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公开(公告)号:US20210305341A1
公开(公告)日:2021-09-30
申请号:US17344903
申请日:2021-06-10
Applicant: LG Display Co., Ltd.
Inventor: JungSeok SEO , PilSang YUN , SeHee PARK , Jiyong NOH
Abstract: A display device includes a substrate, a pixel driver on the substrate, and a display element connected to the pixel driver. The pixel driver includes a conductive layer on the substrate, a buffer layer on the conductive layer, a semiconductor layer on the buffer layer, a gate electrode, the gate electrode overlapping the semiconductor layer, and a source electrode and a drain electrode connected to the semiconductor layer. The buffer layer includes a flattened portion overlapping the conductive layer, and a stepped portion overlapping the periphery of the conductive layer. The semiconductor layer includes a first oxide semiconductor layer on the buffer layer, and a second oxide semiconductor layer on the first oxide semiconductor layer. A width of the first oxide semiconductor layer is larger than a width of the second oxide semiconductor layer, and the first oxide semiconductor layer is on the stepped portion of the buffer layer.
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公开(公告)号:US20210202755A1
公开(公告)日:2021-07-01
申请号:US17124344
申请日:2020-12-16
Applicant: LG Display Co., Ltd.
Inventor: KyungChul OK , JungSeok SEO , PilSang YUN , Jiyong NOH , Jaeman JANG , InTak CHO
IPC: H01L29/786 , H01L29/66 , H01L27/32
Abstract: Disclosed is a thin film transistor, a method for manufacturing the same and a display apparatus comprising the same, wherein the thin film transistor includes a first insulating layer on a substrate, an active layer on the first insulating layer, and a gate electrode spaced apart from the active layer and configured to have at least a portion overlapped with the active layer, wherein the active layer has a single crystal structure of an oxide semiconductor material, and an upper surface of the first insulating layer which contacts the active layer is an oxygen (O) layer made of oxygen (O).
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公开(公告)号:US20210193804A1
公开(公告)日:2021-06-24
申请号:US17131284
申请日:2020-12-22
Applicant: LG Display Co., Ltd.
Inventor: InTak CHO , Jiyong NOH , Jaeman JANG , PilSang YUN , Jeyong JEON
IPC: H01L29/40 , G09G3/32 , H01L27/12 , H01L29/786 , H01L21/02 , H01L21/765 , H01L29/66
Abstract: A thin film transistor, a display panel comprising the same and a display apparatus are discussed. The thin film transistor comprises a buffer layer embodied on a substrate, a semiconductor layer embodied on the buffer layer, including a channel area, a first conductor portion and a second conductor portion, a gate insulating film embodied on the semiconductor layer, a gate electrode embodied on the gate insulating film, and an auxiliary electrode overlapped with the second conductor portion, wherein the first conductor portion is extended from one side of the channel area, and becomes a source area, and the second conductor portion is extended from the other side of the channel area, and becomes a drain area.
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公开(公告)号:US20210202754A1
公开(公告)日:2021-07-01
申请号:US17121248
申请日:2020-12-14
Applicant: LG Display Co., Ltd.
Inventor: Jaeman JANG , PilSang YUN , Jiyong NOH , InTak CHO
IPC: H01L29/786 , H01L29/66
Abstract: Disclosed are a thin film transistor, a display apparatus comprising the thin film transistor, and a method for manufacturing the thin film transistor. The thin film transistor comprises an active layer, and a gate electrode spaced apart from the active layer and configured to have at least a portion overlapped with the active layer, wherein the active layer includes a silicon semiconductor layer, and an oxide semiconductor layer which contacts the silicon semiconductor layer, wherein at least a portion of the silicon semiconductor layer and at least a portion of the oxide semiconductor layer are overlapped with the gate electrode.
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公开(公告)号:US20200152913A1
公开(公告)日:2020-05-14
申请号:US16668262
申请日:2019-10-30
Applicant: LG Display Co., Ltd.
Inventor: Jiyong NOH , PilSang Yun , SeHee Park , JungSeok Seo
Abstract: A panel comprises a substrate, a semiconductor layer on the substrate, and including an oxide semiconductor or a low-temperature polycrystalline silicon, an interlayer insulating film on the substrate and the semiconductor layer, a passivation layer on the interlayer insulating film, an overcoat layer on the passivation layer, a light emitting layer on the overcoat layer, and an encapsulation layer on the light emitting layer. The encapsulation layer includes an auxiliary encapsulation layer having at least one of a silicon nitride (SiNx:H) layer including hydrogen, a silicon oxide (SiO2:H) layer including hydrogen, or a silicon oxynitride (SiON:H) layer including hydrogen. At least one of the interlayer insulating film, the passivation layer, or the overcoat layer is a hydrogen trapping layer.
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公开(公告)号:US20240099063A1
公开(公告)日:2024-03-21
申请号:US18241283
申请日:2023-09-01
Applicant: LG DISPLAY CO., LTD.
Inventor: Dohyung LEE , JuHeyuck BAECK , Jiyong NOH , HongRak CHOI , ChanYong JEONG
IPC: H10K59/121 , H10K59/126 , H10K71/00
CPC classification number: H10K59/1213 , H10K59/1216 , H10K59/126 , H10K71/861 , H10K2102/351
Abstract: A display panel and a display device both include a first active layer disposed on a substrate and including a channel area, a first area positioned on a first side of the channel area, and a second area positioned on a second side of the channel area, a first conductor on the first area, a second conductor on the second area, and a first auxiliary electrode on the first conductor, wherein an area where the first auxiliary electrode is disposed includes a repair area, thereby facilitating to repair a subpixel while mitigating or minimizing instantaneous ghosting on panel.
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公开(公告)号:US20210343855A1
公开(公告)日:2021-11-04
申请号:US17378333
申请日:2021-07-16
Applicant: LG Display Co., Ltd.
Inventor: SeHee PARK , InTak CHO , DaeHwan KIM , JuHeyuck BAECK , Jiyong NOH
IPC: H01L29/49 , G11C19/28 , G09G3/3225 , H01L27/12 , G09G3/3266 , G09G3/3233 , H01L29/786
Abstract: A thin film transistor substrate can include a buffer layer on a base substrate and having a first buffer layer and a second buffer layer; a semiconductor layer disposed on the buffer layer; a gate insulating film on the semiconductor layer; and a gate electrode spaced apart from the semiconductor layer, at least a part of the gate electrode overlapping with the semiconductor layer. The base substrate, the first buffer layer, the second buffer layer, the semiconductor layer, the gate insulating film and the gate electrode are sequentially stacked, and a surface oxygen concentration of the first buffer layer is higher than a surface oxygen concentration of the second buffer layer.
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公开(公告)号:US20200052085A1
公开(公告)日:2020-02-13
申请号:US16538587
申请日:2019-08-12
Applicant: LG Display Co., Ltd.
Inventor: SeHee PARK , InTak CHO , DaeHwan KIM , JuHeyuck BAECK , Jiyong NOH
IPC: H01L29/49 , G11C19/28 , H01L27/12 , G09G3/3225
Abstract: A thin film transistor substrate can include a first buffer layer disposed on a base substrate; a second buffer layer disposed on the first buffer layer; a semiconductor layer disposed on the second buffer layer; and a gate electrode spaced apart from the semiconductor layer, at least a part of the gate electrode overlapping with the semiconductor layer, in which a surface oxygen concentration of the first buffer layer is higher than a surface oxygen concentration of the second buffer layer.
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公开(公告)号:US20230018306A1
公开(公告)日:2023-01-19
申请号:US17958167
申请日:2022-09-30
Applicant: LG Display Co., Ltd.
Inventor: Jaeman JANG , PilSang YUN , Jiyong NOH , InTak CHO
IPC: H01L29/786 , H01L29/66
Abstract: Disclosed are a thin film transistor, a display apparatus comprising the thin film transistor, and a method for manufacturing the thin film transistor. The thin film transistor comprises an active layer, and a gate electrode spaced apart from the active layer and configured to have at least a portion overlapped with the active layer, wherein the active layer includes a silicon semiconductor layer, and an oxide semiconductor layer which contacts the silicon semiconductor layer, wherein at least a portion of the silicon semiconductor layer and at least a portion of the oxide semiconductor layer are overlapped with the gate electrode.
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公开(公告)号:US20200184903A1
公开(公告)日:2020-06-11
申请号:US16694674
申请日:2019-11-25
Applicant: LG DISPLAY CO., LTD.
Inventor: InTak CHO , PilSang YUN , Jeyong JEON , Jiyong NOH , SeHee PARK
IPC: G09G3/3291 , H01L27/32 , G09G3/3266
Abstract: An electronic device can include: a panel; a driver circuit configured to drive the panel; and first and second transistors disposed in the panel, the first and second transistors including: a first electrode of the first transistor, the first electrode being disposed on a substrate; a first insulating film disposed on the substrate, overlapping an edge of the first electrode and having an open area for receiving portions of the second transistor; a second electrode of the first transistor, the second electrode being disposed on the first insulating film and overlapping with a portion of the first electrode; third and fourth electrodes of the second transistor, the third electrode and the fourth electrode being disposed on a same layer as the second electrode and spaced apart from the second electrode, the open area of the first insulating film being disposed between the third electrode and the fourth electrode; a first active layer of the first transistor, the first active layer being disposed on the first electrode, the first insulating film and the second electrode; and a second active layer of the second transistor, the second active layer being disposed on the third and fourth electrodes and across the open area of the first insulating film.
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