Method and apparatus for producing group III nitride based compound semiconductor
    10.
    发明授权
    Method and apparatus for producing group III nitride based compound semiconductor 有权
    制备III族氮化物基化合物半导体的方法和装置

    公开(公告)号:US08123856B2

    公开(公告)日:2012-02-28

    申请号:US12225550

    申请日:2007-04-05

    IPC分类号: C30B19/00 C30B19/06

    摘要: In the flux method, a source nitrogen gas is sufficiently heated before feeding to an Na—Ga mixture.The apparatus of the invention is provided for producing a group III nitride based compound semiconductor. The apparatus includes a reactor which maintains a group III metal and a metal differing from the group III metal in a molten state, a heating apparatus for heating the reactor, an outer vessel for accommodating the reactor and the heating apparatus, and a feed pipe for feeding a gas containing at least nitrogen from the outside of the outer vessel into the reactor. The feed pipe has a zone for being heated together with the reactor by means of the heating apparatus, wherein the zone is heated inside the outer vessel and outside the reactor.

    摘要翻译: 在通量法中,在将氮源充分加热至Na-Ga混合物之前,充分加热。 提供本发明的装置用于制造III族氮化物基化合物半导体。 该装置包括在熔融状态下维持III族金属和不同于III族金属的金属的反应器,用于加热反应器的加热装置,用于容纳反应器的外部容器和加热装置,以及用于 将从外部容器外部至少含有氮气的气体进料到反应器中。 进料管具有通过加热装置与反应器一起加热的区域,其中该区域在外部容器内部和反应器外部被加热。