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1.发明授权Photosensitive composition comprising a sulfonimide compound according to the formula R.sub.1 -SO.sub.2 -NR.sub.3 -SO.sub.2 -R.sub.2 wherein R.sub.1, R.sub.2 and R.sub.3 each represents an aromatic group or an alkyl group 失效包含根据式R1-SO2-NR3-SO2-R2的磺酰亚胺化合物的光敏组合物，其中R 1，R 2和R 3各自表示芳基或烷基
公开(公告)号：US5698369A
公开(公告)日：1997-12-16
申请号：US488450
申请日：1995-06-07
CPC分类号： G03F7/0045
摘要： Disclosed is a photosensitive composition comprising a sulfonimide compound represented by formula (I): R.sub.1 --SO.sub.2 --NR.sub.3 --SO.sub.2 --R.sub.2 (I) wherein R.sub.1, R.sub.2 and R.sub.3 each represents an unsubstituted or substituted aromatic group or an unsubstituted or substituted alkyl group.
摘要翻译： 公开了包含由式（I）表示的磺酰亚胺化合物的光敏组合物：其中R 1，R 2和R 3各自表示未取代或取代的芳族基团或未取代或取代的烷基的R 1 -SO 2 -NR 3 SO 2 -R 2（I）。
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公开(公告)号：US20130101812A1
公开(公告)日：2013-04-25
申请号：US13807498
申请日：2011-09-16
申请人： Sou Kamimura , Tsukasa Yamanaka , Yuichiro Enomoto , Keita Kato
发明人： Sou Kamimura , Tsukasa Yamanaka , Yuichiro Enomoto , Keita Kato
CPC分类号： G03F7/32 , G03F7/0382 , G03F7/0397 , G03F7/20 , G03F7/2041 , G03F7/325 , G03F7/405 , Y10T428/24802
摘要： Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing an organic solvent, wherein the developer contains an ester and a ketone having 7 or more carbon atoms.
摘要翻译： 提供一种形成图案的方法，包括（a）将化学放大的抗蚀剂组合物形成为膜，（b）将膜曝光，和（c）用含有机溶剂的显影剂显影曝光的膜，其中 显影剂含有酯和具有7个或更多个碳原子的酮。
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公开(公告)号：US08287709B2
公开(公告)日：2012-10-16
申请号：US12530213
申请日：2008-03-06
申请人： Yusuke Hagihara , Masaki Takahashi , Makoto Takayanagi , Hideki Ikeda , Naoya Kanke , Tsukasa Yamanaka , Takayuki Tahara
发明人： Yusuke Hagihara , Masaki Takahashi , Makoto Takayanagi , Hideki Ikeda , Naoya Kanke , Tsukasa Yamanaka , Takayuki Tahara
摘要： An immersion treatment method with which a vehicle body horizontally immersed in liquid is taken out in a tilted position. The vehicle body is taken out of the liquid at high speed in a tilted position. Foreign matter is separated from the vehicle body and removed together with the liquid.
摘要翻译： 将水平浸没在液体中的车体倾斜地取出的浸渍处理方法。 车体在倾斜的位置被高速地从液体中取出。 异物与车身分离并与液体一起除去。
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公开(公告)号：US20100200416A1
公开(公告)日：2010-08-12
申请号：US12530213
申请日：2008-03-06
申请人： Yusuke Hagihara , Masaki Takahashi , Makoto Takayanagi , Hideki Ikeda , Naoya Kanke , Tsukasa Yamanaka , Takayuki Tahara
发明人： Yusuke Hagihara , Masaki Takahashi , Makoto Takayanagi , Hideki Ikeda , Naoya Kanke , Tsukasa Yamanaka , Takayuki Tahara
摘要： An immersion treatment method with which a vehicle body horizontally immersed in liquid is taken out in a tilted position. The vehicle body is taken out of the liquid at high speed in a tilted position. Foreign matter is separated from the vehicle body and removed together with the liquid.
摘要翻译： 将水平浸没在液体中的车体倾斜地取出的浸渍处理方法。 车体在倾斜的位置被高速地从液体中取出。 异物与车身分离并与液体一起除去。
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公开(公告)号：US07749678B2
公开(公告)日：2010-07-06
申请号：US11085482
申请日：2005-03-22
申请人： Tsukasa Yamanaka
发明人： Tsukasa Yamanaka
CPC分类号： G03F7/0045 , G03F7/0392 , G03F7/0397 , Y10S430/106 , Y10S430/114
摘要： A photosensitive composition comprising (A) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution, (B) a compound that generates an acid upon irradiation of an actinic ray or radiation, and (C1) a compound having a molecular weight of 1,000 or less and containing an aliphatic ring and an aromatic ring, and a photosensitive composition comprising (A) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution, (B) a compound that generates an acid upon irradiation of an actinic ray or radiation, and (C2) a resin containing a hydroxystyrene unit; and a pattern forming method using these photosensitive composition.
摘要翻译： 一种感光性组合物，其包含（A）通过酸的作用而分解以增加在碱性显影液中的溶解度的树脂，（B）在光化射线或辐射照射时产生酸的化合物，和（C1） （A）通过酸的作用而分解的树脂以增加在碱性显影液中的溶解度的树脂，（B）分子量为1000以下的含有脂肪族环和芳香环的化合物， 在光化射线或辐射照射时产生酸的化合物，和（C2）含有羟基苯乙烯单元的树脂; 以及使用这些感光性组合物的图案形成方法。
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6.发明授权公开(公告)号：US07348122B2
公开(公告)日：2008-03-25
申请号：US11511375
申请日：2006-08-29
申请人： Kenichiro Sato , Tsukasa Yamanaka
发明人： Kenichiro Sato , Tsukasa Yamanaka
CPC分类号： G03F7/022 , G03F7/0233 , G03F7/40
摘要： A photosensitive resin composition comprising: a quinone diazide sulfonic acid ester of a phenol compound represented by formula (I) as defined in the specification; and a polybenzoxazole precursor, and a method for manufacturing a semiconductor device using the same
摘要翻译： 一种光敏树脂组合物，其包含：如说明书中定义的由式（I）表示的酚化合物的醌二叠氮磺酸酯; 和聚苯并恶唑前体，以及使用其制造半导体器件的方法
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公开(公告)号：US5824451A
公开(公告)日：1998-10-20
申请号：US497795
申请日：1995-07-03
申请人： Toshiaki Aoai , Tsukasa Yamanaka
发明人： Toshiaki Aoai , Tsukasa Yamanaka
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , Y10S430/106
摘要： A positive photosensitive composition comprising (a)a resin soluble in an aqueous alkali solution containing a specific structure unit; (b) a compound which generates an acid with irradiation of an active ray or radiation; and (c) a low molecular weight acid-decomposable dissolution inhibitor having a molecular weight of not more than 3000, which possesses a tertiary alkyl ester group and whose solubility in an aqueous alkali solution is increased by the action of an acid; wherein compound (c) is a compound having at least two tertiary alkyl ester groups, in which the longest distance with respect to the distance between two tertiary ester groups selected arbitrarily comprises at least 10 bonding atoms except for the atoms contained in the ester groups or a compound having at least three tertiary alkyl ester groups, in which the longest distance with respect to the distance between two tertiary ester groups selected arbitrarily comprises at least 9 bonding atoms except for the atoms contained in the ester groups. The positive photosensitive composition has a high sensitivity, high resolution and good profile and excels in storage stability and heat resistance of the resist solution.
摘要翻译： 一种正型感光性组合物，其包含（a）可溶于含有特定结构单元的碱性水溶液中的树脂; （b）通过活性射线或辐射的照射产生酸的化合物; 和（c）分子量不大于3000的低分子量可酸分解溶解抑制剂，其具有叔烷基酯基，并且其在碱性水溶液中的溶解度通过酸的作用而增加; 其中化合物（c）是具有至少两个叔烷基酯基团的化合物，其中相对于任选地选择的两个叔酯基团之间的距离最长的距离包含至少10个键合原子，除了酯基团中包含的原子，或 具有至少三个叔烷基酯基的化合物，其中相对于任意选择的两个叔酯基团之间的距离最长的距离包含除了酯基中包含的原子以外的至少9个键合原子。 正型感光性组合物具有高灵敏度，高分辨率和良好的轮廓，并且抗蚀剂溶液的储存稳定性和耐热性优异。
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8.发明申请公开(公告)号：US20070212899A1
公开(公告)日：2007-09-13
申请号：US11715883
申请日：2007-03-09
申请人： Tsukasa Yamanaka , Kenichiro Sato
发明人： Tsukasa Yamanaka , Kenichiro Sato
IPC分类号： H01L21/469 , G03C5/00
CPC分类号： G03F7/0233
摘要： A photosensitive resin composition comprises: a polybenzoxazole precursor (A); a naphthoquinone diazide photosensitizer (B); and a specific phenolic hydroxyl group-containing compound (C).
摘要翻译： 光敏树脂组合物包含：聚苯并恶唑前体（A）; 萘醌二氮嗪光敏剂（B）; 和特定的含酚羟基的化合物（C）。
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9.发明申请Photosensitive resin composition and manufacturing method of semiconductor device using the same 有权光敏树脂组合物及使用其的半导体器件的制造方法公开(公告)号：US20070172753A1
公开(公告)日：2007-07-26
申请号：US11655905
申请日：2007-01-22
申请人： Kenichiro Sato , Tsukasa Yamanaka
发明人： Kenichiro Sato , Tsukasa Yamanaka
IPC分类号： G03C5/18
CPC分类号： G03F7/0757 , G03F7/0046 , G03F7/022 , G03F7/0233
摘要： A positive photosensitive resin composition, which contains a polybenzoxazole precursor, a quinonediazide photosensitizer and a carbonate solvent, and a method of manufacturing a semiconductor device using the composition.
摘要翻译： 含有聚苯并恶唑前体，醌二叠氮化物光敏剂和碳酸酯溶剂的正型感光性树脂组合物以及使用该组合物的半导体装置的制造方法。
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10.发明申请公开(公告)号：US20070048656A1
公开(公告)日：2007-03-01
申请号：US11511375
申请日：2006-08-29
申请人： Kenichiro Sato , Tsukasa Yamanaka
发明人： Kenichiro Sato , Tsukasa Yamanaka
IPC分类号： G03C5/18
CPC分类号： G03F7/022 , G03F7/0233 , G03F7/40
摘要： A photosensitive resin composition comprising: a quinone diazide sulfonic acid ester of a phenol compound represented by formula (I) as defined in the specification; and a polybenzoxazole precursor, and a method for manufacturing a semiconductor device using the same.
摘要翻译： 一种光敏树脂组合物，其包含：如说明书中定义的由式（I）表示的酚化合物的醌二叠氮磺酸酯; 和聚苯并恶唑前体，以及使用其制造半导体器件的方法。
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