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1.
公开(公告)号:US09908358B2
公开(公告)日:2018-03-06
申请号:US14905856
申请日:2014-07-22
Applicant: KONINKLIJKE PHILIPS N.V.
Inventor: Remco Van Brakel , Marcus Antonius Verschuuren, Jr.
Abstract: A method of manufacturing a patterned stamp (100) for patterning a contoured surface (10) is disclosed. The method comprises providing a pliable stamp layer (120) carrying a pattern of features (122), forcing the pliable stamp layer onto the contoured surface with said pattern of features facing the contoured surface; applying a fluid support layer (130) over the pliable stamp layer on the contoured surface; solidifying the support layer (140) to form the patterned stamp; and removing the patterned stamp from the contoured surface. A corresponding patterned stamp, imprinting method and imprinted article are also disclosed.
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2.
公开(公告)号:US11453232B2
公开(公告)日:2022-09-27
申请号:US15874068
申请日:2018-01-18
Applicant: KONINKLIJKE PHILIPS N.V.
Inventor: Remco Van Brakel , Marcus Antonius Verschuuren
Abstract: A method of manufacturing a patterned stamp for patterning a contoured surface is disclosed. The method comprises providing a pliable stamp layer carrying a pattern of features, forcing the pliable stamp layer onto the contoured surface with said pattern of features facing the contoured surface; applying a fluid support layer over the pliable stamp layer on the contoured surface; solidifying the support layer to form the patterned stamp; and removing the patterned stamp from the contoured surface. A corresponding patterned stamp, imprinting method and imprinted article are also disclosed.
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公开(公告)号:US11086217B2
公开(公告)日:2021-08-10
申请号:US15538354
申请日:2015-12-09
Applicant: KONINKLIJKE PHILIPS N.V.
Inventor: Remco Van Brakel , Marcus Antonius Verschuuren
IPC: G03F7/00 , G03F7/20 , H01L21/027 , G03F7/004 , G03F7/11
Abstract: A method of manufacturing a patterned stamp (100) for patterning a contoured surface (10) is disclosed. The method comprises applying a layer (115) of a pliable material precursor over a master (50) carrying an inverse pattern (52) to form a desired pattern (112) in said layer; curing the pliable material precursor to form a pliable stamp layer (120) comprising said desired pattern; providing an intermediate stamp structure by adhering a porous pliable support layer (130) to the pliable stamp layer; releasing the intermediate stamp structure from the master; forcing the intermediate stamp structure onto the contoured surface with said pattern of features facing the contoured surface; forming the patterned stamp by filling the porous pliable support layer with a filler material to reduce the pliability of the support layer; and removing the patterned stamp from the contoured surface. A corresponding patterned stamp, imprinting method and imprinted article are also disclosed.
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公开(公告)号:US20170089546A1
公开(公告)日:2017-03-30
申请号:US15312338
申请日:2015-05-18
Applicant: KONINKLIJKE PHILIPS N.V.
Inventor: Marcus Antonius Verschuuren , Manuela Lunz , Ke Guo , Gabriel Sebastian Lozano Barbero , Remco Van Brakel
CPC classification number: F21V9/30 , F21K9/64 , G02B5/008 , G02F1/017 , G02F1/01708 , G02F2001/01791 , H01L33/502
Abstract: There is provided an illumination device comprising: a wavelength converting layer comprising a photon emitting donor configured to absorb energy to reach an excited state, and a photon emitting acceptor; an energy source configured to provide energy to the donor such that the donor reach the excited state; wherein the donor and the acceptor are selected and arranged at a distance from each other such that non-radiative transfer of excitation energy from the donor to the acceptor occur, and wherein the acceptor is configured to emit a photon at a second wavelength after the transfer of energy; the illumination device further comprising a periodic plasmonic antenna array, arranged on the substrate and embedded within the wavelength converting layer, and comprising a plurality of individual antenna elements arranged in an antenna array plane, the plasmonic antenna array being configured to support a first lattice resonance at the second wavelength, arising from coupling of localized surface plasmon resonances in the individual antenna elements to photonic modes supported by the system comprising the plasmonic antenna array and the wavelength converting layer, wherein the plasmonic antenna array is configured to comprise plasmon resonance modes such that light emitted from the plasmonic antenna array has an anisotropic angle distribution.
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公开(公告)号:US10946625B2
公开(公告)日:2021-03-16
申请号:US14443181
申请日:2013-12-13
Applicant: KONINKLIJKE PHILIPS N.V.
Inventor: Marcus Antonius Verschuuren , Remco Van Brakel
IPC: B32B27/00 , C09D11/102 , G03F7/00 , C09D11/101 , C08L83/04 , C08L83/06 , B82Y10/00 , G03F7/075 , B82Y40/00 , B32B27/08 , B32B27/28 , B32B3/26
Abstract: Disclosed is a silane-based composition for forming an imprinting ink for imprint lithography applications in which the crosslinking of the silanes in the composition is suppressed by the inclusion of a compound of Formula 3: wherein R9 is selected from the group consisting of C1-C6 linear or branched alkyl groups and a phenyl group, and wherein n is a positive integer having a value of at least 2. An ink may be formed by adding a PAG, photoinitiator or TAG to the composition such upon their activation, the crosslinking reaction is completed. An imprinting method using 10 such an ink is also disclosed.
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公开(公告)号:US10088747B2
公开(公告)日:2018-10-02
申请号:US15129998
申请日:2015-03-20
Applicant: KONINKLIJKE PHILIPS N.V.
Inventor: Marcus Antonius Verschuuren , Remco Van Brakel , Hubertas Wilhelmus Jacobus Jozef Van de Laar
IPC: G03F7/00
Abstract: Disclosed is a method and apparatus for contacting a relief stamping surface of a flexible stamp with a receiving surface of a substrate. The method and apparatus can be used in an imprinting method. During the method and with the apparatus, creation or breaking of contact near a contact front (border) of a preformed contact area in which a part of a locally bent relief stamping surface is in contact with the stamp receiving surface, the speed of such creation or breaking is varied for different parts of the flexible stamp such that this contact front moves over the stamp receiving surface with different speed at different locations along a contact front movement trajectory on the stamp receiving surface. This may be used to optimize throughput when using such method and apparatus.
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公开(公告)号:US09995460B2
公开(公告)日:2018-06-12
申请号:US15312338
申请日:2015-05-18
Applicant: KONINKLIJKE PHILIPS N.V.
Inventor: Marcus Antonius Verschuuren , Manuela Lunz , Ke Guo , Gabriel Sebastian Lozano Barbero , Remco Van Brakel
CPC classification number: F21V9/30 , F21K9/64 , G02B5/008 , G02F1/017 , G02F1/01708 , G02F2001/01791 , H01L33/502
Abstract: There is provided an illumination device comprising: a wavelength converting layer comprising a photon emitting donor configured to absorb energy to reach an excited state, and a photon emitting acceptor; an energy source configured to provide energy to the donor such that the donor reach the excited state; wherein the donor and the acceptor are selected and arranged at a distance from each other such that non-radiative transfer of excitation energy from the donor to the acceptor occur, and wherein the acceptor is configured to emit a photon at a second wavelength after the transfer of energy; the illumination device further comprising a periodic plasmonic antenna array, arranged on the substrate and embedded within the wavelength converting layer, and comprising a plurality of individual antenna elements arranged in an antenna array plane, the plasmonic antenna array being configured to support a first lattice resonance at the second wavelength, arising from coupling of localized surface plasmon resonances in the individual antenna elements to photonic modes supported by the system comprising the plasmonic antenna array and the wavelength converting layer, wherein the plasmonic antenna array is configured to comprise plasmon resonance modes such that light emitted from the plasmonic antenna array has an anisotropic angle distribution.
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公开(公告)号:US20150291815A1
公开(公告)日:2015-10-15
申请号:US14443181
申请日:2013-12-13
Applicant: KONINKLIJKE PHILIPS N.V.
Inventor: Marcus Antonius Verschuuren , Remco Van Brakel
IPC: C09D11/02 , C09D11/102 , G03F7/00
CPC classification number: C09D11/02 , B82Y10/00 , B82Y40/00 , C08L83/04 , C08L83/06 , C09D11/101 , C09D11/102 , G03F7/0002 , G03F7/0757
Abstract: Disclosed is a silane-based composition for forming an imprinting ink for imprint lithography applications in which the crosslinking of the silanes in the composition is suppressed by the inclusion of a compound of Formula 3: wherein R9 is selected from the group consisting of C1-C6 linear or branched alkyl groups and a phenyl group, and wherein n is a positive integer having a value of at least 2. An ink may be formed by adding a PAG, photoinitiator or TAG to the composition such upon their activation, the crosslinking reaction is completed. An imprinting method using 10 such an ink is also disclosed.
Abstract translation: 公开了用于形成用于压印光刻应用的压印油墨的硅烷基组合物,其中通过包含式3化合物来抑制组合物中硅烷的交联:其中R 9选自C 1 -C 6 直链或支链烷基和苯基,其中n为至少为2的正整数。可以通过在组合物中活化后加入PAG,光引发剂或TAG,形成油墨,交联反应为 完成 还公开了使用10种这样的油墨的压印方法。
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