Integrated circuits utilizing amorphous oxides
    1.
    发明授权
    Integrated circuits utilizing amorphous oxides 有权
    采用无定形氧化物的集成电路

    公开(公告)号:US08203146B2

    公开(公告)日:2012-06-19

    申请号:US12882404

    申请日:2010-09-15

    IPC分类号: H01L31/20

    CPC分类号: H01L29/7869

    摘要: Semiconductor devices and circuits with use of transparent oxide film are provided. The semiconductor device having a P-type region and an N-type region, wherein amorphous oxides with electron carrier concentration less than 1018/cm3 is used for the N-type region.

    摘要翻译: 提供了使用透明氧化膜的半导体器件和电路。 具有P型区域和N型区域的半导体器件,其中电子载流子浓度小于1018 / cm3的非晶形氧化物用于N型区域。

    INTEGRATED CIRCUITS UTILIZING AMORPHOUS OXIDES
    3.
    发明申请
    INTEGRATED CIRCUITS UTILIZING AMORPHOUS OXIDES 有权
    集成电路利用非晶态氧化物

    公开(公告)号:US20110024741A1

    公开(公告)日:2011-02-03

    申请号:US12882404

    申请日:2010-09-15

    IPC分类号: H01L29/26

    CPC分类号: H01L29/7869

    摘要: Semiconductor devices and circuits with use of transparent oxide film are provided. The semiconductor device having a P-type region and an N-type region, wherein amorphous oxides with electron carrier concentration less than 1018/cm3 is used for the N-type region.

    摘要翻译: 提供了使用透明氧化膜的半导体器件和电路。 具有P型区域和N型区域的半导体器件,其中电子载流子浓度小于1018 / cm3的非晶形氧化物用于N型区域。

    Integrated circuits utilizing amorphous oxides
    4.
    发明授权
    Integrated circuits utilizing amorphous oxides 有权
    采用无定形氧化物的集成电路

    公开(公告)号:US07863611B2

    公开(公告)日:2011-01-04

    申请号:US11269646

    申请日:2005-11-09

    IPC分类号: H01L31/20

    CPC分类号: H01L29/7869

    摘要: Semiconductor devices and circuits with use of transparent oxide film are provided. The semiconductor device having a P-type region and an N-type region, wherein amorphous oxides with electron carrier concentration less than 1018/cm3 is used for the N-type region.

    摘要翻译: 提供了使用透明氧化膜的半导体器件和电路。 具有P型区域和N型区域的半导体器件,其中电子载流子浓度小于1018 / cm3的非晶形氧化物用于N型区域。

    SWITCHING ELEMENT
    5.
    发明申请
    SWITCHING ELEMENT 审中-公开
    开关元件

    公开(公告)号:US20120012838A1

    公开(公告)日:2012-01-19

    申请号:US13243244

    申请日:2011-09-23

    IPC分类号: H01L29/26

    摘要: A switching element of LCDs or organic EL displays which uses a thin film transistor device, includes: a drain electrode, a source electrode, a channel layer contacting the drain electrode and the source electrode, wherein the channel layer comprises indium-gallium-zinc oxide having a transparent, amorphous state of a composition equivalent to InGaO3(ZnO)m (wherein m is a natural number less than 6) in a crystallized state, and the channel layer has a semi-insulating property represented by an electron mobility of more than 1 cm2/(V·sec) and an electron carrier concentration is less than 1018/cm3, a gate electrode, and a gate insulating film positioned between the gate electrode and the channel layer.

    摘要翻译: 使用薄膜晶体管器件的LCD或有机EL显示器的开关元件包括:漏电极,源电极,与漏电极和源电极接触的沟道层,其中沟道层包括铟镓锌氧化物 具有在结晶化状态下等价于InGaO 3(ZnO)m(其中m为小于6的自然数)的组成的透明非晶状态,并且沟道层具有以电子迁移率表示的半绝缘性 1cm 2 /(V·sec),电子载流子浓度小于1018 / cm3,栅电极和栅极绝缘膜位于栅电极和沟道层之间。