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1.发明申请CLEANING SHEETS, TRANSFER MEMBER HAVING CLEANING FUNCTION, AND METHOD OF CLEANING SUBSTRATE-PROCESSING APPARATUS WITH THESE 失效清洁纸，具有清洁功能的转印部件以及用这些清洁基板处理装置的方法公开(公告)号：US20080173329A1
公开(公告)日：2008-07-24
申请号：US12045326
申请日：2008-03-10
申请人： Makoto NAMIKAWA , Yoshio Terada , Jirou Nukaga
发明人： Makoto NAMIKAWA , Yoshio Terada , Jirou Nukaga
CPC分类号： H01L21/6835 , B08B1/00 , B08B7/0028 , C11D17/049 , G11B23/505 , H01J2237/022 , H05K3/26 , Y10T428/24942 , Y10T428/249953 , Y10T428/249978 , Y10T428/24998 , Y10T428/249982 , Y10T428/249983 , Y10T428/28 , Y10T428/31504
摘要： A cleaning sheet which comprises a porous layer as a cleaning layer; or a cleaning sheet which comprises a sheet material having a porous layer and, formed on one side of the sheet material, an adhesive layer.
摘要翻译： 一种清洁片，其包括多孔层作为清洁层; 或清洁片，其包括具有多孔层的片材，并且在片材的一侧上形成粘合剂层。
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2.发明授权Cleaning sheets, transfer member having cleaning function, and method of cleaning substrate-processing apparatus with these 失效清洁片，具有清洁功能的转印部件以及用这些清洁基板处理装置的方法公开(公告)号：US08460783B2
公开(公告)日：2013-06-11
申请号：US12045326
申请日：2008-03-10
申请人： Makoto Namikawa , Yoshio Terada , Jirou Nukaga
发明人： Makoto Namikawa , Yoshio Terada , Jirou Nukaga
CPC分类号： H01L21/6835 , B08B1/00 , B08B7/0028 , C11D17/049 , G11B23/505 , H01J2237/022 , H05K3/26 , Y10T428/24942 , Y10T428/249953 , Y10T428/249978 , Y10T428/24998 , Y10T428/249982 , Y10T428/249983 , Y10T428/28 , Y10T428/31504
摘要： A cleaning sheet which comprises a porous layer as a cleaning layer; or a cleaning sheet which comprises a sheet material having a porous layer and, formed on one side of the sheet material, an adhesive layer.
摘要翻译： 一种清洁片，其包括多孔层作为清洁层; 或清洁片，其包括具有多孔层的片材，并且在片材的一侧上形成粘合剂层。
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3.发明申请CLEANING SHEET, CONVEYING MEMBER USING THE SAME, AND SUBSTRATE PROCESSING EQUIPMENT CLEANING METHOD USING THEM 审中-公开使用它们的清洁片，输送构件和使用它们的基板处理设备清洁方法公开(公告)号：US20100319151A1
公开(公告)日：2010-12-23
申请号：US12851797
申请日：2010-08-06
申请人： Makoto Namikawa , Yoshio Terada , Jirou Nukaga , Eiji Toyoda , Hirofumi Fujii , Daisuke Uenda , Asami Funatsu , Nobuaki Maruoka , Hitoshi Ishizaka , Yasuhiro Amano
发明人： Makoto Namikawa , Yoshio Terada , Jirou Nukaga , Eiji Toyoda , Hirofumi Fujii , Daisuke Uenda , Asami Funatsu , Nobuaki Maruoka , Hitoshi Ishizaka , Yasuhiro Amano
IPC分类号： A47L25/00
CPC分类号： B08B1/00 , B08B7/00 , B08B7/0028 , Y10T428/2848 , Y10T428/31721
摘要： A cleaning sheet for cleaning foreign matters away from the interior of the substrate processing equipment is provided. The cleaning sheet includes a cleaning layer having substantially no tackiness and having a tensile modulus of not lower than 0.98 N/mm2 as determined according to JIS K7127. Alternatively, the cleaning sheet includes a cleaning layer having a Vickers hardness of not lower than 10 MPa.
摘要翻译： 提供了一种用于清除离开基板处理设备内部的异物的清洁片。 清洁片包括基本上没有粘性并且根据JIS K7127测定的拉伸模量不低于0.98N / mm 2的清洁层。 或者，清洁片包括维氏硬度不低于10MPa的清洁层。
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4.发明申请Cleaning sheet, conveying member using the same, and substrate processing equipment cleaning method using them 审中-公开清洁片，使用其的输送部件，以及使用它们的基板处理设备清洗方法公开(公告)号：US20060105164A1
公开(公告)日：2006-05-18
申请号：US11229586
申请日：2005-09-20
申请人： Makoto Namikawa , Yoshio Terada , Jirou Nukaga , Eiji Toyoda , Hirofumi Fujii , Daisuke Uenda , Asami Funatsu , Nobuaki Maruoka , Hitoshi Ishizaka , Yasuhiro Amano
发明人： Makoto Namikawa , Yoshio Terada , Jirou Nukaga , Eiji Toyoda , Hirofumi Fujii , Daisuke Uenda , Asami Funatsu , Nobuaki Maruoka , Hitoshi Ishizaka , Yasuhiro Amano
CPC分类号： B08B1/00 , B08B7/00 , B08B7/0028 , C08G73/12 , C08G73/16 , C08J7/047 , C08J2409/00 , C08J2479/00 , G11B5/41 , Y10T428/28 , Y10T442/2738
摘要： A cleaning sheet for cleaning foreign matters away from the interior of the substrate processing equipment is provided. The cleaning sheet includes a cleaning layer having substantially no tackiness and having a tensile modulus of not lower than 0.98 N/mm2 as determined according to JIS K7127. Alternatively, the cleaning sheet includes a cleaning layer having a Vickers hardness of not lower than 10 MPa.
摘要翻译： 提供了一种用于清除离开基板处理设备内部的异物的清洁片。 清洁片包括基本上没有粘性并且根据JIS K7127测定的拉伸模量不低于0.98N / mm 2的清洁层。 或者，清洁片包括维氏硬度不低于10MPa的清洁层。
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5.发明授权Cleaning sheet, conveying member using the same, and substrate processing equipment cleaning method using them 有权清洁片，使用其的输送部件，以及使用它们的基板处理设备清洗方法公开(公告)号：US07793668B2
公开(公告)日：2010-09-14
申请号：US11014779
申请日：2004-12-20
申请人： Makoto Namikawa , Yoshio Terada , Jirou Nukaga , Eiji Toyoda , Hirofumi Fujii , Daisuke Uenda , Asami Funatsu , Nobuaki Maruoka , Hitoshi Ishizaka , Yasuhiro Amano
发明人： Makoto Namikawa , Yoshio Terada , Jirou Nukaga , Eiji Toyoda , Hirofumi Fujii , Daisuke Uenda , Asami Funatsu , Nobuaki Maruoka , Hitoshi Ishizaka , Yasuhiro Amano
IPC分类号： B08B3/00
CPC分类号： B08B1/00 , B08B7/00 , B08B7/0028 , Y10T428/2848 , Y10T428/31721
摘要： A cleaning sheet for cleaning foreign matters away from the interior of the substrate processing equipment is provided. The cleaning sheet includes a cleaning layer having substantially no tackiness and having a tensile modulus of not lower than 0.98 N/mm2 as determined according to JIS K7127. Alternatively, the cleaning sheet includes a cleaning layer having a Vickers hardness of not lower than 10 MPa.
摘要翻译： 提供了一种用于清除离开基板处理设备内部的异物的清洁片。 清洁片包括基本上没有粘性并且根据JIS K7127测定的拉伸模量不低于0.98N / mm 2的清洁层。 或者，清洁片包括维氏硬度不低于10MPa的清洁层。
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6.发明授权Cleaning sheet, conveying member using the same, and substrate processing equipment cleaning method using them 有权清洁片，使用其的输送部件，以及使用它们的基板处理设备清洗方法公开(公告)号：US07713356B2
公开(公告)日：2010-05-11
申请号：US10297173
申请日：2001-05-08
申请人： Makoto Namikawa , Yoshio Terada , Jirou Nukaga , Eiji Toyoda
发明人： Makoto Namikawa , Yoshio Terada , Jirou Nukaga , Eiji Toyoda
CPC分类号： B08B1/00 , B08B7/00 , B08B7/0028 , Y10T156/1052 , Y10T428/2481 , Y10T428/24818 , Y10T428/249982
摘要： A cleaning sheet for cleaning foreign matters away from the interior of the substrate processing equipment is provided. The cleaning sheet includes a cleaning layer having substantially no tackiness and having a tensile modulus of not lower than 0.98 N/mm2 as determined according to JIS K7127. Alternatively, the cleaning sheet includes a cleaning layer having a Vickers hardness of not lower than 10.
摘要翻译： 提供了一种用于清除离开基板处理设备内部的异物的清洁片。 清洁片包括基本上没有粘性并且根据JIS K7127测定的拉伸模量不低于0.98N / mm 2的清洁层。 或者，清洁片包括维氏硬度不低于10的清洁层。
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7.发明申请Cleaning sheets, transfer member having cleaning function, and method of cleaning substrate-processing apparatus with these 审中-公开清洁片，具有清洁功能的转印部件以及用这些清洁基板处理装置的方法公开(公告)号：US20070104939A1
公开(公告)日：2007-05-10
申请号：US11643774
申请日：2006-12-22
申请人： Makoto Namikawa , Yoshio Terada , Jirou Nukaga
发明人： Makoto Namikawa , Yoshio Terada , Jirou Nukaga
CPC分类号： H01L21/6835 , B08B1/00 , B08B7/0028 , C11D17/049 , G11B23/505 , H01J2237/022 , H05K3/26 , Y10T428/24942 , Y10T428/249953 , Y10T428/249978 , Y10T428/24998 , Y10T428/249982 , Y10T428/249983 , Y10T428/28 , Y10T428/31504
摘要： A cleaning sheet which comprises a porous layer as a cleaning layer; or a cleaning sheet which comprises a sheet material having a porous layer and, formed on one side of the sheet material, an adhesive layer.
摘要翻译： 一种清洁片，其包括多孔层作为清洁层; 或清洁片，其包括具有多孔层的片材，并且在片材的一侧上形成粘合剂层。
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8.发明申请Cleaning sheet, conveying member using the same, and substrate processing equipment cleaning method using them 有权清洁片，使用其的输送部件，以及使用它们的基板处理设备清洗方法公开(公告)号：US20050244632A1
公开(公告)日：2005-11-03
申请号：US11014779
申请日：2004-12-20
申请人： Makoto Namikawa , Yoshio Terada , Jirou Nukaga , Eiji Toyoda , Hirofumi Fujii , Daisuke Uenda , Asami Funatsu , Nobuaki Maruoka , Hitoshi Ishizaka , Yasuhiro Amano
发明人： Makoto Namikawa , Yoshio Terada , Jirou Nukaga , Eiji Toyoda , Hirofumi Fujii , Daisuke Uenda , Asami Funatsu , Nobuaki Maruoka , Hitoshi Ishizaka , Yasuhiro Amano
CPC分类号： B08B1/00 , B08B7/00 , B08B7/0028 , Y10T428/2848 , Y10T428/31721
摘要： A cleaning sheet for cleaning foreign matters away from the interior of the substrate processing equipment is provided. The cleaning sheet includes a cleaning layer having substantially no tackiness and having a tensile modulus of not lower than 0.98 N/mm2 as determined according to JIS K7127. Alternatively, the cleaning sheet includes a cleaning layer having a Vickers hardness of not lower than 10 MPa.
摘要翻译： 提供了一种用于清除离开基板处理设备内部的异物的清洁片。 清洁片包括基本上没有粘性并且根据JIS K7127测定的拉伸模量不低于0.98N / mm 2的清洁层。 或者，清洁片包括维氏硬度不低于10MPa的清洁层。
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9.发明申请Cleaning sheets, transfer member having cleaning function, and method of cleaning substrate-processing apparatus with these 审中-公开清洁片，具有清洁功能的转印部件以及用这些清洁基板处理装置的方法公开(公告)号：US20050118414A1
公开(公告)日：2005-06-02
申请号：US11000007
申请日：2004-12-01
申请人： Makoto Namikawa , Yoshio Terada , Jirou Nukaga
发明人： Makoto Namikawa , Yoshio Terada , Jirou Nukaga
CPC分类号： H01L21/6835 , B08B1/00 , B08B7/0028 , C11D17/049 , G11B23/505 , H01J2237/022 , H05K3/26 , Y10T428/24942 , Y10T428/249953 , Y10T428/249978 , Y10T428/24998 , Y10T428/249982 , Y10T428/249983 , Y10T428/28 , Y10T428/31504
摘要： A cleaning sheet which comprises a porous layer as a cleaning layer; or a cleaning sheet which comprises a sheet material having a porous layer and, formed on one side of the sheet material, an adhesive layer.
摘要翻译： 一种清洁片，其包括多孔层作为清洁层; 或清洁片，其包括具有多孔层的片材，并且在片材的一侧上形成粘合剂层。
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公开(公告)号：US07846258B2
公开(公告)日：2010-12-07
申请号：US10535842
申请日：2003-11-10
申请人： Yoshio Terada , Makoto Namikawa , Eiji Toyoda
发明人： Yoshio Terada , Makoto Namikawa , Eiji Toyoda
CPC分类号： B08B1/00 , B08B3/08 , G02F2001/1316 , Y10T428/14 , Y10T428/28
摘要： A cleaning sheet comprises a cleaning layer provided on one side of a base material, from which cleaning layer F−, Cl−, Br−, NO2−, NO3−, PO43−, SO42−, Na+, NH4+ and K+ are extractable with pure water each in an amount of not greater than 20 ppm, when extracted under boiling at 120° C. for 1 hour, and a pressure-sensitive adhesive layer provided on the other side of the base material, a carrying material with cleaning capacity comprising the aforementioned cleaning sheet laminated on a carrying material with a pressure-sensitive adhesive layer. The present disclosure also relates to a method for cleaning a substrate processing equipment which comprises conveying the aforementioned carrying material with cleaning capacity into the substrate processing equipment.
摘要翻译： 清洁片包括设置在基材一侧上的清洁层，清洁层F-，Cl-，Br-，NO2-，NO3-，PO43-，SO42-，Na +，NH4 +和K +可从其中纯化 当在120℃下沸腾提取1小时时，各自的量不大于20ppm，并且设置在基材另一侧的压敏粘合剂层，具有清洁能力的载体材料包括 上述清洁片层压在携带材料上的压敏粘合剂层。 本公开还涉及一种用于清洁基板处理设备的方法，其包括将具有清洁能力的上述携带材料输送到基板处理设备中。
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