摘要:
A clamp structure clamps superimposed circuit boards to a support plate portion of a rangefinder case in a still camera. The clamp structure includes first and second support arms spaced in confronting relation from each other by a distance greater than the thicknesses of the superimposed circuit boards and the support plate portion. The first and second support arms are disposed in sandwiching relation to the circuit boards and the support plate portion. A rod is inserted in a space defined between the second support arm and the lowermost circuit board which faces the second support arm while the first support arm is being held against the uppermost circuit board which faces the first support arm. With the rod inserted in the space, the circuit boards are fastened to the support plate portion between the first and second support arms under the resiliency of either an elastic member which is placed between the first support arm and the uppermost circuit board or the resiliency of the first and second support arms themselves.
摘要:
A PLL circuit includes a polyphase reference clock output circuit, which outputs multiple reference clocks, each clock being of different phase. The PLL circuit further includes a digital voltage controlled oscillator, which, using any one of the multiple reference clocks chosen as an operating clock, outputs an output clock whose frequency varies according to a value of a frequency control signal, and which outputs a delay amount data representing a phase difference between the phase of the output clock and an ideal phase gained by computing based on the value of the frequency control signal. The PLL circuit further includes a selection circuit which is responsive to the delay amount data to select and output the output clock synchronized with one of the multiple reference clocks.
摘要:
A method for manufacturing an LED device includes the steps of mounting an LED on a substrate, sealing the LED with a transparent resin including phosphor particles to form an LED device before being dyed, measuring chromaticity of light from the LED device before being dyed; and dyeing the sealing resin by a dye having a color for correcting the measured chromaticity to a desired color.
摘要:
A graphics processing apparatus includes a first detection part for detecting, with respect to each pixel of an image, whether or not an edge of the image starts on a scanline, and for setting a control data depending on whether or not the edge starts on the scanline, a second detection part for detecting a duration of beam power modulation corresponding to one or plural edge pixels being intersected by a line defined in the image, and for setting a duration data, a third detection part for detecting an outermost edge pixel in the edge pixels, a part for generating a beam power data indicating an intensity level of light beam power corresponding to the outermost edge pixel, an output part for outputting the image by means of a printer having a light source for emitting a light beam, and a control means for continuously modulating light beam power of the light source from the intensity level to a predetermined level with respect to the edge pixels, so that an image with smooth edges is generated by modulating the light beam power of the light source in accordance with the control data and the duration data.
摘要:
A graphic output device for removing the aliases of the edges of a vector image by an antialiasing procedure and effectively outputting image data undergone such processing. Whether or not the inclination of an input vector is greater than 45 degrees is determined. In the event of outputting the result of antialiasing processing, a pulse width modulation system (vertically long dot diameter) is selected if the inclination of the vector is greater than 45 degrees, or a power modulation system (horizontally long dot diameter) is selected if it is smaller than 45 degrees.
摘要:
A plasma processing method for use in device isolation by shallow trench isolation in which an insulating film is embedded in a trench formed in silicon and the insulating film is planarized to form a device isolation film, the method includes a plasma nitriding the silicon of an inner wall surface of the trench by using a plasma before embedding the insulating film in the trench. The plasma nitriding is performed by using a plasma of a processing gas containing a nitrogen-containing gas under conditions in which a processing pressure ranges from 1.3 Pa to 187 Pa and a ratio of a volumetric flow rate of the nitrogen-containing gas to a volumetric flow rate of the entire processing gas ranges from 1% to 80% such that a silicon nitride film is formed on the inner wall surface of the trench to have a thickness of 1 to 10 nm.
摘要:
A PLL circuit includes a polyphase reference clock output circuit that outputs reference clocks, a polyphase frequency divider circuit that outputs divided clocks, which is obtained by dividing frequencies of the reference clocks, a selection switch circuit that selects one of the reference clocks or one of the divided clocks, and outputs the selected clock as a selected clock, a digital VCO that uses the selected clock as an operating clock, and outputs delay amount data indicating a phase difference between an output clock and an ideal phase, where the output clock has a frequency that fluctuates according to a value of frequency control input data, and the ideal phase is calculated according to the output clock and the value of the frequency control input data, and a selection circuit that selects and outputs the output clock synchronized with the divided clocks according to the delay amount data.
摘要:
Disclosed is an in-chamber preprocessing method for carrying out preprocessing in a chamber prior to carrying out plasma nitridation processing of an oxide film, formed on a substrate, in the chamber. The method includes a step of supplying an oxygen-containing processing gas into the chamber and converting the gas into plasma, thereby generating an oxidizing plasma in the chamber (step 1), and a step of supplying a nitrogen-containing processing gas into the chamber and converting the gas into plasma, thereby generating a nitriding plasma in the chamber (step 2).
摘要:
Disclosed is improvement of a quartz-glass top plate to be used as a microwave-transmitting window in a microwave plasma processing apparatus. The surface, facing a substrate W, of the top plate has surface roughness equal to or less than 0.2 μm in arithmetic mean surface roughness Ra. Thereby, generation of particles derived from the quartz glass material constituting the top plate is minimized, even when the top plate is exposed to a severe environment of high electron density and high electron temperature.
摘要:
A graphics processing apparatus carries out an antialiasing for obtaining an output image having smooth edges, enabling a speedy computation of approximate shading area rates of pixels by making use of neither a subpixel dividing process nor a shading pixel counting process. The apparatus comprises a discriminating part for discriminating the presence of an end point pixel at an edge portion of an image defined by a vector data, a computing part for computing the number of edge pixels by extracting two integer parts a, b from x coordinate values Xa, Xb of two points where a scanline intersects the vector data, a setting part for setting a x coordinate value of the end point pixel to the Xb only when an end point pixel is found at the edge portion, an approximate point part for determining an approximate point value C' from a prescribed factor c.times.(n-1) computed by a decimal fraction c extracted from the x coordinate value Xa, a memory part for storing a lookup table containing a set of predetermined data, and an approximate area factor part for determining an approximate shading area factor k by making reference to the lookup table stored in the memory part.