摘要:
Offset in the ejection direction of target material droplets is corrected in order to stabilize EUV output in an EUV light source device. An extreme ultraviolet light source device includes a droplet generation device 110 that outputs target material droplets 101 towards a predetermined plasma emission point 103; a charging device 130 that charges the target material droplets 101; a trajectory correction device 140 that generates a force field in the trajectory to correct the travel direction of the charged target material droplets 101a so that the charged target material droplets 101a travel towards the plasma emission point 103; and a laser light source 150 that irradiates, at the plasma emission point 103, a laser beam onto the charged target material to generate plasma thereby.
摘要:
Offset in the ejection direction of target material droplets is corrected in order to stabilize EUV output in an EUV light source device. An extreme ultraviolet light source device includes a droplet generation device 110 that outputs target material droplets 101 towards a predetermined plasma emission point 103; a charging device 130 that charges the target material droplets 101; a trajectory correction device 140 that generates a force field in the trajectory to correct the travel direction of the charged target material droplets 101a so that the charged target material droplets 101a travel towards the plasma emission point 103; and a laser light source 150 that irradiates, at the plasma emission point 103, a laser beam onto the charged target material to generate plasma thereby.
摘要:
In an LPP type EUV light source apparatus, the intensity of radiated EUV light is stabilized by improving the positional stability of droplets. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a target supply division including a target tank for storing a target material therein and an injection nozzle for injecting the target material in a jet form, for supplying the target material into the chamber; a charging electrode applied with a direct-current voltage between the target tank and itself, for charging droplets when the target material in the jet form injected from the injection nozzle is broken up into the droplets; a laser for applying a laser beam to the droplets of the target material to generate plasma; and a collector mirror for collecting extreme ultra violet light radiated from the plasma to output the extreme ultra violet light.
摘要:
An in-vehicle terminal (101) is provided, which has a function ensuring that computer resource secured by a virtual machine (1a1) or a virtual machine (1b1) is controlled within a limit value of the computer resource that is allocated to the corresponding virtual machine, or a function which is capable of executing multiple virtual machines appropriately.When the virtual machine (1a1) or the virtual machine (1b1) requests securing the computer resource, the in-vehicle terminal (101) requests the OS (143) to secure computer resource in response to the request, if the requested resource is lower than the limit value of the computer resource that is allocated to the corresponding virtual machine. Furthermore, the in-vehicle terminal (101) checks at predetermined intervals the continuously selected count of the virtual machine previously selected, and if the continuously selected count is equal to the limit value, or the virtual machine is in standby state, a different virtual machine is selected and the OS (143) is instructed to execute the selected virtual machine.
摘要:
Solid tin (Sn) is used as a target, a CO2 laser is used as an excitation source for the target, and after the size of debris emitted from plasma is decreased to a nanometer or smaller size by exciting the solid tin by a laser beam outputted from the CO2 laser, the emitted debris of a nanometer or smaller size is acted upon so as not to reach the optical element. In accordance with the present invention, in the EUV light source apparatus, the debris emitted together with EUV light from plasma generated by exciting a target within a chamber by a laser beam is prevented from adhering to an optical element provided within the chamber and forming a metal film. As a result, the service life of the optical element can be extended.
摘要:
For the purpose of reducing the time for information processing in an array type disk device provided with a plurality of optical disk devices, when a beginning address is notified from any one of the optical disk devices to a main control device of the array type disk device, the main control device determines the beginning address notified first as a writing start address, without waiting for a notification of a beginning address from any other optical disk devices. Then, the main control device notifies the determined writing start address to the respective optical disk devices. Accordingly, even if search times for the writing start address are different among the optical disk devices, all the optical disk devices can start the writing of information based on which optical disk device has most quickly notified the beginning address.
摘要:
In a target supply unit of an extreme ultraviolet light source apparatus for generating extreme ultraviolet light by applying a laser beam to a target material to turn the target material into plasma, clogging of a target nozzle for supplying the target material to a laser beam application point is suppressed. The target supply unit includes: a target container for accommodating the target material; a target nozzle for injecting the target material supplied from the target container; and a reducing gas supply unit for supplying a reducing gas into the target container. Instead of using the reducing gas, a carbon-based material having a reduction action may be provided within the target container for causing reduction reaction.
摘要:
To solve the foregoing problems, provided is a ZnO-based semiconductor element having an entirely novel function distinct from hitherto, using a ZnO-based semiconductor and organic matter for an active role. An organic electrode 2 is formed on a ZnO-based semiconductor 1, and an Au film 3 is formed on the organic electrode 2. An electrode formed of a multilayer metal film including a Ti film 4 and an Au film 5 is formed on the back surface of the ZnO-based semiconductor 1 so as to be opposed to the organic electrode 2. A bonding interface between the organic electrode 2 and the ZnO-based semiconductor 1 is in a pn junction-like state. Thus, rectification occurs therebetween.
摘要:
An optical disk device includes an optical head unit, a drive means and a recording surface state determination means, and determines the type of an optical disk based on a state of the information recording surface. The information recording surface includes a management region on which management information is recorded and formed by a guiding groove or a prepit sequence and a data recording region on which a user data is recorded and on which a track formed by a guiding groove or a prepit sequence. The optical head unit irradiates a focused beam onto the information recording surface of an optical disk which rotates. The drive means drives to move the focused beam along a radial direction of the optical disk by driving the optical head unit. The recording surface state determination means determines a state of the information recording surface based on a reflected light of the focused beam. The optical disk device determines the type of the optical disk based on a state of the information recording surface in a determination region being set to straddle between a management region and the data recording region.
摘要:
A target supplier accelerates a target material injected from a nozzle such that a velocity of the target material after accelerated is kept within a predetermined range. The target supplier includes: a target nozzle that injects a target material in a liquid droplet state or solid particle state; an electric charge supplying unit that supplies electric charge to the target material; a charge amount measuring unit that measures an amount of the electric charge supplied to the target material by the electric charge supplying unit; a control unit that controls the electric charge supplying unit in a feedback manner based on a measurement result obtained by the charge amount measuring unit; and an accelerator that accelerates the target material supplied with the electric charge by the electric charge supplying unit.