Emulsion For Aqueous Inkjet Ink
    1.
    发明申请
    Emulsion For Aqueous Inkjet Ink 审中-公开
    水性喷墨油墨乳液

    公开(公告)号:US20080097058A1

    公开(公告)日:2008-04-24

    申请号:US11794251

    申请日:2006-01-05

    IPC分类号: C08F2/10

    CPC分类号: C09D11/30 C09D11/16 C09D11/18

    摘要: This invention relates to an aqueous ink jet ink emulsion obtained by emulsion polymerization of (b) an ethylenic unsaturated bond-containing monomer under the presence of (a) a hydrophilic group-, hydrophobic group- and radical reactive group-containing reactive emulsifier, and there is provided an additive (polymer emulsion) having an effect of improving print quality (print density, abrasion resistance and glossiness) of printed matter by adding the emulsion to an aqueous ink.

    摘要翻译: 本发明涉及通过在(a)含亲水基团,含疏水基团和基团反应性基团的反应性乳化剂存在下(b)含烯属不饱和键的单体的乳液聚合获得的水性喷墨油墨乳液,以及 通过将乳液添加到水性油墨中,提供了具有改善印刷品的印刷质量(印刷密度,耐磨性和光泽度)的效果的添加剂(聚合物乳液)。

    Ink composition for ink jet recording
    2.
    发明申请
    Ink composition for ink jet recording 有权
    用于喷墨记录的油墨组合物

    公开(公告)号:US20060160923A1

    公开(公告)日:2006-07-20

    申请号:US11322155

    申请日:2005-12-29

    IPC分类号: C03C17/00

    CPC分类号: C09D11/30 Y10T428/31855

    摘要: There is provided an ink composition which can yield images having silver salt photograph-like gloss and is also excellent in fixation, lightfastness, and gasfastness of recorded images. The ink composition comprises: a resin produced by emulsion polymerization of an ethylenically unsaturated monomer in the presence of a reactive emulsifier containing a hydrophilic group, a hydrophobic group and a radical reactive group; water; and a pigment.

    摘要翻译: 提供了一种油墨组合物,其可以产生具有银盐照片样光泽的图像,并且记录图像的固色性,耐光性和耐气体性也优异。 油墨组合物包括:在含有亲水基团,疏水基团和自由基反应性基团的反应性乳化剂存在下通过烯属不饱和单体的乳液聚合制备的树脂; 水; 和颜料。

    Cleaning agent for semiconductor parts and method for cleaning semiconductor parts
    5.
    发明授权
    Cleaning agent for semiconductor parts and method for cleaning semiconductor parts 有权
    用于半导体部件的清洁剂和用于清洁半导体部件的方法

    公开(公告)号:US06440856B1

    公开(公告)日:2002-08-27

    申请号:US09661449

    申请日:2000-09-13

    IPC分类号: H01L21302

    摘要: Provided are a cleaning agent for semiconductor parts, which can decrease a load on the environment and has a high cleaning effect on CMP (chemical mechanical polishing) abrasive particles, metallic impurities and other impurities left on the semiconductor parts such as semiconductor substrates after the CMP, comprising a (co)polymer having at least one kind of group selected from the group consisting of sulfonic acid (salt) groups and carboxylic acid (salt) groups, the cleaning agent further containing a phosphonic acid (salt) group-containing (co)polymer, a phosphonic acid compound or a surfactant as needed; and a method for cleaning semiconductor parts with the above cleaning agent.

    摘要翻译: 提供一种用于半导体部件的清洁剂,其能够降低对环境的负担,并且对CMP(化学机械抛光)磨料颗粒,残留在诸如半导体衬底之后的半导体部件上的金属杂质和其它杂质的CMP(化学机械抛光) ,包含具有选自磺酸(盐)基和羧酸(盐)基团中的至少一种基团的(共)聚合物,所述清洗剂还含有含膦酸(盐)基团(共 )聚合物,膦酸化合物或表面活性剂; 以及用上述清洗剂清洗半导体部件的方法。

    Catalyst paste composition for electrode
    7.
    发明授权
    Catalyst paste composition for electrode 有权
    用于电极的催化剂浆料组合物

    公开(公告)号:US07060748B2

    公开(公告)日:2006-06-13

    申请号:US10483421

    申请日:2003-05-20

    IPC分类号: C08L3/04 C08L3/09 C08L9/00

    摘要: A catalyst paste composition for making electrodes has a uniform dispersion condition of a carbon black supporting a hydrogen reduction catalyst and is excellent in storage stability. The catalyst paste composition comprises a carbon black supporting a hydrogen reduction catalyst, an electrolyte, a water-soluble sulfonated polymer and a solvent.

    摘要翻译: 用于制造电极的催化剂浆料组合物具有支撑氢还原催化剂的炭黑的均匀分散条件,并且储存稳定性优异。 催化剂浆料组合物包含支持氢还原催化剂的炭黑,电解质,水溶性磺化聚合物和溶剂。