INTEGRATED CIRCUITS UTILIZING AMORPHOUS OXIDES
    1.
    发明申请
    INTEGRATED CIRCUITS UTILIZING AMORPHOUS OXIDES 有权
    集成电路利用非晶态氧化物

    公开(公告)号:US20110024741A1

    公开(公告)日:2011-02-03

    申请号:US12882404

    申请日:2010-09-15

    IPC分类号: H01L29/26

    CPC分类号: H01L29/7869

    摘要: Semiconductor devices and circuits with use of transparent oxide film are provided. The semiconductor device having a P-type region and an N-type region, wherein amorphous oxides with electron carrier concentration less than 1018/cm3 is used for the N-type region.

    摘要翻译: 提供了使用透明氧化膜的半导体器件和电路。 具有P型区域和N型区域的半导体器件,其中电子载流子浓度小于1018 / cm3的非晶形氧化物用于N型区域。

    Integrated circuits utilizing amorphous oxides
    2.
    发明授权
    Integrated circuits utilizing amorphous oxides 有权
    采用无定形氧化物的集成电路

    公开(公告)号:US07863611B2

    公开(公告)日:2011-01-04

    申请号:US11269646

    申请日:2005-11-09

    IPC分类号: H01L31/20

    CPC分类号: H01L29/7869

    摘要: Semiconductor devices and circuits with use of transparent oxide film are provided. The semiconductor device having a P-type region and an N-type region, wherein amorphous oxides with electron carrier concentration less than 1018/cm3 is used for the N-type region.

    摘要翻译: 提供了使用透明氧化膜的半导体器件和电路。 具有P型区域和N型区域的半导体器件,其中电子载流子浓度小于1018 / cm3的非晶形氧化物用于N型区域。

    Integrated circuits utilizing amorphous oxides
    3.
    发明授权
    Integrated circuits utilizing amorphous oxides 有权
    采用无定形氧化物的集成电路

    公开(公告)号:US08203146B2

    公开(公告)日:2012-06-19

    申请号:US12882404

    申请日:2010-09-15

    IPC分类号: H01L31/20

    CPC分类号: H01L29/7869

    摘要: Semiconductor devices and circuits with use of transparent oxide film are provided. The semiconductor device having a P-type region and an N-type region, wherein amorphous oxides with electron carrier concentration less than 1018/cm3 is used for the N-type region.

    摘要翻译: 提供了使用透明氧化膜的半导体器件和电路。 具有P型区域和N型区域的半导体器件,其中电子载流子浓度小于1018 / cm3的非晶形氧化物用于N型区域。