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    Techniques for processing a substrate
    1.
    发明授权
    Techniques for processing a substrate 有权
    用于处理基材的技术

    公开(公告)号：US08900982B2

    公开(公告)日：2014-12-02

    申请号：US12756036

    申请日：2010-04-07

    申请人： Kevin M. Daniels ,  Russell L. Low ,  Nicholas P. T. Bateman ,  Benjamin B. Riordon

    发明人： Kevin M. Daniels ,  Russell L. Low ,  Nicholas P. T. Bateman ,  Benjamin B. Riordon

    IPC分类号： H01L21/266 ,  H01J37/317

    CPC分类号： C23C14/042 ,  C23C14/48 ,  H01J37/3171 ,  H01J2237/08 ,  H01J2237/303 ,  H01J2237/31711 ,  H01L21/266

    摘要： Herein, an improved technique for processing a substrate is disclosed. In one particular exemplary embodiment, the technique may be achieved using a mask for processing the substrate. The mask may be incorporated into a substrate processing system such as, for example, an ion implantation system. The mask may comprise one or more first apertures disposed in a first row; and one or more second apertures disposed in a second row, each row extending along a width direction of the mask, wherein the one or more first apertures and the one or more second apertures are non-uniform.

    摘要翻译： 本文中公开了一种用于处理衬底的改进技术。 在一个特定的示例性实施例中，可以使用用于处理衬底的掩模来实现该技术。 掩模可以并入基板处理系统中，例如离子注入系统。 掩模可以包括设置在第一排中的一个或多个第一孔; 以及设置在第二排中的一个或多个第二孔，每排沿着所述掩模的宽度方向延伸，其中所述一个或多个第一孔和所述一个或多个第二孔是不均匀的。

    System and method for aligning substrates for multiple implants
    3.
    发明授权
    System and method for aligning substrates for multiple implants 有权
    用于对准多个植入物的基底的系统和方法

    公开(公告)号：US08895325B2

    公开(公告)日：2014-11-25

    申请号：US13458441

    申请日：2012-04-27

    申请人： John W. Graff ,  Benjamin B. Riordon ,  Nicholas P. T. Bateman

    发明人： John W. Graff ,  Benjamin B. Riordon ,  Nicholas P. T. Bateman

    IPC分类号： H01L21/00 ,  B05C11/00

    CPC分类号： H01J37/3171 ,  H01J37/3045 ,  H01J2237/31711 ,  H01L21/266

    摘要： A system and method are disclosed for aligning substrates during successive process steps, such as ion implantation steps, is disclosed. Implanted regions are created on a substrate. After implantation, an image is obtained of the implanted regions, and a fiducial is provided on the substrate in known relation to at least one of the implanted regions. A thermal anneal process is performed on the substrate such that the implanted regions are no longer visible but the fiducial remains visible. The position of the fiducial may be used in downstream process steps to properly align pattern masks over the implanted regions. The fiducial also may be applied to the substrate before any ion implanting of the substrate is performed. The position of the fiducial with respect to an edge or a corner of the substrate may be used for aligning during downstream process steps. Other embodiments are described and claimed.

    摘要翻译： 公开了用于在连续工艺步骤期间对准衬底的系统和方法，例如离子注入步骤。 在衬底上形成植入区域。 在植入之后，获得植入区域的图像，并且已知关系到至少一个植入区域的基底上提供了基准。 在基板上进行热退火处理，使得注入区域不再可见，但基准仍然可见。 基准的位置可以用于下游处理步骤，以便在注入区域上正确对准图案掩模。 在进行基板的任何离子注入之前，基准也可以应用于基板。 基准面相对于衬底的边缘或拐角的位置可用于在下游工艺步骤期间对准。 描述和要求保护其他实施例。

    Masked ion implant with fast-slow scan
    4.
    发明授权
    Masked ion implant with fast-slow scan 失效
    具有快速扫描的掩蔽离子植入物

    公开(公告)号：US08461553B2

    公开(公告)日：2013-06-11

    申请号：US13188837

    申请日：2011-07-22

    申请人： Nicholas P. T. Bateman ,  Steven M. Anella ,  Benjamin B. Riordon ,  Atul Gupta

    发明人： Nicholas P. T. Bateman ,  Steven M. Anella ,  Benjamin B. Riordon ,  Atul Gupta

    IPC分类号： H01J37/317 ,  H01J37/244 ,  H01J3/07 ,  G21K5/10

    CPC分类号： H01J37/3171 ,  H01J37/20 ,  H01J2237/20228 ,  H01J2237/31711 ,  H01L21/266 ,  H01L31/068 ,  H01L31/1804 ,  Y02E10/547 ,  Y02P70/521

    摘要： An improved method of producing solar cells utilizes a mask which is fixed relative to an ion beam in an ion implanter. The ion beam is directed through a plurality of apertures in the mask toward a substrate. The substrate is moved at different speeds such that the substrate is exposed to an ion dose rate when the substrate is moved at a first scan rate and to a second ion dose rate when the substrate is moved at a second scan rate. By modifying the scan rate, various dose rates may be implanted on the substrate at corresponding substrate locations. This allows ion implantation to be used to provide precise doping profiles advantageous for manufacturing solar cells.

    摘要翻译： 制造太阳能电池的改进方法利用在离子注入机中相对于离子束固定的掩模。 离子束被引导通过掩模中的多个孔朝向衬底。 衬底以不同的速度移动，使得当衬底以第一扫描速率移动时衬底暴露于离子剂量率，而当衬底以第二扫描速率移动时，衬底暴露于离子剂量率。 通过修改扫描速率，可以在相应的衬底位置的衬底上植入各种剂量率。 这允许离子注入用于提供有利于制造太阳能电池的精确掺杂分布。

    Stepped masking for patterned implantation
    6.
    发明授权
    Stepped masking for patterned implantation 有权
    步进屏蔽图案植入

    公开(公告)号：US08569157B2

    公开(公告)日：2013-10-29

    申请号：US13442571

    申请日：2012-04-09

    申请人： Benjamin B. Riordon ,  Nicholas P. T. Bateman ,  Charles T. Carlson

    发明人： Benjamin B. Riordon ,  Nicholas P. T. Bateman ,  Charles T. Carlson

    IPC分类号： H01L21/425

    CPC分类号： H01L21/266 ,  H01J37/3172 ,  H01L31/1804 ,  Y02E10/547 ,  Y02P70/521

    摘要： An improved method of moving a mask to perform a pattern implant of a substrate is disclosed. The mask has a plurality of apertures, and is placed between the ion source and the substrate. After the substrate is exposed to the ion beam, the mask is indexed to a new position relative to the substrate and a subsequent implant step is performed. Through the selection of the aperture size and shape, the index distance and the number of implant steps, a variety of implant patterns may be created. In some embodiments, the implant pattern includes heavily doped horizontal stripes with lighter doped regions between the stripes. In some embodiments, the implant pattern includes a grid of heavily doped regions. In other embodiments, the implant pattern is suitable for use with a bus-bar structure.

    摘要翻译： 公开了一种移动掩模以执行衬底的图案植入的改进方法。 掩模具有多个孔，并且被放置在离子源和基底之间。 在将衬底暴露于离子束之后，掩模被引导到相对于衬底的新位置，并且执行随后的注入步骤。 通过选择孔径尺寸和形状，指数距离和植入步骤的数量，可以产生各种种植体图案。 在一些实施例中，注入图案包括在条纹之间具有较轻掺杂区域的重掺杂水平条纹。 在一些实施例中，植入模式包括重掺杂区域格栅。 在其它实施例中，植入图案适用于汇流条结构。

    Stepped masking for patterned implantation
    7.
    发明授权
    Stepped masking for patterned implantation 失效
    步进屏蔽图案植入

    公开(公告)号：US08173527B2

    公开(公告)日：2012-05-08

    申请号：US12906369

    申请日：2010-10-18

    申请人： Benjamin B. Riordon ,  Nicholas P. T. Bateman ,  Charles T. Carlson

    发明人： Benjamin B. Riordon ,  Nicholas P. T. Bateman ,  Charles T. Carlson

    IPC分类号： H01L21/425

    CPC分类号： H01L21/266 ,  H01J37/3172 ,  H01L31/1804 ,  Y02E10/547 ,  Y02P70/521

    摘要： An improved method of moving a mask to perform a pattern implant of a substrate is disclosed. The mask has a plurality of apertures, and is placed between the ion source and the substrate. After the substrate is exposed to the ion beam, the mask is indexed to a new position relative to the substrate and a subsequent implant step is performed. Through the selection of the aperture size and shape, the index distance and the number of implant steps, a variety of implant patterns may be created. In some embodiments, the implant pattern includes heavily doped horizontal stripes with lighter doped regions between the stripes. In some embodiments, the implant pattern includes a grid of heavily doped regions. In other embodiments, the implant pattern is suitable for use with a bus-bar structure.

    摘要翻译： 公开了一种移动掩模以执行衬底的图案植入的改进方法。 掩模具有多个孔，并且被放置在离子源和基底之间。 在将衬底暴露于离子束之后，掩模被引导到相对于衬底的新位置，并且执行随后的注入步骤。 通过选择孔径尺寸和形状，指数距离和植入步骤的数量，可以产生各种种植体图案。 在一些实施例中，注入图案包括在条纹之间具有较轻掺杂区域的重掺杂水平条纹。 在一些实施例中，植入模式包括重掺杂区域格栅。 在其它实施例中，植入图案适用于汇流条结构。

    Masked ion implant with fast-slow scan
    9.
    发明授权
    Masked ion implant with fast-slow scan 有权
    具有快速扫描的掩蔽离子植入物

    公开(公告)号：US08008176B2

    公开(公告)日：2011-08-30

    申请号：US12853698

    申请日：2010-08-10

    申请人： Nicholas P. T. Bateman ,  Steven M. Anella ,  Benjamin B. Riordon ,  Atul Gupta

    发明人： Nicholas P. T. Bateman ,  Steven M. Anella ,  Benjamin B. Riordon ,  Atul Gupta

    IPC分类号： H01L21/425

    CPC分类号： H01J37/3171 ,  H01J37/20 ,  H01J2237/20228 ,  H01J2237/31711 ,  H01L21/266 ,  H01L31/068 ,  H01L31/1804 ,  Y02E10/547 ,  Y02P70/521

    摘要： An improved method of producing solar cells utilizes a mask which is fixed relative to an ion beam in an ion implanter. The ion beam is directed through a plurality of apertures in the mask toward a substrate. The substrate is moved at different speeds such that the substrate is exposed to an ion dose rate when the substrate is moved at a first scan rate and to a second ion dose rate when the substrate is moved at a second scan rate. By modifying the scan rate, various dose rates may be implanted on the substrate at corresponding substrate locations. This allows ion implantation to be used to provide precise doping profiles advantageous for manufacturing solar cells.

    摘要翻译： 制造太阳能电池的改进方法利用在离子注入机中相对于离子束固定的掩模。 离子束被引导通过掩模中的多个孔朝向衬底。 衬底以不同的速度移动，使得当衬底以第一扫描速率移动时衬底暴露于离子剂量率，而当衬底以第二扫描速率移动时，衬底暴露于离子剂量率。 通过修改扫描速率，可以在相应的衬底位置的衬底上植入各种剂量率。 这允许离子注入用于提供有利于制造太阳能电池的精确掺杂分布。