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    Apparatus and method for irradiating electron beam
    1.
    发明申请
    Apparatus and method for irradiating electron beam 失效
    用于照射电子束的装置和方法

    公开(公告)号：US20050180877A1

    公开(公告)日：2005-08-18

    申请号：US11029815

    申请日：2005-01-04

    申请人： Mamoru Usami ,  Kazushi Tanaka ,  Yukio Kaneko ,  Naoyuki Echigo ,  Akihiko Kizaki ,  Hiroshi Tominaga ,  Kunihiko Ozaki

    发明人： Mamoru Usami ,  Kazushi Tanaka ,  Yukio Kaneko ,  Naoyuki Echigo ,  Akihiko Kizaki ,  Hiroshi Tominaga ,  Kunihiko Ozaki

    IPC分类号： G21K5/04 ,  A61L2/00 ,  A61L2/08 ,  B29C35/08 ,  G21K5/00 ,  G21K5/10 ,  H01J37/18

    CPC分类号： H01J37/18 ,  B29C2035/0877 ,  H01J2237/3156

    摘要： An electron beam irradiation apparatus includes a turn-transfer mechanism; a turn-transfer chamber; an electron beam irradiation section; a replacement room configured to bring a target into and out of the turn-transfer chamber; an outer irradiation target holding table configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, and a target holding mechanism; an inner irradiation target holding table, configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, and a target holding mechanism, the inner irradiation target holding table being supported by the turn-transfer mechanism; a turning mechanism configured to turn the turn-transfer mechanism and an elevator mechanism configured to move the turn-transfer mechanism up and down; and a rotation mechanism disposed at the electron beam irradiation section and configured to rotate the target.

    摘要翻译： 电子束照射装置包括转向传递机构; 转转室; 电子束照射部; 更换室，其配置成使目标进出转向传送室; 被配置为形成更换室的一部分的外部照射目标保持台，并且包括X射线屏蔽机构，气密性保持机构和目标保持机构; 内部照射目标保持台，被配置为形成更换室的一部分，并且包括X射线屏蔽机构，气密性保持机构和目标保持机构，所述内侧照射目标保持台由所述转动 机制; 转动机构，其构造成转动转向机构;以及升降机构，其构造成使转动机构上下移动; 以及旋转机构，设置在所述电子束照射部，并且被配置为使所述目标旋转。

    Apparatus and method for irradiating electron beam
    2.
    发明授权
    Apparatus and method for irradiating electron beam 失效
    用于照射电子束的装置和方法

    公开(公告)号：US07282726B2

    公开(公告)日：2007-10-16

    申请号：US11029815

    申请日：2005-01-04

    申请人： Mamoru Usami ,  Kazushi Tanaka ,  Yukio Kaneko ,  Naoyuki Echigo ,  Akihiko Kizaki ,  Hiroshi Tominaga ,  Kunihiko Ozaki

    发明人： Mamoru Usami ,  Kazushi Tanaka ,  Yukio Kaneko ,  Naoyuki Echigo ,  Akihiko Kizaki ,  Hiroshi Tominaga ,  Kunihiko Ozaki

    IPC分类号： A61I2/00

    CPC分类号： H01J37/18 ,  B29C2035/0877 ,  H01J2237/3156

    摘要： An electron beam irradiation apparatus includes a turn-transfer mechanism; a turn-transfer chamber; an electron beam irradiation section; a replacement room configured to bring a target into and out of the turn-transfer chamber; an outer irradiation target holding table configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, and a target holding mechanism; an inner irradiation target holding table, configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, and a target holding mechanism, the inner irradiation target holding table being supported by the turn-transfer mechanism; a turning mechanism configured to turn the turn-transfer mechanism and an elevator mechanism configured to move the turn-transfer mechanism up and down; and a rotation mechanism disposed at the electron beam irradiation section and configured to rotate the target.

    摘要翻译： 电子束照射装置包括转向传递机构; 转转室; 电子束照射部; 更换室，其配置成使目标进出转向传送室; 被配置为形成更换室的一部分的外部照射目标保持台，并且包括X射线屏蔽机构，气密性保持机构和目标保持机构; 内部照射目标保持台，被配置为形成更换室的一部分，并且包括X射线屏蔽机构，气密性保持机构和目标保持机构，所述内侧照射目标保持台由所述转动 机制; 转动机构，其构造成转动转向机构;以及升降机构，其构造成使转动机构上下移动; 以及旋转机构，设置在所述电子束照射部，并且被配置为使所述目标旋转。

    Apparatus and method for irradiating electron beam
    3.
    发明授权
    Apparatus and method for irradiating electron beam 失效
    用于照射电子束的装置和方法

    公开(公告)号：US07348555B2

    公开(公告)日：2008-03-25

    申请号：US11029810

    申请日：2005-01-04

    申请人： Mamoru Usami ,  Kazushi Tanaka ,  Yukio Kaneko ,  Naoyuki Echigo ,  Hiroshi Tominaga ,  Akihiko Kizaki ,  Kunihiko Ozaki

    发明人： Mamoru Usami ,  Kazushi Tanaka ,  Yukio Kaneko ,  Naoyuki Echigo ,  Hiroshi Tominaga ,  Akihiko Kizaki ,  Kunihiko Ozaki

    IPC分类号： H01J49/32

    CPC分类号： G21K5/04

    摘要： An electron beam irradiation apparatus includes a turn-transfer mechanism; a turn irradiation chamber; an electron beam irradiation section; a replacement room configured to bring a target into and out of the turn irradiation chamber; an outer irradiation target holding table configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, a target holding mechanism; an inner irradiation target holding table configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, and a target holding mechanism, the inner irradiation target holding table being supported by the turn-transfer mechanism; a turning mechanism configured to drive the turn-transfer mechanism; and an elevator mechanism configured to move the turn-transfer mechanism, which supports the inner irradiation target holding table, up and down.

    摘要翻译： 电子束照射装置包括转向传递机构; 转照射室; 电子束照射部; 更换室，其构造成使目标进出转动照射室; 外部照射目标保持台，被配置为形成更换室的一部分，并且包括X射线屏蔽机构，气密性保持机构，目标保持机构; 内部照射目标保持台，被配置为形成更换室的一部分，并且包括X射线屏蔽机构，气密性保持机构和目标保持机构，所述内部照射目标保持台由所述转动传递机构 ; 构造成驱动转向传递机构的转动机构; 以及电梯机构，被构造成上下移动支撑内照射目标保持台的转向传递机构。

    Apparatus and method for irradiating electron beam
    4.
    发明申请
    Apparatus and method for irradiating electron beam 失效
    用于照射电子束的装置和方法

    公开(公告)号：US20050173654A1

    公开(公告)日：2005-08-11

    申请号：US11029810

    申请日：2005-01-04

    申请人： Mamoru Usami ,  Kazushi Tanaka ,  Yukio Kaneko ,  Naoyuki Echigo ,  Hiroshi Tominaga ,  Akihiko Kizaki ,  Kunihiko Ozaki

    发明人： Mamoru Usami ,  Kazushi Tanaka ,  Yukio Kaneko ,  Naoyuki Echigo ,  Hiroshi Tominaga ,  Akihiko Kizaki ,  Kunihiko Ozaki

    IPC分类号： A61L2/08 ,  G21K5/00 ,  G21K5/04 ,  G21K5/10

    CPC分类号： G21K5/04

    摘要： An electron beam irradiation apparatus includes a turn-transfer mechanism; a turn irradiation chamber; an electron beam irradiation section; a replacement room configured to bring a target into and out of the turn irradiation chamber; an outer irradiation target holding table configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, a target holding mechanism; an inner irradiation target holding table configured to form a part of the replacement room, and including an X-ray shielding mechanism, an airtightness maintaining mechanism, and a target holding mechanism, the inner irradiation target holding table being supported by the turn-transfer mechanism; a turning mechanism configured to drive the turn-transfer mechanism; and an elevator mechanism configured to move the turn-transfer mechanism, which supports the inner irradiation target holding table, up and down.

    摘要翻译： 电子束照射装置包括转向传递机构; 转照射室; 电子束照射部; 更换室，其构造成使目标进出转动照射室; 外部照射目标保持台，被配置为形成更换室的一部分，并且包括X射线屏蔽机构，气密性保持机构，目标保持机构; 内部照射目标保持台，被配置为形成更换室的一部分，并且包括X射线屏蔽机构，气密性保持机构和目标保持机构，所述内部照射目标保持台由所述转动传递机构 ; 构造成驱动转向传递机构的转动机构; 以及电梯机构，被构造成上下移动支撑内照射目标保持台的转向传递机构。

    Method and apparatus for irradiating active energy ray
    5.
    发明授权
    Method and apparatus for irradiating active energy ray 失效
    用于照射活性能量射线的方法和装置

    公开(公告)号：US06727508B1

    公开(公告)日：2004-04-27

    申请号：US09857367

    申请日：2001-06-04

    申请人： Hiroshi Tominaga ,  Akihiko Kizaki ,  Yasuo Iida ,  Kunihiko Ozaki

    发明人： Hiroshi Tominaga ,  Akihiko Kizaki ,  Yasuo Iida ,  Kunihiko Ozaki

    IPC分类号： A61N500

    CPC分类号： B29C35/10 ,  B01J19/12 ,  B01J19/125 ,  B01J19/22 ,  B29C2035/0827 ,  B29C2035/0844 ,  B29C2035/085 ,  B29C2035/0877 ,  B29C2035/0883 ,  B29C2791/005 ,  B29K2105/256 ,  B29L2007/002

    摘要： A target object to be irradiated is transported into an irradiating chamber through a transport inlet for irradiation with an active energy beam under an inert gas atmosphere in an active energy beam irradiating section included in the irradiating chamber and, then is transported out of the irradiating chamber. When the object is subject to above steps, the gas flow resistance at the transport outlet is controlled such that the active energy beam irradiation is carried out under the condition of X/Y≧1, where X represents the gas amount passing through the transport inlet, and Y represents the gas amount passing through the transport outlet.

    摘要翻译： 要照射的目标物体通过用于在惰性气体气氛中的活性能量束照射的输送入口在包含在照射室中的活性能量束照射部分中被输送到照射室中，然后被运送到照射室 。 当物体经受上述步骤时，控制输送出口处的气体流动阻力，使得活性能量束照射在X / Y> = 1的条件下进行，其中X表示通过运输的气体量 入口，Y表示通过运输出口的气体量。

    Gas barrier laminate
    6.
    发明授权
    Gas barrier laminate 有权
    阻气层压板

    公开(公告)号：US08114521B2

    公开(公告)日：2012-02-14

    申请号：US12088135

    申请日：2006-09-25

    申请人： Hideki Kuwata ,  Takayoshi Okuzu ,  Munehiro Miyake ,  Mitsuo Yoshida ,  Junji Okamoto ,  Kunihiko Ozaki ,  Miyuki Kamoshita ,  Reiko Ueno

    发明人： Hideki Kuwata ,  Takayoshi Okuzu ,  Munehiro Miyake ,  Mitsuo Yoshida ,  Junji Okamoto ,  Kunihiko Ozaki ,  Miyuki Kamoshita ,  Reiko Ueno

    IPC分类号： B32B27/40 ,  B05D1/36

    CPC分类号： B32B27/08 ,  B32B7/12 ,  Y10T428/31565 ,  Y10T428/31609 ,  Y10T428/31797

    摘要： A gas barrier laminate comprising: a plastic substrate (I); a gas barrier layer (II) formed from a gas barrier layer-forming coating material (C) containing a polyalcohol-based polymer (A) and a polycarboxylic acid-based polymer (B); an overcoat layer (III) formed from an overcoat layer-forming coating material (F) containing at least one of a monovalent metal compound (D) and a bivalent or higher metal compound (E); and a top coat layer (IV) formed from a top coat layer-forming coating material (G); wherein the gas barrier layer (II) is laminated to the plastic substrate (I), either directly or with an anchor coat layer disposed therebetween, the overcoat layer (III) is laminated on top of the gas barrier layer (II), and the top coat layer (IV) is formed on top of the overcoat layer (III).

    摘要翻译： 1.一种阻气性层压体，包括：塑料基材（I）; 由含有多元醇系聚合物（A）和多元羧酸系聚合物（B）的阻气层形成用涂料（C）形成的阻气层（II） 由含有一价金属化合物（D）和二价以上金属化合物（E）中的至少一种的外涂层形成用涂料（F）形成的外涂层（III） 以及由顶涂层形成用涂料（G）形成的面涂层（IV）。 其中所述阻气层（II）直接地或者设置在其间的锚固涂层层压到所述塑料基板（I）上，所述外涂层（III）层压在所述阻气层（II）的顶部，并且 顶涂层（IV）形成在外涂层（III）的顶部。

    Paper container for fluid substances, and inside lid therefor
    8.
    发明授权
    Paper container for fluid substances, and inside lid therefor 失效
    用于流体物质的纸容器及其内盖

    公开(公告)号：US5622308A

    公开(公告)日：1997-04-22

    申请号：US430740

    申请日：1995-04-28

    申请人： Shinobu Ito ,  Keisuke Kaiho ,  Kunihiko Ozaki

    发明人： Shinobu Ito ,  Keisuke Kaiho ,  Kunihiko Ozaki

    IPC分类号： B65D3/06 ,  B65D3/14 ,  B65D3/22 ,  B65D5/40

    CPC分类号： B65D3/06 ,  B65D3/14 ,  B65D3/22

    摘要： A paper container for fluid substances. It comprises: a tapered trunk portion formed by rolling a sheet comprising a layer having a barrier ability applied onto a surface of cardboard, in a state in which the layer is disposed inside, and by joining longitudinal-directional ends of the sheet with each other; and a bottom member formed from a disk-shaped sheet comprising a layer having barrier ability applied onto a surface of cardboard, a lower end portion of the trunk portion and a peripheral portion of the bottom portion member being engaged and jointed with each other in such a manner that the respective layers face each other. A first end portion for forming a joint portion of the trunk portion has an extending film which surrounds an end surface of the cardboard and reaches an external surface of the cardboard. A second end portion of the joint portion has a stepped portion which bends outside from an end-surface position of the first end portion and which extends along an external surface of the first end portion. An inner film of the second end portion are directly or indirectly joined with the extending film of the first end portion.

    摘要翻译： 用于流体物质的纸容器。 它包括：一个锥形主干部分，其通过将片材包含一层具有阻挡能力的片材形成，该片材具有施加在纸板表面上的层，其中该层被设置在内部的状态下，并且通过将该片材的纵向端部彼此接合 ; 以及由盘状片形成的底部构件，其包括施加在纸板表面上的阻挡能力的层，主体部分的下端部分和底部部件的周边部分彼此接合并接合 各层彼此面对的方式。 用于形成主体部分的接合部分的第一端部具有围绕纸板的端面并延伸到纸板的外表面的延伸膜。 接合部的第二端部具有从第一端部的端面位置向外侧弯曲并且沿着第一端部的外表面延伸的阶梯部。 第二端部的内部膜与第一端部的延伸膜直接或间接接合。

    Process for the manufacture of deposition films and apparatus therefor
    9.
    发明授权
    Process for the manufacture of deposition films and apparatus therefor 失效
    沉积膜及其设备的制造工艺

    公开(公告)号：US5107791A

    公开(公告)日：1992-04-28

    申请号：US526719

    申请日：1990-05-22

    申请人： Atsushi Hirokawa ,  Kunihiko Ozaki

    发明人： Atsushi Hirokawa ,  Kunihiko Ozaki

    IPC分类号： C23C14/08 ,  C23C14/06 ,  C23C14/10 ,  C23C14/24 ,  C23C14/56

    CPC分类号： C23C14/562 ,  C23C14/10 ,  C23C14/246

    摘要： An apparatus for use in a process for the substantially continuous manufacture of a silicon oxide deposition film by evaporating a deposition material composed mainly of a combination of silicon and silicon oxide or silicon oxide alone by heating the material to continuously form a deposition layer composed mainly of silicon oxide and having a thickness of from 100 to 3,000 .ANG. on the surface of a travelling flexible plastic film. The apparatus comprises a vacuum chamber and, within the vacuum chamber, a means to allow a flexible plastic film to travel continuously, a heat evaporation member having a means to hold a shaped deposition material and a means to evaporate the shaped deposition material, the holding means having a supply port for the shaped deposition material, an outlet for evaporation residue and an opening for evaporation of the deposition material, and the means to substantially continuously supply the shaped deposition material being connected to the supply port to the heat evaporation member and to substantially continuously discharge evaporation residue from the heat evaporation member.

    摘要翻译： 一种用于通过蒸发主要由硅和氧化硅或氧化硅的组合构成的沉积材料而基本上连续制造氧化硅沉积膜的方法，该方法通过加热该材料以连续地形成主要由 氧化硅，并且在行进的柔性塑料膜的表面上具有100至3,000埃的厚度。 该设备包括真空室，并且在真空室内，允许柔性塑料膜连续行进的装置，具有保持成形沉积材料的装置的热蒸发构件和蒸发成形沉积材料的装置， 具有用于成形沉积材料的供应口，用于蒸发残余物的出口和用于蒸发沉积材料的开口的装置，以及用于将连接到供应端口的成形沉积材料基本上连续地供应到热蒸发构件的装置，以及 从蒸发构件基本上连续排出蒸发残渣。