摘要:
This invention relates to an aqueous ink jet ink emulsion obtained by emulsion polymerization of (b) an ethylenic unsaturated bond-containing monomer under the presence of (a) a hydrophilic group-, hydrophobic group- and radical reactive group-containing reactive emulsifier, and there is provided an additive (polymer emulsion) having an effect of improving print quality (print density, abrasion resistance and glossiness) of printed matter by adding the emulsion to an aqueous ink.
摘要:
There is provided an ink composition which can yield images having silver salt photograph-like gloss and is also excellent in fixation, lightfastness, and gasfastness of recorded images. The ink composition comprises: a resin produced by emulsion polymerization of an ethylenically unsaturated monomer in the presence of a reactive emulsifier containing a hydrophilic group, a hydrophobic group and a radical reactive group; water; and a pigment.
摘要:
There is provided an ink composition which can yield images having silver salt photograph-like gloss and is also excellent in fixation, lightfastness, and gasfastness of recorded images. The ink composition comprises: a resin produced by emulsion polymerization of an ethylenically unsaturated monomer in the presence of a reactive emulsifier containing a hydrophilic group, a hydrophobic group and a radical reactive group; water; and a pigment.
摘要:
An ink-jet recording water-based ink composition includes a polymer obtained by emulsion polymerization of a monomer having an ethylene-type unsaturated bond in the molecule and divinylbenzene in the presence of a reactive emulsifier, a polyethylene-based wax, a water-soluble resin, water, and a colorant. When ink coat is formed on a plastic film having a degree of gloss at 60° of 140 to 150 by discharging droplets of the ink composition onto the plastic film, the ink coat has a degree of gloss at 60° within a range of 50 to 120.
摘要:
Provided are a cleaning agent for semiconductor parts, which can decrease a load on the environment and has a high cleaning effect on CMP (chemical mechanical polishing) abrasive particles, metallic impurities and other impurities left on the semiconductor parts such as semiconductor substrates after the CMP, comprising a (co)polymer having at least one kind of group selected from the group consisting of sulfonic acid (salt) groups and carboxylic acid (salt) groups, the cleaning agent further containing a phosphonic acid (salt) group-containing (co)polymer, a phosphonic acid compound or a surfactant as needed; and a method for cleaning semiconductor parts with the above cleaning agent.
摘要:
There is disclosed acrylate-terminated oligomers which are radiation-curable and which can be pigmented with magnetizable power to cure on electron beam exposure to provide superior magnetic recording structures. These oligomers include sulfonic acid groups which improve pigment wetting and which can be included in amide-containing compounds.
摘要:
A catalyst paste composition for making electrodes has a uniform dispersion condition of a carbon black supporting a hydrogen reduction catalyst and is excellent in storage stability. The catalyst paste composition comprises a carbon black supporting a hydrogen reduction catalyst, an electrolyte, a water-soluble sulfonated polymer and a solvent.
摘要:
A curable resin composition adapted for bundling coated optical fibers comprises:(A) polyetherpolyurethanes of at least one kind having an ethylenically unsaturated group and containing from 40% to 85%, by weight, of a tetramethyleneoxy structure in the entire structure thereof;(B) ethylenically unsaturated monomer; and(C) a photopolymerization initiator. This resin composition, when cured, has a coefficient of dynamic friction with polyethylene of not more than 0.4, and is thus specially adapted for use in holding together coated optical fibers in a tape-like structure.