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公开(公告)号：US06444132B1
公开(公告)日：2002-09-03
申请号：US09294747
申请日：1999-04-19
IPC分类号： G11B5127
CPC分类号： G11B5/3103 , C09G1/02 , G11B5/1871 , G11B5/3116 , G11B5/3903
摘要： This invention relates to free abrasive slurries suited for use in polishing workpieces composed of materials varying in hardness, uniformly without selective polishing or working without difference in the amounts of polishing for different materials. The subject matter of this invention is a free abrasive slurry composition for polishing workpieces in which at least one soft material with a Vickers hardness in the range of 26 to 360 and at least one hard material with a Vickers hardness in the range of 700 to 4000 are mixedly present, comprising a polyol with a molecular weight ranging from 300 to 20000, a polishing powder, a dispersion medium, and optionally a surfactant.
摘要翻译： 本发明涉及适用于抛光工件的自由研磨浆料，该工件由硬度均匀的材料组成，均匀而无选择性抛光或加工，而不同材料的抛光量不同。 本发明的主题是用于抛光工件的自由磨料浆料组合物，其中至少一种维氏硬度在26至360度范围内的软质材料和至少一种维氏硬度在700至4000范围内的硬质材料 混合存在，包含分子量范围为300-20000的多元醇，抛光粉，分散介质和任选的表面活性剂。
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公开(公告)号：US06383239B1
公开(公告)日：2002-05-07
申请号：US09522115
申请日：2000-03-09
申请人： Yasuyuki Suzuki , Tomohiro Kaku , Isao Saito , Kazuya Orii , Yasutoshi Fujita , Masao Yamaguchi , Masahiro Sasaki
发明人： Yasuyuki Suzuki , Tomohiro Kaku , Isao Saito , Kazuya Orii , Yasutoshi Fujita , Masao Yamaguchi , Masahiro Sasaki
IPC分类号： C09K314
CPC分类号： C09G1/02 , C09K3/1472
摘要： The present invention relates to a free abrasive slurry composition which is advantageously used in uniform grinding of a composite material composed of a plurality of materials each having different hardness, without causing selective grinding. The free abrasive slurry composition contains abrasive particles, an anti-abrasion agent as an anti-selective grinding agent and a dispersion medium and the anti-abrasive agent is a compound containing one or both of sulfur and phosphorus or hydroxyl group(s) in the molecular chain.
摘要翻译： 本发明涉及一种自由磨料浆料组合物，其有利地用于均匀研磨由多种具有不同硬度的材料组成的复合材料，而不会引起选择性研磨。 游离研磨剂浆料组合物含有磨料颗粒，作为抗选择性研磨剂的抗磨剂和分散介质，抗磨剂是含有硫和磷或羟基中的一个或两个的化合物 分子链。
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公开(公告)号：US06500049B2
公开(公告)日：2002-12-31
申请号：US09747684
申请日：2000-12-26
IPC分类号： B24B100
CPC分类号： B24B37/048 , B24B37/042
摘要： The present invention relates to a lapping oil composition which is advantageously used in finish-grinding of a material to provide a high-quality grinding surface, without selective grinding, which is generally caused during lapping and polishing processes of the composite material. The lapping oil composition contains at least one acetylene glycol compound and preferably further contains at least one at least one phosphoric ester compound.
摘要翻译： 研磨油组合物本发明涉及一种研磨油组合物，其有利地用于材料的精磨，以提供通常在复合材料的研磨和抛光工艺期间引起的高质量研磨表面，而无需选择性研磨。 研磨油组合物含有至少一种炔二醇化合物，优选还含有至少一种至少一种磷酸酯化合物。
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公开(公告)号：US6095895A
公开(公告)日：2000-08-01
申请号：US81785
申请日：1998-05-20
CPC分类号： B24B41/06 , B24B37/048 , G11B5/1871 , G11B5/3103 , G11B5/3116 , G11B5/3163 , G11B5/3967
摘要： A processing jig comprises a main body including a material retainer for retaining a magnetic head material at the lower end thereof. The main body has a hole for fixing in its longitudinal mid-section and in a position above the middle along the vertical direction. A bolt is inserted into the hole for fixing the main body to a jig fixing plate of the processing apparatus. The jig is fixed to the processing apparatus with the bolt inserted into the hole only at the one point in the longitudinal mid-section.
摘要翻译： 加工夹具包括：主体，其包括用于在其下端保持磁头材料的材料保持器。 主体具有用于在其纵向中间部分中以及沿着垂直方向在中间上方的位置固定的孔。 将螺栓插入孔中，用于将主体固定到加工设备的夹具固定板上。 夹具固定在加工设备上，螺栓仅在纵向中间部分的一点插入孔中。
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公开(公告)号：US06497611B2
公开(公告)日：2002-12-24
申请号：US09767881
申请日：2001-01-24
IPC分类号： B24B4900
CPC分类号： B24B53/017 , B24B37/048 , G11B5/3103 , G11B5/3116 , G11B5/3163
摘要： Disclosed is a method of polishing a magnetic head slider whereby a by-processed step can be easily reduced. An air bearing surface of the magnetic head slider is polished with setting a bar that includes the magnetic head slider where a thin film magnetic head element is formed to reciprocate in a radius direction of a polishing plate, as well as rotating the polishing plate having a polishing surface. Polishing steps include a first polishing step of performing a height polish while rotating the polishing plate at a first velocity, and a second polishing step of performing a finishing polish while rotating the polishing plate at a second velocity sufficiently lower than the first velocity. The second velocity at the second polishing step is set so that an average linear velocity in the direction of the rotation of the polishing plate is equal to or lower than 0.032 m/s (preferably equal to or lower than 0.008 m/s). Consequently, the by-processed step that is generated on the air bearing surface of the magnetic head slider is reduced.
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公开(公告)号：USRE41329E1
公开(公告)日：2010-05-11
申请号：US11493942
申请日：2006-07-27
申请人： Hiroshi Shindou , Masahiro Sasaki , Akio Ogawa , Tetsuo Abe , Masaki Kouzu , Masao Yamaguchi
发明人： Hiroshi Shindou , Masahiro Sasaki , Akio Ogawa , Tetsuo Abe , Masaki Kouzu , Masao Yamaguchi
CPC分类号： G11B5/3103 , B24B37/048 , B24B49/16 , G11B5/3116 , G11B5/3163 , G11B5/3169 , G11B5/3173 , G11B5/3967
摘要： To provide an apparatus that may impart a complicated bend deformation to an object to be machined such as a ceramic bar elongated in one direction or the like, and may reduce the non-uniformity in machining amount of the object to be machined upon the machining work of the object to be machined, specifically a correcting mechanism for deforming the object to be machined together with a jig holding the object to be machined is provided in a machining apparatus. The correcting mechanism includes a base, a plurality of levers provided at first ends with pins, a shaft fixed to the base for rotatably supporting the levers, and a plurality of correcting drive means coupled to second ends of said levers for pivoting the levers to the shaft to thereby pivoting the pins. The jig includes a plurality of load receiving portions arranged in a holding portion elongated on one direction for holding the object to be machined whereby portions corresponding to the load receiving portion in the holding portion are deformed together with the object to be machined in accordance with pivoting of each pin.
摘要翻译： 为了提供一种能够对诸如在一个方向等上延伸的陶瓷棒等被加工物体施加复杂的弯曲变形的装置，并且可以减少加工时加工对象物的加工量的不均匀性 具体地说，一种用于使待加工物体与夹具被加工物的夹具一起使其变形的校正机构设置在加工装置中。 校正机构包括基座，多个杆，其在第一端设置有销，固定到基座的轴可旋转地支撑杠杆;以及多个校正驱动装置，联接到所述杠杆的第二端，用于将杠杆转动到 从而枢转销。 夹具包括多个负载接收部，其布置在沿一个方向伸长的保持部分中，用于保持待加工物体，从而与保持部分中的负载接收部分相对应的部分与待加工物体一起根据枢转 的每个引脚。
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7.发明授权公开(公告)号：US06859678B1
公开(公告)日：2005-02-22
申请号：US09592291
申请日：2000-06-12
CPC分类号： G11B5/3166 , G11B5/3169 , G11B5/3173 , G11B5/39 , H01F41/14
摘要： Provided are a method and an apparatus for manufacturing a magnetoresistive element and a method and an apparatus for manufacturing a magnetic head which can reduce variation in properties of an magnetoresistive element and variation in the median of distribution.Before starting polishing, wafer information containing various types of factors in a wafer stage which may have an influence on a resistance value of a final MR film is obtained, and an S value is calculated from the information by using a statistical scheme. During a polishing step, ongoing-work-information containing various types of factors in a polishing stage which may have an influence on the resistance value of the final MR film is obtained at regular intervals. A K value is calculated from the information by using the statistical scheme. Then, an MR resistance estimate during the polishing step is calculated from the S value and the K value. When the MR resistance estimate reaches a target resistance value , polishing is stopped.
摘要翻译： 提供一种用于制造磁阻元件的方法和装置，以及用于制造磁头的方法和装置，其可以减小磁阻元件的性质变化和分布中值的变化。在开始抛光之前，包含各种类型的晶片信息 可以获得可能对最终MR膜的电阻值产生影响的晶片级中的因子，并且通过使用统计方案从该信息计算出S值。 在抛光步骤中，以规则的间隔获得在抛光阶段包含可能对最终MR膜的电阻值有影响的各种因素的正在进行的工作信息。 通过使用统计方案从信息计算K值。 然后，根据S值和K值计算研磨步骤期间的MR电阻估计。 当MR电阻估计值达到目标电阻值时，停止抛光。
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公开(公告)号：US06767275B2
公开(公告)日：2004-07-27
申请号：US09789547
申请日：2001-02-22
申请人： Hiroshi Shindou , Masahiro Sasaki , Akio Ogawa , Tetsuo Abe , Masaki Kouzu , Masao Yamaguchi
发明人： Hiroshi Shindou , Masahiro Sasaki , Akio Ogawa , Tetsuo Abe , Masaki Kouzu , Masao Yamaguchi
IPC分类号： B24B900
CPC分类号： G11B5/3103 , B24B37/048 , B24B49/16 , G11B5/3116 , G11B5/3163 , G11B5/3169 , G11B5/3173 , G11B5/3967
摘要： To provide an apparatus that may impart a complicated bend deformation to an object to be machined such as a ceramic bar elongated in one direction or the like, and may reduce the non-uniformity in machining amount of the object to be machined upon the machining work of the object to be machined, specifically a correcting mechanism for deforming the object to be machined together with a jig holding the object to be machined is provided in a machining apparatus. The correcting mechanism includes a base, a plurality of levers provided at first ends with pins, a shaft fixed to the base for rotatably supporting the levers, and a plurality of correcting drive means coupled to second ends of said levers for pivoting the levers to the shaft to thereby pivoting the pins. The jig includes a plurality of load receiving portions arranged in a holding portion elongated on one direction for holding the object to be machined whereby portions corresponding to the load receiving portion in the holding portion are deformed together with the object to be machined in accordance with pivoting of each pin.
摘要翻译： 为了提供一种能够对诸如在一个方向等上延伸的陶瓷棒等被加工物体施加复杂的弯曲变形的装置，并且可以减少加工时加工对象物的加工量的不均匀性 具体地说，一种用于使待加工物体与夹具被加工物的夹具一起变形的校正机构设置在加工装置中。 校正机构包括基座，多个杆，其在第一端设置有销，固定到基座的轴可旋转地支撑杠杆;以及多个校正驱动装置，联接到所述杠杆的第二端，用于将杠杆转动到 从而枢转销。 夹具包括多个负载接收部，其布置在沿一个方向伸长的保持部分中，用于保持待加工物体，从而与保持部分中的负载接收部分相对应的部分与待加工物体一起根据枢转 的每个引脚。
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公开(公告)号：US06623336B2
公开(公告)日：2003-09-23
申请号：US09788558
申请日：2001-02-21
申请人： Hiroshi Shindou , Masahiro Sasaki , Akio Ogawa , Tetsuo Abe , Masaki Kouzu , Masao Yamaguchi
发明人： Hiroshi Shindou , Masahiro Sasaki , Akio Ogawa , Tetsuo Abe , Masaki Kouzu , Masao Yamaguchi
IPC分类号： B24B900
CPC分类号： G11B5/3116 , B24B37/048 , B24B49/16 , G11B5/3103 , G11B5/3163 , G11B5/3173
摘要： When electric elements are formed on a ceramic bar or the like, the positional displacement of the respective elements occurs due to a division exposing process or the like. An object of the present invention is to provide a device and a method which unify the non-polished portion of the respective elements by conducting polishing while a complicated deformation or the like is given to the ceramic bar. To achieve this object, the ceramic bar or like is held by using a jig, and a plurality of loads are applied to portions of the jig where the ceramic bar or the like is held, to thereby deform the ceramic bar or the like and polish the element in that state. In this situation the load applied points are disposed so as to avoid the boundaries of the division exposure.
摘要翻译： 当电元件形成在陶瓷棒等上时，由于分割曝光处理等，各元件的位置偏移。 本发明的目的是提供一种通过进行抛光来统一未磨光部分的装置和方法，同时向陶瓷棒施加复杂的变形等。 为了实现该目的，通过使用夹具来保持陶瓷棒等，并且将多个负载施加到夹具的陶瓷棒等的夹持部分，从而使陶瓷棒等发生变形和抛光 该状态中的元素。 在这种情况下，负载施加点被设置为避免划分曝光的边界。
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公开(公告)号：US09435514B2
公开(公告)日：2016-09-06
申请号：US14347646
申请日：2012-09-10
申请人： Hiroshi Takatori , Masao Yamaguchi
发明人： Hiroshi Takatori , Masao Yamaguchi
CPC分类号： F21V13/02 , G02B6/003 , G02B6/0031 , G02B6/0053 , G02B6/0096 , G02F1/133602 , G09F13/04 , G09F13/0409 , G09F13/14 , G09F2013/049 , G09F2013/147
摘要： In a surface light source device (1), a positive reflective region (23) of a reflective member (20) that is disposed on the bottom surface (4) of a housing (2) reflects light output by a light emitting device (14) toward a direction away from the light emitting device (14). As a result, the brightness of the light in the proximity of the light emitting device (14) of the surface shaped illuminating light output by a light emitting surface member (3) can be suppressed, and the brightness of light of a central part (position furthest away from the light emitting device (14)) of the surface shaped illuminating light output by the light emitting surface member (3) can be increased.
摘要翻译： 在表面光源装置（1）中，设置在壳体（2）的底面（4）上的反射构件（20）的正反射区域（23）反射由发光装置（14）输出的光 ）朝向远离发光器件（14）的方向。 结果，可以抑制由发光面部件（3）输出的表面形状的照明光的发光器件（14）附近的光的亮度，并且可以抑制中心部分 可以增加由发光面构件（3）输出的表面形状的照明光的距离发光装置（14）最远的位置。
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