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1.发明申请System and Method for Real Time Positioning of a Substrate in a Vacuum Processing System 审中-公开真空处理系统中基板实时定位的系统和方法公开(公告)号：US20170004987A1
公开(公告)日：2017-01-05
申请号：US14788574
申请日：2015-06-30
申请人： Kevin P. Fairbairn
发明人： Kevin P. Fairbairn
IPC分类号： H01L21/68 , H01L21/677 , H01L21/687
CPC分类号： H01L21/681 , H01L21/67259 , H01L21/67742 , H01L21/68707
摘要： An improved position control means for robotic handling systems; particularly, a sensing system and method for precisely determining the center point of a substrate, such as a semiconductor wafer, relative to a destination point by using a set of multi pixel imaging sensors incorporated into the wafer carrying end effector of the robotic handling system.
摘要翻译： 一种用于机器人处理系统的改进的位置控制装置; 特别地，通过使用结合到机器人处理系统的晶片承载端部执行器中的一组多像素成像传感器来相对于目的地点精确地确定诸如半导体晶片的衬底的中心点的感测系统和方法。
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2.发明申请公开(公告)号：US20110303148A1
公开(公告)日：2011-12-15
申请号：US13157077
申请日：2011-06-09
申请人： Jun XIE , Kevin P. Fairbairn , Charles Liu , Patrick Leahey , Robert L. Ruck , Terry Bluck
发明人： Jun XIE , Kevin P. Fairbairn , Charles Liu , Patrick Leahey , Robert L. Ruck , Terry Bluck
IPC分类号： C23C16/50
CPC分类号： C23C16/4412 , C23C16/4409 , H01J37/32513 , H01J37/32798 , H01J37/32834 , H01J37/32871
摘要： An enclosure for generating a secondary environment within a processing chamber for coating a substrate. An enclosure wall forms a secondary environment encompassing the coating source, plasma, and the substrate, and separating them from interior of the processing chamber. The enclosure wall includes a plurality of pumping channels for diverting gaseous flow away from the substrate. The channels have an intake of larger diameter from the exhaust opening and are oriented at an angle with the intake opening pointing away from the deposition source. A movable seal enables transport of the substrate in open position and processing the substrate in closed position. The seal may be formed as a labyrinth seal to avoid particle generation from a standard contact seal.
摘要翻译： 一种用于在用于涂覆基底的处理室内产生二次环境的外壳。 外壳壁形成包围涂料源，等离子体和基材的二次环境，并将它们从处理室的内部分离。 封闭壁包括多个泵送通道，用于将气流从衬底转向。 通道具有来自排气口的较大直径的入口并且与进气开口指向远离沉积源的角度定向。 可移动密封件使得能够将基板传送到打开位置并且将基板处于关闭位置。 密封件可以形成为迷宫式密封件，以避免从标准接触密封件产生颗粒。
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公开(公告)号：US08349196B2
公开(公告)日：2013-01-08
申请号：US12329462
申请日：2008-12-05
申请人： Kevin P. Fairbairn , Michael S. Barnes , Terry Bluck , Ren Xu , Charles Liu , Ralph Kerns
发明人： Kevin P. Fairbairn , Michael S. Barnes , Terry Bluck , Ren Xu , Charles Liu , Ralph Kerns
IPC分类号： B44C1/22
CPC分类号： G11B5/84 , G11B5/855 , H01J37/3438
摘要： A system is provided for etching patterned media disks for hard drive. The modular system may be tailored to perform specific processes sequences so that a patterned media disk is fabricated without removing the disk from vacuum environment. In some sequence the magnetic stack is etched while in other the etch is performed prior to forming the magnetic stack. In a further sequence ion implantation is used without etching steps. For etching a movable non-contact electrode is utilized to perform sputter etch. The cathode moves to near contact distance to, but not contacting, the substrate so as to couple RF energy to the disk. The substrate is held vertically in a carrier and both sides are etched serially. That is, one side is etched in one chamber and then in the next chamber the second side is etched.
摘要翻译： 提供了用于蚀刻用于硬盘驱动器的图案化介质盘的系统。 模块化系统可以被定制以执行特定的处理顺序，使得图案化的介质盘被制造而不从真空环境中移除盘。 在一些顺序中，磁性堆叠被蚀刻，而另一些蚀刻则在形成磁性堆叠之前进行。 在另外的序列中，使用离子注入而没有蚀刻步骤。 为了蚀刻可移动的非接触电极用于进行溅射蚀刻。 阴极移动到与衬底接近但不接触的接近距离，以将RF能量耦合到盘。 衬底垂直地保持在载体中，并且两侧被连续蚀刻。 也就是说，在一个室中蚀刻一面，然后在下一个室中蚀刻第二面。
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公开(公告)号：US20080066678A1
公开(公告)日：2008-03-20
申请号：US11523101
申请日：2006-09-19
IPC分类号： C23C16/00
CPC分类号： H01L21/67184 , H01L21/67173 , H01L21/67196 , H01L21/67201 , H01L21/67745
摘要： There is described apparatus and methods for transporting and processing substrates including wafers as to efficiently produce at reasonable costs improved throughput as compared to systems in use today. A key element is the use of a transport chamber along the sides of processing chambers for feeding substrates into a controlled atmosphere through a load lock and then along a transport chamber as a way of reaching processing chambers and then out of the controlled atmosphere following processing in the processing chambers.
摘要翻译： 描述了与目前使用的系统相比，用于运输和处理包括晶片的基板以便以合理的成本有效地生产提高的生产量的装置和方法。 关键要素是沿着处理室的侧面使用传送室，用于通过装载锁定将基板输送到受控气氛中，然后沿着传送室作为到达处理室的方式，然后在受控气氛中进行处理 处理室。
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公开(公告)号：US09524896B2
公开(公告)日：2016-12-20
申请号：US12368241
申请日：2009-02-09
IPC分类号： H01L21/677 , C23C14/56 , C23C16/54 , H01L21/67
CPC分类号： H01L21/67745 , C23C14/568 , C23C16/54 , C23C16/545 , H01L21/67167 , H01L21/67173 , H01L21/67184 , H01L21/67196 , H01L21/67201 , H01L21/67709
摘要： There is described apparatus and methods for transporting and processing substrates including wafers as to efficiently produce at reasonable costs improved throughput as compared to systems in use today. A linear transport chamber includes linear tracks and robot arms riding on the linear tracks to linearly transfer substrates along the sides of processing chambers for feeding substrates into a controlled atmosphere through a load lock and then along a transport chamber as a way of reaching processing chambers.
摘要翻译： 描述了与目前使用的系统相比，用于运输和处理包括晶片的基板以便以合理的成本有效地生产提高的生产量的装置和方法。 线性传送室包括线性轨道和机器人手臂，该线性轨道和机器人臂骑在线性轨道上，以沿着处理室的侧面线性地传送衬底，用于通过负载锁定将衬底馈送到受控气氛中，然后沿着运送室作为到达处理室的方式。
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公开(公告)号：US08303764B2
公开(公告)日：2012-11-06
申请号：US13042407
申请日：2011-03-07
IPC分类号： C23F1/00 , H01L21/306 , H01L21/677 , C23C16/00 , C23C14/00
CPC分类号： H01L21/67184 , H01L21/67173 , H01L21/67196 , H01L21/67201 , H01L21/67745
摘要： There is described apparatus and methods for transporting and processing substrates including wafers as to efficiently produce at reasonable costs improved throughput as compared to systems in use today. A key element is the use of a transport chamber along the sides of processing chambers for feeding substrates into a controlled atmosphere through a load lock and then along a transport chamber as a way of reaching processing chambers and then out of the controlled atmosphere following processing in the processing chambers.
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公开(公告)号：US20090145879A1
公开(公告)日：2009-06-11
申请号：US12329462
申请日：2008-12-05
申请人： Kevin P. Fairbairn , Michael S. Barnes , Terry Bluck , Ren Xu , Charles Liu , Ralph Kerns
发明人： Kevin P. Fairbairn , Michael S. Barnes , Terry Bluck , Ren Xu , Charles Liu , Ralph Kerns
IPC分类号： C23F1/00
CPC分类号： G11B5/84 , G11B5/855 , H01J37/3438
摘要： A system is provided for etching patterned media disks for hard drive. The modular system may be tailored to perform specific processes sequences so that a patterned media disk is fabricated without removing the disk from vacuum environment. In some sequence the magnetic stack is etched while in other the etch is performed prior to forming the magnetic stack. In a further sequence ion implantation is used without etching steps. For etching a movable non-contact electrode is utilized to perform sputter etch. The cathode moves to near contact distance to, but not contacting, the substrate so as to couple RF energy to the disk. The substrate is held vertically in a carrier and both sides are etched serially. That is, one side is etched in one chamber and then in the next chamber the second side is etched.
摘要翻译： 提供了用于蚀刻用于硬盘驱动器的图案化介质盘的系统。 模块化系统可以被定制以执行特定的处理顺序，使得图案化的介质盘被制造而不从真空环境中移除盘。 在一些顺序中，磁性堆叠被蚀刻，而另一些蚀刻则在形成磁性堆叠之前进行。 在另外的序列中，使用离子注入而没有蚀刻步骤。 为了蚀刻可移动的非接触电极用于进行溅射蚀刻。 阴极移动到与衬底接近但不接触的接近距离，以将RF能量耦合到盘。 衬底垂直地保持在载体中，并且两侧被连续蚀刻。 也就是说，在一个室中蚀刻一面，然后在下一个室中蚀刻第二面。
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公开(公告)号：US07042060B2
公开(公告)日：2006-05-09
申请号：US10891877
申请日：2004-07-15
申请人： Kenneth A Costello , Kevin P. Fairbairn , David W. Brown , Yun Chung , Patricia Gober , Edward Yin
发明人： Kenneth A Costello , Kevin P. Fairbairn , David W. Brown , Yun Chung , Patricia Gober , Edward Yin
IPC分类号： H01L31/00 , H01L29/04 , H01L29/06 , H01L31/062 , H01L31/113
CPC分类号： H01L27/14683 , H01L27/14623 , H01L27/14643 , H01L27/14806
摘要： Backthinning in an area selective manner is applied to imaging sensors 12 for use in electron bombarded devices. A further arrangement results in an array of collimators 51 aligned with pixels 42 or groups of pixels providing improved image contrast of such image sensor. Provision of a thin P-doped layer 52 on the illuminated rear surface provides both a diffusion barrier resulting in improved resolution and a functional shield for reference pixels. A gradient in concentration of P-doped layer 52 optimizes electron collection at the pixel array.
摘要翻译： 以区域选择性的方式进行反向应用于用于电子轰击装置的成像传感器12。 进一步的布置导致与像素42或像素组对准的准直器51的阵列，从而提供这种图像传感器的改善的图像对比度。 在照明的后表面上提供薄的P掺杂层52提供了扩散屏障，从而提供改进的分辨率和用于参考像素的功能屏蔽。 P掺杂层52的浓度梯度优化了像素阵列处的电子收集。
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公开(公告)号：US20090191030A1
公开(公告)日：2009-07-30
申请号：US12368241
申请日：2009-02-09
IPC分类号： H01L21/677
CPC分类号： H01L21/67745 , C23C14/568 , C23C16/54 , C23C16/545 , H01L21/67167 , H01L21/67173 , H01L21/67184 , H01L21/67196 , H01L21/67201 , H01L21/67709
摘要： There is described apparatus and methods for transporting and processing substrates including wafers as to efficiently produce at reasonable costs improved throughput as compared to systems in use today. A linear transport chamber includes linear tracks and robot arms riding on the linear tracks to linearly transfer substrates along the sides of processing chambers for feeding substrates into a controlled atmosphere through a load lock and then along a transport chamber as a way of reaching processing chambers.
摘要翻译： 描述了与目前使用的系统相比，用于运输和处理包括晶片的基板以便以合理的成本有效地生产提高的生产量的装置和方法。 线性传送室包括线性轨道和机器人手臂，该线性轨道和机器人臂骑在线性轨道上，以沿着处理室的侧面线性地传送衬底，用于通过负载锁定将衬底馈送到受控气氛中，然后沿着运送室作为到达处理室的方式。
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公开(公告)号：US20090078374A1
公开(公告)日：2009-03-26
申请号：US12325993
申请日：2008-12-01
CPC分类号： H01L21/67745 , H01L21/67173 , H01L21/67184 , H01L21/67201
摘要： There is described apparatus and methods for transporting and processing substrates including wafers as to efficiently produce at reasonable costs improved throughput as compared to systems in use today. A key element is the use of a transport chamber along the sides of processing chambers for feeding substrates into a controlled atmosphere through a load lock and then along a transport chamber as a way of reaching processing chambers and then out of the controlled atmosphere following processing in the processing chambers.
摘要翻译： 描述了与目前使用的系统相比，用于运输和处理包括晶片的基板以便以合理的成本有效地生产提高的生产量的装置和方法。 关键要素是沿着处理室的侧面使用传送室，用于通过装载锁定将基板输送到受控气氛中，然后沿着传送室作为到达处理室的方式，然后在受控气氛中进行处理 处理室。
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