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1.发明授权公开(公告)号：US07684436B2
公开(公告)日：2010-03-23
申请号：US10518409
申请日：2003-06-18
IPC分类号： H04J3/22
CPC分类号： H04L67/2819 , H04L29/06 , H04L47/2408 , H04L67/04 , H04L67/26 , H04L67/28 , H04L67/2871 , H04L69/08 , H04L69/329 , H04W4/00 , H04W4/18 , H04W80/04 , H04W88/16
摘要： Various services for a mobile communication network or an IP network are implemented by processing necessary information suitably in accordance with a service type so as to exchange the information to a service control device and transmitting the results of the service process by the service control device to the mobile communication network or the IP network, for a service request from the mobile communication network or the IP network. A gateway device of the present invention retains a signal defining various rules or policies received from the service control device, judges a service type and a destination requested from the service request signal by the various rules or policies for the service request signal transmitted from a communication terminal of the mobile communication network or the communication terminal of the IP network, performs protocol conversion on the service request signal in accordance with the service type, and transmits the service request signal to the corresponding destination.
摘要翻译： 针对移动通信网络或IP网络的各种服务通过根据服务类型适当地处理必要信息来实现，以便将信息交换到服务控制设备，并将服务控制设备的服务处理结果传送到 移动通信网络或IP网络，用于来自移动通信网络或IP网络的服务请求。 本发明的网关装置保存定义从服务控制装置接收的各种规则或策略的信号，通过从通信发送的服务请求信号的各种规则或策略来判断从服务请求信号请求的服务类型和目的地 移动通信网络的终端或IP网络的通信终端，根据服务类型对服务请求信号执行协议转换，并将服务请求信号发送到对应的目的地。
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2.发明申请Gateway apparatus, and method for processsing signals in the gateway apparatus 有权网关装置，以及网关装置中处理信号的方法公开(公告)号：US20050226250A1
公开(公告)日：2005-10-13
申请号：US10518409
申请日：2003-06-18
IPC分类号： H04W88/16 , H04L12/66 , H04L12/701 , H04L12/721 , H04L29/06 , H04L29/08 , H04W4/00 , H04W4/16 , H04W4/18 , H04W28/00 , H04W80/04 , H04L12/56
CPC分类号： H04L67/2819 , H04L29/06 , H04L47/2408 , H04L67/04 , H04L67/26 , H04L67/28 , H04L67/2871 , H04L69/08 , H04L69/329 , H04W4/00 , H04W4/18 , H04W80/04 , H04W88/16
摘要： The present invention provides various services for a mobile communication network (100) or an IP network (200), by processing necessary information suitably in accordance with a service type so as to exchange the information to a service control device (20) and transmitting the results of the service process by the service control device (20) to the mobile communication network (100) or the IP network (200), for a service request from the mobile communication network (100) or the IP network (200). A gateway device (10) of the present invention retains a signal defining various rules or policies received from the service control device (20), judges a service type and a destination requested from the service request signal by the various rules or policies for the service request signal transmitted from a communication terminal (300) of the mobile communication network (100) or the communication terminal of the IP network (20), performs protocol conversion on the service request signal in accordance with the service type, and transmits the service request signal to the corresponding destination.
摘要翻译： 本发明通过根据业务类型适当地处理必要信息，为移动通信网（100）或IP网络（200）提供各种业务，以便将信息交换到业务控制设备（20） 对于来自移动通信网络（100）或IP网络（200）的服务请求，业务控制设备（20）向移动通信网络（100）或IP网络（200）的业务处理结果。 本发明的网关装置（10）保存定义从服务控制装置（20）接收的各种规则或策略的信号，通过服务请求信号所要求的服务类型和目的地，通过服务的各种规则或策略 从所述移动通信网络（100）的通信终端（300）或所述IP网络（20）的通信终端发送的请求信号，根据所述服务类型对所述服务请求信号执行协议转换，并且发送所述服务请求 信号到相应的目的地。
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3.发明授权公开(公告)号：US08926402B2
公开(公告)日：2015-01-06
申请号：US13303485
申请日：2011-11-23
申请人： Masayuki Nakanishi , Masaya Seki , Kenji Kodera
发明人： Masayuki Nakanishi , Masaya Seki , Kenji Kodera
CPC分类号： B24B9/065 , B24B21/002 , B24B37/02
摘要： A method of polishing a peripheral portion of a substrate is provided. This method includes: causing sliding contact between the peripheral portion of the substrate and a polishing tape; and supplying a polishing liquid onto the polishing tape contacting the peripheral portion of the substrate. The polishing tape includes a base tape and a fixed abrasive formed on the base tape, and the polishing liquid is an alkaline polishing liquid containing an alkaline chemical and an additive including molecules that cause steric hindrance.
摘要翻译： 提供了研磨基板周边部分的方法。 该方法包括：引起基板的周边部分与研磨带之间的滑动接触; 以及将研磨液供给到与基板的周边部分接触的研磨带上。 抛光带包括形成在基带上的基带和固定磨料，抛光液是含有碱性化学物质和包含引起空间位阻的分子的添加剂的碱性抛光液。
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4.发明授权Method and apparatus for polishing a substrate having a grinded back surface 有权用于研磨具有研磨后表面的基材的方法和设备公开(公告)号：US08535117B2
公开(公告)日：2013-09-17
申请号：US12956381
申请日：2010-11-30
IPC分类号： B24B1/00
CPC分类号： B24B9/065 , B24B21/002
摘要： A method capable of quickly polishing an angular portion formed by a grinded back surface and a circumferential surface of a substrate without causing damages on the thin substrate is provided. The method includes rotating the substrate about its center, and pressing a polishing tape against the angular portion formed by the back surface and the circumferential surface of the substrate to polish the angular portion.
摘要翻译： 提供了一种能够快速抛光由磨削的背面和基板的圆周表面形成的角部，而不会在薄基板上造成损坏的方法。 该方法包括使基板围绕其中心旋转，并且将研磨带压靠在由基板的背面和圆周表面形成的角部上以抛光角部。
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5.发明申请POLISHING APPARATUS, POLISHING METHOD AND PRESSING MEMBER FOR PRESSING A POLISHING TOOL 有权抛光设备，抛光方法和压制用于压制抛光工具的构件公开(公告)号：US20110237164A1
公开(公告)日：2011-09-29
申请号：US12986481
申请日：2011-01-07
申请人： Masaya SEKI , Kenya Ito , Masayuki Nakanishi
发明人： Masaya SEKI , Kenya Ito , Masayuki Nakanishi
CPC分类号： B24B9/065 , B24B21/004 , B24B37/27
摘要： A polishing apparatus polishes a top edge portion and/or a bottom edge portion of a substrate accurately and uniformly. The polishing apparatus includes a rotary holding mechanism 3 configured to hold the substrate W horizontally and to rotate the substrate W; and at least one polishing head 30 disposed near the peripheral portion of the substrate. The polishing head 30 has at least one protrusion 51a, 51b extending along a circumferential direction of the substrate W, and the polishing head 30 is configured to press a polishing surface of a polishing tape 23 by the protrusion 51a, 51b against the peripheral portion of the substrate W from above or below.
摘要翻译： 抛光装置精确而均匀地抛光基板的顶边部分和/或底边部分。 抛光装置包括旋转保持机构3，其构造成水平地保持基板W并使基板W旋转; 以及设置在基板的周边部分附近的至少一个抛光头30。 抛光头30具有沿着基板W的圆周方向延伸的至少一个突起51a，51b，并且抛光头30被构造成通过突起51a，51b将抛光带23的抛光表面压靠在基板 基底W从上方或下方。
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公开(公告)号：US06938968B2
公开(公告)日：2005-09-06
申请号：US10258131
申请日：2001-04-23
CPC分类号： F16L59/065 , B65D81/18 , B65D81/3823 , B65D81/3897 , C03C13/00 , F25D23/062 , F25D2201/124 , F25D2201/126 , F25D2201/14 , F25D2400/04 , Y10T428/1362 , Y10T428/231
摘要： Vacuum heat insulator comprising a laminated core made of a plurality of sheets of inorganic fibers having 10 μm or smaller in diameter and a certain composition including SiO2 as a main component, Al2O3, CaO, and MgO, a gas barrier enveloping member, and an absorbent. The vacuum heat insulator is characterized by having at least one groove formed therein after fabrication of the vacuum heat insulator. Further, the vacuum heat insulator is characterized by using inorganic fiber core of which a peak of distribution in fiber diameter lies between 1 μm or smaller and 0.1 μm or larger, and not containing binding material for binding the fiber material. Electronic apparatuses use the vacuum heat insulator. With use of the vacuum heat insulator, electronic and electric apparatuses superior in energy saving and not to present uncomfortable feeling to the user can be provided.
摘要翻译： 真空绝热体包括由直径10μm以下的多个无机纤维片构成的叠层铁芯，以及以SiO 2为主要成分的一定成分，Al 2 N 2 氧化铝，氧化镁，氧化镁，阻气性包封材料和吸收剂。 真空绝热器的特征在于在制造真空隔热件之后具有形成在其中的至少一个凹槽。 此外，真空绝热体的特征在于使用纤维直径分布的峰值在1μm以上0.1μm以下的无机纤维芯，不含粘合纤维材料的粘合材料。 电子设备使用真空绝热体。 通过使用真空绝热体，可以提供节能性优异且不给使用者带来不适感的电子电气装置。
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7.发明授权Microencapsulated photochromic material, process for its preparation and a water-base ink composition prepared therefrom 失效微胶囊化光致变色材料，其制备方法和由其制备的水性油墨组合物
公开(公告)号：US5017225A
公开(公告)日：1991-05-21
申请号：US392913
申请日：1989-07-27
CPC分类号： C09D11/50 , C09K9/02 , G03C1/002 , G03C1/685 , Y10T428/2984
摘要： This invention relates to a microencapsulated photochromic material and a process for its preparation. More particularly, it relates to a microencapsulated photochromic material having a good durability and a process for its preparation.The present invention further relates to a water-base ink composition comprising said microencapsulated photochromic material.
摘要翻译： PCT No.PCT / JP88 / 01215 Sec。 371日期：1989年7月27日 102（e）日期1989年7月27日PCT提交1988年12月1日PCT公布。 第WO89 / 05335号公报 日本6月15日，1989年。本发明涉及一种微囊化光致变色材料及其制备方法。 更具体地说，本发明涉及具有良好耐久性的微囊化光致变色材料及其制备方法。 本发明还涉及包含所述微囊化光致变色材料的水性油墨组合物。
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公开(公告)号：US09457447B2
公开(公告)日：2016-10-04
申请号：US13073218
申请日：2011-03-28
申请人： Masaya Seki , Tetsuji Togawa , Masayuki Nakanishi
发明人： Masaya Seki , Tetsuji Togawa , Masayuki Nakanishi
IPC分类号： B24B1/00 , B24B21/00 , B24B9/06 , B24B21/20 , H01L21/306 , H01L21/67 , H01L21/68 , H01L21/84 , H01L21/66
CPC分类号： B24B21/002 , B24B9/065 , B24B21/20 , H01L21/30625 , H01L21/67092 , H01L21/67259 , H01L21/68 , H01L21/84 , H01L22/20
摘要： The polishing apparatus has a polishing unit capable of forming a right-angled cross section by polishing a peripheral portion of the substrate. The polishing unit includes a polishing head having a pressing member configured to press a polishing tape against the peripheral portion of the substrate from above, a tape supply and recovery mechanism configured to supply the polishing tape to the polishing head and to recover the polishing tape from the polishing head, a first moving mechanism configured to move the polishing head in a radial direction of the substrate, and a second moving mechanism configured to move the tape supply and recovery mechanism in the radial direction of the substrate. The guide rollers are arranged such that the polishing tape extends parallel to a tangential direction of the substrate and a polishing surface of the polishing tape is parallel to a surface of the substrate.
摘要翻译： 抛光装置具有能够通过抛光基板的周边部分而形成直角横截面的抛光单元。 抛光单元包括：抛光头，其具有被配置成从上方将研磨带压靠在基板的周边部分上的按压构件，配置成将抛光带供给到抛光头并将抛光带从 抛光头，构造成沿着基板的径向方向移动抛光头的第一移动机构和被配置为沿着基板的径向移动带供给和恢复机构的第二移动机构。 引导辊布置成使得抛光带平行于基板的切线方向延伸，并且抛光带的抛光表面平行于基板的表面。
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公开(公告)号：US08979615B2
公开(公告)日：2015-03-17
申请号：US13308857
申请日：2011-12-01
CPC分类号： B24B21/002 , B24B9/065 , B24B21/004 , B24B21/006 , B24B21/008 , B24B21/20
摘要： The polishing apparatus has a polishing unit capable of polishing a peripheral portion of the substrate to form a right-angled cross section. The polishing apparatus includes: a substrate holder that holds and rotates the substrate; guide rollers that support a polishing tape; and a polishing head having a pressing member that presses an edge of the polishing tape against the peripheral portion of the substrate from above. The guide rollers are arranged such that the polishing tape extends parallel to a tangential direction of the substrate and a polishing surface of the polishing tape is parallel to a surface of the substrate. The substrate holder includes: a holding stage that holds the substrate; and a supporting stage that supports a lower surface of the peripheral portion of the substrate in its entirety. The supporting stage rotates in unison with the holding stage.
摘要翻译： 抛光装置具有能够抛光基板的周边部分以形成直角横截面的抛光单元。 抛光装置包括：保持和旋转衬底的衬底保持器; 支撑抛光带的导辊; 以及抛光头，其具有从上方将研磨带的边缘压靠在基板的周边部分的按压部件。 引导辊布置成使得抛光带平行于基板的切线方向延伸，并且抛光带的抛光表面平行于基板的表面。 基板保持器包括：保持基板的保持台; 以及支撑台，其整体地支撑基板的周边部分的下表面。 支撑台与保持台一致地旋转。
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公开(公告)号：US07767472B2
公开(公告)日：2010-08-03
申请号：US11882398
申请日：2007-08-01
申请人： Atsushi Shigeta , Gen Toyota , Hiroyuki Yano , Kunio Oishi , Kenya Ito , Masayuki Nakanishi , Kenji Yamaguchi
发明人： Atsushi Shigeta , Gen Toyota , Hiroyuki Yano , Kunio Oishi , Kenya Ito , Masayuki Nakanishi , Kenji Yamaguchi
IPC分类号： H01L21/00
CPC分类号： B24B37/013 , B24B9/065
摘要： A substrate processing method is used to polish a substrate. The substrate processing method includes rotating a substrate 13 by a motor 12, polishing a first surface of a peripheral portion of the substrate 13 by pressing a polishing surface of a polishing mechanism 20 against the first surface, determining a polishing end point of the first surface by monitoring a polished state of the first surface, stopping the polishing according to the determining the polishing end point, determining a polishing time spent for the polishing, determining a polishing time for a second surface of the peripheral portion based on the polishing time of the first surface, and polishing the second surface for the determined polishing time.
摘要翻译： 基板处理方法用于抛光基板。 基板处理方法包括通过马达12旋转基板13，通过将研磨机构20的研磨面压在第一面上来研磨基板13的周边部的第一面，确定第一面的研磨终点 通过监测第一表面的抛光状态，根据确定抛光终点停止抛光，确定抛光所用的抛光时间，基于抛光时间确定周边部分的第二表面的抛光时间 第一表面，并抛光第二表面以确定抛光时间。
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