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    Method for producing purified alkali silicate aqueous solution and silica sol
    2.
    发明授权
    Method for producing purified alkali silicate aqueous solution and silica sol 有权
    纯碱性硅酸盐水溶液和硅溶胶的制备方法

    公开(公告)号：US09108855B2

    公开(公告)日：2015-08-18

    申请号：US13603715

    申请日：2012-09-05

    申请人： Kiyomi Ema ,  Noriyuki Takakuma ,  Tohru Nishimura ,  Naoki Kawashita ,  Kouji Yamaguchi

    发明人： Kiyomi Ema ,  Noriyuki Takakuma ,  Tohru Nishimura ,  Naoki Kawashita ,  Kouji Yamaguchi

    IPC分类号： B24D3/00 ,  B24D3/02 ,  B24D11/00 ,  B24D18/00 ,  C09K3/14 ,  C09C1/68 ,  C01B33/148 ,  C01B33/143 ,  B82Y30/00

    CPC分类号： C01B33/1485 ,  B82Y30/00 ,  C01B33/1435 ,  C01P2004/64 ,  C09K3/1463

    摘要： To provide a method for producing an alkali silicate aqueous solution containing a reduced amount of foreign substance of plate-like fine particles and a method for producing a silica sol containing a reduced amount of foreign substance of plate-like fine particles. A method for producing an alkali silicate aqueous solution fulfilling the following condition: the existing amount of plate-like fine particles having a length of one side of 0.2 to 4.0 μm and a thickness of 1 to 100 nm is determined to be 0 to 30%. The method for producing an alkali silicate aqueous solution includes the steps of adjusting a silica concentration of an alkali silicate aqueous solution to 0.5 to 10.0% by mass and filtering the alkali silicate aqueous solution through a filter having a removal rate of particles with a primary particle size of 1.0 μm of 50% or more.

    摘要翻译： 提供一种含有少量板状微粒的异物的碱金属硅酸盐水溶液的制造方法以及含有少量的板状微粒的异物的二氧化硅溶胶的制造方法。 一种满足以下条件的碱金属硅酸盐水溶液的制造方法：将一边长度为0.2〜4.0μm，厚度为1〜100nm的板状微粒的存在量确定为0〜30％ 。 碱土金属硅酸盐水溶液的制造方法包括将碱土金属硅酸盐水溶液的二氧化硅浓度调整为0.5〜10.0质量％的步骤，通过具有一次粒子的粒子去除率的过滤器过滤碱金属硅酸盐水溶液 1.0μm的尺寸为50％以上。

    Alumina powder, process for producing the same and polishing composition
    3.
    发明授权
    Alumina powder, process for producing the same and polishing composition 失效
    氧化铝粉，其制造方法和抛光组合物

    公开(公告)号：US06440187B1

    公开(公告)日：2002-08-27

    申请号：US09581084

    申请日：2000-07-18

    申请人： Toshio Kasai ,  Kiyomi Ema ,  Isao Ota ,  Tohru Nishimura

    发明人： Toshio Kasai ,  Kiyomi Ema ,  Isao Ota ,  Tohru Nishimura

    IPC分类号： C09K314

    CPC分类号： B82Y30/00 ,  C01F7/02 ,  C01F7/448 ,  C01P2002/00 ,  C01P2004/10 ,  C01P2004/20 ,  C01P2004/30 ,  C01P2004/50 ,  C01P2004/54 ,  C01P2004/61 ,  C01P2004/62 ,  C01P2004/64 ,  C01P2006/12 ,  C01P2006/40 ,  C01P2006/90 ,  C09G1/02 ,  C09K3/1436 ,  C09K3/1463

    摘要： Production of an alumina powder characterized by having a single or multiple crystal structure selected from the group consisting of &ggr;, &dgr; and &thgr;-forms, a primary particle size of 10 to 50 nm, a mean secondary particle size of 100 to 500 nm, and a granular primary particle shape, or an alumina powder characterized by having an a-form crystal structure, a primary particle size of 60 to 150 nm, a mean secondary particle size of 200 to 500 nm, and a granular primary particle shape, using as a raw material an alumina hydrate comprising rectangular plate-like primary particles having a boehmite structure and having a length of one side of 10 to 50 nm; and preparation of a polishing composition comprising the alumina powder, water and a polishing accelerator.

    摘要翻译： 其特征在于具有选自γ，δ和θ形式的一种或多种晶体结构，一次粒径为10-50nm，二次平均粒径为100-500nm的氧化铝粉末，以及 颗粒状一次粒子形状或特征在于具有a型晶体结构，一次粒径为60〜150nm，平均二次粒径为200〜500nm的氧化铝粉末和粒状一次粒子形状，使用为 原料为氧化铝水合物，其包含具有勃姆石结构且长度为10〜50nm的矩形板状一次粒子; 以及制备包含氧化铝粉末，水和抛光促进剂的抛光组合物。

    Polishing composition
    4.
    发明授权
    Polishing composition 失效
    抛光组成

    公开(公告)号：US06398827B1

    公开(公告)日：2002-06-04

    申请号：US09605542

    申请日：2000-06-29

    申请人： Isao Ota ,  Tohru Nishimura ,  Yoshitane Watanabe ,  Yoshiyuki Kashima ,  Kiyomi Ema ,  Yutaka Ohmori

    发明人： Isao Ota ,  Tohru Nishimura ,  Yoshitane Watanabe ,  Yoshiyuki Kashima ,  Kiyomi Ema ,  Yutaka Ohmori

    IPC分类号： C09K314

    CPC分类号： C09K3/1463 ,  C09G1/02

    摘要： The present invention relates to a polishing composition for polishing alumina disks, polishing substrates having silica surfaces and semiconductor wafers, comprising a stable aqueous silica sol containing moniliform colloidal silica particles having a ratio (D1/D2) of a particle diameter D1 nm (as measured by dynamic light scattering method) to a mean particle diameter D2 (as measured by nitrogen absorption method) of 3 or more, wherein D1 is between 50 to 800 nm and D2 is between 10 to 120 nm, said moniliform colloidal silica particles being composed of spherical colloidal silica particles and a metal oxide-containing silica bond which bonds these spherical colloidal silica particles together, wherein the spherical colloidal silica particles are linked together in rows in only one plane by observation through an electron microscope, and further wherein said polishing composition contains 0.5 to 50% by weight of said moniliform colloidal silica particles.

    摘要翻译： 本发明涉及一种用于抛光氧化铝盘的抛光组合物，具有二氧化硅表面的抛光衬底和半导体晶片，其包含稳定的含水二氧化硅溶胶，其含有粒径为D1nm（D1 / D2）的粒径为D1nm 通过动态光散射法）至平均粒径D2（通过氮吸收法测定）为3以上，其中D1为50〜800nm，D2为10〜120nm，所述观察胶体二氧化硅粒子为 球形胶体二氧化硅颗粒和将这些球形胶体二氧化硅颗粒结合在一起的含金属氧化物的二氧化硅结合体，其中通过电子显微镜观察，球形胶体二氧化硅颗粒在一个平面内以行排列在一起，并且其中所述抛光组合物含有 0.5〜50重量％的所述念珠状胶体二氧化硅粒子。

    LIQUID CRYSTAL DISPLAY DEVICE
    6.
    发明申请
    LIQUID CRYSTAL DISPLAY DEVICE 审中-公开
    液晶显示装置

    公开(公告)号：US20120268685A1

    公开(公告)日：2012-10-25

    申请号：US13509828

    申请日：2010-10-14

    申请人： Tohru Nishimura

    发明人： Tohru Nishimura

    IPC分类号： G02F1/13357

    CPC分类号： G02F1/133308 ,  G02F2001/133334 ,  G02F2201/465

    摘要： A liquid crystal display device 100 includes a liquid crystal panel 12, a backlight device 14, a first housing 16, and a second housing 18. The backlight device 14 is located to face a rear surface of the liquid crystal panel 12. The first housing 16 supports the liquid crystal panel 12 and has a peripheral portion 22 extending along a periphery of the liquid crystal panel 12. The second housing 18 accommodates the backlight device 14, and has a peripheral portion 24 overlapping an inner surface of the peripheral portion 22 of the first housing 16. An attachment hole 26 is formed in the peripheral portion 24 of the second housing 18. At the peripheral portion 22 of the first housing 16, an attachment piece 28 overlapping, and joined to, an inner surface of the peripheral portion 24 of the second housing 18 through the attachment hole 26 in the peripheral portion 24 of the second housing 18 is provided.

    摘要翻译： 液晶显示装置100包括液晶面板12，背光装置14，第一壳体16和第二壳体18.背光装置14位于液晶面板12的后表面。第一壳体 16支撑液晶面板12，并且具有沿液晶面板12的周边延伸的周边部22.第二壳体18容纳背光装置14，并且具有与外围部分22的内表面重叠的周边部分24 第一壳体16.在第二壳体18的周边部分24中形成有安装孔26.在第一壳体16的周边部分22处，安装件28与周边部分的内表面重叠并接合 24设置在第二壳体18的周边部分24中的安装孔26中。

    Process for preparing crystalline ceric oxide
    7.
    发明授权
    Process for preparing crystalline ceric oxide 失效
    制备结晶二氧化铈的方法

    公开(公告)号：US5543126A

    公开(公告)日：1996-08-06

    申请号：US490612

    申请日：1995-06-15

    申请人： Isao Ota ,  Tohru Nishimura

    发明人： Isao Ota ,  Tohru Nishimura

    IPC分类号： C01F17/00 ,  C03C1/00 ,  C09K3/14

    CPC分类号： C03C1/00 ,  B82Y30/00 ,  C01F17/0043 ,  C09K3/1409 ,  C01P2004/61 ,  C01P2004/62 ,  C01P2004/64 ,  Y10S516/02

    摘要： The present invention is to provide a process for preparing ceric oxide particles used as an abrasive or polishing material for producing semiconductors or as a UV ray-absorbing material for plastics, glass and the like.The present invention relates to a process for preparing cerium (IV) oxide particles having a particle size of from 0.03 .mu.m to 5 .mu.m, which comprises adjusting an aqueous medium containing cerium (IV) hydroxide and a nitrate to a pH of from 8 to 11 with an alkaline substance and heating the aqueous medium at a temperature of from 100.degree. to 200.degree. C. under pressure.

    摘要翻译： 本发明提供一种制备用作制造半导体的磨料或抛光材料的氧化铈颗粒的方法或用作塑料，玻璃等的紫外线吸收材料。 本发明涉及一种制备粒度为0.03μm至5μm的氧化铈（IV）颗粒的方法，其包括将含有氢氧化铈（IV）和硝酸盐的水性介质调节至pH为8 至11，并在100℃至200℃的温度下加压水性介质。

    Cerium oxide sol and abrasive
    8.
    发明授权
    Cerium oxide sol and abrasive 失效
    氧化铈溶胶和磨料

    公开(公告)号：US06887289B2

    公开(公告)日：2005-05-03

    申请号：US10780568

    申请日：2004-02-19

    申请人： Isao Ota ,  Kenji Tanimoto ,  Tohru Nishimura

    发明人： Isao Ota ,  Kenji Tanimoto ,  Tohru Nishimura

    IPC分类号： C01F17/00 ,  C09G1/02 ,  C09K3/14 ,  C09G1/04

    CPC分类号： B82Y30/00 ,  C01F17/0043 ,  C01P2002/01 ,  C01P2002/72 ,  C01P2004/10 ,  C01P2004/61 ,  C01P2004/62 ,  C01P2004/64 ,  C01P2006/12 ,  C09G1/02 ,  C09K3/1472

    摘要： There is provided an abrasive used for polishing a substrate which comprises silica as a main component, for example a rock crystal, a quartz glass for photomask, for CMP of an organic film, Inter Layer Dielectric (ILD) and shallow trench isolation of a semiconductor device, or for polishing a hard disk made of glass. A sol which particles are dispersed in a medium, wherein the particles have a particle size of 0.005 to 1 μm and comprise as a main component crystalline cerium oxide of the cubic system and as an additional component a lanthanum compound, a neodymium compound or a combination thereof, wherein the additional component is contained in X/(Ce+X) molar ratio of 0.001 to 0.5 in which X is lanthanum atoms, neodymium atoms or a combination thereof. The sol is prepared by reacting an aqueous solution which a cerium (III) salt is mixed with a lanthanum (III) salt and/or a neodymium (III) salt, with an alkaline substance to give a suspension in which cerium (III) hydroxide is homogeneously mixed with lanthanum (III) hydroxide and/or neodymium (III) hydroxide, and blowing oxygen or a gas containing oxygen into the suspension.

    摘要翻译： 提供了用于抛光基底的磨料，其包括二氧化硅作为主要成分，例如岩石晶体，用于光掩模的石英玻璃，用于有机膜的CMP，层间介电（ILD）和半导体的浅沟槽隔离 装置或用于抛光由玻璃制成的硬盘。 一种溶胶，其中颗粒分散在介质中，其中颗粒的粒度为0.005-1μm，并且包含作为主要组分的立方晶系的结晶二氧化铈，并且作为附加组分的镧化合物，钕化合物或组合 其中所述附加成分以X =（Ce + X）摩尔比为0.001〜0.5，X为镧原子，钕原子或其组合。 通过使铈（III）盐与镧（III）盐和/或钕（III）盐混合的水溶液与碱性物质反应制备溶胶，得到悬浮液，其中氢氧化铈（III） 与氢氧化镧（III）和/或氢氧化钕（III）均匀混合，并将氧气或含有氧的气体吹入悬浮液中。