公开(公告)号：US08536540B2

公开(公告)日：2013-09-17

申请号：US13381953

申请日：2010-05-14

申请人： Makoto Suzuki ,  Kenji Tanimoto ,  Takuma Yamamoto

发明人： Makoto Suzuki ,  Kenji Tanimoto ,  Takuma Yamamoto

IPC分类号： H01J37/26

CPC分类号： H01J37/28 ,  H01J37/026 ,  H01J37/20 ,  H01J2237/004 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： Since charging characteristics differ between the outer circumferential portion and the center portion of a sample to be inspected, equivalent inspection sensitivities cannot be obtained in the outer circumferential portion and the center portion of the sample to be inspected. A sample cover is provided in the outer circumferential portion of a sample holder on which the sample to be inspected is placed. Charging characteristics of the sample cover are changed according to charging characteristics of the sample to be inspected. Consequently, uniform charged states can be formed in the outer circumferential portion and the center portion of the sample. Inspection/observation of the outer circumferential portion of the sample can be realized at higher sensitivity than in the past.

摘要翻译： 由于待检查样品的外周部分和中心部分的充电特性不同，所以待检样品的外周部分和中心部分不能获得相同的检查灵敏度。 在待检测样品放置的样品架的外周部设置有样品盖。 样品盖的充电特性根据待检样品的充电特性而改变。 因此，可以在样品的外周部分和中心部分形成均匀的带电状态。 可以以比以往更高的灵敏度实现样品的外周部的检查/观察。

公开(公告)号：US20120126118A1

公开(公告)日：2012-05-24

申请号：US13381953

申请日：2010-05-14

申请人： Makoto Suzuki ,  Kenji Tanimoto ,  Takuma Yamamoto

发明人： Makoto Suzuki ,  Kenji Tanimoto ,  Takuma Yamamoto

IPC分类号： H01J37/26 ,  H01J37/20

CPC分类号： H01J37/28 ,  H01J37/026 ,  H01J37/20 ,  H01J2237/004 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： Since charging characteristics differ between the outer circumferential portion and the center portion of a sample to be inspected, equivalent inspection sensitivities cannot be obtained in the outer circumferential portion and the center portion of the sample to be inspected. A sample cover is provided in the outer circumferential portion of a sample holder on which the sample to be inspected is placed. Charging characteristics of the sample cover are changed according to charging characteristics of the sample to be inspected. Consequently, uniform charged states can be formed in the outer circumferential portion and the center portion of the sample. Inspection/observation of the outer circumferential portion of the sample can be realized at higher sensitivity than in the past.

摘要翻译： 由于待检查样品的外周部分和中心部分的充电特性不同，所以待检样品的外周部分和中心部分不能获得相同的检查灵敏度。 在待检测样品放置的样品架的外周部设置有样品盖。 样品盖的充电特性根据待检样品的充电特性而改变。 因此，可以在样品的外周部分和中心部分形成均匀的带电状态。 可以以比以往更高的灵敏度实现样品的外周部的检查/观察。

公开(公告)号：US20070241278A1

公开(公告)日：2007-10-18

申请号：US11808376

申请日：2007-06-08

申请人： Makoto Suzuki ,  Kenji Tanimoto ,  Yuko Sasaki

发明人： Makoto Suzuki ,  Kenji Tanimoto ,  Yuko Sasaki

IPC分类号： G01N23/00

CPC分类号： H01J37/21 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/216 ,  H01J2237/24592 ,  H01J2237/2487 ,  H01J2237/2817 ,  H01J2237/2826

摘要： A charged particle beam apparatus obtains an image by detecting a generation signal inclusively indicative of secondary electrons generated from a specimen. The apparatus has an input unit for inputting current and voltage values to be applied to a charged particle optical system through which the charged particle beam travels, a memory unit for storing shape, position and physical properties of the charged particle optical system and accuracy of the applied current or voltage, an electromagnetic field calculation unit for calculating an electromagnetic field near a path of the charged particle beam, a charged particle trajectory calculation unit for calculating a trajectory of the charged particle beam in the calculated electromagnetic field, a memory unit for storing a result of the trajectory calculation and a controller for controlling the charged particle optical system on the basis of the result of the trajectory calculation.

公开(公告)号：US20060016990A1

公开(公告)日：2006-01-26

申请号：US11183906

申请日：2005-07-19

申请人： Makoto Suzuki ,  Kenji Tanimoto ,  Yuko Sasaki

发明人： Makoto Suzuki ,  Kenji Tanimoto ,  Yuko Sasaki

IPC分类号： H01J37/28 ,  H01J37/256

CPC分类号： H01J37/21 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/216 ,  H01J2237/24592 ,  H01J2237/2487 ,  H01J2237/2817 ,  H01J2237/2826

摘要： A charged particle beam apparatus obtains an image by detecting a generation signal inclusively indicative of secondary electrons generated from a specimen. The apparatus has an input unit for inputting current and voltage values to be applied to a charged particle optical system through which the charged particle beam travels, a memory unit for storing shape, position and physical properties of the charged particle optical system and accuracy of the applied current or voltage, an electromagnetic field calculation unit for calculating an electromagnetic field near a path of the charged particle beam, a charged particle trajectory calculation unit for calculating a trajectory of the charged particle beam in the calculated electromagnetic field, a memory unit for storing a result of the trajectory calculation and a controller for controlling the charged particle optical system on the basis of the result of the trajectory calculation.

摘要翻译： 带电粒子束装置通过检测包含从样本产生的二次电子的生成信号来获得图像。 该装置具有用于输入要施加到带电粒子光束通过的带电粒子光学系统的电流和电压值的输入单元，用于存储带电粒子光学系统的形状，位置和物理特性的存储单元以及 施加电流或电压的电磁场计算单元，用于计算带电粒子束路径附近的电磁场的电磁场计算单元，用于计算计算出的电磁场中的带电粒子束的轨迹的带电粒子轨迹计算单元，存储 轨迹计算的结果和基于轨迹计算结果来控制带电粒子光学系统的控制器。

公开(公告)号：US07435960B2

公开(公告)日：2008-10-14

申请号：US11808376

申请日：2007-06-08

申请人： Makoto Suzuki ,  Kenji Tanimoto ,  Yuko Sasaki

发明人： Makoto Suzuki ,  Kenji Tanimoto ,  Yuko Sasaki

IPC分类号： H01J37/28 ,  H01J37/256

CPC分类号： H01J37/21 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/216 ,  H01J2237/24592 ,  H01J2237/2487 ,  H01J2237/2817 ,  H01J2237/2826

摘要： A charged particle beam apparatus obtains an image by detecting a generation signal inclusively indicative of secondary electrons generated from a specimen. The apparatus has an input unit for inputting current and voltage values to be applied to a charged particle optical system through which the charged particle beam travels, a memory unit for storing shape, position and physical properties of the charged particle optical system and accuracy of the applied current or voltage, an electromagnetic field calculation unit for calculating an electromagnetic field near a path of the charged particle beam, a charged particle trajectory calculation unit for calculating a trajectory of the charged particle beam in the calculated electromagnetic field, a memory unit for storing a result of the trajectory calculation and a controller for controlling the charged particle optical system on the basis of the result of the trajectory calculation.

摘要翻译： 带电粒子束装置通过检测包含从样本产生的二次电子的生成信号来获得图像。 该装置具有用于输入要施加到带电粒子光束通过的带电粒子光学系统的电流和电压值的输入单元，用于存储带电粒子光学系统的形状，位置和物理特性的存储单元以及 施加电流或电压的电磁场计算单元，用于计算带电粒子束路径附近的电磁场的电磁场计算单元，用于计算计算出的电磁场中的带电粒子束的轨迹的带电粒子轨迹计算单元，存储 轨迹计算的结果和基于轨迹计算结果来控制带电粒子光学系统的控制器。

公开(公告)号：US07241996B2

公开(公告)日：2007-07-10

申请号：US11183906

申请日：2005-07-19

申请人： Makoto Suzuki ,  Kenji Tanimoto ,  Yuko Sasaki

发明人： Makoto Suzuki ,  Kenji Tanimoto ,  Yuko Sasaki

IPC分类号： H01J37/28 ,  H01J37/256

CPC分类号： H01J37/21 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/216 ,  H01J2237/24592 ,  H01J2237/2487 ,  H01J2237/2817 ,  H01J2237/2826

摘要： A charged particle beam apparatus obtains an image by detecting a generation signal inclusively indicative of secondary electrons generated from a specimen. The apparatus has an input unit for inputting current and voltage values to be applied to a charged particle optical system through which the charged particle beam travels, a memory unit for storing shape, position and physical properties of the charged particle optical system and accuracy of the applied current or voltage, an electromagnetic field calculation unit for calculating an electromagnetic field near a path of the charged particle beam, a charged particle trajectory calculation unit for calculating a trajectory of the charged particle beam in the calculated electromagnetic field, a memory unit for storing a result of the trajectory calculation and a controller for controlling the charged particle optical system on the basis of the result of the trajectory calculation.

摘要翻译： 带电粒子束装置通过检测包含从样本产生的二次电子的生成信号来获得图像。 该装置具有用于输入要施加到带电粒子光束通过的带电粒子光学系统的电流和电压值的输入单元，用于存储带电粒子光学系统的形状，位置和物理特性的存储单元以及 施加电流或电压的电磁场计算单元，用于计算带电粒子束路径附近的电磁场的电磁场计算单元，用于计算计算出的电磁场中的带电粒子束的轨迹的带电粒子轨迹计算单元，存储 轨迹计算的结果和基于轨迹计算结果来控制带电粒子光学系统的控制器。

公开(公告)号：US07752864B2

公开(公告)日：2010-07-13

申请号：US11659121

申请日：2005-08-01

申请人： Masaaki Takegami ,  Takeo Ueno ,  Kenji Tanimoto ,  Satoru Sakae

发明人： Masaaki Takegami ,  Takeo Ueno ,  Kenji Tanimoto ,  Satoru Sakae

IPC分类号： F25B13/00

CPC分类号： F25B13/00 ,  F25B2313/0231

摘要： A refrigeration apparatus (1) is provided with a refrigerant circuit (1E) along which are connected a compressor (2), an outdoor heat exchanger (4), an expansion mechanism, an indoor heat exchanger (41) for providing room air conditioning, and a cooling heat exchanger (45, 51) for providing storage compartment cooling. The refrigerant circuit (1E) includes a discharge side three way switch valve (101) for varying the flow rate of a portion of the refrigerant which is discharged out of the compressor (2) and then distributed to the indoor heat exchanger (41) and the outdoor heat exchanger (4) during a heat recovery operation mode in which the indoor heat exchanger (41) and the outdoor heat exchanger (4) operate as condensers. As a result of such arrangement, even when the amount of heat obtained in the cooling heat exchanger (45, 51) exceeds the amount of heat required in the indoor heat exchanger (41), surplus heat is discharged without excessive decrease in the discharge pressure of the compressor (2).

摘要翻译： 制冷装置（1）具备：制冷剂回路（1E），连接有压缩机（2），室外热交换器（4），膨胀机构，室内空调用的室内热交换器（41） 以及用于提供储藏室冷却的冷却热交换器（45,51）。 制冷剂回路（1E）包括排出侧三通切换阀（101），用于改变从压缩机（2）排出的一部分制冷剂的流量，然后分配到室内热交换器（41）和 在室内热交换器（41）和室外热交换器（4）作为冷凝器运转的热回收运转模式中的室外热交换器（4）。 作为这种结构的结果，即使在冷却热交换器（45,51）中获得的热量超过室内热交换器（41）所需的热量的情况下，也可以排出多余的热量而不会使排出压力过度降低 的压缩机（2）。

公开(公告)号：US20080156908A1

公开(公告)日：2008-07-03

申请号：US12071785

申请日：2008-02-26

申请人： Isao Ota ,  Kenji Tanimoto ,  Gen Yamada ,  Noriyuki Takakuma

发明人： Isao Ota ,  Kenji Tanimoto ,  Gen Yamada ,  Noriyuki Takakuma

IPC分类号： B02C17/20

CPC分类号： B02C17/00 ,  B02C17/20 ,  C09K3/1409

摘要： A method of milling cerium compound by means of a ball mill using a milling medium, characterized in that ratio Hb/r of radius r of a cylindrical ball mill container and depth Hb of the milling medium in the ball mill container disposed horizontally ranges from 1.2 to 1.9, and the ball mill container is rotated at a rotational speed which is 50% or less of critical rotational speed Nc=299/r1/2 of the ball mill container converted from the radius r expressed in centimeter. The milling method can be carried out in a wet or dry process, and the cerium compound is preferably cerium oxide. The method can be also applied for producing a cerium compound slurry.

摘要翻译： 一种通过使用研磨介质的球磨机研磨铈化合物的方法，其特征在于，圆柱形球磨机容器的半径r与深度H b b的比值H b / 水平设置的球磨机容器中的研磨介质的SUB> 1.2〜1.9，球磨容器以临界旋转速度N C = 50％以下的转速旋转， 从以半径r表示的半径r转换的球磨机容器的299 / r 1/2倍。 研磨方法可以在湿法或干法中进行，铈化合物优选为氧化铈。 该方法也可用于制备铈化合物浆料。

公开(公告)号：US20070228276A1

公开(公告)日：2007-10-04

申请号：US11692263

申请日：2007-03-28

申请人： HIROSHI MAKINO ,  Kenji Tanimoto ,  Zhaohui Cheng ,  Hikaru Koyama

发明人： HIROSHI MAKINO ,  Kenji Tanimoto ,  Zhaohui Cheng ,  Hikaru Koyama

IPC分类号： G21K7/00

CPC分类号： H01J37/265 ,  H01J2237/047 ,  H01J2237/0473 ,  H01J2237/0475 ,  H01J2237/2817

摘要： When performing an inspection using a charge control function in a SEM wafer inspection apparatus, acceleration voltage, control voltage and deceleration voltage are changed in conjunction so that incident energy determined by “acceleration voltage−deceleration voltage” and bias voltage determined by “deceleration voltage−control voltage” do not change. By this means, charge of a wafer can be controlled, while restraining electrostatic lens effect generated near a control electrode. As a result, an inspection using a charge control function at low incident energy and in a wide viewing field can be performed, and a highly sensitive inspection of semiconductor patterns subject to damages due to electron beam irradiation can be realized. Acceleration voltage, control voltage and deceleration voltage are changed in conjunction so that incident energy determined by “acceleration voltage−deceleration voltage” and bias voltage determined by “deceleration voltage−control voltage” do not change.

摘要翻译： 当在SEM晶片检查装置中使用充电控制功能进行检查时，加速电压，控制电压和减速电压结合起来，使得由“加速电压 - 减速电压”确定的入射能量和由“减速电压 - 控制电压“不变。 通过这种方式，可以控制晶片的电荷，同时抑制在控制电极附近产生的静电透镜效应。 结果，可以执行使用低入射能量和宽视场中的电荷控制功能的检查，并且可以实现由于电子束照射而受到损害的半导体图案的高灵敏度检查。 加速电压，控制电压和减速电压结合起来，使得由“加速电压 - 减速电压”确定的入射能量和由“减速电压控制电压”确定的偏置电压不变。

公开(公告)号：US07155928B2

公开(公告)日：2007-01-02

申请号：US10489297

申请日：2003-07-02

申请人： Masaaki Takegami ,  Kenji Tanimoto

发明人： Masaaki Takegami ,  Kenji Tanimoto

IPC分类号： F25B1/00 ,  F25B49/00

CPC分类号： F25B13/00 ,  F25B1/10 ,  F25B40/00 ,  F25B2313/007 ,  F25B2313/0231 ,  F25B2313/0233 ,  F25B2313/02331 ,  F25B2400/075 ,  F25B2400/0751 ,  F25B2400/16 ,  F25B2400/22 ,  F25B2600/021 ,  Y02B30/741

摘要： In a refrigerating apparatus in which a plurality of application-side heat exchangers (41, 45, 51) are connected to a heat-source side heat exchanger (4), liquid lines for a plurality of channels in a refrigerant circuit (1E) share a liquid side communication pipe (11) in order to reduce the number of pipes. Further, the liquid side communication pipe (11) is provided adjacent to a low-pressure gas side communication pipe (15) for at least one channel so as to contact it in order to supercool a liquid refrigerant by a low-pressure gas refrigerant. Thus, workability for connecting the pipes is improved and a refrigerating ability may not be decreased even if communication pipes (11, 15, 17) become long.

摘要翻译： 在多个利用侧热交换器（41,45,51）与热源侧热交换器（4）连接的制冷装置中，制冷剂回路（1E）中的多个通道的液体管线 共享液侧连通管（11），以减少管道数量。 此外，液侧连通管（11）与低压气体侧连通管（15）相邻设置，用于至少一个通道以与其接触，以便通过低压气体制冷剂使液体制冷剂过冷。 因此，即使连通管（11,15,17）变长，也可以提高连接管的可加工性，并且制冷能力也不会降低。