Production method and production device for thin film
    4.
    发明申请
    Production method and production device for thin film 审中-公开
    薄膜生产方法及生产装置

    公开(公告)号:US20050087141A1

    公开(公告)日:2005-04-28

    申请号:US10509463

    申请日:2003-03-24

    摘要: An electron beam evaporation source (42) that contains a first thin film material, an electron beam source (44) that emits an electron beam (45) to be used to evaporate the first thin film material by heating, and a resistance heating evaporation source (48) for evaporating a second thin film material by heating using a resistance heating method are arranged so that the electron beam (45) passes through a vapor stream of the second thin film material. Thus, evaporated atoms of the second thin film material can be ionized. As a result, a thin film having improved properties and increased mechanical strength can be formed. Further, since it is no longer necessary to use another device for ionizing the evaporated atoms of the second thin film material, the complication of a configuration and a cost increase can be prevented.

    摘要翻译: 包含第一薄膜材料的电子束蒸发源(42),发射用于通过加热蒸发第一薄膜材料的电子束(45)的电子束源(44)和电阻加热蒸发源 通过使用电阻加热法加热来蒸发第二薄膜材料的第四薄膜材料(48)被布置成使得电子束(45)通过第二薄膜材料的蒸气流。 因此,可以离子化第二薄膜材料的蒸发原子。 结果,可以形成具有改善的性能和增加的机械强度的薄膜。 此外,由于不再需要使用用于电离第二薄膜材料的蒸发原子的另一装置,可以防止配置的复杂化和成本增加。

    HEATING APPARATUS, VACUUM-HEATING METHOD AND METHOD FOR MANUFACTURING THIN FILM
    10.
    发明申请
    HEATING APPARATUS, VACUUM-HEATING METHOD AND METHOD FOR MANUFACTURING THIN FILM 审中-公开
    加热装置,真空加热方法和制造薄膜的方法

    公开(公告)号:US20130189424A1

    公开(公告)日:2013-07-25

    申请号:US13820141

    申请日:2012-06-28

    IPC分类号: H01M10/04

    摘要: Provided is a heating apparatus including: an object to be heated under vacuum; a heating body separable from the object to be heated, the heating body being configured so that a gap is formed between the heating body itself and the object to be heated; and a gas introduction channel for introducing a heat transfer gas into the gap. The object to be heated is heated by the heating body via the heat transfer gas. An example of the heating apparatus is a deposition apparatus 30. An example of the object to be heated is a storage container 9 that holds a deposition material and that has an opening for allowing the deposition material that has been vaporized to pass therethrough. An example of the heating body is a heating container 10 that detachably accommodates the storage container 9 and that has a heater 20 for heating the deposition material in the storage container 9. An example of the gas introduction channel is the gas introduction tube 11.

    摘要翻译: 本发明提供一种加热装置,包括:真空加热对象物; 加热体,其与被加热物体分离,所述加热体构造成在所述加热体本体与被加热体之间形成间隙, 以及用于将传热气体引入到间隙中的气体导入通道。 待加热物体由加热体通过传热气体加热。 加热装置的一个实例是沉积装置30.被加热物体的一个实例是保持沉积材料的储存容器9,并且具有允许已被蒸发的沉积材料通过的开口。 加热体的一个实例是可拆卸地容纳储存容器9的加热容器10,并且具有用于加热储存容器9中的沉积材料的加热器20.气体导入通道的一个例子是气体导入管11。