaki Kato , Masato Akita , Hideaki Okano
IPC分类号： B01F33/3012 , B01F33/301
CPC分类号： B01F33/3017 , B01F33/3012 , B01F2215/0409 , B01F2215/0431
摘要： According to one embodiment, a fluid controller includes a fluid channel deforming portion and a mixing portion provided downstream from the fluid channel deforming portion. The fluid channel deforming portion includes an upstream end portion, a first channel, a second channel and a channel terminating portion. At least one of the first and second channels is deformed between the upstream end portion and the channel terminating portion. A region of the second channel in a second cross-section, is increased more than a region of the second channel in the first cross-section, between the upstream end portion ad the channel terminating portion. The mixing portion mixes a plurality of fluids flowing through the fluid channel deforming portion.
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公开(公告)号：US20190259579A1
公开(公告)日：2019-08-22
申请号：US16111628
申请日：2018-08-24
发明人： Tomonao TAKAMATSU , Akio Ui , Masato Akita
摘要： According to one embodiment, a plasma actuator includes an electrode member, an application electrode, a ground electrode, and a supporting member. The electrode member has a first surface facing a processing object and a second surface of an opposite side of the first surface. The application electrode is provided in the first surface. The ground electrode is provided in the second surface or an inner portion of the electrode member. The supporting member is provided in at least one of the electrode member and the application electrode to form a processing space between the processing object and the electrode member. The supporting member is capable of abutting on the processing object.
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公开(公告)号：US10145859B2
公开(公告)日：2018-12-04
申请号：US15687951
申请日：2017-08-28
摘要： According to one embodiment, an automatic container processing apparatus includes a tube socket, an operation part, and a control device. The tube socket has a container holding part for holding a container. The operation part is capable of operating the container holding part of the tube socket. The control device controls the operation part. The container held by the container holding part is dropped by operating the operation part.
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公开(公告)号：US11497110B2
公开(公告)日：2022-11-08
申请号：US17186423
申请日：2021-02-26
发明人： Yosuke Sato , Akio Ui , Masato Akita , Shotaro Oka , Tomonao Takamatsu , Hiroyuki Yasui , Shinya Matsuda
IPC分类号： H05H1/24
摘要： A dielectric barrier discharge electrode of an embodiment has: a dielectric; a first electrode provided to be exposed on the dielectric; a second electrode provided to be covered by the dielectric; and a third electrode provided to be covered by the dielectric in a neighborhood of the first electrode.
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公开(公告)号：US20220087002A1
公开(公告)日：2022-03-17
申请号：US17192757
申请日：2021-03-04
发明人： Yosuke SATO Sato , Akio Ui , Masato Akita , Shotaro Oka
IPC分类号： H05H1/24
摘要： A dielectric barrier discharge device in an embodiment includes: a dielectric having a hollow-shaped flow path; a first electrode and a second electrode provided apart along the dielectric so as to cause a first region in which plasma is formed inside the flow path; and a power supply to apply a voltage between the first electrode and the second electrode. The dielectric includes a flow path area adjusting portion provided to project from an inner wall of the dielectric toward a center of the flow path in a manner that a first flow path cross-sectional area in the first region is smaller than a second flow path cross-sectional area in a second region other than the first region in the flow path.
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公开(公告)号：US10724942B2
公开(公告)日：2020-07-28
申请号：US15687924
申请日：2017-08-28
摘要： According to one embodiment, an inspection apparatus includes a socket, a first arm, and a recognition device. The socket has at least one container holding part for holding a container containing an object. The first arm includes at least two links of which ends are connected. The first arm is able to install the container into the container holding part when the links are in a first posture and to reinstall the container into the container holding part when the links are in a second posture different from the first posture. The recognition device obtains at least recognition results indicating respective positions of the object when the container is installed into the container holding part in the first posture and the second posture.
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公开(公告)号：US09934944B2
公开(公告)日：2018-04-03
申请号：US15210115
申请日：2016-07-14
发明人： Masato Akita , Akio Ui , Yasushi Sanada
CPC分类号： H01J37/32541 , A61L2/14 , A61L2/202 , A61L9/015 , A61L9/22 , A61L2202/11 , A61L2202/13 , A61L2209/212 , H01J9/18 , H01J37/32348 , H01J37/32844 , H05H1/2406 , H05H2001/2412 , H05H2001/2418 , H05H2001/2437 , Y02C20/30
摘要： In one embodiment, a plasma induced flow electrode structure has an electrode block, an insulating layer and an electrode layer. The electrode block has first and second surfaces and through holes penetrating between these first and second surfaces. The insulating layer is disposed on the first surface and inside the through holes. The electrode layer is disposed on the insulating layer of the first surface.
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公开(公告)号：US09468698B2
公开(公告)日：2016-10-18
申请号：US14633745
申请日：2015-02-27
发明人： Akio Ui , Yosuke Sato , Masato Akita , Yasushi Sanada
CPC分类号： A61L9/16 , A61L9/22 , A61L2209/212 , B01D53/323 , B01D53/8631 , B01D53/869 , B01D2251/104 , B01D2255/802 , B01D2257/406 , B01D2257/702 , B01D2257/708 , B01D2257/90
摘要： A gas processing apparatus of an embodiment includes: first and second dielectric substrates facing with each other; first and second discharge electrodes respectively disposed on a pair of facing principal surfaces of the dielectric substrates; first and second ground electrodes respectively disposed on a pair of principle surfaces at opposite sides of the principle surfaces of the dielectric substrates; a gas flow path to supply gas to be processed between the discharge electrodes; an AC power source to generate first and second plasma-induced flows by applying an AC voltage between the discharge electrodes and the ground electrodes; and a region disposed between the dielectric substrates at downstream of the plasma-induced flows from the discharge electrodes, and a gap between the dielectric substrates being 1.3 times or less of a sum of thicknesses of the plasma-induced flows.
摘要翻译： 实施例的气体处理装置包括：彼此面对的第一和第二电介质基板; 第一和第二放电电极分别设置在电介质基板的一对相对的主表面上; 第一和第二接地电极分别设置在电介质基板的主表面的相对侧上的一对主表面上; 用于在所述放电电极之间提供待处理气体的气体流路; AC电源，通过在放电电极和接地电极之间施加AC电压来产生第一和第二等离子体感应流; 以及设置在电介质基板之间的等离子体引起的来自放电电极的下游的区域，并且电介质基板之间的间隙是等离子体引起的流的厚度之和的1.3倍以下。
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公开(公告)号：US20150004507A1
公开(公告)日：2015-01-01
申请号：US14485260
申请日：2014-09-12
发明人： Norihiro TOMIMATSU , Masato Akita , Ryosuke Yagi
IPC分类号： H01M8/04
CPC分类号： H01M8/04104 , H01M8/04089 , H01M8/04186 , H01M8/04194 , H01M8/04238 , H01M8/04298 , H01M8/04447 , H01M8/04552 , H01M8/04559 , H01M8/04589 , H01M8/04619 , H01M8/04753 , H01M8/04873 , H01M8/0488 , H01M8/04902 , H01M8/0491 , H01M8/0494 , H01M8/1011 , Y02E60/523
摘要： A fuel cell apparatus includes a fuel cell generating electric power, and including a fuel electrode which includes an anode catalyst, which is disposed in one side of an electrolyte membrane, which is supplied with liquid fuel, and which discharges gas generated by a chemical reaction accelerated by the anode catalyst, and an oxidizing agent electrode which includes a cathode catalyst, which is disposed in the other side of the electrolyte membrane, and which is supplied with air, and a control unit controlling a load applied to the fuel cell. The control unit increases the load in at least one of two cases, one case being when electric power generated by the fuel cell lowers below a predetermined reference value and another case being at predetermined time intervals, and stops the increase of the load after elapsing a predetermined time period from the start of the increase of the load.
摘要翻译： 燃料电池装置包括燃料电池产生电力，并且包括燃料电极，其包括设置在电解质膜的一侧的阳极催化剂，所述阳极催化剂被供应液体燃料，并且排出由化学反应产生的气体 由阳极催化剂加速的氧化剂电极和设置在电解质膜的另一侧并被供给空气的阴极催化剂的氧化剂电极以及控制施加到燃料电池的负荷的控制单元。 控制单元在两种情况中的至少一种情况下增加负载，一种情况是当燃料电池产生的电力低于预定基准值，另一种情况是以预定的时间间隔，并且在经过一段时间后停止负载的增加 从负载增加开始的预定时间段。
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