Production method and production device for thin film
    7.
    发明申请
    Production method and production device for thin film 审中-公开
    薄膜生产方法及生产装置

    公开(公告)号:US20050087141A1

    公开(公告)日:2005-04-28

    申请号:US10509463

    申请日:2003-03-24

    摘要: An electron beam evaporation source (42) that contains a first thin film material, an electron beam source (44) that emits an electron beam (45) to be used to evaporate the first thin film material by heating, and a resistance heating evaporation source (48) for evaporating a second thin film material by heating using a resistance heating method are arranged so that the electron beam (45) passes through a vapor stream of the second thin film material. Thus, evaporated atoms of the second thin film material can be ionized. As a result, a thin film having improved properties and increased mechanical strength can be formed. Further, since it is no longer necessary to use another device for ionizing the evaporated atoms of the second thin film material, the complication of a configuration and a cost increase can be prevented.

    摘要翻译: 包含第一薄膜材料的电子束蒸发源(42),发射用于通过加热蒸发第一薄膜材料的电子束(45)的电子束源(44)和电阻加热蒸发源 通过使用电阻加热法加热来蒸发第二薄膜材料的第四薄膜材料(48)被布置成使得电子束(45)通过第二薄膜材料的蒸气流。 因此,可以离子化第二薄膜材料的蒸发原子。 结果,可以形成具有改善的性能和增加的机械强度的薄膜。 此外,由于不再需要使用用于电离第二薄膜材料的蒸发原子的另一装置,可以防止配置的复杂化和成本增加。