公开(公告)号：US5429881A

公开(公告)日：1995-07-04

申请号：US195338

申请日：1994-02-14

申请人： Masamichi Aono ,  Toshihiro Chikada ,  Souichi Hayashi ,  Asao Mochizuki ,  Hiroshi Sato ,  Kouki Ikeda ,  Jun Hisamoto ,  Nagisa Takee ,  Toshiki Ueda ,  Masao Takemoto ,  Hideo Fujimoto ,  Akihiro Tsuruno ,  Kikuo Toyose

发明人： Masamichi Aono ,  Toshihiro Chikada ,  Souichi Hayashi ,  Asao Mochizuki ,  Hiroshi Sato ,  Kouki Ikeda ,  Jun Hisamoto ,  Nagisa Takee ,  Toshiki Ueda ,  Masao Takemoto ,  Hideo Fujimoto ,  Akihiro Tsuruno ,  Kikuo Toyose

IPC分类号： C23C18/48 ,  C23C22/78 ,  B32B15/20

CPC分类号： C23C18/48 ,  C23C22/78 ,  Y10T428/12611 ,  Y10T428/12736 ,  Y10T428/12757

摘要： Surface-treated Al or Al alloy materials which excel in adhesive property, formability, weldability, phosphatability, paint adhesion, and post-painting corrosion resistance are provided by forming a coated layer containing Zn and Fe or one or more of Si oxides, Al oxides and Al hydroxides together therewith, on the surface of Al or Al alloy base. The surface-treated Al or Al alloy materials are useful as metallic material to be painted and used after press forming and other processing, spot or laser welding and phosphating, including panel materials for automobiles and other various vehicles, shells for housefold electrical apparatus, and building materials.

摘要翻译： 通过形成包含Zn和Fe或一种或多种Si氧化物，Al氧化物的涂层来提供表现出优异的粘合性，成形性，可焊性，磷酸盐性，涂料粘附性和耐后腐蚀性的表面处理的Al或Al合金材料 和Al氢氧化物，在Al或Al合金基体的表面上。 表面处理的Al或Al合金材料可用作在压制成型和其它加工，点焊或激光焊接和磷化处理之后被涂漆和使用的金属材料，包括用于汽车和其他各种车辆的面板材料，用于房屋电气设备的壳体和 建筑材料。

公开(公告)号：US5389453A

公开(公告)日：1995-02-14

申请号：US62141

申请日：1993-05-17

申请人： Kikurou Toyose ,  Hideo Fujimoto ,  Akihiro Tsuruno ,  Masao Takemoto ,  Eiki Usui ,  Masahiro Kawaguchi ,  Kouki Ikeda ,  Jun Hisamoto ,  Nagisa Takee

发明人： Kikurou Toyose ,  Hideo Fujimoto ,  Akihiro Tsuruno ,  Masao Takemoto ,  Eiki Usui ,  Masahiro Kawaguchi ,  Kouki Ikeda ,  Jun Hisamoto ,  Nagisa Takee

IPC分类号： C23C22/78 ,  C23C28/00 ,  B32B15/20

CPC分类号： C23C28/00 ,  C23C22/78 ,  Y10T428/12486 ,  Y10T428/1266 ,  Y10T428/12736 ,  Y10T428/12792

摘要： An aluminum alloy material having a surface suitable for zinc phosphate processing prepared by a process comprising the steps of (1) cleaning the aluminum alloy surface, and (2) forming a composite film layer comprising Zn metal, Ni or Mn metal, and silicon oxide on the surface of the aluminum alloy.

摘要翻译： 1.一种铝合金材料，其具有适于磷酸锌处理的表面，该方法包括以下步骤：（1）清洗铝合金表面，和（2）形成包含Zn金属，Ni或Mn金属的复合膜层和氧化硅 在铝合金表面。

公开(公告)号：US5169726A

公开(公告)日：1992-12-08

申请号：US747967

申请日：1991-08-21

申请人： Hiroshi Sato ,  Kouki Ikeda ,  Jun Hisamoto ,  Nagisa Takee

发明人： Hiroshi Sato ,  Kouki Ikeda ,  Jun Hisamoto ,  Nagisa Takee

IPC分类号： C25D15/02

CPC分类号： C25D15/02 ,  Y10T428/31699

摘要： The present invention discloses a surface treated material of excellent adhesion for painting layer, corrosion resistance after painting and press formability, containing, in a Zn or Fe series plating layer, a (meth)acrylic polymer having repeating units of a (meth)acrylic acid derivative in which a compound having an epoxy group is added to a chemical formula represented by: ##STR1## where X represents --NH-- or --O--, A represents C.sub.n H.sub.2n, n is 0 or a positive integer, R represents --H or --CH.sub.3, and R.sub.1, R.sub.2 which may be identical or different with each other represents H or alkyl group.

公开(公告)号：US6027792A

公开(公告)日：2000-02-22

申请号：US849123

申请日：1997-06-03

申请人： Seigo Yamamoto ,  Katsuhiro Itayama ,  Kouki Ikeda ,  Jun Hisamoto ,  Takashi Onishi

发明人： Seigo Yamamoto ,  Katsuhiro Itayama ,  Kouki Ikeda ,  Jun Hisamoto ,  Takashi Onishi

IPC分类号： C23C14/02 ,  C23C14/08 ,  C23C16/48 ,  G02B1/10

CPC分类号： G02B1/105 ,  C23C14/024 ,  C23C14/081 ,  C23C16/488 ,  Y10T428/24942 ,  Y10T428/24975 ,  Y10T428/265

摘要： The present invention relates to a coating film excellent in resistance to corrosive halogen-containing gas and halogen-containing plasma, a method for producing the same, and technology utilizing the same.More specifically, the coating film includes an aluminum oxide as an essential material and silicon-containing material, and the coating film has such a tightness that the content of the silicon-containing material is 5 wt % or less when reduced to silicon. In other word, the coating film has no peak of a half-value width of 5.degree. or less in X-ray diffraction. In still other word, the coating film is a little short of oxygen having an oxygen-to aluminum atomic ration of 1.3 or more to below 1.5. The present invention provides a laminated structure coated with such a coating film such as a window material for use in a vacuum apparatus, and a method for producing the window material.

摘要翻译： PCT No.PCT / JP96 / 02887 Sec。 371日期：1997年6月3日 102（e）日1997年6月3日PCT 1996年10月3日提交PCT本发明涉及耐腐蚀性含卤素气体和含卤素等离子体的耐腐蚀性优异的涂膜及其制造方法， 相同。 更具体地，涂膜包括作为必需材料的氧化铝和含硅材料，并且涂膜具有这样的密封性，使得当被还原成硅时，含硅材料的含量为5重量％以下。 换句话说，涂膜在X射线衍射中没有半值宽度为5度以下的峰值。 换句话说，涂膜的氧 - 铝原子比为1.3以上至1.5以下的一点点。 本发明提供一种涂覆有如真空装置中使用的窗口材料等涂膜的层压结构体及其制造方法。

公开(公告)号：US09005765B2

公开(公告)日：2015-04-14

申请号：US13120600

申请日：2009-09-16

申请人： Koji Wada ,  Jun Hisamoto

发明人： Koji Wada ,  Jun Hisamoto

IPC分类号： B32B15/04 ,  C25D11/08 ,  C25D11/06 ,  C25D11/02

CPC分类号： C25D11/06 ,  C25D11/024

摘要： Provided is an anodic oxide processing method in which the generation of cracks is suppressed in an anodic oxide film formed on an aluminum alloy substrate surface, such as an inner wall of a vacuum chamber of a plasma processing device, and an anodic oxide film having low heat reflectivity and a high withstand voltage is formed with high efficiency. The method for forming an anodic oxide film involves forming the anodic oxide film on the surface of a JIS 6061 aluminum alloy substrate in a sulfuric acid solution or a mixed acid solution of sulfuric acid and oxalic acid.

摘要翻译： 提供了一种阳极氧化处理方法，其中在诸如等离子体处理装置的真空室的内壁的铝合金基板表面上形成的阳极氧化膜和具有低等离子体处理装置的阳极氧化膜中抑制了裂纹的产生 以高效率形成热反射率和高耐受电压。 形成阳极氧化膜的方法包括在硫酸溶液或硫酸和草酸的混合酸溶液中在JIS 6061铝合金基材的表面上形成阳极氧化膜。

公开(公告)号：US06686053B2

公开(公告)日：2004-02-03

申请号：US10196198

申请日：2002-07-17

申请人： Koji Wada ,  Jun Hisamoto

发明人： Koji Wada ,  Jun Hisamoto

IPC分类号： B32B1504

CPC分类号： C25D11/06 ,  C22C21/02 ,  C22C21/08 ,  C25D11/18 ,  Y10T428/12479

摘要： An Al alloy member having excellent corrosion resistance comprises an Al or Al alloy substrate having an anodic oxide film including a porous layer and a pore-free barrier layer. At least a part of a structure of the barrier layer is altered into boehmite and/or pseudo-boehmite, a dissolution rate of the film is at 100 mg/dm2/15 minutes or below when determined by an immersion test in phosphoric acid/chromic acid (JIS H 8683-2), and a corroded area percent is at 10% or below after allowing the film to stand in an atmosphere of 5% Cl2—Ar gas at 400° C. for 4 hours.

摘要翻译： 具有优异耐腐蚀性的Al合金构件包括具有包括多孔层和无孔阻隔层的阳极氧化膜的Al或Al合金基底。 阻挡层的结构的至少一部分被改变为勃姆石和/或假勃姆石，当通过磷酸浸渍试验测定时，膜的溶解速率为100mg / dm 2/15分钟或更低 酸/铬酸（JIS H 8683-2），腐蚀面积百分数在使膜在5％Cl 2 -Ar气氛中在400℃下放置4小时后为10％以下。

公开(公告)号：US06521046B2

公开(公告)日：2003-02-18

申请号：US09773638

申请日：2001-02-02

申请人： Toshiyuki Tanaka ,  Koji Wada ,  Jun Hisamoto ,  Hiroki Sawada ,  Hiroshi Matsuura

发明人： Toshiyuki Tanaka ,  Koji Wada ,  Jun Hisamoto ,  Hiroki Sawada ,  Hiroshi Matsuura

IPC分类号： C23C1600

CPC分类号： H01J37/32467

摘要： A chamber material made of Al alloy excellent in thermal cracking resistance and chemical and/or physical corrosion resistance and capable of reducing contamination excellently and further having excellent and wide applicable brazing property in a high temperature corrosive circumstance, in which the substrate aluminum material for the chamber material made of Al alloy having an anodized film comprises 0.1 to 2.0% Si, 0.1 to 3.5% Mg, 0.02 to 4.0% Cu on the mass% basis and the balance of Al and impurity element with Cr in the impurity elements being less than 0.04%. Preferably, Fe is 0.1% or less and Mn is 0.04% or less in the impurity element and, further, the total sum of impurity elements other than Cr and Mn being restricted to 0.1% or less. This invention can be utilized suitably to various materials used in high temperature corrosive circumstance, particularly, in high temperature corrosive gas or plasma atmosphere.

摘要翻译： 由耐热龟裂性，耐化学腐蚀性和/或物理耐腐蚀性优异并且能够在高温腐蚀环境中具有优异且广泛适用的钎焊性能的，能够优异地降低污染的Al合金制的腔室材料，其中用于 具有阳极氧化膜的Al合金制成的室内材料以质量％计含有0.1〜2.0％的Si，0.1〜3.5％的Mg，0.02〜4.0％的Cu，余量的Al和杂质元素的杂质元素的Cr少于 0.04％。 优选的是，在杂质元素中，Fe为0.1％以下，Mn为0.04％以下，Cr，Mn以外的杂质元素的总和为0.1％以下。 本发明可以适用于高温腐蚀性环境中使用的各种材料，特别是在高温腐蚀性气体或等离子体气氛中。

公开(公告)号：US09187840B2

公开(公告)日：2015-11-17

申请号：US13581086

申请日：2011-02-23

申请人： Koji Wada ,  Mamoru Hosokawa ,  Takayuki Tsubota ,  Jun Hisamoto

发明人： Koji Wada ,  Mamoru Hosokawa ,  Takayuki Tsubota ,  Jun Hisamoto

IPC分类号： C25D11/04 ,  C25D11/18 ,  C25D11/02 ,  C25D11/08 ,  C25D11/16 ,  C25D11/24 ,  C25D21/12

CPC分类号： C25D11/04 ,  C25D11/024 ,  C25D11/08 ,  C25D11/16 ,  C25D11/18 ,  C25D11/246 ,  C25D21/12

摘要： The present invention provides a method for forming an anode oxide film, in which on the assumption that a direct-current power source is used, a thick anode oxide film can be formed with good productivity within a short time without using special equipment. The method includes allowing a current A0 to pass through an aluminum base material, and includes a step of repeating a first electricity cut-off treatment multiple times, in which when a voltage reaches a voltage V1 during the formation of the film, the passage of electricity is once cut off, this electricity cut-off is continued for a period equal to or longer than an electricity cut-off time T1, and the passage of electricity is then resumed, wherein the voltage V1 and electricity cut-off time T1 satisfy the prescribed expressions.

摘要翻译： 本发明提供了一种形成阳极氧化膜的方法，其中假设使用直流电源时，可以在短时间内以高生产率形成厚阳极氧化膜而不使用特殊设备。 该方法包括使电流A0通过铝基材料，并且包括多次重复第一次断电处理的步骤，其中当膜形成期间电压达到电压V1时，通过 电一旦被切断，该断电持续时间等于或长于断电时间T1，然后恢复通电，其中电压V1和断电时间T1满足 规定的表达。

公开(公告)号：US08349519B2

公开(公告)日：2013-01-08

申请号：US12709935

申请日：2010-02-22

申请人： Toshiki Sato ,  Jun Suzuki ,  Yoshinori Ito ,  Jun Hisamoto

发明人： Toshiki Sato ,  Jun Suzuki ,  Yoshinori Ito ,  Jun Hisamoto

IPC分类号： H01M8/00

CPC分类号： H01M4/8657 ,  H01M4/8803 ,  H01M4/8817 ,  H01M4/8867 ,  H01M4/92 ,  H01M4/921 ,  H01M8/0206 ,  H01M2008/1095

摘要： It is an object of the present invention to provide a titanium electrode material which is low in cost and is excellent in electric conductivity, corrosion resistance and hydrogen absorption resistance, and a surface treatment method of a titanium electrode material. A titanium electrode material includes: on the surface of a titanium material including pure titanium or a titanium alloy, a titanium oxide layer having a thickness of 3 nm or more and 75 nm or less, and having an atomic concentration ratio of oxygen and titanium (O/Ti) at a site having the maximum oxygen concentration in the layer of 0.3 or more and 1.7 or less; and an alloy layer including at least one noble metal selected from Au, Pt, and Pd, and at least one non-noble metal selected from Zr, Nb, Ta, and Hf, having a content ratio of the noble metal and the non-noble metal of 35:65 to 95:5 by atomic ratio, and having a thickness of 2 nm or more, on the titanium oxide layer. The surface treatment method of a titanium electrode material includes a titanium oxide layer formation step, an alloy layer formation step, and a heat treatment step.

摘要翻译： 本发明的目的是提供一种成本低且导电性，耐腐蚀性和耐氢吸收性优异的钛电极材料以及钛电极材料的表面处理方法。 钛电极材料包括：在包括纯钛或钛合金的钛材料的表面上，具有3nm以上且75nm以下的氧化钛层，并且具有氧和钛的原子浓度比（ O / Ti）在层中的最大氧浓度为0.3以上且1.7以下的部位; 以及包含选自Au，Pt和Pd中的至少一种贵金属和选自Zr，Nb，Ta和Hf中的至少一种非贵金属的合金层，其具有贵金属和非金属的含量比， 在氧化钛层上的原子比为35:65〜95:5的贵金属，厚度为2nm以上。 钛电极材料的表面处理方法包括氧化钛层形成步骤，合金层形成步骤和热处理步骤。

公开(公告)号：US08298723B2

公开(公告)日：2012-10-30

申请号：US12594825

申请日：2008-03-05

申请人： Shinichi Tanifuji ,  Hirotaka Ito ,  Toshiki Sato ,  Jun Suzuki ,  Yoshinori Ito ,  Jun Hisamoto

发明人： Shinichi Tanifuji ,  Hirotaka Ito ,  Toshiki Sato ,  Jun Suzuki ,  Yoshinori Ito ,  Jun Hisamoto

IPC分类号： H01M8/04

CPC分类号： C23C14/22 ,  C22C5/02 ,  C22C5/04 ,  C22C14/00 ,  C22C16/00 ,  C22C27/02 ,  C23C14/16 ,  C23C14/165 ,  C23C14/345 ,  H01M8/0206 ,  H01M8/0208 ,  H01M8/021 ,  H01M8/0228 ,  Y02P70/56

摘要： A metal separator 1 for a fuel cell according to the invention is a metal separator for a fuel cell manufactured by using a metal substrate 2 with a flat surface, or with concave gas flow paths formed on at least a part of the surface. The metal separator 1 includes an acid-resistant metal film 3 formed over the surface of the metal substrate 2, and containing one or more kinds of non-noble metals selected from the group comprised of Zr, Nb, and Ta, and a conductive alloy film 4 formed over the acid-resistant metal film 3, and containing one or more kinds of noble metals selected from the group comprised of Au and Pt, and one or more kinds of non-noble metals selected from the group comprised of Zr, Nb, and Ta. A method for manufacturing the metal separator for a fuel cell according to the invention includes a step S1 of depositing an acid-resistant metal film, and a step S2 of depositing a conductive alloy film. With this structure, the invention provides the metal separator for a fuel cell with an excellent acid resistance and a low contact resistance, and a manufacturing method thereof.

摘要翻译： 根据本发明的用于燃料电池的金属隔板1是通过使用具有平坦表面的金属基板2或者形成在表面的至少一部分上的凹入气体流路而制造的用于燃料电池的金属隔板。 金属隔板1包括在金属基板2的表面上形成的耐酸金属膜3，并且含有选自Zr，Nb，Ta中的一种以上的非贵金属和导电性合金 在耐酸金属膜3上形成的含有选自Au和Pt的一种或多种贵金属的一种或多种选自Zr，Nb ，和Ta。 根据本发明的燃料电池用金属隔板的制造方法包括沉积耐酸金属膜的工序S1和沉积导电性合金膜的工序S2。 利用该结构，本发明提供了具有优异的耐酸性和低接触电阻的燃料电池用金属隔板及其制造方法。