公开(公告)号：US06514622B1

公开(公告)日：2003-02-04

申请号：US09762144

申请日：2001-06-04

申请人： Makoto Hayakawa ,  Koichi Hayashi ,  Masami Ando ,  Masaaki Ito ,  Tomoyasu Ichiki ,  Hirotaka Ishibashi ,  Mitsuyoshi Machida

发明人： Makoto Hayakawa ,  Koichi Hayashi ,  Masami Ando ,  Masaaki Ito ,  Tomoyasu Ichiki ,  Hirotaka Ishibashi ,  Mitsuyoshi Machida

IPC分类号： B32B1504

CPC分类号： C04B41/009 ,  C04B41/52 ,  C04B41/89 ,  C04B2111/2069 ,  C04B41/4543 ,  C04B41/5022 ,  C04B41/5116 ,  C04B41/5075 ,  C04B33/00

摘要： Disclosed is a sanitary ware which has a self-cleaning function for releasing carboxyl-containing greasy stains or soils, such as fatty acids, fatty esters, metallic soaps (scum of soaps), proteins, amino acids, bacteria, and fungi, and deposited stains or soils, such as water scale and urinary calculi. This sanitary ware comprises at least a sanitary ware body and a glaze layer as an outermost layer of the sanitary ware, a monovalent metal component and/or a metal component having a measure of the electronegativity based on Pouling's rule of not more than 1 being provided so as to be releasable evenly and continuously, over the whole surface of the glaze layer as the outermost layer, in such an amount large enough to impart a self-cleaning function for releasing stains or soils to the surface of the glaze layer as the outermost layer, the metal component being suppliable from the glaze layer as the outermost layer and/or the sanitary ware body to the whole surface of the outermost layer. The sanitary ware is advantageous in that stains or soils on the sanitary ware can be simply removed, for example, by running water without using any surfactant and without strongly scrubbing the surface of the sanitary ware by a scrubbing brush or a cleaning brush.

摘要翻译： 公开了一种卫生洁具，其具有用于释放含羧基的油脂污渍或污垢如脂肪酸，脂肪酸酯，金属皂（肥皂），蛋白质，氨基酸，细菌和真菌的自清洁功能，并沉积 污渍或污垢，如水垢和尿结石。 这种卫生洁具至少包括作为卫生洁具的最外层的卫生洁具主体和釉层，具有基于Pouling规则的不超过1的电负性量度的一价金属成分和/或金属成分 以均匀且连续的方式在作为最外层的釉层的整个表面上以足够大的量赋予自清洁功能，以将污渍或污垢释放到釉层的表面作为最外层 层，作为最外层的釉层提供的金属成分和/或卫生洁具主体到最外层的整个表面。 卫生洁具的优点在于，可以简单地除去卫生洁具上的污渍或污垢，例如通过流水而不使用任何表面活性剂，并且不用擦洗刷或清洁刷强力洗涤卫生洁具的表面。

公开(公告)号：US06699606B2

公开(公告)日：2004-03-02

申请号：US10358590

申请日：2003-02-05

申请人： Mitsuyoshi Machida ,  Koichi Hayashi ,  Hirotaka Ishibashi ,  Tomoyasu Ichiki ,  Masaaki Ito ,  Masami Ando ,  Atsushi Kitamura ,  Toshihiro Aoshima ,  Katsuhiro Kawakami ,  Satoshi Horiuchi ,  Makoto Hayakawa

发明人： Mitsuyoshi Machida ,  Koichi Hayashi ,  Hirotaka Ishibashi ,  Tomoyasu Ichiki ,  Masaaki Ito ,  Masami Ando ,  Atsushi Kitamura ,  Toshihiro Aoshima ,  Katsuhiro Kawakami ,  Satoshi Horiuchi ,  Makoto Hayakawa

IPC分类号： B32B900

CPC分类号： C04B41/009 ,  C04B41/5022 ,  C04B41/86 ,  C04B2111/00336 ,  Y10T428/24926 ,  Y10T428/265 ,  Y10T428/2982 ,  Y10T428/31 ,  C04B33/00

摘要： A sanitary ware comprises a sanitary ware body and a surface glaze layer provided on the sanitary ware body. The surface glaze layer has a center line average roughness Ra of less than 0.07 &mgr;m as measured with a stylus type surface roughness tester according to JIS B 0651-1996.

摘要翻译： 卫生洁具包括卫生洁具主体和设置在卫生洁具主体上的表面釉层。 表面釉层的中心线平均粗糙度Ra小于0.07μm，用根据JIS B 0651-1996的触针式表面粗糙度测试仪测量。

公开(公告)号：US06548162B1

公开(公告)日：2003-04-15

申请号：US09490894

申请日：2000-01-27

申请人： Mitsuyoshi Machida ,  Koichi Hayashi ,  Hirotaka Ishibashi ,  Tomoyasu Ichiki ,  Masaaki Ito ,  Masami Ando ,  Atsushi Kitamura ,  Toshihiro Aoshima ,  Katsuhiro Kawakami ,  Satoshi Horiuchi ,  Makoto Hayakawa

发明人： Mitsuyoshi Machida ,  Koichi Hayashi ,  Hirotaka Ishibashi ,  Tomoyasu Ichiki ,  Masaaki Ito ,  Masami Ando ,  Atsushi Kitamura ,  Toshihiro Aoshima ,  Katsuhiro Kawakami ,  Satoshi Horiuchi ,  Makoto Hayakawa

IPC分类号： B32B516

CPC分类号： C04B41/009 ,  C04B41/5022 ,  C04B41/86 ,  C04B2111/00336 ,  Y10T428/24926 ,  Y10T428/265 ,  Y10T428/2982 ,  Y10T428/31 ,  C04B33/00

摘要： Sanitary wares having a controlled surface are disclosed which are less likely to be stained or soiled and/or possess excellent gloss. The first sanitary ware comprises a sanitary ware body and a surface glaze layer provided on the sanitary ware body, wherein the surface glaze layer has a center line average roughness Ra of less than 0.07 &mgr;m. This sanitary ware is advantageous in that stains or soils are much less likely to be adhered to the surface thereof and, even when adhered to the surface thereof, can be removed by a weak water stream. The second sanitary ware comprises a sanitary ware body and a surface glaze layer provided on the sanitary ware body, wherein the surface glaze layer has a kurtosis Rku of less than 2.70. This sanitary ware advantageously possesses excellent surface gloss. The third sanitary ware comprises a sanitary ware body and a surface glaze layer provided on the sanitary ware body, wherein the surface of the surface glaze layer consists essentially of a vitreous component and is free from silica particles having a particle diameter of not less than 10 &mgr;m. This sanitary ware is advantageous in that stains or soils are less likely to be adhered to the surface thereof.

摘要翻译： 公开了具有受控表面的卫生用品，其不太可能被染色或污染和/或具有优异的光泽。 第一卫生洁具包括卫生洁具主体和设置在卫生洁具主体上的表面釉层，其中表面釉层的中心线平均粗糙度Ra小于0.07μm。 这种卫生洁具的优点在于，污渍或土壤不太可能附着在其表面上，并且即使当粘附到其表面时也可以通过弱水流除去。 第二卫生洁具包括卫生洁具主体和设置在卫生洁具主体上的表面釉层，其中表面釉层的峭度Rku小于2.70。 这种卫生洁具有利地具有优异的表面光泽度。 第三卫生洁具包括卫生洁具主体和设置在卫生洁具主体上的表面釉层，其中表面釉层的表面主要由玻璃质成分组成，不含粒径不小于10的二氧化硅颗粒 妈妈 这种卫生洁具的优点在于，污渍或污垢不太可能附着在其表面上。

公开(公告)号：US20140198321A1

公开(公告)日：2014-07-17

申请号：US14240669

申请日：2012-07-27

申请人： Masaaki Ito ,  Takahiro Jingu ,  Hisashi Hatano

发明人： Masaaki Ito ,  Takahiro Jingu ,  Hisashi Hatano

IPC分类号： G01B11/24 ,  G01N21/55

CPC分类号： G01B11/303 ,  G01B11/24 ,  G01B2210/56 ,  G01N21/4738 ,  G01N21/55 ,  G01N21/9501 ,  G01N2201/12

摘要： In related art, consideration is not given to that a spatial distribution of scattered light changes in various direction such as forward/backward/sideways according to a difference in micro roughness. Particularly, although a step-terrace structure appearing on an epitaxial growth wafer produces anisotropy in the scattered light distribution, consideration is not given to this point in the related art. The invention includes a process in which light is illuminated to a sample surface, plural detection optical systems mutually different in directions of optical axes detect a spatial distribution of scattered light, and a spatial frequency spectrum of the sample surface is calculated.

摘要翻译： 在现有技术中，不考虑散射光的空间分布根据微粗糙度的差异而在各种方向如前后/侧面变化。 特别地，虽然出现在外延生长晶片上的台阶平台结构在散射光分布中产生各向异性，但是在现有技术中没有考虑到这一点。 本发明包括将光照射到样品表面的方法，在光轴方向上彼此不同的多个检测光学系统检测散射光的空间分布，并且计算样品表面的空间频谱。

公开(公告)号：US20130286191A1

公开(公告)日：2013-10-31

申请号：US13997496

申请日：2011-11-02

申请人： Masaaki Ito ,  Hidetoshi Nishimura ,  Takahiro Jingu

发明人： Masaaki Ito ,  Hidetoshi Nishimura ,  Takahiro Jingu

IPC分类号： H04N7/18

CPC分类号： H04N7/18 ,  G01N21/47 ,  G01N21/9501 ,  G01N21/956 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： In a defect inspecting apparatus, the strength of a fatal defect signal decreases due to miniaturization. Thus, in order to assure a high SN ratio, it is necessary to reduce noises caused by scattered light from a wafer. Roughness of a pattern edge and surface roughness which serve as a scattered-light source are spread over the entire wafer. The present invention has discovered the fact that reduction of an illuminated area is a technique effective for decreasing noises. That is to say, the present invention has discovered the fact that creation of an illuminated area having a spot shape and reduction of the dimension of a spot beam are effective. A plurality of temporally and spatially divided spot beams are radiated to the wafer serving as a sample.

摘要翻译： 在缺陷检查装置中，致命缺陷信号的强度由于小型化而降低。 因此，为了确保高的SN比，需要减少由晶片散射的光产生的噪声。 用作散射光源的图案边缘和表面粗糙度的粗糙度分布在整个晶片上。 本发明已经发现，减少照明区域是有效降低噪声的技术。 也就是说，本发明已经发现了具有斑点形状的照明区域的创建和点光束的尺寸的减小的事实是有效的。 将多个时间上和空间上分开的光束照射到作为样品的晶片。

公开(公告)号：US20130250297A1

公开(公告)日：2013-09-26

申请号：US13990103

申请日：2011-10-11

申请人： Masaaki Ito ,  Minori Noguchi

发明人： Masaaki Ito ,  Minori Noguchi

IPC分类号： G01N21/95

CPC分类号： G01N21/9501 ,  G01N21/95607

摘要： Disclosed here is a macro inspection apparatus for a sample such as a semiconductor wafer having a pattern formed thereon, the apparatus being capable of detecting abnormalities in dimension and size with high sensitivity.The inspection apparatus for a sample having pattern formed thereon includes: an illumination optical system which illuminates the sample having the pattern formed thereon; a detection optical system which receives scattered light from the pattern; an imaging device which is disposed over a pupil plane of the detection optical system, the imaging device acquiring Fourier images of the pattern; and a processing unit which compares the Fourier images with the Fourier image of the normal pattern to detect an irregularity of the pattern.

摘要翻译： 这里公开了一种用于诸如其上形成有图案的半导体晶片的样品的宏观检查装置，该装置能够以高灵敏度检测尺寸和尺寸的异常。 用于其上形成有图案的样品的检查装置包括：照射具有形成在其上的图案的样品的照明光学系统; 检测光学系统，其接收来自图案的散射光; 成像装置，其设置在所述检测光学系统的光瞳平面上，所述成像装置获取所述图案的付里叶图像; 以及处理单元，其将傅立叶图像与正常图案的傅里叶图像进行比较，以检测图案的不规则性。

公开(公告)号：US07819159B2

公开(公告)日：2010-10-26

申请号：US11439953

申请日：2006-05-25

申请人： Masaaki Ito ,  Yukinori Nakayama ,  Tatsuharu Yamamoto ,  Hiroaki Imai

发明人： Masaaki Ito ,  Yukinori Nakayama ,  Tatsuharu Yamamoto ,  Hiroaki Imai

IPC分类号： B29C65/00 ,  B32B37/00

CPC分类号： G02F1/1341 ,  G02F1/1303 ,  G02F2001/133354 ,  G02F2001/13415 ,  G02F2202/28

摘要： A bonding apparatus, suitable for accurately bonding large substrates for a liquid crystal display, includes Z-axis drive mechanisms, and upper and lower chambers. The Z-axis drive mechanisms for moving an upper frame vertically are disposed at four corners of a mount. The upper chamber is supported by the upper frame and has an upper table inside. The lower chamber has a lower table inside and is supported on the mount. The upper and lower chambers are united through a seal ring to define a vacuum chamber. Moving the upper frame moves the upper chamber vertically to open or close the vacuum chamber. The lower table is supported via a free joint stage between the plurality of support legs and the table, and is moved horizontally by a side thrust mechanism disposed outside of the vacuum chamber.

摘要翻译： 适合于将液晶显示器的大基板精确地接合的接合装置包括Z轴驱动机构和上下室。 用于垂直移动上框架的Z轴驱动机构设置在底座的四个角处。 上部腔室由上部框架支撑，内部具有上部工作台。 下腔室内有一个较低的台面，并支撑在支架上。 上部和下部腔室通过密封环联合以限定真空室。 移动上框架使上室垂直移动以打开或关闭真空室。 下表通过多个支撑腿和台之间的自由关节台支撑，并且通过设置在真空室外部的侧推力机构水平移动。

公开(公告)号：US07746659B2

公开(公告)日：2010-06-29

申请号：US12072165

申请日：2008-02-25

申请人： Masaaki Ito

发明人： Masaaki Ito

IPC分类号： H05K1/18

CPC分类号： G02F1/13452 ,  G02F1/133385

摘要： The invention provides a heat dissipater such as a heat dissipation member that dissipates heat of an integrated circuit that is formed on a flexible substrate such as a flexible printed circuit board. The heat dissipater according to an aspect of the invention includes; a main body section that is formed in the shape of a hollow sleeve in such a manner that the flexible substrate can be inserted through and inserted inside the main body section; and an adhering section that is formed on an inner surface of the main body section in such a manner that the main body section and the integrated circuit are adhered to each other via the adhering section.

摘要翻译： 本发明提供一种散热器，例如散热构件，其散热形成在诸如柔性印刷电路板的柔性基板上的集成电路的热量。 根据本发明的一个方面的散热器包括： 主体部，其形成为中空套筒的形状，使得柔性基板能够插入并插入到主体部内; 以及粘附部，其以主体部和集成电路经由粘接部彼此粘合形成在主体部的内表面上。

公开(公告)号：US20090202138A1

公开(公告)日：2009-08-13

申请号：US12361954

申请日：2009-01-29

申请人： Masaaki Ito ,  Minori Noguchi ,  Shigeru Matsui

发明人： Masaaki Ito ,  Minori Noguchi ,  Shigeru Matsui

IPC分类号： G06K9/00

CPC分类号： G01N21/9501 ,  G01N21/95623 ,  G01N2021/8822 ,  G06K9/74

摘要： The present invention provides an inspection apparatus having a high throughput and high sensitivity with respect to a number of various manufacturing processes and defects of interest in inspection of a specimen such as a semiconductor wafer on which a pattern is formed. The apparatus illuminates with light the specimen having the pattern formed thereon, forms an image of the specimen on an image sensor through a reflective optics, and determines the existence/nonexistence of a defect. The reflective optics has a conjugate pair of Fourier transform optics. An aberration of the reflective optics is corrected off-axis. The reflective optics has a field of view in non-straight-line slit form on the specimen surface. Also, the optics is of a reflection type, includes a conjugate pair of Fourier transform optics and has a field of view in non-straight-line slit form. An optimum wavelength band is selected according to the specimen (FIG. 1).

摘要翻译： 本发明提供了一种检测装置，其相对于在其上形成有图案的半导体晶片的样本的检查中的多种制造工艺和多个不同的制造工艺和缺陷而具有高生产率和高灵敏度。 该装置用光照射具有形成在其上的图案的样本，通过反射光学元件在图像传感器上形成样本的图像，并且确定缺陷的存在/不存在。 反射光学器件具有傅立叶变换光学器件的共轭对。 反射光学器件的像差被偏离校正。 反射光学元件在样品表面上具有非直线狭缝形式的视场。 此外，光学器件是反射型的，包括傅立叶变换光学器件的共轭对，并且具有非直线狭缝形式的视场。 根据样品选择最佳波长带（图1）。

公开(公告)号：US20090161943A1

公开(公告)日：2009-06-25

申请号：US12338528

申请日：2008-12-18

申请人： Hiroyuki Yamashita ,  Norio Sakaiya ,  Kei Shimura ,  Masaaki Ito

发明人： Hiroyuki Yamashita ,  Norio Sakaiya ,  Kei Shimura ,  Masaaki Ito

IPC分类号： G01N21/88 ,  G06T11/20 ,  G06K9/00

CPC分类号： G01N21/88 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/8848 ,  G01N2021/8861 ,  G06K9/2036 ,  G06K2209/19 ,  G06T7/00

摘要： The invention is directed to find a false defect from defect candidates and obtain a threshold with which the false defect can be eliminated by the smallest number of review times. Defect candidates are reviewed and selected as a defect or a false defect. By deleting a defect candidate having a characteristic quantity equal to or less than that of the false defect from a map or displaying it in another sign, the false defect can be determined visually. Since the defect candidate having the characteristic quantity equal to or less than that of the selected false defect is deleted from the map or displayed in another sign, the defect candidates unnecessary to set a threshold are not reviewed. The number of defect candidates to be reviewed can be largely reduced as compared with that in the conventional technique. Further, by repeating the above work, the threshold is automatically calculated, and an inspection result map with the threshold is displayed, so that a re-inspection is unnecessary.

摘要翻译： 本发明旨在从缺陷候选中找到虚假缺陷，并获得最小次数的审查时间可以消除错误缺陷的阈值。 缺陷候选者被审查和选择为缺陷或假缺陷。 通过从地图中删除具有等于或小于虚假缺陷的特征量的缺陷候选物，或者以另一个符号显示，可以视觉地确定假缺陷。 由于具有等于或小于所选择的错误缺陷的特征量的缺陷候选者从地图中删除或以另一个符号显示，所以不会检查不必设置阈值的缺陷候选。 与常规技术相比，可以大大减少待审查的缺陷候选物的数量。 此外，通过重复上述工作，自动计算阈值，并且显示具有阈值的检查结果图，使得不需要重新检查。